DE69313597T2 - Verfahren und Vorrichtung zur Megaschallreinigung - Google Patents

Verfahren und Vorrichtung zur Megaschallreinigung

Info

Publication number
DE69313597T2
DE69313597T2 DE69313597T DE69313597T DE69313597T2 DE 69313597 T2 DE69313597 T2 DE 69313597T2 DE 69313597 T DE69313597 T DE 69313597T DE 69313597 T DE69313597 T DE 69313597T DE 69313597 T2 DE69313597 T2 DE 69313597T2
Authority
DE
Germany
Prior art keywords
megasound
cleaning
cleaning megasound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69313597T
Other languages
English (en)
Other versions
DE69313597D1 (de
Inventor
Hendrik F Bok
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Specialty Coating Systems Inc
Original Assignee
Specialty Coating Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Specialty Coating Systems Inc filed Critical Specialty Coating Systems Inc
Publication of DE69313597D1 publication Critical patent/DE69313597D1/de
Application granted granted Critical
Publication of DE69313597T2 publication Critical patent/DE69313597T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
DE69313597T 1992-12-18 1993-12-17 Verfahren und Vorrichtung zur Megaschallreinigung Expired - Fee Related DE69313597T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/993,098 US5339842A (en) 1992-12-18 1992-12-18 Methods and apparatus for cleaning objects

Publications (2)

Publication Number Publication Date
DE69313597D1 DE69313597D1 (de) 1997-10-09
DE69313597T2 true DE69313597T2 (de) 1998-03-26

Family

ID=25539084

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69313597T Expired - Fee Related DE69313597T2 (de) 1992-12-18 1993-12-17 Verfahren und Vorrichtung zur Megaschallreinigung

Country Status (7)

Country Link
US (1) US5339842A (de)
EP (1) EP0603008B1 (de)
JP (1) JP3323310B2 (de)
CA (1) CA2111784C (de)
DE (1) DE69313597T2 (de)
MX (1) MX9308186A (de)
TW (1) TW252932B (de)

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JP4576270B2 (ja) * 2005-03-29 2010-11-04 昭和電工株式会社 ハンダ回路基板の製造方法
JP5013567B2 (ja) * 2005-05-24 2012-08-29 オルガノ株式会社 流体供給システム
WO2007007865A1 (en) * 2005-07-11 2007-01-18 Showa Denko K.K. Method for attachment of solder powder to electronic circuit board and solder-attached electronic circuit board
WO2007029866A1 (en) * 2005-09-09 2007-03-15 Showa Denko K.K. Method for attachment of solder powder to electronic circuit board and soldered electronic circuit board
DE102006033372B4 (de) * 2006-02-17 2010-04-29 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Ultraschallaktor zur Reinigung von Objekten
TWI352628B (en) * 2006-07-21 2011-11-21 Akrion Technologies Inc Nozzle for use in the megasonic cleaning of substr
WO2008048259A2 (en) * 2006-10-16 2008-04-24 Materials And Technologies Corporation Wet processing using a fluid meniscus, apparatus and method
US8978673B2 (en) * 2007-08-09 2015-03-17 Asm Assembly Automation Ltd Megasonic cleaning system
FR2924815B1 (fr) * 2007-12-06 2010-02-12 Ceprim Technologies Dispositif et procede de nettoyage a ultrasons des pointes de contact des cartes de test de circuits integres ou des cartes de circuits imprimes
US7975710B2 (en) * 2009-07-06 2011-07-12 Asm Assembly Automation Ltd Acoustic cleaning system for electronic components
JP5470186B2 (ja) * 2010-07-30 2014-04-16 日本発條株式会社 被検査物の清浄度検査装置と、清浄度検査方法
JP5717526B2 (ja) * 2011-04-26 2015-05-13 化研テック株式会社 部分洗浄装置および部分洗浄方法
CN102891078A (zh) * 2011-07-18 2013-01-23 商先创光伏股份有限公司 用于衬底圆片的单面湿处理的装置和方法
US9505036B2 (en) * 2013-03-15 2016-11-29 Lam Research Corporation Portable sonic particle removal tool with a chemically controlled working fluid
US9808840B2 (en) * 2014-10-15 2017-11-07 Saudi Arabian Oil Company Air filter ultrasonic cleaning systems and the methods of using the same
JP2022068575A (ja) * 2020-10-22 2022-05-10 株式会社ディスコ 洗浄装置
CN114082729B (zh) * 2022-01-18 2022-04-01 季华实验室 一种外延炉反应腔的清洗系统、方法、设备和存储介质
KR102616585B1 (ko) * 2022-04-01 2023-12-21 세메스 주식회사 기판처리장치 및 기판처리방법

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Also Published As

Publication number Publication date
EP0603008B1 (de) 1997-09-03
DE69313597D1 (de) 1997-10-09
JP3323310B2 (ja) 2002-09-09
US5339842A (en) 1994-08-23
TW252932B (de) 1995-08-01
CA2111784A1 (en) 1994-06-19
EP0603008A1 (de) 1994-06-22
CA2111784C (en) 1997-08-05
JPH07928A (ja) 1995-01-06
MX9308186A (es) 1995-01-31

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee