DE69331173T2 - Anlage zur plasmaaktivierten Gasphasenabscheidung - Google Patents

Anlage zur plasmaaktivierten Gasphasenabscheidung

Info

Publication number
DE69331173T2
DE69331173T2 DE69331173T DE69331173T DE69331173T2 DE 69331173 T2 DE69331173 T2 DE 69331173T2 DE 69331173 T DE69331173 T DE 69331173T DE 69331173 T DE69331173 T DE 69331173T DE 69331173 T2 DE69331173 T2 DE 69331173T2
Authority
DE
Germany
Prior art keywords
plasma
plant
vapor deposition
activated vapor
activated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69331173T
Other languages
English (en)
Other versions
DE69331173D1 (de
Inventor
Yoichi Murayama
Toshio Narita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ITOH C FINE CHEMICAL CO
Shincron Co Ltd
Original Assignee
ITOH C FINE CHEMICAL CO
Shincron Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ITOH C FINE CHEMICAL CO, Shincron Co Ltd filed Critical ITOH C FINE CHEMICAL CO
Publication of DE69331173D1 publication Critical patent/DE69331173D1/de
Application granted granted Critical
Publication of DE69331173T2 publication Critical patent/DE69331173T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C23C14/044—Coating on selected surface areas, e.g. using masks using masks using masks to redistribute rather than totally prevent coating, e.g. producing thickness gradient
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
  • Surface Treatment Of Glass (AREA)
DE69331173T 1992-05-20 1993-05-20 Anlage zur plasmaaktivierten Gasphasenabscheidung Expired - Fee Related DE69331173T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP12781092 1992-05-20
JP5099880A JPH0665724A (ja) 1992-05-20 1993-04-26 インラインプラズマ蒸着装置

Publications (2)

Publication Number Publication Date
DE69331173D1 DE69331173D1 (de) 2002-01-03
DE69331173T2 true DE69331173T2 (de) 2002-07-25

Family

ID=26440969

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69331173T Expired - Fee Related DE69331173T2 (de) 1992-05-20 1993-05-20 Anlage zur plasmaaktivierten Gasphasenabscheidung

Country Status (6)

Country Link
EP (1) EP0575055B1 (de)
JP (1) JPH0665724A (de)
KR (1) KR0169148B1 (de)
CN (1) CN1044012C (de)
CA (1) CA2096593C (de)
DE (1) DE69331173T2 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE9407482U1 (de) * 1994-05-05 1994-10-06 Leybold Ag Funktionseinrichtung für eine Vakuumanlage für die Behandlung von scheibenförmigen Werkstücken
TW320687B (de) * 1996-04-01 1997-11-21 Toray Industries
DE10013635A1 (de) * 2000-03-18 2001-09-20 Gerhard Regittnig CIS-Dünnfilm-Photovoltaik
US20030010288A1 (en) * 2001-02-08 2003-01-16 Shunpei Yamazaki Film formation apparatus and film formation method
DE10205168A1 (de) * 2002-02-07 2003-08-21 Ardenne Anlagentech Gmbh Verfahren zur Zwischenbehandlung von Substraten in einer In-Line-Vakuumbeschichtungsanlage
JP5813920B2 (ja) 2007-03-02 2015-11-17 テル・ソーラー・アクチェンゲゼルシャフトＴｅｌ Ｓｏｌａｒ Ａｇ 基板上に薄膜を蒸着する方法および基板のインライン真空処理のための装置
CN101353778B (zh) * 2007-07-27 2011-03-23 鸿富锦精密工业（深圳）有限公司 溅镀式镀膜装置及镀膜方法
CN102124140B (zh) 2008-08-19 2014-07-09 东电电子太阳能股份公司 阱
KR101018644B1 (ko) * 2008-09-05 2011-03-03 에스엔유 프리시젼 주식회사 증착장치 및 이를 이용한 증착방법
KR20100075721A (ko) * 2009-10-21 2010-07-05 바코스 주식회사 도장 공정과 연계 가능한 인라인 진공증착 시스템 및 이를 이용한 증착 방법
DE102009055638A1 (de) 2009-11-25 2011-05-26 Oerlikon Leybold Vacuum Gmbh Heißfallenanordnung

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3568632A (en) * 1969-03-24 1971-03-09 Gary F Cawthon Lens coating apparatus
JPS61133068A (ja) * 1984-12-03 1986-06-20 Matsushita Electric Ind Co Ltd 光磁気薄膜製造装置およびその製造方法
JPH0672300B2 (ja) * 1986-03-12 1994-09-14 株式会社ト−ビ ハイブリツドイオンプレ−テイング装置
JPH0796707B2 (ja) * 1988-09-14 1995-10-18 日本真空技術株式会社 ホローカソード式長尺物連続イオンプレーティング装置
JPH02182876A (ja) * 1989-01-06 1990-07-17 Ishikawajima Harima Heavy Ind Co Ltd イオンプレーティング装置
US5032421A (en) * 1990-08-21 1991-07-16 Amp Incorporated Metal coating method

Also Published As

Publication number Publication date
CA2096593A1 (en) 1993-11-21
EP0575055B1 (de) 2001-11-21
CN1044012C (zh) 1999-07-07
CA2096593C (en) 1999-02-02
EP0575055A3 (en) 1995-09-27
JPH0665724A (ja) 1994-03-08
DE69331173D1 (de) 2002-01-03
KR940006188A (ko) 1994-03-23
CN1080332A (zh) 1994-01-05
KR0169148B1 (ko) 1999-01-15
EP0575055A2 (de) 1993-12-22

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee