ES485671A1 - Procedimiento de metalizacion a partir de puentes de vapor por bombardeo de los depositos con particulas energeticas. - Google Patents

Procedimiento de metalizacion a partir de puentes de vapor por bombardeo de los depositos con particulas energeticas.

Info

Publication number
ES485671A1
ES485671A1 ES485671A ES485671A ES485671A1 ES 485671 A1 ES485671 A1 ES 485671A1 ES 485671 A ES485671 A ES 485671A ES 485671 A ES485671 A ES 485671A ES 485671 A1 ES485671 A1 ES 485671A1
Authority
ES
Spain
Prior art keywords
deposition process
deposit
bombarding
producing
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES485671A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ford Motor Co
Original Assignee
Ford Motor Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US06/055,939 external-priority patent/US4256780A/en
Application filed by Ford Motor Co filed Critical Ford Motor Co
Publication of ES485671A1 publication Critical patent/ES485671A1/es
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5826—Treatment with charged particles
    • C23C14/5833—Ion beam bombardment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/20—Metallic material, boron or silicon on organic substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/584—Non-reactive treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

Procedimiento de metalización a partir de fuentes de vapor por bombardeo de los depósitos con partículas energéticas que incluye: (a) mantener un vacío en una cámara, (B) situar un substrato en la cámara, © formar un vapor depositable constituido por un metal de transición en el vacío a partir de un fuente de vapor, depositándose normalmente el vapor bajo tensión, (D) permitir que el vapor entre en contacto con el substrato para formar un depósito en el él, y (E) bombardear el depósito con particular aceleradas que comprenden partículas atómicas, energéticas procedentes de otra fuente cuyo número y energía son suficientes como para que la tensión interna del depósito sea aproximadamente cero a su compresión.
ES485671A 1978-11-02 1979-11-02 Procedimiento de metalizacion a partir de puentes de vapor por bombardeo de los depositos con particulas energeticas. Expired ES485671A1 (es)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US95737478A 1978-11-02 1978-11-02
US95737378A 1978-11-02 1978-11-02
US06/055,939 US4256780A (en) 1978-11-02 1979-07-09 Metallization process

Publications (1)

Publication Number Publication Date
ES485671A1 true ES485671A1 (es) 1980-10-01

Family

ID=27368938

Family Applications (1)

Application Number Title Priority Date Filing Date
ES485671A Expired ES485671A1 (es) 1978-11-02 1979-11-02 Procedimiento de metalizacion a partir de puentes de vapor por bombardeo de los depositos con particulas energeticas.

Country Status (5)

Country Link
EP (1) EP0010971B1 (es)
AU (1) AU532935B2 (es)
CA (1) CA1124957A (es)
DE (1) DE2966835D1 (es)
ES (1) ES485671A1 (es)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3003285A1 (de) * 1980-01-30 1981-08-06 Siemens AG, 1000 Berlin und 8000 München Verfahren zum herstellen niederohmiger, einkristalliner metall- oder legierungsschichten auf substraten
JPS60176981A (ja) * 1984-02-22 1985-09-11 株式会社豊田中央研究所 セラミツクスの強化方法
GB8423255D0 (en) * 1984-09-14 1984-10-17 Atomic Energy Authority Uk Surface treatment of metals
EP0751235B1 (en) * 1995-06-30 1999-05-06 Toyoda Gosei Co., Ltd. Flexible metallized products and process for producing the same
DE19640832C2 (de) * 1996-10-02 2000-08-10 Fraunhofer Ges Forschung Verfahren zur Herstellung wärmereflektierender Schichtsysteme
GB9821903D0 (en) * 1998-10-09 1998-12-02 Rolls Royce Plc A method of applying a coating to a metallic article and an apparatus for applying a coating to a metallic article
US7208396B2 (en) 2002-01-16 2007-04-24 Tegal Corporation Permanent adherence of the back end of a wafer to an electrical component or sub-assembly
US7229533B2 (en) 2004-06-25 2007-06-12 Guardian Industries Corp. Method of making coated article having low-E coating with ion beam treated and/or formed IR reflecting layer
US7311975B2 (en) * 2004-06-25 2007-12-25 Centre Luxembourgeois De Recherches Pour Le Verre Et La Ceramique S.A. (C.R.V.C.) Coated article having low-E coating with ion beam treated IR reflecting layer and corresponding method
US8691057B2 (en) 2008-03-25 2014-04-08 Oem Group Stress adjustment in reactive sputtering
US8482375B2 (en) 2009-05-24 2013-07-09 Oem Group, Inc. Sputter deposition of cermet resistor films with low temperature coefficient of resistance
US10472274B2 (en) 2017-07-17 2019-11-12 Guardian Europe S.A.R.L. Coated article having ceramic paint modified surface(s), and/or associated methods
CN110903153B (zh) * 2019-12-17 2024-02-06 胡滨 高可塑性含能构造

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1107514A (fr) * 1953-06-05 1956-01-03 Procédé de traitement des surfaces métalliques et ses applications
DE1225939B (de) * 1963-11-16 1966-09-29 Leybold Hochvakuum Anlagen Verfahren zur Herstellung einer aus mehreren Lagen zusammengesetzten duennen Schicht durch Hochvakuumbedampfung
FR1424767A (fr) * 1964-03-17 1966-01-14 Gen Precision Inc Appareil de bombardement ionique et de dépôt sous vide
US3615881A (en) * 1968-10-15 1971-10-26 Air Reduction Method of forming flux pinning sites in a superconducting material by bombardment with an ion beam and the products thereof
US3856647A (en) * 1973-05-15 1974-12-24 Ibm Multi-layer control or stress in thin films
GB1486265A (en) * 1973-10-17 1977-09-21 Hitachi Ltd Method for producing an amorphous state of a solid material

Also Published As

Publication number Publication date
AU532935B2 (en) 1983-10-20
DE2966835D1 (en) 1984-04-26
AU5182079A (en) 1980-05-08
EP0010971A3 (en) 1980-05-28
CA1124957A (en) 1982-06-08
EP0010971B1 (en) 1984-03-21
EP0010971A2 (en) 1980-05-14

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