DE69123792T2 - Hochmolekulare spiropyranverbindung - Google Patents

Hochmolekulare spiropyranverbindung

Info

Publication number
DE69123792T2
DE69123792T2 DE69123792T DE69123792T DE69123792T2 DE 69123792 T2 DE69123792 T2 DE 69123792T2 DE 69123792 T DE69123792 T DE 69123792T DE 69123792 T DE69123792 T DE 69123792T DE 69123792 T2 DE69123792 T2 DE 69123792T2
Authority
DE
Germany
Prior art keywords
spiropyrane
connection
high molecular
molecular
spiropyrane connection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69123792T
Other languages
English (en)
Other versions
DE69123792D1 (de
Inventor
Akira Miyashita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Otsuka Chemical Co Ltd
Original Assignee
Otsuka Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Otsuka Chemical Co Ltd filed Critical Otsuka Chemical Co Ltd
Application granted granted Critical
Publication of DE69123792D1 publication Critical patent/DE69123792D1/de
Publication of DE69123792T2 publication Critical patent/DE69123792T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D495/00—Heterocyclic compounds containing in the condensed system at least one hetero ring having sulfur atoms as the only ring hetero atoms
    • C07D495/02—Heterocyclic compounds containing in the condensed system at least one hetero ring having sulfur atoms as the only ring hetero atoms in which the condensed system contains two hetero rings
    • C07D495/10—Spiro-condensed systems
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D517/00—Heterocyclic compounds containing in the condensed system at least one hetero ring having selenium, tellurium, or halogen atoms as ring hetero atoms
    • C07D517/02—Heterocyclic compounds containing in the condensed system at least one hetero ring having selenium, tellurium, or halogen atoms as ring hetero atoms in which the condensed system contains two hetero rings
    • C07D517/10—Spiro-condensed systems
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
    • C08F20/36—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate containing oxygen in addition to the carboxy oxygen, e.g. 2-N-morpholinoethyl (meth)acrylate or 2-isocyanatoethyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/38—Esters containing sulfur
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/163—Radiation-chromic compound
DE69123792T 1990-02-08 1991-02-04 Hochmolekulare spiropyranverbindung Expired - Fee Related DE69123792T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP3037690 1990-02-08
JP3084090 1990-02-09
PCT/JP1991/000131 WO1991012279A1 (fr) 1990-02-08 1991-02-04 Compose spiropyranique a poids moleculaire eleve

Publications (2)

Publication Number Publication Date
DE69123792D1 DE69123792D1 (de) 1997-02-06
DE69123792T2 true DE69123792T2 (de) 1997-07-03

Family

ID=26368707

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69123792T Expired - Fee Related DE69123792T2 (de) 1990-02-08 1991-02-04 Hochmolekulare spiropyranverbindung

Country Status (5)

Country Link
US (1) US5241027A (de)
EP (1) EP0466938B1 (de)
CA (1) CA2051394C (de)
DE (1) DE69123792T2 (de)
WO (1) WO1991012279A1 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5521269A (en) * 1993-03-11 1996-05-28 Otsuka Kagaku Kabushiki Kaisha Spiropyran compounds and optically active spiropyran compounds and their use
US5985307A (en) 1993-04-14 1999-11-16 Emory University Device and method for non-occlusive localized drug delivery
JP2004315728A (ja) * 2003-04-18 2004-11-11 Yamanashi Tlo:Kk フォトクロミック化合物およびフォトクロミック組成物並びにこれを用いたフォトクロミック表示素子
JP4568027B2 (ja) * 2003-07-17 2010-10-27 パイロットインキ株式会社 フォトクロミック材料

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1273746A (en) * 1968-10-03 1972-05-10 Agfa Gevaert Unsaturated photochromic monomers and polymers prepared therefrom
JPS5837078A (ja) * 1981-08-28 1983-03-04 Sony Corp フオトクロミツク感光性組成物
JPS59122577A (ja) * 1982-12-28 1984-07-16 Sony Corp フオトクロミツク感光性組成物
JPH0723468B2 (ja) * 1984-12-10 1995-03-15 ソニー株式会社 フオトクロミツク感光性組成物
JPS61170737A (ja) * 1985-01-24 1986-08-01 Sony Corp 光記録媒体
JPH01152182A (ja) * 1987-12-08 1989-06-14 Toray Ind Inc フォトクロミック材料およびその製造方法
JP2503016B2 (ja) * 1987-06-09 1996-06-05 東レ株式会社 水溶性フォトクロミックポリマ−
JPH07121977B2 (ja) * 1987-07-24 1995-12-25 東レ株式会社 フォトクロミック性ポリマ−微粒子
JP2762478B2 (ja) * 1988-09-14 1998-06-04 三菱化学株式会社 フォトクロミック材料

Also Published As

Publication number Publication date
EP0466938A4 (en) 1992-07-22
CA2051394C (en) 1999-04-27
CA2051394A1 (en) 1991-08-09
DE69123792D1 (de) 1997-02-06
EP0466938B1 (de) 1996-12-27
EP0466938A1 (de) 1992-01-22
US5241027A (en) 1993-08-31
WO1991012279A1 (fr) 1991-08-22

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee