DE69032873D1 - Vollständig substituierte Novalak-Polymere enthaltende Strahlungsempfindliche Zusammensetzungen - Google Patents

Vollständig substituierte Novalak-Polymere enthaltende Strahlungsempfindliche Zusammensetzungen

Info

Publication number
DE69032873D1
DE69032873D1 DE69032873T DE69032873T DE69032873D1 DE 69032873 D1 DE69032873 D1 DE 69032873D1 DE 69032873 T DE69032873 T DE 69032873T DE 69032873 T DE69032873 T DE 69032873T DE 69032873 D1 DE69032873 D1 DE 69032873D1
Authority
DE
Germany
Prior art keywords
novalak
polymers
compositions containing
radiation sensitive
fully substituted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69032873T
Other languages
English (en)
Other versions
DE69032873T2 (de
Inventor
Charles E Ebersole
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Olin Microelectronic Chemicals Inc
Original Assignee
Olin Microelectronic Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Olin Microelectronic Chemicals Inc filed Critical Olin Microelectronic Chemicals Inc
Application granted granted Critical
Publication of DE69032873D1 publication Critical patent/DE69032873D1/de
Publication of DE69032873T2 publication Critical patent/DE69032873T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Materials For Photolithography (AREA)
  • Memory System Of A Hierarchy Structure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE69032873T 1989-09-08 1990-09-06 Vollständig substituierte Novalak-Polymere enthaltende Strahlungsempfindliche Zusammensetzungen Expired - Fee Related DE69032873T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US40580289A 1989-09-08 1989-09-08
US55348390A 1990-07-13 1990-07-13

Publications (2)

Publication Number Publication Date
DE69032873D1 true DE69032873D1 (de) 1999-02-11
DE69032873T2 DE69032873T2 (de) 1999-07-29

Family

ID=27019242

Family Applications (2)

Application Number Title Priority Date Filing Date
DE69032744T Expired - Fee Related DE69032744T2 (de) 1989-09-08 1990-09-06 Vollständig substituierte novalak-polymere enthaltende strahlungsempfindliche zusammensetzungen
DE69032873T Expired - Fee Related DE69032873T2 (de) 1989-09-08 1990-09-06 Vollständig substituierte Novalak-Polymere enthaltende Strahlungsempfindliche Zusammensetzungen

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE69032744T Expired - Fee Related DE69032744T2 (de) 1989-09-08 1990-09-06 Vollständig substituierte novalak-polymere enthaltende strahlungsempfindliche zusammensetzungen

Country Status (6)

Country Link
US (1) US5237037A (de)
EP (2) EP0490966B1 (de)
JP (1) JP2711254B2 (de)
AU (1) AU6339390A (de)
DE (2) DE69032744T2 (de)
WO (1) WO1991003769A1 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5413896A (en) † 1991-01-24 1995-05-09 Japan Synthetic Rubber Co., Ltd. I-ray sensitive positive resist composition
US5346799A (en) * 1991-12-23 1994-09-13 Ocg Microelectronic Materials, Inc. Novolak resins and their use in radiation-sensitive compositions wherein the novolak resins are made by condensing 2,6-dimethylphenol, 2,3-dimethylphenol, a para-substituted phenol and an aldehyde
US5413894A (en) * 1993-05-07 1995-05-09 Ocg Microelectronic Materials, Inc. High ortho-ortho bonded novolak binder resins and their use in radiation-sensitive compositions
FR2813886B1 (fr) * 2000-09-08 2005-04-15 Ceca Sa Resines novolaques, leur procede de preparation et leurs utilisations
US6656643B2 (en) 2001-02-20 2003-12-02 Chartered Semiconductor Manufacturing Ltd. Method of extreme ultraviolet mask engineering
US6582861B2 (en) * 2001-03-16 2003-06-24 Applied Materials, Inc. Method of reshaping a patterned organic photoresist surface
US20050014086A1 (en) * 2001-06-20 2005-01-20 Eswaran Sambasivan Venkat "High ortho" novolak copolymers and composition thereof
KR20050034887A (ko) * 2003-10-10 2005-04-15 삼성전자주식회사 전원전압 동기신호 생성 장치 및 방법

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JPS55126250A (en) * 1979-03-20 1980-09-29 Fuji Photo Film Co Ltd Photosensitive lithographic printing plate material and manufacture of lithographic printing plate using this
US4529682A (en) * 1981-06-22 1985-07-16 Philip A. Hunt Chemical Corporation Positive photoresist composition with cresol-formaldehyde novolak resins
US4377631A (en) * 1981-06-22 1983-03-22 Philip A. Hunt Chemical Corporation Positive novolak photoresist compositions
US4499171A (en) * 1982-04-20 1985-02-12 Japan Synthetic Rubber Co., Ltd. Positive type photosensitive resin composition with at least two o-quinone diazides
US4404357A (en) * 1982-05-03 1983-09-13 Shipley Company Inc. High temperature naphthol novolak resin
JPS6031138A (ja) * 1983-07-30 1985-02-16 Konishiroku Photo Ind Co Ltd 感光性組成物
EP0136110A3 (de) * 1983-08-30 1986-05-28 Mitsubishi Kasei Corporation Positive lichtempfindliche Zusammensetzung und Verwendung für Photolacke
JPH0648381B2 (ja) * 1984-01-26 1994-06-22 三菱化成株式会社 ポジ型フオトレジスト組成物
JPS60164740A (ja) * 1984-02-06 1985-08-27 Japan Synthetic Rubber Co Ltd ポジ型感光性樹脂組成物
JPS60176034A (ja) * 1984-02-23 1985-09-10 Japan Synthetic Rubber Co Ltd ポジ型感光性樹脂組成物
JPS61185741A (ja) * 1985-02-13 1986-08-19 Mitsubishi Chem Ind Ltd ポジ型フオトレジスト組成物
JPS61275748A (ja) * 1985-05-29 1986-12-05 Sumitomo Chem Co Ltd ポジ型フオトレジスト組成物
JPH0616175B2 (ja) * 1985-10-15 1994-03-02 三菱化成株式会社 ポジ型フオトレジスト組成物
JPH0778157B2 (ja) * 1985-11-21 1995-08-23 日本合成ゴム株式会社 ポジ型感放射線性樹脂組成物の製造方法
DE3686032T2 (de) * 1985-12-27 1993-02-18 Japan Synthetic Rubber Co Ltd Strahlungsempfindliche positiv arbeitende kunststoffzusammensetzung.
JPS62153950A (ja) * 1985-12-27 1987-07-08 Japan Synthetic Rubber Co Ltd ポジ型感放射線性樹脂組成物
JPH0654385B2 (ja) * 1986-01-27 1994-07-20 日本合成ゴム株式会社 ポジ型感放射線性樹脂組成物
JPS62163055A (ja) * 1986-01-14 1987-07-18 Mitsubishi Chem Ind Ltd ポジ型感光性平版印刷版
JP2626655B2 (ja) * 1986-01-24 1997-07-02 住友化学工業株式会社 ポジ型フォトレジスト用ノボラック樹脂の製造法
JPH0654386B2 (ja) * 1986-03-28 1994-07-20 日本合成ゴム株式会社 ポジ型感放射線性樹脂組成物
DE3751743T2 (de) * 1986-03-28 1996-11-14 Japan Synthetic Rubber Co Ltd Positiv arbeitende photoempfindliche Kunststoffzusammensetzung
JPH0656487B2 (ja) * 1986-05-02 1994-07-27 東京応化工業株式会社 ポジ型ホトレジスト用組成物
JPH0654388B2 (ja) * 1986-05-02 1994-07-20 東京応化工業株式会社 ポジ型ホトレジスト組成物
JPS6334540A (ja) * 1986-07-30 1988-02-15 Mitsubishi Chem Ind Ltd ポジ型フオトレジスト組成物
JPH0772796B2 (ja) * 1986-07-31 1995-08-02 日本合成ゴム株式会社 ポジ型放射線感応性樹脂組成物
JPS6343134A (ja) * 1986-08-11 1988-02-24 Mitsubishi Chem Ind Ltd ポジ型フオトレジスト組成物
JP2590342B2 (ja) * 1986-11-08 1997-03-12 住友化学工業株式会社 ポジ型フォトレジスト用ノボラック樹脂及びそれを含有するポジ型フォトレジスト組成物
AU605561B2 (en) * 1987-03-20 1991-01-17 Mitsubishi Petrochemical Company Limited Developing composition and a sheet for pressure-sensitive copy paper
JPS63234249A (ja) * 1987-03-23 1988-09-29 Nippon Zeon Co Ltd ポジ型フオトレジスト組成物
JPS63234250A (ja) * 1987-03-23 1988-09-29 Nippon Zeon Co Ltd ポジ型フオトレジスト組成物
JPH0812423B2 (ja) * 1987-05-14 1996-02-07 三菱化学株式会社 ポジ型フォトレジスト組成物
JPS63291053A (ja) * 1987-05-25 1988-11-28 Nippon Zeon Co Ltd ポジ型フォトレジスト組成物
JPS63291052A (ja) * 1987-05-25 1988-11-28 Nippon Zeon Co Ltd ポジ型フォトレジスト組成物
JPH0768435B2 (ja) * 1987-09-30 1995-07-26 日本合成ゴム株式会社 感放射線性樹脂組成物
JPH01106043A (ja) * 1987-10-20 1989-04-24 Matsushita Electric Ind Co Ltd パターン形成材料
JP2693472B2 (ja) * 1987-11-26 1997-12-24 株式会社東芝 レジスト
JP2569669B2 (ja) * 1987-12-28 1997-01-08 日本合成ゴム株式会社 感放射線性樹脂組成物
DE3810631A1 (de) * 1988-03-29 1989-10-12 Hoechst Ag Positiv arbeitendes lichtempfindliches gemisch und daraus hergestelltes aufzeichnungsmaterial mit hohem waermestand
JPH01304455A (ja) * 1988-06-01 1989-12-08 Chisso Corp ポジ型フォトレジスト組成物
JPH0219851A (ja) * 1988-07-07 1990-01-23 Mitsubishi Kasei Corp ポジ型フォトレジスト用現像液
JPH0220868A (ja) * 1988-07-08 1990-01-24 Mitsubishi Electric Corp ポジ型フォトレジスト組成物
JPH0247656A (ja) * 1988-08-09 1990-02-16 Tosoh Corp ポジ型フォトレジスト
US4965167A (en) * 1988-11-10 1990-10-23 Olin Hunt Specialty Products, Inc. Positive-working photoresist employing a selected mixture of ethyl lactate and ethyl 3-ethoxy propionate as casting solvent
US4957846A (en) * 1988-12-27 1990-09-18 Olin Hunt Specialty Products Inc. Radiation sensitive compound and mixtures with trinuclear novolak oligomer with o-naphthoquinone diazide sulfonyl group
US4992596A (en) * 1988-12-27 1991-02-12 Olin Hunt Specialty Products Inc. Selected trinuclear novolak oligomers and their use in photoactive compounds and radiation sensitive mixtures
US4992356A (en) * 1988-12-27 1991-02-12 Olin Hunt Specialty Products Inc. Process of developing a radiation imaged product with trinuclear novolak oligomer having o-naphthoquinone diazide sulfonyl group

Also Published As

Publication number Publication date
DE69032744D1 (de) 1998-12-10
EP0490966A4 (en) 1992-10-21
EP0701169B1 (de) 1998-12-30
AU6339390A (en) 1991-04-08
DE69032744T2 (de) 1999-06-02
JP2711254B2 (ja) 1998-02-10
EP0490966A1 (de) 1992-06-24
EP0490966B1 (de) 1998-11-04
DE69032873T2 (de) 1999-07-29
EP0701169A1 (de) 1996-03-13
JPH05500274A (ja) 1993-01-21
WO1991003769A1 (en) 1991-03-21
US5237037A (en) 1993-08-17

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Legal Events

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8339 Ceased/non-payment of the annual fee