DE69207450T2 - Ständer - Google Patents
StänderInfo
- Publication number
- DE69207450T2 DE69207450T2 DE69207450T DE69207450T DE69207450T2 DE 69207450 T2 DE69207450 T2 DE 69207450T2 DE 69207450 T DE69207450 T DE 69207450T DE 69207450 T DE69207450 T DE 69207450T DE 69207450 T2 DE69207450 T2 DE 69207450T2
- Authority
- DE
- Germany
- Prior art keywords
- stand
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67796—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations with angular orientation of workpieces
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2037—Exposure with X-ray radiation or corpuscular radiation, through a mask with a pattern opaque to that radiation
- G03F7/2039—X-ray radiation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70766—Reaction force control means, e.g. countermass
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/02—Details
- H01J2237/0216—Means for avoiding or correcting vibration effects
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Manufacturing & Machinery (AREA)
- Life Sciences & Earth Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Chemical & Material Sciences (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Atmospheric Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP05010291A JP3182158B2 (ja) | 1991-02-25 | 1991-02-25 | 露光装置用のステージ支持装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69207450D1 DE69207450D1 (de) | 1996-02-22 |
DE69207450T2 true DE69207450T2 (de) | 1996-06-13 |
Family
ID=12849718
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69207450T Expired - Fee Related DE69207450T2 (de) | 1991-02-25 | 1992-02-24 | Ständer |
Country Status (4)
Country | Link |
---|---|
US (1) | US5467720A (de) |
EP (1) | EP0501724B1 (de) |
JP (1) | JP3182158B2 (de) |
DE (1) | DE69207450T2 (de) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102004013707B4 (de) * | 2003-08-28 | 2016-05-25 | Cascade Microtech, Inc. | Vorrichtung zum Testen von Substraten |
Families Citing this family (56)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4926517A (en) | 1989-02-24 | 1990-05-22 | Smith Keith E | Sweeper |
JP3200282B2 (ja) * | 1993-07-21 | 2001-08-20 | キヤノン株式会社 | 処理システム及びこれを用いたデバイス製造方法 |
US6989647B1 (en) * | 1994-04-01 | 2006-01-24 | Nikon Corporation | Positioning device having dynamically isolated frame, and lithographic device provided with such a positioning device |
US5874820A (en) | 1995-04-04 | 1999-02-23 | Nikon Corporation | Window frame-guided stage mechanism |
US5528118A (en) * | 1994-04-01 | 1996-06-18 | Nikon Precision, Inc. | Guideless stage with isolated reaction stage |
US7365513B1 (en) | 1994-04-01 | 2008-04-29 | Nikon Corporation | Positioning device having dynamically isolated frame, and lithographic device provided with such a positioning device |
TW318255B (de) | 1995-05-30 | 1997-10-21 | Philips Electronics Nv | |
US5812420A (en) * | 1995-09-05 | 1998-09-22 | Nikon Corporation | Vibration-preventive apparatus and exposure apparatus |
JP3815750B2 (ja) * | 1995-10-09 | 2006-08-30 | キヤノン株式会社 | ステージ装置、ならびに前記ステージ装置を用いた露光装置およびデバイス製造方法 |
JP3221823B2 (ja) * | 1995-11-24 | 2001-10-22 | キヤノン株式会社 | 投影露光装置およびこれを用いた露光方法ならびに半導体製造方法 |
AU2179297A (en) * | 1996-04-08 | 1997-10-29 | Delta Tooling Co., Ltd. | Magnetic spring having damping characteristics and vibration mechanism having same |
JP3659529B2 (ja) * | 1996-06-06 | 2005-06-15 | キヤノン株式会社 | 露光装置およびデバイス製造方法 |
JP3266515B2 (ja) * | 1996-08-02 | 2002-03-18 | キヤノン株式会社 | 露光装置、デバイス製造方法およびステージ装置 |
JP3635600B2 (ja) * | 1996-08-29 | 2005-04-06 | キヤノン株式会社 | 送り装置 |
JP3283767B2 (ja) * | 1996-10-02 | 2002-05-20 | キヤノン株式会社 | 露光装置およびデバイス製造方法 |
JP3548353B2 (ja) * | 1996-10-15 | 2004-07-28 | キヤノン株式会社 | ステージ装置およびこれを用いた露光装置ならびにデバイス製造方法 |
JP3689510B2 (ja) * | 1996-11-15 | 2005-08-31 | キヤノン株式会社 | 露光装置およびデバイス製造方法 |
US6222614B1 (en) * | 1996-12-06 | 2001-04-24 | Nikon Corporation | Exposure elements with a cable-relaying support |
JP3725272B2 (ja) * | 1996-12-27 | 2005-12-07 | 株式会社デルタツーリング | 振動発生機構 |
US6128069A (en) * | 1997-03-13 | 2000-10-03 | Canon Kabushiki Kaisha | Stage mechanism for exposure apparatus |
JPH1130274A (ja) * | 1997-05-15 | 1999-02-02 | Delta Tsuuring:Kk | 磁気バネを有する振動機構 |
KR100281474B1 (ko) | 1997-05-16 | 2001-02-01 | 후지타 히토시 | 자기스프링을구비한에너지출력기구 |
US6330052B1 (en) | 1997-06-13 | 2001-12-11 | Canon Kabushiki Kaisha | Exposure apparatus and its control method, stage apparatus, and device manufacturing method |
US6408045B1 (en) * | 1997-11-11 | 2002-06-18 | Canon Kabushiki Kaisha | Stage system and exposure apparatus with the same |
JP3535749B2 (ja) | 1997-12-10 | 2004-06-07 | キヤノン株式会社 | ステージ装置、露光装置、並びにデバイス製造方法 |
JPH11191585A (ja) | 1997-12-26 | 1999-07-13 | Canon Inc | ステージ装置、およびこれを用いた露光装置、ならびにデバイス製造方法 |
JP3630964B2 (ja) * | 1997-12-26 | 2005-03-23 | キヤノン株式会社 | ステージ装置、およびこれを用いた露光装置ならびにデバイス製造方法 |
JP3526202B2 (ja) * | 1998-02-03 | 2004-05-10 | キヤノン株式会社 | ステージ装置、およびこれを用いた露光装置、ならびにデバイス製造方法 |
JPH11287880A (ja) | 1998-04-01 | 1999-10-19 | Canon Inc | ステージ装置、およびこれを用いた露光装置ならびにデバイス製造方法 |
JP3869938B2 (ja) | 1998-06-05 | 2007-01-17 | キヤノン株式会社 | ステージ装置、露光装置、およびデバイス製造方法 |
JP3745167B2 (ja) | 1998-07-29 | 2006-02-15 | キヤノン株式会社 | ステージ装置、露光装置およびデバイス製造方法ならびにステージ駆動方法 |
EP1050202B1 (de) * | 1998-11-24 | 2005-06-22 | Continental Teves AG & Co. oHG | Anordnung zum schutz von elektronischen funktionseinheiten und/oder funktionsgruppen |
TW552480B (en) * | 1999-04-19 | 2003-09-11 | Asml Netherlands Bv | Moveable support in a vacuum chamber and its application in lithographic projection apparatus |
JP2001160530A (ja) * | 1999-12-01 | 2001-06-12 | Nikon Corp | ステージ装置及び露光装置 |
JP3814453B2 (ja) * | 2000-01-11 | 2006-08-30 | キヤノン株式会社 | 位置決め装置、半導体露光装置およびデバイス製造方法 |
TW509823B (en) * | 2000-04-17 | 2002-11-11 | Asml Netherlands Bv | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
US6334398B1 (en) * | 2000-04-28 | 2002-01-01 | Tokyo Electron Limited | Variable gap stop which can be used in a semiconductor processing device |
JP3945148B2 (ja) * | 2000-11-02 | 2007-07-18 | 株式会社日立製作所 | Xyテーブル及びxyzテーブル |
US6885430B2 (en) * | 2000-11-16 | 2005-04-26 | Nikon Corporation | System and method for resetting a reaction mass assembly of a stage assembly |
US6958808B2 (en) * | 2000-11-16 | 2005-10-25 | Nikon Corporation | System and method for resetting a reaction mass assembly of a stage assembly |
JP2003022960A (ja) * | 2001-07-09 | 2003-01-24 | Canon Inc | ステージ装置及びその駆動方法 |
JP2003059797A (ja) * | 2001-08-09 | 2003-02-28 | Canon Inc | 移動装置、ステージ装置及び露光装置 |
JP3977086B2 (ja) * | 2002-01-18 | 2007-09-19 | キヤノン株式会社 | ステージシステム |
JP4323759B2 (ja) * | 2002-05-27 | 2009-09-02 | キヤノン株式会社 | 露光装置およびデバイス製造方法 |
JP3849932B2 (ja) * | 2002-08-12 | 2006-11-22 | キヤノン株式会社 | 移動ステージ装置 |
JP3826087B2 (ja) * | 2002-08-30 | 2006-09-27 | キヤノン株式会社 | 位置決め装置、荷電粒子線露光装置 |
JP4012024B2 (ja) * | 2002-09-10 | 2007-11-21 | キヤノン株式会社 | 位置決め装置に於ける衝撃吸収装置 |
JP2004172557A (ja) | 2002-11-22 | 2004-06-17 | Canon Inc | ステージ装置及びその制御方法 |
JP4143438B2 (ja) * | 2003-02-24 | 2008-09-03 | キヤノン株式会社 | 支持装置、露光装置、デバイス製造方法 |
JP2005005393A (ja) * | 2003-06-10 | 2005-01-06 | Canon Inc | ステージ装置、露光装置、およびデバイス製造方法 |
JP2005142501A (ja) * | 2003-11-10 | 2005-06-02 | Canon Inc | ステージ装置および露光装置ならびにデバイス製造方法 |
JP4486521B2 (ja) * | 2005-02-08 | 2010-06-23 | 藤倉ゴム工業株式会社 | レベリング調整装置 |
WO2007040254A1 (ja) * | 2005-10-05 | 2007-04-12 | Nikon Corporation | 露光装置及び露光方法 |
JP2016023720A (ja) * | 2014-07-22 | 2016-02-08 | キヤノン株式会社 | 振動制御装置、リソグラフィ装置、および物品の製造方法 |
US10258150B2 (en) * | 2016-12-27 | 2019-04-16 | Yi-Cheng Tseng | Height adjustable desk |
US10948043B2 (en) * | 2018-10-02 | 2021-03-16 | Hiroshi Kurabayashi | Damping device for structure |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE263569C (de) * | ||||
DE3200815A1 (de) * | 1982-01-11 | 1983-07-21 | Gerb Gesellschaft für Isolierung mbH & Co KG, 1000 Berlin | Verfahren zum ausrichten der wellen von elastisch aufgestellten maschinen |
US4489991A (en) * | 1982-01-11 | 1984-12-25 | Gerb Gesellschaft Fur Isolierung Mbh & Co. Kg | Elastic support for machines |
DE3437835A1 (de) * | 1983-10-31 | 1985-05-23 | I.T.W. España, S.A., Las Franquesas des Valles, Barcelona | Lagersystem fuer waschmaschinentrommeln |
JPS62238005A (ja) * | 1986-04-10 | 1987-10-19 | Sumitomo Heavy Ind Ltd | ピルガ−式圧延機の慣性力バランス装置 |
DD263569A1 (de) * | 1987-09-02 | 1989-01-04 | Zeiss Jena Veb Carl | Schwingungsisolationssystem |
JP2770960B2 (ja) * | 1988-10-06 | 1998-07-02 | キヤノン株式会社 | Sor−x線露光装置 |
US5228358A (en) * | 1990-02-21 | 1993-07-20 | Canon Kabushiki Kaisha | Motion guiding device |
JP3320444B2 (ja) * | 1992-04-06 | 2002-09-03 | 株式会社千代田製作所 | 染色装置用ノズル洗浄装置 |
-
1991
- 1991-02-25 JP JP05010291A patent/JP3182158B2/ja not_active Expired - Fee Related
-
1992
- 1992-02-24 DE DE69207450T patent/DE69207450T2/de not_active Expired - Fee Related
- 1992-02-24 EP EP92301529A patent/EP0501724B1/de not_active Expired - Lifetime
-
1994
- 1994-10-24 US US08/328,390 patent/US5467720A/en not_active Expired - Fee Related
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102004013707B4 (de) * | 2003-08-28 | 2016-05-25 | Cascade Microtech, Inc. | Vorrichtung zum Testen von Substraten |
DE102004013707B9 (de) * | 2003-08-28 | 2016-06-23 | Cascade Microtech, Inc. | Vorrichtung zum Testen von Substraten |
Also Published As
Publication number | Publication date |
---|---|
DE69207450D1 (de) | 1996-02-22 |
EP0501724A3 (en) | 1993-03-17 |
EP0501724B1 (de) | 1996-01-10 |
JPH04268713A (ja) | 1992-09-24 |
US5467720A (en) | 1995-11-21 |
EP0501724A2 (de) | 1992-09-02 |
JP3182158B2 (ja) | 2001-07-03 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE69207450D1 (de) | Ständer | |
ATE137279T1 (de) | Stoffauflauf | |
DE69217383D1 (de) | Lampenständer | |
FI88467B (fi) | Anordning foer skaerbraenning under vattnet | |
ATA39792A (de) | Maehwerk | |
DE69232673T2 (de) | Tiefsttemperaturmessausrüstung | |
DK194891A (da) | Vaeskemotor | |
ATE163916T1 (de) | Ethyl-6-formyloxy-4-hexenoat | |
ATA9892A (de) | Formstein | |
ATA67791A (de) | Rollski | |
KR930008137U (ko) | 스탠드형 옷걸이 | |
KR940019407U (ko) | 반자돌림대 | |
DE9308416U1 (de) | Thekenartiger Stand | |
ES1017019Y (es) | Caballete desmontable | |
NO924249D0 (no) | Stativ | |
NO923407D0 (no) | Holdestativ | |
KR930000214U (ko) | 꽃꽂이용 받침대 | |
IT223221Z2 (it) | Leggio | |
ATE131399T1 (de) | Skiständer | |
KR930007816U (ko) | 스피커용 받침대 | |
DK62891D0 (da) | Vandstander | |
KR920020755U (ko) | 진열장 | |
KR920017591U (ko) | 진열장 | |
KR920017587U (ko) | 진열장 | |
KR930002309U (ko) | 톱 대 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |