DE69227556D1 - Photomaske und Verfahren zur Herstellung - Google Patents

Photomaske und Verfahren zur Herstellung

Info

Publication number
DE69227556D1
DE69227556D1 DE69227556T DE69227556T DE69227556D1 DE 69227556 D1 DE69227556 D1 DE 69227556D1 DE 69227556 T DE69227556 T DE 69227556T DE 69227556 T DE69227556 T DE 69227556T DE 69227556 D1 DE69227556 D1 DE 69227556D1
Authority
DE
Germany
Prior art keywords
manufacturing
photo mask
photo
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69227556T
Other languages
English (en)
Other versions
DE69227556T2 (de
Inventor
Satoru Asai
Isamu Hanyu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Application granted granted Critical
Publication of DE69227556D1 publication Critical patent/DE69227556D1/de
Publication of DE69227556T2 publication Critical patent/DE69227556T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/30—Alternating PSM, e.g. Levenson-Shibuya PSM; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/80—Etching
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/28—Phase shift masks [PSM]; PSM blanks; Preparation thereof with three or more diverse phases on the same PSM; Preparation thereof
DE69227556T 1991-07-30 1992-07-30 Photomaske und Verfahren zur Herstellung Expired - Fee Related DE69227556T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3190091A JPH0534897A (ja) 1991-07-30 1991-07-30 光学マスク及びその製造方法

Publications (2)

Publication Number Publication Date
DE69227556D1 true DE69227556D1 (de) 1998-12-17
DE69227556T2 DE69227556T2 (de) 1999-05-06

Family

ID=16252221

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69227556T Expired - Fee Related DE69227556T2 (de) 1991-07-30 1992-07-30 Photomaske und Verfahren zur Herstellung

Country Status (5)

Country Link
US (1) US5368963A (de)
EP (1) EP0529338B1 (de)
JP (1) JPH0534897A (de)
KR (1) KR960004314B1 (de)
DE (1) DE69227556T2 (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100298610B1 (ko) * 1992-09-01 2001-11-30 기타지마 요시토시 위상쉬프트포토마스크,위상쉬프트포토마스크블랭크및이들의제조방법
KR0138297B1 (ko) * 1994-02-07 1998-06-01 김광호 포토 마스크 및 그 제조 방법
KR0143340B1 (ko) * 1994-09-09 1998-08-17 김주용 위상반전 마스크
KR0147665B1 (ko) * 1995-09-13 1998-10-01 김광호 변형조명방법, 이에 사용되는 반사경 및 그 제조방법
US5948571A (en) * 1997-03-12 1999-09-07 International Business Machines Corporation Asymmetrical resist sidewall
JPH10256394A (ja) 1997-03-12 1998-09-25 Internatl Business Mach Corp <Ibm> 半導体構造体およびデバイス
US5985492A (en) * 1998-01-22 1999-11-16 International Business Machines Corporation Multi-phase mask
US6090633A (en) * 1999-09-22 2000-07-18 International Business Machines Corporation Multiple-plane pair thin-film structure and process of manufacture
JP2003173014A (ja) * 2001-12-07 2003-06-20 Mitsubishi Electric Corp 位相シフトマスクの製造方法、位相シフトマスク、および、装置
KR100853215B1 (ko) * 2002-05-14 2008-08-20 삼성전자주식회사 액정 표시 장치
KR100465067B1 (ko) * 2002-06-19 2005-01-06 주식회사 하이닉스반도체 노광 마스크, 이의 제조 방법 및 이를 이용한 감광막 패턴형성 방법
TWI316732B (en) * 2005-09-09 2009-11-01 Au Optronics Corp Mask and manufacturing method thereof
CN1740909B (zh) * 2005-09-26 2011-04-13 友达光电股份有限公司 光罩及其制造方法
JP4879603B2 (ja) * 2006-02-16 2012-02-22 Ｈｏｙａ株式会社 パターン形成方法及び位相シフトマスクの製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0653679B1 (de) * 1989-04-28 2002-08-21 Fujitsu Limited Maske, Verfahren zur Herstellung der Maske und Verfahren zur Musterherstellung mit einer Maske
EP0437376B1 (de) * 1990-01-12 1997-03-19 Sony Corporation Phasenverschiebungsmaske und Verfahren zur Herstellung
JPH0455854A (ja) * 1990-06-25 1992-02-24 Matsushita Electric Ind Co Ltd フォトマスク装置およびこれを用いたパターン形成方法
JPH04221954A (ja) * 1990-12-25 1992-08-12 Nec Corp フォトマスク
US5229255A (en) * 1991-03-22 1993-07-20 At&T Bell Laboratories Sub-micron device fabrication with a phase shift mask having multiple values of phase delay

Also Published As

Publication number Publication date
EP0529338B1 (de) 1998-11-11
JPH0534897A (ja) 1993-02-12
US5368963A (en) 1994-11-29
KR930003267A (ko) 1993-02-24
EP0529338A1 (de) 1993-03-03
KR960004314B1 (ko) 1996-03-30
DE69227556T2 (de) 1999-05-06

Similar Documents

Publication Publication Date Title
DE69220719T2 (de) Handschuhe und Verfahren zur Herstellung
DE69327483T2 (de) Diode und Verfahren zur Herstellung
DE69322700D1 (de) Zusammendrückbare Walze und Verfahren zur Herstellung
DE69124009D1 (de) Dünnfilmtransistor und Verfahren zur Herstellung
DE69125195D1 (de) Phasenverschiebungsmaske und Verfahren zur Herstellung
DE69431023T2 (de) Halbleiteraufbau und Verfahren zur Herstellung
DE69118511D1 (de) EPROM und Verfahren zur Herstellung
DE69225761T2 (de) Präzisionswiderstand und Verfahren zur Herstellung
DE69227556T2 (de) Photomaske und Verfahren zur Herstellung
DE69131173T2 (de) Optische Phasenmaske und Verfahren zur Herstellung
DE69304455D1 (de) Halbleiterlaser und Verfahren zur Herstellung
DE69229314D1 (de) Halbleiteranordnung und Verfahren zur Herstellung
DE69226757T2 (de) Filmkondensator und Verfahren zur Herstellung
DE69123642T2 (de) MESFET und Verfahren zur Herstellung
DE69218501D1 (de) Dünnfilm-Transistoren und Verfahren zur Herstellung
DE69227290T2 (de) Halbleiteranordnung und Verfahren zur Herstellung
DE69128406T2 (de) Lateraler MOSFET und Verfahren zur Herstellung
DE69216463D1 (de) Thermischer Photodetektor und Verfahren zur Herstellung desselben
DE69218738D1 (de) Farbabtastgerät und Verfahren zur Herstellung des Gerätes
DE69128829D1 (de) Feldeffekttransistor und Verfahren zur Herstellung
DE69310031D1 (de) Quartzgerät und Verfahren zur Herstellung
DE69127165T2 (de) Supraleitende Streifen und Verfahren zur Herstellung
DE69132444T2 (de) Röntgenstrahlmaskenstruktur, Verfahren zur Herstellung und zur Röntgenstrahlbelichtung
DE69303643D1 (de) Halbleiterlaservorrichtung und Verfahren zur Herstellung
DE69124563D1 (de) Dünnfilm-Transistor und Verfahren zur Herstellung

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee