DE69227556D1 - Photomaske und Verfahren zur Herstellung - Google Patents
Photomaske und Verfahren zur HerstellungInfo
- Publication number
- DE69227556D1 DE69227556D1 DE69227556T DE69227556T DE69227556D1 DE 69227556 D1 DE69227556 D1 DE 69227556D1 DE 69227556 T DE69227556 T DE 69227556T DE 69227556 T DE69227556 T DE 69227556T DE 69227556 D1 DE69227556 D1 DE 69227556D1
- Authority
- DE
- Germany
- Prior art keywords
- manufacturing
- photo mask
- photo
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
- G03F1/30—Alternating PSM, e.g. Levenson-Shibuya PSM; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/80—Etching
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
- G03F1/28—Phase shift masks [PSM]; PSM blanks; Preparation thereof with three or more diverse phases on the same PSM; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3190091A JPH0534897A (ja) | 1991-07-30 | 1991-07-30 | 光学マスク及びその製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69227556D1 true DE69227556D1 (de) | 1998-12-17 |
DE69227556T2 DE69227556T2 (de) | 1999-05-06 |
Family
ID=16252221
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69227556T Expired - Fee Related DE69227556T2 (de) | 1991-07-30 | 1992-07-30 | Photomaske und Verfahren zur Herstellung |
Country Status (5)
Country | Link |
---|---|
US (1) | US5368963A (de) |
EP (1) | EP0529338B1 (de) |
JP (1) | JPH0534897A (de) |
KR (1) | KR960004314B1 (de) |
DE (1) | DE69227556T2 (de) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0585872B1 (de) * | 1992-09-01 | 2000-03-29 | Dai Nippon Printing Co., Ltd. | Verfahren zur Herstellung einer Phasenschiebermaske oder eines Phasenschiebermasken-Rohlings |
KR0138297B1 (ko) * | 1994-02-07 | 1998-06-01 | 김광호 | 포토 마스크 및 그 제조 방법 |
KR0143340B1 (ko) * | 1994-09-09 | 1998-08-17 | 김주용 | 위상반전 마스크 |
KR0147665B1 (ko) * | 1995-09-13 | 1998-10-01 | 김광호 | 변형조명방법, 이에 사용되는 반사경 및 그 제조방법 |
JPH10256394A (ja) | 1997-03-12 | 1998-09-25 | Internatl Business Mach Corp <Ibm> | 半導体構造体およびデバイス |
US5948571A (en) * | 1997-03-12 | 1999-09-07 | International Business Machines Corporation | Asymmetrical resist sidewall |
US5985492A (en) * | 1998-01-22 | 1999-11-16 | International Business Machines Corporation | Multi-phase mask |
US6090633A (en) * | 1999-09-22 | 2000-07-18 | International Business Machines Corporation | Multiple-plane pair thin-film structure and process of manufacture |
JP2003173014A (ja) * | 2001-12-07 | 2003-06-20 | Mitsubishi Electric Corp | 位相シフトマスクの製造方法、位相シフトマスク、および、装置 |
KR100853215B1 (ko) * | 2002-05-14 | 2008-08-20 | 삼성전자주식회사 | 액정 표시 장치 |
KR100465067B1 (ko) * | 2002-06-19 | 2005-01-06 | 주식회사 하이닉스반도체 | 노광 마스크, 이의 제조 방법 및 이를 이용한 감광막 패턴형성 방법 |
TWI316732B (en) * | 2005-09-09 | 2009-11-01 | Au Optronics Corp | Mask and manufacturing method thereof |
CN1740909B (zh) * | 2005-09-26 | 2011-04-13 | 友达光电股份有限公司 | 光罩及其制造方法 |
JP4879603B2 (ja) * | 2006-02-16 | 2012-02-22 | Hoya株式会社 | パターン形成方法及び位相シフトマスクの製造方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE69028871T2 (de) * | 1989-04-28 | 1997-02-27 | Fujitsu Ltd | Maske, Herstellungsverfahren und Musterherstellung mit einer solchen Maske |
DE69125195T2 (de) * | 1990-01-12 | 1997-06-26 | Sony Corp | Phasenverschiebungsmaske und Verfahren zur Herstellung |
JPH0455854A (ja) * | 1990-06-25 | 1992-02-24 | Matsushita Electric Ind Co Ltd | フォトマスク装置およびこれを用いたパターン形成方法 |
JPH04221954A (ja) * | 1990-12-25 | 1992-08-12 | Nec Corp | フォトマスク |
US5229255A (en) * | 1991-03-22 | 1993-07-20 | At&T Bell Laboratories | Sub-micron device fabrication with a phase shift mask having multiple values of phase delay |
-
1991
- 1991-07-30 JP JP3190091A patent/JPH0534897A/ja active Pending
-
1992
- 1992-07-21 US US07/916,262 patent/US5368963A/en not_active Expired - Lifetime
- 1992-07-29 KR KR1019920013607A patent/KR960004314B1/ko not_active IP Right Cessation
- 1992-07-30 EP EP92113030A patent/EP0529338B1/de not_active Expired - Lifetime
- 1992-07-30 DE DE69227556T patent/DE69227556T2/de not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH0534897A (ja) | 1993-02-12 |
KR930003267A (ko) | 1993-02-24 |
EP0529338B1 (de) | 1998-11-11 |
DE69227556T2 (de) | 1999-05-06 |
KR960004314B1 (ko) | 1996-03-30 |
US5368963A (en) | 1994-11-29 |
EP0529338A1 (de) | 1993-03-03 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE69220719D1 (de) | Handschuhe und Verfahren zur Herstellung | |
DE69327483D1 (de) | Diode und Verfahren zur Herstellung | |
DE69322700D1 (de) | Zusammendrückbare Walze und Verfahren zur Herstellung | |
DE69124009D1 (de) | Dünnfilmtransistor und Verfahren zur Herstellung | |
DE69316810D1 (de) | SiGe-SOI-MOSFET und Verfahren zur Herstellung | |
DE69129746D1 (de) | Modifiziertes Polysilazan und Verfahren zu seiner Herstellung | |
DE68925715D1 (de) | Verbundfolie und Verfahren zur Herstellung | |
DE69120995D1 (de) | Hochgeschwindigkeitsdiode und Verfahren zur Herstellung | |
DE69323827D1 (de) | Diamant-Halbleiter und Verfahren zur Herstellung | |
DE69326373D1 (de) | Elektrokatalysator und Verfahren zur Herstellung | |
DE69125195D1 (de) | Phasenverschiebungsmaske und Verfahren zur Herstellung | |
DE69225005D1 (de) | Wärmeschrumpfbarer Schlauch und Verfahren zur Herstellung | |
DE69431023D1 (de) | Halbleiteraufbau und Verfahren zur Herstellung | |
DE69118511D1 (de) | EPROM und Verfahren zur Herstellung | |
DE69210151D1 (de) | Optischer Schalter und Verfahren zu seiner Herstellung | |
DE69225761D1 (de) | Präzisionswiderstand und Verfahren zur Herstellung | |
DE69227556D1 (de) | Photomaske und Verfahren zur Herstellung | |
DE69131173D1 (de) | Optische Phasenmaske und Verfahren zur Herstellung | |
DE69111375D1 (de) | Pigment und Verfahren zur Herstellung. | |
DE69304455D1 (de) | Halbleiterlaser und Verfahren zur Herstellung | |
DE69213608D1 (de) | Verbundwalze und Verfahren zur Herstellung derselben | |
DE69229314D1 (de) | Halbleiteranordnung und Verfahren zur Herstellung | |
DE69202634D1 (de) | Feldemissionsvorrichtung und Verfahren zur Herstellung. | |
DE69400093D1 (de) | Übungsgeschloss und Verfahren zur Herstellung | |
DE69226757D1 (de) | Filmkondensator und Verfahren zur Herstellung |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |