KR940011097U - 화학증착용 클램핑 장치 - Google Patents

화학증착용 클램핑 장치

Info

Publication number
KR940011097U
KR940011097U KR2019920020185U KR920020185U KR940011097U KR 940011097 U KR940011097 U KR 940011097U KR 2019920020185 U KR2019920020185 U KR 2019920020185U KR 920020185 U KR920020185 U KR 920020185U KR 940011097 U KR940011097 U KR 940011097U
Authority
KR
South Korea
Prior art keywords
vapor deposition
clamping device
chemical vapor
chemical
clamping
Prior art date
Application number
KR2019920020185U
Other languages
English (en)
Other versions
KR950009552Y1 (ko
Inventor
서광하
고석윤
Original Assignee
금성일렉트론 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 금성일렉트론 주식회사 filed Critical 금성일렉트론 주식회사
Priority to KR92020185U priority Critical patent/KR950009552Y1/ko
Publication of KR940011097U publication Critical patent/KR940011097U/ko
Application granted granted Critical
Publication of KR950009552Y1 publication Critical patent/KR950009552Y1/ko

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582—Rigid and flat substrates, e.g. plates or discs
    • C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
    • C23C16/4585—Devices at or outside the perimeter of the substrate support, e.g. clamping rings, shrouds
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
KR92020185U 1992-10-20 1992-10-20 화학증착용 클램핑 장치 KR950009552Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR92020185U KR950009552Y1 (ko) 1992-10-20 1992-10-20 화학증착용 클램핑 장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR92020185U KR950009552Y1 (ko) 1992-10-20 1992-10-20 화학증착용 클램핑 장치

Publications (2)

Publication Number Publication Date
KR940011097U true KR940011097U (ko) 1994-05-27
KR950009552Y1 KR950009552Y1 (ko) 1995-11-08

Family

ID=19342113

Family Applications (1)

Application Number Title Priority Date Filing Date
KR92020185U KR950009552Y1 (ko) 1992-10-20 1992-10-20 화학증착용 클램핑 장치

Country Status (1)

Country Link
KR (1) KR950009552Y1 (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100342395B1 (ko) * 2000-06-28 2002-07-02 황인길 반도체 소자 제조 장치

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100342395B1 (ko) * 2000-06-28 2002-07-02 황인길 반도체 소자 제조 장치

Also Published As

Publication number Publication date
KR950009552Y1 (ko) 1995-11-08

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Payment date: 20041018

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