DE69125195T2 - Phasenverschiebungsmaske und Verfahren zur Herstellung - Google Patents

Phasenverschiebungsmaske und Verfahren zur Herstellung

Info

Publication number
DE69125195T2
DE69125195T2 DE1991625195 DE69125195T DE69125195T2 DE 69125195 T2 DE69125195 T2 DE 69125195T2 DE 1991625195 DE1991625195 DE 1991625195 DE 69125195 T DE69125195 T DE 69125195T DE 69125195 T2 DE69125195 T2 DE 69125195T2
Authority
DE
Germany
Prior art keywords
manufacturing
phase shift
shift mask
mask
phase
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE1991625195
Other languages
English (en)
Other versions
DE69125195D1 (de
Inventor
Hideo Shimizu
Hiroichi Kawahira
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP560690A external-priority patent/JP3122107B2/ja
Priority claimed from JP2069979A external-priority patent/JPH03269531A/ja
Priority claimed from JP2116464A external-priority patent/JPH0413141A/ja
Application filed by Sony Corp filed Critical Sony Corp
Application granted granted Critical
Publication of DE69125195D1 publication Critical patent/DE69125195D1/de
Publication of DE69125195T2 publication Critical patent/DE69125195T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/29—Rim PSM or outrigger PSM; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE1991625195 1990-01-12 1991-01-11 Phasenverschiebungsmaske und Verfahren zur Herstellung Expired - Fee Related DE69125195T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP560690A JP3122107B2 (ja) 1990-01-12 1990-01-12 位相シフトマスクの製造方法
JP2069979A JPH03269531A (ja) 1990-03-20 1990-03-20 位相シフトマスクの製造方法
JP2116464A JPH0413141A (ja) 1990-05-02 1990-05-02 位相シフトマスクの製造方法

Publications (2)

Publication Number Publication Date
DE69125195D1 DE69125195D1 (de) 1997-04-24
DE69125195T2 true DE69125195T2 (de) 1997-06-26

Family

ID=27276824

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1991625195 Expired - Fee Related DE69125195T2 (de) 1990-01-12 1991-01-11 Phasenverschiebungsmaske und Verfahren zur Herstellung

Country Status (3)

Country Link
EP (2) EP0437376B1 (de)
KR (1) KR0163437B1 (de)
DE (1) DE69125195T2 (de)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69028871T2 (de) * 1989-04-28 1997-02-27 Fujitsu Ltd Maske, Herstellungsverfahren und Musterherstellung mit einer solchen Maske
KR920009369B1 (ko) * 1990-05-25 1992-10-15 삼성전자 주식회사 마스크의 제작방법
JPH0450943A (ja) * 1990-06-15 1992-02-19 Mitsubishi Electric Corp マスクパターンとその製造方法
EP0843217A3 (de) * 1990-09-10 1998-12-16 Fujitsu Limited Optische Phasenmaske und Verfahren zur Herstellung
EP0773477B1 (de) * 1990-09-21 2001-05-30 Dai Nippon Printing Co., Ltd. Verfahren zur Herstellung einer Phasenschieber-Fotomaske
US5153083A (en) * 1990-12-05 1992-10-06 At&T Bell Laboratories Method of making phase-shifting lithographic masks
US6128068A (en) * 1991-02-22 2000-10-03 Canon Kabushiki Kaisha Projection exposure apparatus including an illumination optical system that forms a secondary light source with a particular intensity distribution
US5305054A (en) 1991-02-22 1994-04-19 Canon Kabushiki Kaisha Imaging method for manufacture of microdevices
JPH0534897A (ja) * 1991-07-30 1993-02-12 Fujitsu Ltd 光学マスク及びその製造方法
JPH0536586A (ja) * 1991-08-02 1993-02-12 Canon Inc 像投影方法及び該方法を用いた半導体デバイスの製造方法
US5382483A (en) * 1992-01-13 1995-01-17 International Business Machines Corporation Self-aligned phase-shifting mask
EP0553543B1 (de) * 1992-01-31 1997-12-29 Mitsubishi Denki Kabushiki Kaisha Phasenverschiebungsmaske und Verfahren zur Erzeugung eines Fotolackmusters unter Verwendung dieser Maske
JP3210123B2 (ja) * 1992-03-27 2001-09-17 キヤノン株式会社 結像方法及び該方法を用いたデバイス製造方法
JP3278896B2 (ja) * 1992-03-31 2002-04-30 キヤノン株式会社 照明装置及びそれを用いた投影露光装置
KR940007984A (ko) * 1992-09-29 1994-04-28 윌리엄 이. 힐러 반도체 제조용 포토 마스크 및 그 제조방법
US5403682A (en) * 1992-10-30 1995-04-04 International Business Machines Corporation Alternating rim phase-shifting mask
US6436608B1 (en) * 2000-01-20 2002-08-20 Agere Systems Guardian Corp. Lithographic method utilizing a phase-shifting mask
EP1254049B1 (de) 2000-01-20 2011-05-11 Free-Flow Packaging International, Inc. Apparat zur herstellung von pneumatisch gefüllten verpackungskissen
US6638663B1 (en) 2000-01-20 2003-10-28 Agere Systems Inc. Phase-shifting mask and semiconductor device
US6551750B2 (en) 2001-03-16 2003-04-22 Numerical Technologies, Inc. Self-aligned fabrication technique for tri-tone attenuated phase-shifting masks
US6635393B2 (en) 2001-03-23 2003-10-21 Numerical Technologies, Inc. Blank for alternating PSM photomask with charge dissipation layer
US7282461B2 (en) 2003-09-04 2007-10-16 Agere Systems, Inc. Phase-shifting mask and semiconductor device
WO2009031057A2 (en) 2007-09-04 2009-03-12 Nds Limited Security chip

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0090924B1 (de) * 1982-04-05 1987-11-11 International Business Machines Corporation Verfahren zur Erhöhung der Bildauflösung einer Photomaske und Photomaske zur Dürchführung dieses Verfahrens
CA1313792C (en) * 1986-02-28 1993-02-23 Junji Hirokane Method of manufacturing photo-mask and photo-mask manufactured thereby
US5234780A (en) * 1989-02-13 1993-08-10 Kabushiki Kaisha Toshiba Exposure mask, method of manufacturing the same, and exposure method using the same
DE69028871T2 (de) * 1989-04-28 1997-02-27 Fujitsu Ltd Maske, Herstellungsverfahren und Musterherstellung mit einer solchen Maske
EP0401795A3 (de) * 1989-06-08 1991-03-27 Oki Electric Industry Company, Limited Phasenverschiebungs-Photomaske für negative Lacke und Verfahren zur Herstellung von isolierten negativen Resistbildern mit dieser Phasenverschiebungsmaske

Also Published As

Publication number Publication date
EP0437376A3 (en) 1991-11-06
EP0437376B1 (de) 1997-03-19
DE69125195D1 (de) 1997-04-24
EP0437376A2 (de) 1991-07-17
KR0163437B1 (ko) 1999-02-01
EP0730200A2 (de) 1996-09-04
EP0730200A3 (de) 1997-01-22

Similar Documents

Publication Publication Date Title
DE69125195D1 (de) Phasenverschiebungsmaske und Verfahren zur Herstellung
DE69130518D1 (de) Maske mit Phasenschiebern und Verfahren zur Herstellung
DE69220719D1 (de) Handschuhe und Verfahren zur Herstellung
DE69129746T2 (de) Modifiziertes Polysilazan und Verfahren zu seiner Herstellung
DE69323812T2 (de) Reflexionsverhindernder Film und Verfahren zur Herstellung von Resistmustern
DE69326373D1 (de) Elektrokatalysator und Verfahren zur Herstellung
DE69423686T2 (de) Halbtonphasenverschiebungsphotomaske, Blankohalbtonphasenverschiebungsmaske und Verfahren zur Herstellung der Blankomaske
DE69431023D1 (de) Halbleiteraufbau und Verfahren zur Herstellung
DE69426409D1 (de) Phasenverschiebungsmaske, Verfahren zur Herstellung derselben und Belichtungsverfahren unter Verwendung einer solchen Phasenverschiebungsmaske
DE69118511D1 (de) EPROM und Verfahren zur Herstellung
DE69123557T2 (de) Halbleiteranordnung und ein verfahren zur herstellung einer solchen halbleiteranordnung
DE69131173D1 (de) Optische Phasenmaske und Verfahren zur Herstellung
DE69213608T2 (de) Verbundwalze und Verfahren zur Herstellung derselben
DE69124604D1 (de) Maske zur phasenverschiebung
DE69227556D1 (de) Photomaske und Verfahren zur Herstellung
DE69400093T2 (de) Übungsgeschloss und Verfahren zur Herstellung
DE69123642T2 (de) MESFET und Verfahren zur Herstellung
DE69226757T2 (de) Filmkondensator und Verfahren zur Herstellung
DE69026754T2 (de) Aromatischer polyesterfilm und verfahren zur herstellung
DE69128406D1 (de) Lateraler MOSFET und Verfahren zur Herstellung
DE69119413T2 (de) Resistmaterial und verfahren zur herstellung
DE69120556T2 (de) Polyäthylen und Verfahren zur Herstellung
DE69127165D1 (de) Supraleitende Streifen und Verfahren zur Herstellung
DE69310031D1 (de) Quartzgerät und Verfahren zur Herstellung
DE69011989D1 (de) Magnet und Verfahren zur Herstellung.

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee