MX166807B - Fotosensibilizador polimerico y composicion fotopolimerizable - Google Patents
Fotosensibilizador polimerico y composicion fotopolimerizableInfo
- Publication number
- MX166807B MX166807B MX008364A MX836487A MX166807B MX 166807 B MX166807 B MX 166807B MX 008364 A MX008364 A MX 008364A MX 836487 A MX836487 A MX 836487A MX 166807 B MX166807 B MX 166807B
- Authority
- MX
- Mexico
- Prior art keywords
- group
- alkaryl
- aryl
- alkyl
- aralkyl
- Prior art date
Links
- 239000003504 photosensitizing agent Substances 0.000 title abstract 3
- 229920000642 polymer Polymers 0.000 title 1
- 125000002877 alkyl aryl group Chemical group 0.000 abstract 3
- 125000000217 alkyl group Chemical group 0.000 abstract 3
- 125000003710 aryl alkyl group Chemical group 0.000 abstract 3
- 125000003118 aryl group Chemical group 0.000 abstract 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract 2
- 125000002947 alkylene group Chemical group 0.000 abstract 2
- 125000000732 arylene group Chemical group 0.000 abstract 2
- 125000005549 heteroarylene group Chemical group 0.000 abstract 2
- 125000000623 heterocyclic group Chemical group 0.000 abstract 2
- 125000004433 nitrogen atom Chemical group N* 0.000 abstract 2
- 125000000962 organic group Chemical group 0.000 abstract 2
- 239000000126 substance Substances 0.000 abstract 2
- 125000004429 atom Chemical group 0.000 abstract 1
- 229910052757 nitrogen Inorganic materials 0.000 abstract 1
- 230000002165 photosensitisation Effects 0.000 abstract 1
- 238000006467 substitution reaction Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/12—Nitrogen compound containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
- Y10S522/904—Monomer or polymer contains initiating group
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
- Y10S522/904—Monomer or polymer contains initiating group
- Y10S522/905—Benzophenone group
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Polymerisation Methods In General (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Paints Or Removers (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Laminated Bodies (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
La presente invención se refiere a un fotosensibilizador polimérico que contiene una cantidad fotosensibilizadoramente efectiva de unidades de cualquiera de las fórmulas: I y II caracterizado porque a se selecciona del grupo que consiste de 0 y 1, x se selecciona del grupo que consiste de 1 y 2, b se selecciona del grupo que consiste de 0 y 1, R1, R2 y R3 se seleccionan independientemente del grupo que consiste de H, grupos alquilo, arilo, alcarilo y aralquilo, R4 y R6 se seleccionan independientemente del grupo que consiste de grupos alquilo, arilo, alcarilo y aralquilo y en donde R 4 y R6 juntos pueden formar un grupo orgánico bivalente, junto con átomos de R5 y los átomos de nitrógeno unidos a R5, seleccionados del grupo que consiste de un grupo heterocíclico o un grupo bis-heterocíclico, R5 es un grupo orgánico divalente o una ligadura química, R7 y R9 se seleccionan independientemente del grupo que consiste de grupos alquileno, arileno, alcarileno y heteroarileno, o un átomo de nitrógeno monosubstituído, en donde la substitución en dicho nitrógeno se selecciona de H, alquilo, arilo, alcarilo o aralquilo, y R8 se selecciona de una ligadura química y del grupo que consiste de grupos alquileno, arileno, alcarileno y heteroarileno.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US06/909,823 US4792506A (en) | 1986-09-19 | 1986-09-19 | Polymerizable compositions containing iodonium photoinitiators and photosensitizers therefor |
Publications (1)
Publication Number | Publication Date |
---|---|
MX166807B true MX166807B (es) | 1993-02-08 |
Family
ID=25427885
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MX008364A MX166807B (es) | 1986-09-19 | 1987-09-18 | Fotosensibilizador polimerico y composicion fotopolimerizable |
Country Status (8)
Country | Link |
---|---|
US (1) | US4792506A (es) |
EP (1) | EP0260877B1 (es) |
JP (1) | JP2573963B2 (es) |
KR (1) | KR950013474B1 (es) |
AU (1) | AU590952B2 (es) |
CA (1) | CA1286831C (es) |
DE (1) | DE3788028T2 (es) |
MX (1) | MX166807B (es) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA1308852C (en) * | 1987-01-22 | 1992-10-13 | Masami Kawabata | Photopolymerizable composition |
US4791045A (en) * | 1988-01-25 | 1988-12-13 | Minnesota Mining And Manufacturing Company | Photosensitizers and polymerizable compositions with mannich bases and iodonium salts |
US4921827A (en) * | 1988-11-23 | 1990-05-01 | Minnesota Mining And Manufacturing Company | Sensitized photoinitiator system for addition polymerization |
JP2604453B2 (ja) * | 1988-12-14 | 1997-04-30 | 積水化学工業株式会社 | アクリル系粘着テープ |
JP6998769B2 (ja) * | 2015-10-01 | 2022-01-18 | 東洋合成工業株式会社 | ポリマー、該ポリマーを含有するレジスト組成物及びそれを用いたデバイスの製造方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3458311A (en) * | 1966-06-27 | 1969-07-29 | Du Pont | Photopolymerizable elements with solvent removable protective layers |
US4072527A (en) * | 1972-09-27 | 1978-02-07 | E. I. Du Pont De Nemours And Company | Oxygen barrier layers for photopolymerizable elements |
US4072528A (en) * | 1972-09-27 | 1978-02-07 | E. I. Du Pont De Nemours And Company | Oxygen barrier layers for photopolymerizable elements |
JPS5928327B2 (ja) * | 1977-08-29 | 1984-07-12 | 大日精化工業株式会社 | 光重合開始剤 |
DE2831263A1 (de) * | 1978-07-15 | 1980-01-31 | Basf Ag | Benzoinderivate mit quartaerer ammoniumgruppe |
FR2442257A1 (fr) * | 1978-11-21 | 1980-06-20 | Ugine Kuhlmann | Composes structurellement colores reticulables, leur preparation et leur utilisation dans des compositions pour revetements |
GB2092164B (en) * | 1980-12-17 | 1984-12-05 | Hitachi Ltd | Loght or radiation-sensitive polymer composition |
EP0119719B1 (en) * | 1983-03-03 | 1987-05-06 | Toray Industries, Inc. | Radiation sensitive polymer composition |
-
1986
- 1986-09-19 US US06/909,823 patent/US4792506A/en not_active Expired - Fee Related
-
1987
- 1987-08-11 AU AU76755/87A patent/AU590952B2/en not_active Ceased
- 1987-08-12 CA CA000544309A patent/CA1286831C/en not_active Expired - Fee Related
- 1987-09-10 EP EP87308008A patent/EP0260877B1/en not_active Expired - Lifetime
- 1987-09-10 DE DE87308008T patent/DE3788028T2/de not_active Expired - Fee Related
- 1987-09-18 KR KR1019870010354A patent/KR950013474B1/ko not_active IP Right Cessation
- 1987-09-18 JP JP62234694A patent/JP2573963B2/ja not_active Expired - Lifetime
- 1987-09-18 MX MX008364A patent/MX166807B/es unknown
Also Published As
Publication number | Publication date |
---|---|
KR950013474B1 (ko) | 1995-11-08 |
DE3788028T2 (de) | 1994-04-07 |
US4792506A (en) | 1988-12-20 |
DE3788028D1 (de) | 1993-12-09 |
JP2573963B2 (ja) | 1997-01-22 |
KR880004015A (ko) | 1988-06-01 |
JPS6395202A (ja) | 1988-04-26 |
CA1286831C (en) | 1991-07-23 |
AU590952B2 (en) | 1989-11-23 |
AU7675587A (en) | 1988-03-24 |
EP0260877A3 (en) | 1989-11-29 |
EP0260877A2 (en) | 1988-03-23 |
EP0260877B1 (en) | 1993-11-03 |
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