DE69002000D1 - Film von titanhydrid. - Google Patents
Film von titanhydrid.Info
- Publication number
- DE69002000D1 DE69002000D1 DE9090203447T DE69002000T DE69002000D1 DE 69002000 D1 DE69002000 D1 DE 69002000D1 DE 9090203447 T DE9090203447 T DE 9090203447T DE 69002000 T DE69002000 T DE 69002000T DE 69002000 D1 DE69002000 D1 DE 69002000D1
- Authority
- DE
- Germany
- Prior art keywords
- film
- metal
- deposited
- titanhydrid
- hydride
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 229910052751 metal Inorganic materials 0.000 abstract 3
- 239000002184 metal Substances 0.000 abstract 3
- 238000000034 method Methods 0.000 abstract 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract 1
- 239000011521 glass Substances 0.000 abstract 1
- 150000004678 hydrides Chemical class 0.000 abstract 1
- 229910052739 hydrogen Inorganic materials 0.000 abstract 1
- 239000001257 hydrogen Substances 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 229910052987 metal hydride Inorganic materials 0.000 abstract 1
- 150000004681 metal hydrides Chemical class 0.000 abstract 1
- 150000002739 metals Chemical class 0.000 abstract 1
- 239000004033 plastic Substances 0.000 abstract 1
- 238000004544 sputter deposition Methods 0.000 abstract 1
- -1 titanium hydride Chemical compound 0.000 abstract 1
- 229910000048 titanium hydride Inorganic materials 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5826—Treatment with charged particles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5846—Reactive treatment
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Magnetic Heads (AREA)
- Chemically Coating (AREA)
- Materials For Medical Uses (AREA)
- Solid-Sorbent Or Filter-Aiding Compositions (AREA)
- Transition And Organic Metals Composition Catalysts For Addition Polymerization (AREA)
- Surface Treatment Of Glass (AREA)
- Compositions Of Oxide Ceramics (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| IT19390A IT1238695B (it) | 1990-02-16 | 1990-02-16 | Film di idruro di titanio |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE69002000D1 true DE69002000D1 (de) | 1993-07-22 |
| DE69002000T2 DE69002000T2 (de) | 1994-01-27 |
Family
ID=11157289
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE90203447T Expired - Fee Related DE69002000T2 (de) | 1990-02-16 | 1990-12-20 | Film von Titanhydrid. |
Country Status (9)
| Country | Link |
|---|---|
| EP (1) | EP0442162B1 (de) |
| JP (1) | JPH04218673A (de) |
| AT (1) | ATE90737T1 (de) |
| CA (1) | CA2036403A1 (de) |
| DE (1) | DE69002000T2 (de) |
| DK (1) | DK0442162T3 (de) |
| ES (1) | ES2042203T3 (de) |
| IT (1) | IT1238695B (de) |
| RU (1) | RU1836487C (de) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10235154B4 (de) * | 2002-08-01 | 2005-01-05 | Saint-Gobain Glass Deutschland Gmbh | Vorspannbares Schichtsystem für Glasscheiben |
| CN102310038B (zh) * | 2011-09-29 | 2014-06-11 | 华东交通大学 | 一种增强金属薄膜表面疏水性的方法 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4055686A (en) * | 1976-02-20 | 1977-10-25 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Method of forming metal hydride films |
| FR2585730B1 (fr) * | 1985-08-01 | 1987-10-09 | Centre Nat Rech Scient | Procede de depot de metaux en couche mince sur un substrat non metallique, avec depot intermediaire d'hydrures par pulverisation cathodique reactive |
| FR2630133B1 (fr) * | 1988-04-18 | 1993-09-24 | Siderurgie Fse Inst Rech | Procede pour l'amelioration de la resistance a la corrosion de materiaux metalliques |
-
1990
- 1990-02-16 IT IT19390A patent/IT1238695B/it active IP Right Grant
- 1990-12-20 DK DK90203447.9T patent/DK0442162T3/da active
- 1990-12-20 ES ES199090203447T patent/ES2042203T3/es not_active Expired - Lifetime
- 1990-12-20 EP EP90203447A patent/EP0442162B1/de not_active Expired - Lifetime
- 1990-12-20 AT AT90203447T patent/ATE90737T1/de not_active IP Right Cessation
- 1990-12-20 DE DE90203447T patent/DE69002000T2/de not_active Expired - Fee Related
-
1991
- 1991-02-15 CA CA002036403A patent/CA2036403A1/en not_active Abandoned
- 1991-02-15 JP JP3042266A patent/JPH04218673A/ja not_active Withdrawn
- 1991-02-15 RU SU914894693A patent/RU1836487C/ru active
Also Published As
| Publication number | Publication date |
|---|---|
| RU1836487C (ru) | 1993-08-23 |
| IT1238695B (it) | 1993-09-01 |
| EP0442162A1 (de) | 1991-08-21 |
| DK0442162T3 (da) | 1993-10-11 |
| EP0442162B1 (de) | 1993-06-16 |
| DE69002000T2 (de) | 1994-01-27 |
| ATE90737T1 (de) | 1993-07-15 |
| CA2036403A1 (en) | 1991-08-17 |
| JPH04218673A (ja) | 1992-08-10 |
| ES2042203T3 (es) | 1993-12-01 |
| IT9019390A1 (it) | 1991-08-17 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8364 | No opposition during term of opposition | ||
| 8339 | Ceased/non-payment of the annual fee |