DE69332231T2 - Halbleitersubstrat und Verfahren zu seiner Herstellung - Google Patents
Halbleitersubstrat und Verfahren zu seiner HerstellungInfo
- Publication number
- DE69332231T2 DE69332231T2 DE69332231T DE69332231T DE69332231T2 DE 69332231 T2 DE69332231 T2 DE 69332231T2 DE 69332231 T DE69332231 T DE 69332231T DE 69332231 T DE69332231 T DE 69332231T DE 69332231 T2 DE69332231 T2 DE 69332231T2
- Authority
- DE
- Germany
- Prior art keywords
- manufacture
- semiconductor substrate
- semiconductor
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/0262—Reduction or decomposition of gaseous compounds, e.g. CVD
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02002—Preparing wafers
- H01L21/02005—Preparing bulk and homogeneous wafers
- H01L21/0203—Making porous regions on the surface
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02367—Substrates
- H01L21/0237—Materials
- H01L21/02373—Group 14 semiconducting materials
- H01L21/02381—Silicon, silicon germanium, germanium
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02367—Substrates
- H01L21/02428—Structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02436—Intermediate layers between substrates and deposited layers
- H01L21/02439—Materials
- H01L21/02488—Insulating materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02524—Group 14 semiconducting materials
- H01L21/02532—Silicon, silicon germanium, germanium
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02587—Structure
- H01L21/0259—Microstructure
- H01L21/02598—Microstructure monocrystalline
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02631—Physical deposition at reduced pressure, e.g. MBE, sputtering, evaporation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02656—Special treatments
- H01L21/02664—Aftertreatments
- H01L21/02667—Crystallisation or recrystallisation of non-monocrystalline semiconductor materials, e.g. regrowth
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
- H01L21/7624—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology
- H01L21/76251—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology using bonding techniques
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
- H01L21/7624—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology
- H01L21/76251—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology using bonding techniques
- H01L21/76256—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology using bonding techniques using silicon etch back techniques, e.g. BESOI, ELTRAN
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/974—Substrate surface preparation
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31663—As siloxane, silicone or silane
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Recrystallisation Techniques (AREA)
- Element Separation (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP04630292A JP3214631B2 (ja) | 1992-01-31 | 1992-01-31 | 半導体基体及びその作製方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69332231D1 DE69332231D1 (de) | 2002-10-02 |
DE69332231T2 true DE69332231T2 (de) | 2003-04-30 |
Family
ID=12743407
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69332231T Expired - Lifetime DE69332231T2 (de) | 1992-01-31 | 1993-01-29 | Halbleitersubstrat und Verfahren zu seiner Herstellung |
Country Status (4)
Country | Link |
---|---|
US (2) | US6309945B1 (de) |
EP (1) | EP0553859B1 (de) |
JP (1) | JP3214631B2 (de) |
DE (1) | DE69332231T2 (de) |
Families Citing this family (37)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW330313B (en) * | 1993-12-28 | 1998-04-21 | Canon Kk | A semiconductor substrate and process for producing same |
US7148119B1 (en) | 1994-03-10 | 2006-12-12 | Canon Kabushiki Kaisha | Process for production of semiconductor substrate |
CA2182442C (en) * | 1995-08-02 | 2000-10-24 | Kiyofumi Sakaguchi | Semiconductor substrate and fabrication method for the same |
CN1132223C (zh) * | 1995-10-06 | 2003-12-24 | 佳能株式会社 | 半导体衬底及其制造方法 |
DE19616970B4 (de) * | 1996-04-27 | 2012-04-12 | Robert Bosch Gmbh | Verfahren zur Herstellung von mikromechanische Strukturen aufweisenden Halbleiterbauelementen |
JP3501642B2 (ja) * | 1997-12-26 | 2004-03-02 | キヤノン株式会社 | 基板処理方法 |
TW459390B (en) | 1998-09-04 | 2001-10-11 | Canon Kk | Semiconductor substrate and method for producing the same |
US6284671B1 (en) * | 1998-11-19 | 2001-09-04 | National Research Council Of Canada | Selective electrochemical process for creating semiconductor nano-and micro-patterns |
JP2000349264A (ja) * | 1998-12-04 | 2000-12-15 | Canon Inc | 半導体ウエハの製造方法、使用方法および利用方法 |
US6653209B1 (en) | 1999-09-30 | 2003-11-25 | Canon Kabushiki Kaisha | Method of producing silicon thin film, method of constructing SOI substrate and semiconductor device |
US6633066B1 (en) | 2000-01-07 | 2003-10-14 | Samsung Electronics Co., Ltd. | CMOS integrated circuit devices and substrates having unstrained silicon active layers |
JP3975634B2 (ja) * | 2000-01-25 | 2007-09-12 | 信越半導体株式会社 | 半導体ウェハの製作法 |
US6635552B1 (en) | 2000-06-12 | 2003-10-21 | Micron Technology, Inc. | Methods of forming semiconductor constructions |
US6429070B1 (en) * | 2000-08-30 | 2002-08-06 | Micron Technology, Inc. | DRAM cell constructions, and methods of forming DRAM cells |
US7045878B2 (en) * | 2001-05-18 | 2006-05-16 | Reveo, Inc. | Selectively bonded thin film layer and substrate layer for processing of useful devices |
US6956268B2 (en) * | 2001-05-18 | 2005-10-18 | Reveo, Inc. | MEMS and method of manufacturing MEMS |
US6740567B2 (en) * | 2001-06-20 | 2004-05-25 | Taiwan Semiconductor Manufacturing Co., Ltd | Laminating method for forming integrated circuit microelectronic fabrication |
US7033910B2 (en) * | 2001-09-12 | 2006-04-25 | Reveo, Inc. | Method of fabricating multi layer MEMS and microfluidic devices |
US7163826B2 (en) * | 2001-09-12 | 2007-01-16 | Reveo, Inc | Method of fabricating multi layer devices on buried oxide layer substrates |
US6875671B2 (en) * | 2001-09-12 | 2005-04-05 | Reveo, Inc. | Method of fabricating vertical integrated circuits |
US6995412B2 (en) * | 2002-04-12 | 2006-02-07 | International Business Machines Corporation | Integrated circuit with capacitors having a fin structure |
TW200423261A (en) * | 2002-11-20 | 2004-11-01 | Reveo Inc | Method of fabricating multi-layer devices on buried oxide layer substrates |
JP2004265914A (ja) * | 2003-02-05 | 2004-09-24 | Tadahiro Omi | 半導体基板の製造方法 |
US7538010B2 (en) * | 2003-07-24 | 2009-05-26 | S.O.I.Tec Silicon On Insulator Technologies | Method of fabricating an epitaxially grown layer |
FR2857983B1 (fr) * | 2003-07-24 | 2005-09-02 | Soitec Silicon On Insulator | Procede de fabrication d'une couche epitaxiee |
FR2858461B1 (fr) * | 2003-07-30 | 2005-11-04 | Soitec Silicon On Insulator | Realisation d'une structure comprenant une couche protegeant contre des traitements chimiques |
JP4438049B2 (ja) * | 2003-08-11 | 2010-03-24 | キヤノン株式会社 | 電界効果トランジスタ及びそれを用いたセンサ並びにその製造方法 |
US20050082526A1 (en) * | 2003-10-15 | 2005-04-21 | International Business Machines Corporation | Techniques for layer transfer processing |
JP2005210062A (ja) * | 2003-12-26 | 2005-08-04 | Canon Inc | 半導体部材とその製造方法、及び半導体装置 |
TWI311781B (en) * | 2004-02-16 | 2009-07-01 | Sharp Kabushiki Kaish | Thin film transistor and method for manufacturing same, display device, method for modifying oxidized film, method for forming oxidized film, semiconductor device and method for manufacturing same, and apparatus for manufacturing semiconductor device |
US7273776B2 (en) * | 2004-07-27 | 2007-09-25 | Legerity, Inc. | Methods of forming a P-well in an integrated circuit device |
KR20060039628A (ko) * | 2004-11-03 | 2006-05-09 | 삼성코닝 주식회사 | 용매확산이 억제된 저유전 다공성 박막 |
JP5064695B2 (ja) * | 2006-02-16 | 2012-10-31 | 信越化学工業株式会社 | Soi基板の製造方法 |
US20080277778A1 (en) | 2007-05-10 | 2008-11-13 | Furman Bruce K | Layer Transfer Process and Functionally Enhanced Integrated Circuits Products Thereby |
US7868374B2 (en) * | 2008-02-21 | 2011-01-11 | International Business Machines Corporation | Semitubular metal-oxide-semiconductor field effect transistor |
US8157978B2 (en) * | 2009-01-29 | 2012-04-17 | International Business Machines Corporation | Etching system and method for forming multiple porous semiconductor regions with different optical and structural properties on a single semiconductor wafer |
FR3085536A1 (fr) * | 2018-09-03 | 2020-03-06 | Soitec | Dispositif cfet et procede de fabrication d'un tel dispositif |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3929529A (en) * | 1974-12-09 | 1975-12-30 | Ibm | Method for gettering contaminants in monocrystalline silicon |
SE409553B (sv) | 1976-10-04 | 1979-08-27 | Aga Ab | Sett vid fraktionering av en gasblandning under utnyttjande av minst tva beddar |
JPS5516464A (en) | 1978-07-21 | 1980-02-05 | Nec Corp | Method of forming wafer for semiconductor device |
US4806996A (en) * | 1986-04-10 | 1989-02-21 | American Telephone And Telegraph Company, At&T Bell Laboratories | Dislocation-free epitaxial layer on a lattice-mismatched porous or otherwise submicron patterned single crystal substrate |
US4897362A (en) * | 1987-09-02 | 1990-01-30 | Harris Corporation | Double epitaxial method of fabricating semiconductor devices on bonded wafers |
US5168078A (en) * | 1988-11-29 | 1992-12-01 | Mcnc | Method of making high density semiconductor structure |
US5094697A (en) | 1989-06-16 | 1992-03-10 | Canon Kabushiki Kaisha | Photovoltaic device and method for producing the same |
EP0688048A3 (de) | 1990-08-03 | 1996-02-28 | Canon Kk | Halbleitersubstrat mit SOI Struktur |
CA2069038C (en) | 1991-05-22 | 1997-08-12 | Kiyofumi Sakaguchi | Method for preparing semiconductor member |
JP3261685B2 (ja) * | 1992-01-31 | 2002-03-04 | キヤノン株式会社 | 半導体素子基体及びその作製方法 |
-
1992
- 1992-01-31 JP JP04630292A patent/JP3214631B2/ja not_active Expired - Lifetime
-
1993
- 1993-01-28 US US08/010,297 patent/US6309945B1/en not_active Expired - Fee Related
- 1993-01-29 DE DE69332231T patent/DE69332231T2/de not_active Expired - Lifetime
- 1993-01-29 EP EP93101420A patent/EP0553859B1/de not_active Expired - Lifetime
-
2000
- 2000-10-18 US US09/690,982 patent/US6468663B1/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP3214631B2 (ja) | 2001-10-02 |
EP0553859A2 (de) | 1993-08-04 |
DE69332231D1 (de) | 2002-10-02 |
US6468663B1 (en) | 2002-10-22 |
EP0553859B1 (de) | 2002-08-28 |
US6309945B1 (en) | 2001-10-30 |
JPH05217827A (ja) | 1993-08-27 |
EP0553859A3 (en) | 1997-09-10 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
R071 | Expiry of right |
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