DE3788028T2 - Photosensibilisatoren und polymerisierbare Zusammensetzungen. - Google Patents

Photosensibilisatoren und polymerisierbare Zusammensetzungen.

Info

Publication number
DE3788028T2
DE3788028T2 DE87308008T DE3788028T DE3788028T2 DE 3788028 T2 DE3788028 T2 DE 3788028T2 DE 87308008 T DE87308008 T DE 87308008T DE 3788028 T DE3788028 T DE 3788028T DE 3788028 T2 DE3788028 T2 DE 3788028T2
Authority
DE
Germany
Prior art keywords
photosensitizers
polymerizable compositions
polymerizable
compositions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE87308008T
Other languages
English (en)
Other versions
DE3788028D1 (de
Inventor
Robert J Devoe
Smarajit Mitra
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Co
Original Assignee
Minnesota Mining and Manufacturing Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining and Manufacturing Co filed Critical Minnesota Mining and Manufacturing Co
Application granted granted Critical
Publication of DE3788028D1 publication Critical patent/DE3788028D1/de
Publication of DE3788028T2 publication Critical patent/DE3788028T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S522/904—Monomer or polymer contains initiating group
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S522/904—Monomer or polymer contains initiating group
    • Y10S522/905—Benzophenone group

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Laminated Bodies (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
DE87308008T 1986-09-19 1987-09-10 Photosensibilisatoren und polymerisierbare Zusammensetzungen. Expired - Fee Related DE3788028T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/909,823 US4792506A (en) 1986-09-19 1986-09-19 Polymerizable compositions containing iodonium photoinitiators and photosensitizers therefor

Publications (2)

Publication Number Publication Date
DE3788028D1 DE3788028D1 (de) 1993-12-09
DE3788028T2 true DE3788028T2 (de) 1994-04-07

Family

ID=25427885

Family Applications (1)

Application Number Title Priority Date Filing Date
DE87308008T Expired - Fee Related DE3788028T2 (de) 1986-09-19 1987-09-10 Photosensibilisatoren und polymerisierbare Zusammensetzungen.

Country Status (8)

Country Link
US (1) US4792506A (de)
EP (1) EP0260877B1 (de)
JP (1) JP2573963B2 (de)
KR (1) KR950013474B1 (de)
AU (1) AU590952B2 (de)
CA (1) CA1286831C (de)
DE (1) DE3788028T2 (de)
MX (1) MX166807B (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1308852C (en) * 1987-01-22 1992-10-13 Masami Kawabata Photopolymerizable composition
US4791045A (en) * 1988-01-25 1988-12-13 Minnesota Mining And Manufacturing Company Photosensitizers and polymerizable compositions with mannich bases and iodonium salts
US4921827A (en) * 1988-11-23 1990-05-01 Minnesota Mining And Manufacturing Company Sensitized photoinitiator system for addition polymerization
JP2604453B2 (ja) * 1988-12-14 1997-04-30 積水化学工業株式会社 アクリル系粘着テープ
JP6998769B2 (ja) * 2015-10-01 2022-01-18 東洋合成工業株式会社 ポリマー、該ポリマーを含有するレジスト組成物及びそれを用いたデバイスの製造方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3458311A (en) * 1966-06-27 1969-07-29 Du Pont Photopolymerizable elements with solvent removable protective layers
US4072528A (en) * 1972-09-27 1978-02-07 E. I. Du Pont De Nemours And Company Oxygen barrier layers for photopolymerizable elements
US4072527A (en) * 1972-09-27 1978-02-07 E. I. Du Pont De Nemours And Company Oxygen barrier layers for photopolymerizable elements
JPS5928327B2 (ja) * 1977-08-29 1984-07-12 大日精化工業株式会社 光重合開始剤
DE2831263A1 (de) * 1978-07-15 1980-01-31 Basf Ag Benzoinderivate mit quartaerer ammoniumgruppe
FR2442257A1 (fr) * 1978-11-21 1980-06-20 Ugine Kuhlmann Composes structurellement colores reticulables, leur preparation et leur utilisation dans des compositions pour revetements
GB2092164B (en) * 1980-12-17 1984-12-05 Hitachi Ltd Loght or radiation-sensitive polymer composition
EP0119719B1 (de) * 1983-03-03 1987-05-06 Toray Industries, Inc. Strahlungsempfindliche Polymermasse

Also Published As

Publication number Publication date
AU7675587A (en) 1988-03-24
JPS6395202A (ja) 1988-04-26
US4792506A (en) 1988-12-20
KR880004015A (ko) 1988-06-01
EP0260877B1 (de) 1993-11-03
EP0260877A2 (de) 1988-03-23
MX166807B (es) 1993-02-08
JP2573963B2 (ja) 1997-01-22
CA1286831C (en) 1991-07-23
EP0260877A3 (en) 1989-11-29
AU590952B2 (en) 1989-11-23
KR950013474B1 (ko) 1995-11-08
DE3788028D1 (de) 1993-12-09

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee