AU2867299A - Fast single-article megasonic cleaning process - Google Patents

Fast single-article megasonic cleaning process

Info

Publication number
AU2867299A
AU2867299A AU28672/99A AU2867299A AU2867299A AU 2867299 A AU2867299 A AU 2867299A AU 28672/99 A AU28672/99 A AU 28672/99A AU 2867299 A AU2867299 A AU 2867299A AU 2867299 A AU2867299 A AU 2867299A
Authority
AU
Australia
Prior art keywords
article
cleaning process
megasonic cleaning
fast single
fast
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU28672/99A
Inventor
Ahmed A. Busnaina
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of AU2867299A publication Critical patent/AU2867299A/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
AU28672/99A 1998-10-14 1999-02-08 Fast single-article megasonic cleaning process Abandoned AU2867299A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10413198P 1998-10-14 1998-10-14
US60104131 1998-10-14
PCT/US1999/002686 WO2000021692A1 (en) 1998-10-14 1999-02-08 Fast single-article megasonic cleaning process

Publications (1)

Publication Number Publication Date
AU2867299A true AU2867299A (en) 2000-05-01

Family

ID=22298820

Family Applications (1)

Application Number Title Priority Date Filing Date
AU28672/99A Abandoned AU2867299A (en) 1998-10-14 1999-02-08 Fast single-article megasonic cleaning process

Country Status (2)

Country Link
AU (1) AU2867299A (en)
WO (1) WO2000021692A1 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7451774B2 (en) 2000-06-26 2008-11-18 Applied Materials, Inc. Method and apparatus for wafer cleaning
JP2004515053A (en) 2000-06-26 2004-05-20 アプライド　マテリアルズ　インコーポレイテッド Wafer cleaning method and apparatus
US6726848B2 (en) 2001-12-07 2004-04-27 Scp Global Technologies, Inc. Apparatus and method for single substrate processing
DE102006033372B4 (en) * 2006-02-17 2010-04-29 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Ultrasonic actuator for cleaning objects
US7775219B2 (en) 2006-12-29 2010-08-17 Applied Materials, Inc. Process chamber lid and controlled exhaust
JP5183777B2 (en) 2011-07-12 2013-04-17 株式会社カイジョー Ultrasonic cleaning apparatus and ultrasonic cleaning method
US8486199B2 (en) 2011-07-22 2013-07-16 Lam Research Ag Ultrasonic cleaning method and apparatus

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4178188A (en) * 1977-09-14 1979-12-11 Branson Ultrasonics Corporation Method for cleaning workpieces by ultrasonic energy
US4401131A (en) * 1981-05-15 1983-08-30 Gca Corporation Apparatus for cleaning semiconductor wafers
US5339842A (en) * 1992-12-18 1994-08-23 Specialty Coating Systems, Inc. Methods and apparatus for cleaning objects
DE19629705A1 (en) * 1996-07-24 1998-01-29 Joachim Dr Scheerer Ultrasonic cleaning especially of wafer

Also Published As

Publication number Publication date
WO2000021692A1 (en) 2000-04-20

Similar Documents

Publication Publication Date Title
AU6106999A (en) Process
AU4977799A (en) Wafer cleaning apparatus
AU3890299A (en) Cryo-sedimentation process
AU8124598A (en) Wet-like cleaning articles
AU2287697A (en) Cleaning process
AU4591300A (en) Lift-and-strike welding process with cleaning stage
EP1127060B8 (en) Hydroboronation process
AU5719300A (en) Cleaning means
AU1538901A (en) Polymersation process
AU5488800A (en) High rpm megasonic cleaning
AU1829500A (en) Aqueous cleaning
AU2867299A (en) Fast single-article megasonic cleaning process
AU3495299A (en) Cleaning chemical composition
AU8464698A (en) Central vacuum cleaning system
AUPP209098A0 (en) Washing apparatus
AU1554700A (en) Cleaning agent
AUPP476398A0 (en) Bleaching process
AU6076199A (en) Wringer
AU5475499A (en) Video-to-film transfer process
AU1306500A (en) Cleaning machine
AU1223600A (en) Process
AU8860498A (en) Cleaning method
AU2757299A (en) Novel process
AU1040500A (en) Washing and cleaning method
AU4538099A (en) New process

Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase