DE69003979T2 - Verfahren zur Herstellung von Silikaglas mit einer Brechwertverteilung. - Google Patents

Verfahren zur Herstellung von Silikaglas mit einer Brechwertverteilung.

Info

Publication number
DE69003979T2
DE69003979T2 DE90303374T DE69003979T DE69003979T2 DE 69003979 T2 DE69003979 T2 DE 69003979T2 DE 90303374 T DE90303374 T DE 90303374T DE 69003979 T DE69003979 T DE 69003979T DE 69003979 T2 DE69003979 T2 DE 69003979T2
Authority
DE
Germany
Prior art keywords
production
refractive index
silica glass
index distribution
distribution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE90303374T
Other languages
English (en)
Other versions
DE69003979D1 (de
Inventor
Osamu Kondo
Masukazu Hirata
Mitsuzo Arii
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Gas Chemical Co Inc
Original Assignee
Mitsubishi Gas Chemical Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP7829889A external-priority patent/JPH02258637A/ja
Priority claimed from JP1078301A external-priority patent/JP2861029B2/ja
Application filed by Mitsubishi Gas Chemical Co Inc filed Critical Mitsubishi Gas Chemical Co Inc
Application granted granted Critical
Publication of DE69003979D1 publication Critical patent/DE69003979D1/de
Publication of DE69003979T2 publication Critical patent/DE69003979T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/016—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by a liquid phase reaction process, e.g. through a gel phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/12—Other methods of shaping glass by liquid-phase reaction processes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/0095—Solution impregnating; Solution doping; Molecular stuffing, e.g. of porous glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/08—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant
    • C03B2201/10—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant doped with boron
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C03B2201/28—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with phosphorus
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/31—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with germanium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/32—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with aluminium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/40—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/40—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C03B2201/42—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn doped with titanium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/54—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with beryllium, magnesium or alkaline earth metals
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2203/00—Fibre product details, e.g. structure, shape
    • C03B2203/10—Internal structure or shape details
    • C03B2203/22—Radial profile of refractive index, composition or softening point
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00—Technologies relating to the processing of minerals
    • Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57—Improving the yield, e-g- reduction of reject rates
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S65/00—Glass manufacturing
    • Y10S65/901—Liquid phase reaction process
DE90303374T 1989-03-31 1990-03-29 Verfahren zur Herstellung von Silikaglas mit einer Brechwertverteilung. Expired - Fee Related DE69003979T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP7829889A JPH02258637A (ja) 1989-03-31 1989-03-31 屈折率分布を持つ石英ガラスの製造方法
JP1078301A JP2861029B2 (ja) 1989-03-31 1989-03-31 光導波路の製造方法

Publications (2)

Publication Number Publication Date
DE69003979D1 DE69003979D1 (de) 1993-11-25
DE69003979T2 true DE69003979T2 (de) 1994-05-05

Family

ID=26419380

Family Applications (1)

Application Number Title Priority Date Filing Date
DE90303374T Expired - Fee Related DE69003979T2 (de) 1989-03-31 1990-03-29 Verfahren zur Herstellung von Silikaglas mit einer Brechwertverteilung.

Country Status (3)

Country Link
US (1) US5160358A (de)
EP (1) EP0390566B1 (de)
DE (1) DE69003979T2 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT1256359B (it) * 1992-09-01 1995-12-01 Enichem Spa Procedimento per la preparazione di componenti e dispositivi ottici indimensioni finali o quasi finali, e prodotti cosi' ottenuti
US5439624A (en) * 1994-02-14 1995-08-08 Wisconsin Alumni Research Foundation Method for forming porous ceramic materials
US6591634B1 (en) * 1994-02-25 2003-07-15 Toshinori Morizane Method for production of metal oxide glass film at a low temperature
JPH08184702A (ja) * 1994-12-29 1996-07-16 Olympus Optical Co Ltd 屈折率分布型光学素子およびその製造方法
US7167615B1 (en) 1999-11-05 2007-01-23 Board Of Regents, The University Of Texas System Resonant waveguide-grating filters and sensors and methods for making and using same
AU2001277156A1 (en) * 2000-08-10 2002-02-25 Yazaki Corporation Process for making glass bodies having refractive index gradients
US6661952B2 (en) * 2001-05-04 2003-12-09 Ut Battelle, Llc Sub-wavelength efficient polarization filter (SWEP filter)
ITNO20050012A1 (it) * 2005-08-10 2007-02-11 Degussa Novara Technology S P A Processo sol-gel migliorato, comprendente il controllo degli ossidrili e materiale cosi' ottenuto
JP5911240B2 (ja) * 2010-10-04 2016-04-27 キヤノン株式会社 多孔質ガラス、その製造方法、光学部材および撮像装置

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1160845A (en) * 1979-01-11 1984-01-24 Shiro Kurosaki Method of producing optical waveguide
JPS56145125A (en) * 1980-04-04 1981-11-11 Sumitomo Electric Ind Ltd Preparation of glass body having graded refractive index distribution
JPS5742547A (en) * 1980-08-25 1982-03-10 Nippon Telegr & Teleph Corp <Ntt> Preparation of optical glass part
CA1172045A (en) * 1980-09-16 1984-08-07 Shiro Kurosaki Process for the production of an optical glass article
US4403031A (en) * 1981-06-25 1983-09-06 Corning Glass Works Method for providing optical patterns in glass
JPS58199747A (ja) * 1982-05-14 1983-11-21 Hoya Corp 屈折率勾配を有するガラス体の製造法
JPS59146946A (ja) * 1983-02-04 1984-08-23 Hoya Corp 厚さ方向にのみ屈折率勾配を有するスラブ状レンズの製造法
JPS6076701A (ja) * 1983-10-04 1985-05-01 Hoya Corp 平板マイクロレンズの製造方法
JPS6081033A (ja) * 1983-10-11 1985-05-09 Nippon Telegr & Teleph Corp <Ntt> 光フアイバの製造方法
JPS60171237A (ja) * 1984-02-14 1985-09-04 Hoya Corp 屈折率勾配を有する透明ガラス体の製造法
JPS61106425A (ja) * 1984-10-27 1986-05-24 Canon Inc 光学素子の製造方法
JPS61232248A (ja) * 1985-04-04 1986-10-16 Canon Inc 光学的パタ−ンの形成方法
JPS61242918A (ja) * 1985-04-16 1986-10-29 Canon Inc 屈折率分布を有するガラス体の製造方法
US4778744A (en) * 1986-11-21 1988-10-18 Corning Glass Works Method for providing high-intensity optical patterns in glass
JPS63195132A (ja) * 1987-02-09 1988-08-12 Seiko Epson Corp 光伝送用ガラス体の製造方法
JPS63206218A (ja) * 1987-02-24 1988-08-25 松下冷機株式会社 粉砕機
US4902650A (en) * 1987-06-09 1990-02-20 The University Of Rochester Gradient-index glass
US4797376A (en) * 1987-06-09 1989-01-10 University Of Rochester Sol-gel method for making gradient-index glass

Also Published As

Publication number Publication date
EP0390566A1 (de) 1990-10-03
US5160358A (en) 1992-11-03
EP0390566B1 (de) 1993-10-20
DE69003979D1 (de) 1993-11-25

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee