DE69423942T2 - Verfahren zur Herstellung einer Vorrichtung unter Verwendung einer Ellipsometrietechnik - Google Patents
Verfahren zur Herstellung einer Vorrichtung unter Verwendung einer EllipsometrietechnikInfo
- Publication number
- DE69423942T2 DE69423942T2 DE69423942T DE69423942T DE69423942T2 DE 69423942 T2 DE69423942 T2 DE 69423942T2 DE 69423942 T DE69423942 T DE 69423942T DE 69423942 T DE69423942 T DE 69423942T DE 69423942 T2 DE69423942 T2 DE 69423942T2
- Authority
- DE
- Germany
- Prior art keywords
- manufacturing
- ellipsometric technique
- ellipsometric
- technique
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32917—Plasma diagnostics
- H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/21—Polarisation-affecting properties
- G01N21/211—Ellipsometry
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32917—Plasma diagnostics
- H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
- H01J37/32972—Spectral analysis
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/152,776 US5494697A (en) | 1993-11-15 | 1993-11-15 | Process for fabricating a device using an ellipsometric technique |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69423942D1 DE69423942D1 (de) | 2000-05-18 |
DE69423942T2 true DE69423942T2 (de) | 2001-07-19 |
Family
ID=22544400
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69423942T Expired - Fee Related DE69423942T2 (de) | 1993-11-15 | 1994-11-02 | Verfahren zur Herstellung einer Vorrichtung unter Verwendung einer Ellipsometrietechnik |
Country Status (5)
Country | Link |
---|---|
US (1) | US5494697A (de) |
EP (1) | EP0653621B1 (de) |
JP (1) | JPH07183348A (de) |
KR (1) | KR100358265B1 (de) |
DE (1) | DE69423942T2 (de) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102006012022A1 (de) * | 2006-03-14 | 2007-09-20 | Betriebsforschungsinstitut VDEh - Institut für angewandte Forschung GmbH | Verfahren zur Bestimmung der Auflage auf einem bewegten Metallband |
Families Citing this family (31)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5877032A (en) * | 1995-10-12 | 1999-03-02 | Lucent Technologies Inc. | Process for device fabrication in which the plasma etch is controlled by monitoring optical emission |
US6059873A (en) | 1994-05-30 | 2000-05-09 | Semiconductor Energy Laboratory Co., Ltd. | Optical processing method with control of the illumination energy of laser light |
US5910021A (en) | 1994-07-04 | 1999-06-08 | Yamaha Corporation | Manufacture of semiconductor device with fine pattens |
US5552327A (en) * | 1994-08-26 | 1996-09-03 | North Carolina State University | Methods for monitoring and controlling deposition and etching using p-polarized reflectance spectroscopy |
US5665214A (en) * | 1995-05-03 | 1997-09-09 | Sony Corporation | Automatic film deposition control method and system |
US5835221A (en) * | 1995-10-16 | 1998-11-10 | Lucent Technologies Inc. | Process for fabricating a device using polarized light to determine film thickness |
US5871805A (en) * | 1996-04-08 | 1999-02-16 | Lemelson; Jerome | Computer controlled vapor deposition processes |
US5702956A (en) * | 1996-08-26 | 1997-12-30 | Taiwan Semiconductor Manufactoring, Company Ltd | Test site and a method of monitoring via etch depths for semiconductor devices |
US5717490A (en) * | 1996-10-17 | 1998-02-10 | Lsi Logic Corporation | Method for identifying order skipping in spectroreflective film measurement equipment |
WO1998033077A2 (en) * | 1997-01-27 | 1998-07-30 | Haaland Peter D | Coatings, methods and apparatus for reducing reflection from optical substrates |
US6172812B1 (en) | 1997-01-27 | 2001-01-09 | Peter D. Haaland | Anti-reflection coatings and coated articles |
US6406641B1 (en) | 1997-06-17 | 2002-06-18 | Luxtron Corporation | Liquid etch endpoint detection and process metrology |
US5900644A (en) * | 1997-07-14 | 1999-05-04 | Taiwan Semiconductor Manufacturing Company, Ltd. | Test site and a method of monitoring via etch depths for semiconductor devices |
FR2771850B1 (fr) * | 1997-12-02 | 2001-06-08 | France Telecom | Procede de fabrication de dispositifs en couches minces utilisant la technique de la reflectance anisotrope |
US6483580B1 (en) * | 1998-03-06 | 2002-11-19 | Kla-Tencor Technologies Corporation | Spectroscopic scatterometer system |
US6228277B1 (en) * | 1998-10-14 | 2001-05-08 | Lucent Technologies Inc. | Etch endpoint detection |
US6475815B1 (en) * | 1998-12-09 | 2002-11-05 | Matsushita Electric Industrial Co., Ltd. | Method of measuring temperature, method of taking samples for temperature measurement and method for fabricating semiconductor device |
US6214496B1 (en) * | 1999-03-29 | 2001-04-10 | Infineon Technologies North America Corp. | Method for reducing corner rounding in mask fabrication utilizing elliptical energy beam |
FR2812941B1 (fr) * | 2000-08-10 | 2002-10-11 | Air Liquide | Procede de controle en temps reel de l'elaboration d'une structure en couches minces par mesure elipsometrique |
US6636309B1 (en) * | 2001-07-27 | 2003-10-21 | J.A. Woollam Co. | Application of spectroscopic ellipsometry to in situ real time fabrication of multiple alternating high/low refractive index narrow bandpass optical filters |
US6641746B2 (en) | 2001-09-28 | 2003-11-04 | Agere Systems, Inc. | Control of semiconductor processing |
US6940592B2 (en) * | 2001-10-09 | 2005-09-06 | Applied Materials, Inc. | Calibration as well as measurement on the same workpiece during fabrication |
US7280230B2 (en) * | 2001-12-19 | 2007-10-09 | Kla-Tencor Technologies Corporation | Parametric profiling using optical spectroscopic systems |
US7216045B2 (en) | 2002-06-03 | 2007-05-08 | Timbre Technologies, Inc. | Selection of wavelengths for integrated circuit optical metrology |
US7006222B2 (en) * | 2003-01-08 | 2006-02-28 | Kla-Tencor Technologies Corporation | Concurrent measurement and cleaning of thin films on silicon-on-insulator (SOI) |
DE10319843A1 (de) * | 2003-05-03 | 2004-12-02 | Infineon Technologies Ag | Verfahren zum Bestimmen der Tiefe einer vergrabenen Struktur |
JP2005015885A (ja) * | 2003-06-27 | 2005-01-20 | Ebara Corp | 基板処理方法及び装置 |
US7063991B1 (en) * | 2004-07-28 | 2006-06-20 | Advanced Micro Devices, Inc. | Methods of determining characteristics of doped regions on device wafers, and system for accomplishing same |
US7515253B2 (en) | 2005-01-12 | 2009-04-07 | Kla-Tencor Technologies Corporation | System for measuring a sample with a layer containing a periodic diffracting structure |
US8709268B2 (en) | 2011-11-14 | 2014-04-29 | Spts Technologies Limited | Etching apparatus and methods |
US9147610B2 (en) | 2012-06-22 | 2015-09-29 | Infineon Technologies Ag | Monitor structures and methods of formation thereof |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0165364B1 (de) * | 1984-06-20 | 1988-09-07 | International Business Machines Corporation | Verfahren zum Standardisieren und Stabilisieren von Halbleiterscheiben |
US5087591A (en) * | 1985-01-22 | 1992-02-11 | Texas Instruments Incorporated | Contact etch process |
US4874240A (en) * | 1988-03-01 | 1989-10-17 | Hoechst Celanese | Characterization of semiconductor resist material during processing |
US5145554A (en) * | 1989-02-23 | 1992-09-08 | Seiko Epson Corporation | Method of anisotropic dry etching of thin film semiconductors |
US5223914A (en) * | 1989-04-28 | 1993-06-29 | International Business Machines Corporation | Follow-up system for etch process monitoring |
JPH047852A (ja) * | 1990-04-25 | 1992-01-13 | Fujitsu Ltd | 膜厚測定方法 |
US5091320A (en) * | 1990-06-15 | 1992-02-25 | Bell Communications Research, Inc. | Ellipsometric control of material growth |
US5131752A (en) * | 1990-06-28 | 1992-07-21 | Tamarack Scientific Co., Inc. | Method for film thickness endpoint control |
US5362356A (en) * | 1990-12-20 | 1994-11-08 | Lsi Logic Corporation | Plasma etching process control |
US5270222A (en) * | 1990-12-31 | 1993-12-14 | Texas Instruments Incorporated | Method and apparatus for semiconductor device fabrication diagnosis and prognosis |
US5220403A (en) * | 1991-03-11 | 1993-06-15 | International Business Machines Corporation | Apparatus and a method for high numerical aperture microscopic examination of materials |
US5208648A (en) * | 1991-03-11 | 1993-05-04 | International Business Machines Corporation | Apparatus and a method for high numerical aperture microscopic examination of materials |
US5395769A (en) * | 1992-06-26 | 1995-03-07 | International Business Machines Corporation | Method for controlling silicon etch depth |
AU4689293A (en) * | 1992-07-15 | 1994-02-14 | On-Line Technologies, Inc. | Method and apparatus for monitoring layer processing |
US5277747A (en) * | 1992-09-15 | 1994-01-11 | Bell Communications Research, Inc. | Extraction of spatially varying dielectric function from ellipsometric data |
US5354575A (en) * | 1993-04-16 | 1994-10-11 | University Of Maryland | Ellipsometric approach to anti-reflection coatings of semiconductor laser amplifiers |
-
1993
- 1993-11-15 US US08/152,776 patent/US5494697A/en not_active Expired - Lifetime
-
1994
- 1994-11-02 DE DE69423942T patent/DE69423942T2/de not_active Expired - Fee Related
- 1994-11-02 EP EP94308068A patent/EP0653621B1/de not_active Expired - Lifetime
- 1994-11-07 KR KR1019940029023A patent/KR100358265B1/ko not_active IP Right Cessation
- 1994-11-14 JP JP6302650A patent/JPH07183348A/ja active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102006012022A1 (de) * | 2006-03-14 | 2007-09-20 | Betriebsforschungsinstitut VDEh - Institut für angewandte Forschung GmbH | Verfahren zur Bestimmung der Auflage auf einem bewegten Metallband |
Also Published As
Publication number | Publication date |
---|---|
KR950015627A (ko) | 1995-06-17 |
KR100358265B1 (ko) | 2003-02-19 |
EP0653621A1 (de) | 1995-05-17 |
EP0653621B1 (de) | 2000-04-12 |
JPH07183348A (ja) | 1995-07-21 |
US5494697A (en) | 1996-02-27 |
DE69423942D1 (de) | 2000-05-18 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8332 | No legal effect for de | ||
8370 | Indication of lapse of patent is to be deleted | ||
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |