DE69131173D1 - Optische Phasenmaske und Verfahren zur Herstellung - Google Patents

Optische Phasenmaske und Verfahren zur Herstellung

Info

Publication number
DE69131173D1
DE69131173D1 DE69131173T DE69131173T DE69131173D1 DE 69131173 D1 DE69131173 D1 DE 69131173D1 DE 69131173 T DE69131173 T DE 69131173T DE 69131173 T DE69131173 T DE 69131173T DE 69131173 D1 DE69131173 D1 DE 69131173D1
Authority
DE
Germany
Prior art keywords
manufacturing
optical phase
phase mask
mask
optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69131173T
Other languages
English (en)
Other versions
DE69131173T2 (de
Inventor
Satoru Asai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2237110A external-priority patent/JPH04118654A/ja
Priority claimed from JP2148391A external-priority patent/JP3125104B2/ja
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Publication of DE69131173D1 publication Critical patent/DE69131173D1/de
Application granted granted Critical
Publication of DE69131173T2 publication Critical patent/DE69131173T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/29—Rim PSM or outrigger PSM; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/80—Etching

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE69131173T 1990-09-10 1991-09-06 Optische Phasenmaske und Verfahren zur Herstellung Expired - Fee Related DE69131173T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2237110A JPH04118654A (ja) 1990-09-10 1990-09-10 位相シフト光学マスクおよびその製造方法
JP2148391A JP3125104B2 (ja) 1991-01-23 1991-01-23 光学マスク及びその製造方法

Publications (2)

Publication Number Publication Date
DE69131173D1 true DE69131173D1 (de) 1999-06-02
DE69131173T2 DE69131173T2 (de) 1999-08-19

Family

ID=26358550

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69131173T Expired - Fee Related DE69131173T2 (de) 1990-09-10 1991-09-06 Optische Phasenmaske und Verfahren zur Herstellung

Country Status (4)

Country Link
US (1) US5424153A (de)
EP (2) EP0843217A3 (de)
KR (1) KR950014324B1 (de)
DE (1) DE69131173T2 (de)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5589305A (en) * 1990-11-29 1996-12-31 Kabushiki Kaisha Toshiba Method of fabricating a reticle
JPH04269750A (ja) * 1990-12-05 1992-09-25 American Teleph & Telegr Co <Att> 離隔特徴をフォトレジスト層に印刷する方法
EP0524741A1 (de) * 1991-07-12 1993-01-27 Motorola, Inc. Verfahren zur Erhöhung der Bildauflösung einer Maske für die Herstellung von Halbleiterschaltungen
JP3194155B2 (ja) * 1992-01-31 2001-07-30 キヤノン株式会社 半導体デバイスの製造方法及びそれを用いた投影露光装置
WO1994017449A1 (en) * 1993-01-21 1994-08-04 Sematech, Inc. Phase shifting mask structure with multilayer optical coating for improved transmission
WO1994017450A1 (en) * 1993-01-21 1994-08-04 Sematech, Inc. Phase shifting mask structure with absorbing/attenuating sidewalls for improved imaging and method of fabricating phase shifters with absorbing/attenuating sidewalls
US5418095A (en) * 1993-01-21 1995-05-23 Sematech, Inc. Method of fabricating phase shifters with absorbing/attenuating sidewalls using an additive process
US5411824A (en) * 1993-01-21 1995-05-02 Sematech, Inc. Phase shifting mask structure with absorbing/attenuating sidewalls for improved imaging
US5470681A (en) * 1993-12-23 1995-11-28 International Business Machines Corporation Phase shift mask using liquid phase oxide deposition
TW270219B (de) * 1994-05-31 1996-02-11 Advanced Micro Devices Inc
US5717218A (en) * 1994-12-28 1998-02-10 International Business Machines Corporation Focal plane phase-shifting lithography
KR100627210B1 (ko) * 1995-08-04 2006-12-01 다이니폰 인사츠 가부시키가이샤 위상시프트마스크
KR100213250B1 (ko) * 1996-10-10 1999-08-02 윤종용 위상 쉬프트 마스크 및 그 제조방법
US6251546B1 (en) * 1999-09-16 2001-06-26 Agere Systems Guardian Corp. Method of fabricating devices using an attenuated phase-shifting mask and an attenuated phase-shifting mask
US6544694B2 (en) * 2000-03-03 2003-04-08 Koninklijke Philips Electronics N.V. Method of manufacturing a device by means of a mask phase-shifting mask for use in said method
US20060083997A1 (en) * 2003-10-15 2006-04-20 Taiwan Semiconductor Manufacturing Company, Ltd. Photomask with wavelength reduction material and pellicle
US20050100798A1 (en) * 2003-10-15 2005-05-12 Taiwan Semiconductor Manufacturing Company, Ltd. Device and method for providing wavelength reduction with a photomask
KR20160127276A (ko) * 2015-04-24 2016-11-03 삼성디스플레이 주식회사 표시 장치

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2865685B2 (ja) * 1988-03-16 1999-03-08 株式会社日立製作所 半導体装置の製造方法
JP2710967B2 (ja) * 1988-11-22 1998-02-10 株式会社日立製作所 集積回路装置の製造方法
JPH02211451A (ja) * 1989-02-13 1990-08-22 Toshiba Corp 露光マスク，露光マスクの製造方法及びこれを用いた露光方法
DE69028871T2 (de) * 1989-04-28 1997-02-27 Fujitsu Ltd Maske, Herstellungsverfahren und Musterherstellung mit einer solchen Maske
EP0437376B1 (de) * 1990-01-12 1997-03-19 Sony Corporation Phasenverschiebungsmaske und Verfahren zur Herstellung
JP2566048B2 (ja) * 1990-04-19 1996-12-25 シャープ株式会社 光露光用マスク及びその製造方法

Also Published As

Publication number Publication date
EP0475694A2 (de) 1992-03-18
EP0843217A3 (de) 1998-12-16
EP0475694B1 (de) 1999-04-28
EP0475694A3 (en) 1992-09-16
DE69131173T2 (de) 1999-08-19
KR950014324B1 (ko) 1995-11-24
EP0843217A2 (de) 1998-05-20
US5424153A (en) 1995-06-13

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee