DE69413116D1 - Resiststintenzusammensetzung und daraus hergestelter gehärteter Gegenstand - Google Patents

Resiststintenzusammensetzung und daraus hergestelter gehärteter Gegenstand

Info

Publication number
DE69413116D1
DE69413116D1 DE69413116T DE69413116T DE69413116D1 DE 69413116 D1 DE69413116 D1 DE 69413116D1 DE 69413116 T DE69413116 T DE 69413116T DE 69413116 T DE69413116 T DE 69413116T DE 69413116 D1 DE69413116 D1 DE 69413116D1
Authority
DE
Germany
Prior art keywords
ink composition
made therefrom
article made
resist ink
hardened article
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69413116T
Other languages
English (en)
Other versions
DE69413116T2 (de
Inventor
Masahisa Kakinuma
Shigeru Komori
Kazuhiro Yoshida
Minoru Yokoshima
Tetsuo Ohkubo
Kazunori Sasahara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Kayaku Co Ltd
Taiyo Holdings Co Ltd
Original Assignee
Taiyo Ink Mfg Co Ltd
Nippon Kayaku Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taiyo Ink Mfg Co Ltd, Nippon Kayaku Co Ltd filed Critical Taiyo Ink Mfg Co Ltd
Publication of DE69413116D1 publication Critical patent/DE69413116D1/de
Application granted granted Critical
Publication of DE69413116T2 publication Critical patent/DE69413116T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/14—Polycondensates modified by chemical after-treatment
    • C08G59/1433—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
    • C08G59/1438—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds containing oxygen
    • C08G59/1455—Monocarboxylic acids, anhydrides, halides, or low-molecular-weight esters thereof
    • C08G59/1461—Unsaturated monoacids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/62—Alcohols or phenols
    • C08G59/625—Hydroxyacids
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Emergency Medicine (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Formation Of Insulating Films (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Manufacturing Of Printed Wiring (AREA)
DE1994613116 1993-05-10 1994-05-04 Resiststintenzusammensetzung und daraus hergestelter gehärteter Gegenstand Expired - Lifetime DE69413116T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10854993A JP2877659B2 (ja) 1993-05-10 1993-05-10 レジストインキ組成物及びその硬化物

Publications (2)

Publication Number Publication Date
DE69413116D1 true DE69413116D1 (de) 1998-10-15
DE69413116T2 DE69413116T2 (de) 1999-02-18

Family

ID=14487657

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1994613116 Expired - Lifetime DE69413116T2 (de) 1993-05-10 1994-05-04 Resiststintenzusammensetzung und daraus hergestelter gehärteter Gegenstand

Country Status (6)

Country Link
US (1) US5538821A (de)
EP (1) EP0624824B1 (de)
JP (1) JP2877659B2 (de)
KR (1) KR100204685B1 (de)
DE (1) DE69413116T2 (de)
TW (1) TW257786B (de)

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JPH06348009A (ja) * 1993-06-10 1994-12-22 Nippon Kayaku Co Ltd レジストインキ組成物及びその硬化物
TW268031B (de) * 1993-07-02 1996-01-11 Ciba Geigy
US5609991A (en) * 1995-02-10 1997-03-11 Morton International, Inc. Photoimageable composition having improved alkaline process resistance and tack-free surface for contact imaging
FR2731433B1 (fr) * 1995-03-08 1997-05-23 Imaje Sa Composition d'encre pour le marquage de supports non poreux
JP3190251B2 (ja) * 1995-06-06 2001-07-23 太陽インキ製造株式会社 アルカリ現像型のフレキシブルプリント配線板用光硬化性・熱硬化性樹脂組成物
US5973034A (en) * 1995-10-11 1999-10-26 Nippon Kayaku Kabushiki Kaisha (Oxide or sulfide) powder epoxy (meth) acrylate w/glass and/or metal
GB2322337B (en) * 1997-02-20 2001-03-14 Autoliv Dev Improvements in or relating to a method of folding an air-bag
US6207346B1 (en) 1997-04-09 2001-03-27 Advanced Coatings International Waterborne photoresists made from urethane acrylates
US6093455A (en) * 1997-05-23 2000-07-25 Deco Patents, Inc. Method and compositions for decorating glass
US6238840B1 (en) 1997-11-12 2001-05-29 Hitachi Chemical Company, Ltd. Photosensitive resin composition
US6355702B1 (en) 1999-03-08 2002-03-12 Cornell Research Foundation, Inc. Acyclic monomers which when cured are reworkable through thermal decomposition
AU2001222286A1 (en) 2000-01-17 2001-07-31 Showa Highpolymer Co. Ltd. Photosensitive resin composition
ATE286931T1 (de) * 2000-02-14 2005-01-15 Taiyo Ink Mfg Co Ltd Phot0- oder wärmehärtende zusammensetzungen zur herstellung matter filme
JP2002236363A (ja) * 2000-11-17 2002-08-23 Nippon Paint Co Ltd フォトソルダーレジスト組成物
JP4503821B2 (ja) * 2000-12-12 2010-07-14 コダック株式会社 光重合性組成物及び光重合性平版印刷版
US6555592B2 (en) * 2001-02-27 2003-04-29 Advance Materials Corporation Photothermosetting composition comprising acrylated epoxy resin
CN1268664C (zh) * 2001-08-07 2006-08-09 日本化药株式会社 树脂组合物,耐焊组合物,以及由此得到的固化物
CN100379780C (zh) * 2002-03-15 2008-04-09 太阳油墨制造株式会社 固化性树脂及含有该固化性树脂的固化性树脂组合物
US20030219656A1 (en) * 2002-04-11 2003-11-27 Baughman Donald Richard Waterborne printed circuit board coating compositions
KR20040042999A (ko) * 2002-11-15 2004-05-22 주식회사 코오롱 솔더 레지스트용 잉크 조성물
US7256228B2 (en) * 2003-11-21 2007-08-14 General Electric Company Stabilized polycarbonate polyester composition
JP5376793B2 (ja) * 2007-11-07 2013-12-25 太陽ホールディングス株式会社 光硬化性樹脂組成物及びその硬化物パターン、並びに該硬化物パターンを具備するプリント配線板
JP5189878B2 (ja) * 2008-04-01 2013-04-24 関西ペイント株式会社 樹脂組成物、レジスト組成物及びレジストパターン形成方法
KR101048329B1 (ko) * 2008-10-06 2011-07-14 주식회사 엘지화학 우레탄계 다관능성 모노머, 그의 제조방법 및 이를 포함하는 감광성 수지 조성물
CN102959480B (zh) 2010-06-24 2016-03-09 Abb股份有限公司 在安全系统中用于控制代码的自动分布的方法和工具
EP2776505A1 (de) * 2011-11-10 2014-09-17 Dow Global Technologies LLC Polymere mit carbonammoniumgruppen als latente katalysatoren für epoxidhärtende harze
US9962430B2 (en) 2012-02-15 2018-05-08 Chirhoclin, Inc. Methods for treating pain associated with chronic pancreatitis
US11635688B2 (en) 2012-03-08 2023-04-25 Kayaku Advanced Materials, Inc. Photoimageable compositions and processes for fabrication of relief patterns on low surface energy substrates
JP6130693B2 (ja) * 2012-03-30 2017-05-17 太陽インキ製造株式会社 積層構造体、ドライフィルムおよび積層構造体の製造方法
US11406718B2 (en) 2012-05-29 2022-08-09 Chirhoclin, Inc. Methods of detecting pancreobiliary ductal leaks
JP6025245B2 (ja) 2012-07-04 2016-11-16 日本化薬株式会社 新規エポキシカルボキシレート化合物、その誘導体、それを含有する活性エネルギー線硬化型樹脂組成物及びその硬化物
JP6075763B2 (ja) * 2013-03-22 2017-02-08 日本化薬株式会社 活性エネルギー線硬化型樹脂組成物、及びそれを用いた表示素子用着色スペーサー及び／またはブラックマトリックス
JP6075772B2 (ja) * 2013-04-18 2017-02-08 日本化薬株式会社 樹脂組成物及びその硬化物
KR102327347B1 (ko) * 2014-08-22 2021-11-16 닛뽄 가야쿠 가부시키가이샤 에폭시(메타)아크릴레이트 화합물 및 그것을 함유하는 수지 조성물 그리고 그의 경화물, 컬러 필터 및 표시 소자
KR102286273B1 (ko) 2014-08-25 2021-08-04 닛뽄 가야쿠 가부시키가이샤 신규 반응성 에폭시카복실레이트 화합물, 그의 유도체, 그것을 함유하는 수지 조성물, 그의 경화물, 및 물품
JP6588346B2 (ja) 2016-01-14 2019-10-09 日本化薬株式会社 エポキシ樹脂、反応性カルボキシレート化合物、それを用いた硬化型樹脂組成物、およびその用途
JP6685813B2 (ja) 2016-04-14 2020-04-22 日本化薬株式会社 エポキシ樹脂、反応性カルボキシレート化合物、それを用いた硬化型樹脂組成物、及びその用途
JP6798811B2 (ja) 2016-07-22 2020-12-09 日本化薬株式会社 エポキシカルボキシレート化合物、ポリカルボン酸化合物、それを含有するエネルギー線硬化型樹脂組成物及びその硬化物
JP7236812B2 (ja) 2017-04-27 2023-03-10 日本化薬株式会社 反応性ポリカルボン酸化合物、それを用いた活性エネルギー線硬化型樹脂組成物、その硬化物及びその用途
JP7236813B2 (ja) 2017-04-28 2023-03-10 日本化薬株式会社 反応性ポリカルボン酸化合物、それを用いた活性エネルギー線硬化型樹脂組成物、その硬化物及びその用途
JP7236817B2 (ja) 2017-06-19 2023-03-10 日本化薬株式会社 反応性ポリカルボン酸化合物、それを用いた活性エネルギー線硬化型樹脂組成物、その硬化物及びその用途
KR102668938B1 (ko) 2018-09-18 2024-05-24 닛뽄 가야쿠 가부시키가이샤 반응성 폴리카르복실산 수지 혼합물, 그것을 사용한 활성 에너지선 경화형 수지 조성물 및 그 경화물, 및 반응성 에폭시카르복실레이트 수지 혼합물
JP7187301B2 (ja) * 2018-12-26 2022-12-12 太陽インキ製造株式会社 めっきレジスト用樹脂組成物
JP7306097B2 (ja) * 2019-06-21 2023-07-11 Dic株式会社 エポキシ（メタ）アクリレート樹脂、硬化性樹脂組成物、硬化物及び物品
US11744878B2 (en) 2020-08-19 2023-09-05 Chirhoclin, Inc. Methods for treatment of COVID-19 syndrome
KR20230101795A (ko) * 2020-11-06 2023-07-06 니폰 가야꾸 가부시끼가이샤 감광성 수지 조성물, 그 경화물 및 다층 재료
JPWO2022107508A1 (de) * 2020-11-19 2022-05-27

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Also Published As

Publication number Publication date
JPH06324490A (ja) 1994-11-25
EP0624824B1 (de) 1998-09-09
TW257786B (de) 1995-09-21
DE69413116T2 (de) 1999-02-18
JP2877659B2 (ja) 1999-03-31
US5538821A (en) 1996-07-23
EP0624824A1 (de) 1994-11-17
KR100204685B1 (ko) 1999-06-15

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