FR2585730B1 - Procede de depot de metaux en couche mince sur un substrat non metallique, avec depot intermediaire d'hydrures par pulverisation cathodique reactive - Google Patents

Procede de depot de metaux en couche mince sur un substrat non metallique, avec depot intermediaire d'hydrures par pulverisation cathodique reactive

Info

Publication number
FR2585730B1
FR2585730B1 FR8511774A FR8511774A FR2585730B1 FR 2585730 B1 FR2585730 B1 FR 2585730B1 FR 8511774 A FR8511774 A FR 8511774A FR 8511774 A FR8511774 A FR 8511774A FR 2585730 B1 FR2585730 B1 FR 2585730B1
Authority
FR
France
Prior art keywords
hydrides
thin film
metallic substrate
depositing thin
reactive cathode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR8511774A
Other languages
English (en)
Other versions
FR2585730A1 (fr
Inventor
Georges Meunier
Jean-Pierre Manaud
Jean Michel Devalette
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Centre National de la Recherche Scientifique CNRS
Original Assignee
Centre National de la Recherche Scientifique CNRS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Centre National de la Recherche Scientifique CNRS filed Critical Centre National de la Recherche Scientifique CNRS
Priority to FR8511774A priority Critical patent/FR2585730B1/fr
Publication of FR2585730A1 publication Critical patent/FR2585730A1/fr
Application granted granted Critical
Publication of FR2585730B1 publication Critical patent/FR2585730B1/fr
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0057—Reactive sputtering using reactive gases other than O2, H2O, N2, NH3 or CH4
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/18—Metallic material, boron or silicon on other inorganic substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
FR8511774A 1985-08-01 1985-08-01 Procede de depot de metaux en couche mince sur un substrat non metallique, avec depot intermediaire d'hydrures par pulverisation cathodique reactive Expired FR2585730B1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR8511774A FR2585730B1 (fr) 1985-08-01 1985-08-01 Procede de depot de metaux en couche mince sur un substrat non metallique, avec depot intermediaire d'hydrures par pulverisation cathodique reactive

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR8511774A FR2585730B1 (fr) 1985-08-01 1985-08-01 Procede de depot de metaux en couche mince sur un substrat non metallique, avec depot intermediaire d'hydrures par pulverisation cathodique reactive

Publications (2)

Publication Number Publication Date
FR2585730A1 FR2585730A1 (fr) 1987-02-06
FR2585730B1 true FR2585730B1 (fr) 1987-10-09

Family

ID=9321862

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8511774A Expired FR2585730B1 (fr) 1985-08-01 1985-08-01 Procede de depot de metaux en couche mince sur un substrat non metallique, avec depot intermediaire d'hydrures par pulverisation cathodique reactive

Country Status (1)

Country Link
FR (1) FR2585730B1 (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT1238695B (it) * 1990-02-16 1993-09-01 Eniricerche Spa Film di idruro di titanio
WO2002014576A1 (fr) * 2000-08-15 2002-02-21 Honeywell International Inc. Cible de pulverisation
US6833058B1 (en) 2000-10-24 2004-12-21 Honeywell International Inc. Titanium-based and zirconium-based mixed materials and sputtering targets
KR100594333B1 (ko) * 2002-01-31 2006-06-30 미쓰비시 마테리알 가부시키가이샤 경질 피복층을 가진 표면 피복 절삭 공구 부재 및 이 경질피복층을 절삭 공구 표면에 형성하는 방법
FR2946433B1 (fr) 2009-06-05 2013-07-12 Ecole Polytechnique Dgar Utilisation d'une couche de silicium amorphe et procede d'analyse
DE102017126590A1 (de) * 2017-11-13 2019-05-16 Doduco Solutions Gmbh Verfahren zum Herstellen einer Bodenplatte für ein Elektronikmodul

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4125446A (en) * 1977-08-15 1978-11-14 Airco, Inc. Controlled reflectance of sputtered aluminum layers

Also Published As

Publication number Publication date
FR2585730A1 (fr) 1987-02-06

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Legal Events

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ST Notification of lapse