IT1238695B - Film di idruro di titanio - Google Patents
Film di idruro di titanioInfo
- Publication number
- IT1238695B IT1238695B IT19390A IT1939090A IT1238695B IT 1238695 B IT1238695 B IT 1238695B IT 19390 A IT19390 A IT 19390A IT 1939090 A IT1939090 A IT 1939090A IT 1238695 B IT1238695 B IT 1238695B
- Authority
- IT
- Italy
- Prior art keywords
- titanium hydride
- metal
- hydride film
- film
- deposited
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5826—Treatment with charged particles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5846—Reactive treatment
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Magnetic Heads (AREA)
- Chemically Coating (AREA)
- Materials For Medical Uses (AREA)
- Transition And Organic Metals Composition Catalysts For Addition Polymerization (AREA)
- Solid-Sorbent Or Filter-Aiding Compositions (AREA)
- Surface Treatment Of Glass (AREA)
- Compositions Of Oxide Ceramics (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (9)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IT19390A IT1238695B (it) | 1990-02-16 | 1990-02-16 | Film di idruro di titanio |
EP90203447A EP0442162B1 (en) | 1990-02-16 | 1990-12-20 | Film of titanium hydride |
AT90203447T ATE90737T1 (de) | 1990-02-16 | 1990-12-20 | Film von titanhydrid. |
ES199090203447T ES2042203T3 (es) | 1990-02-16 | 1990-12-20 | Pelicula de hidruro de titanio. |
DE90203447T DE69002000T2 (de) | 1990-02-16 | 1990-12-20 | Film von Titanhydrid. |
DK90203447.9T DK0442162T3 (da) | 1990-02-16 | 1990-12-20 | Film af titanhydrid |
SU914894693A RU1836487C (ru) | 1990-02-16 | 1991-02-15 | Способ нанесени пленок гидрида металла в вакууме, применение пленки гидрида металла, полученной способом по п.1, и применение субстрата с пленкой гидрида металла, полученной способом по п.1 |
CA002036403A CA2036403A1 (en) | 1990-02-16 | 1991-02-15 | Film of titanium hydride |
JP3042266A JPH04218673A (ja) | 1990-02-16 | 1991-02-15 | コーティング法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IT19390A IT1238695B (it) | 1990-02-16 | 1990-02-16 | Film di idruro di titanio |
Publications (2)
Publication Number | Publication Date |
---|---|
IT9019390A1 IT9019390A1 (it) | 1991-08-17 |
IT1238695B true IT1238695B (it) | 1993-09-01 |
Family
ID=11157289
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IT19390A IT1238695B (it) | 1990-02-16 | 1990-02-16 | Film di idruro di titanio |
Country Status (9)
Country | Link |
---|---|
EP (1) | EP0442162B1 (it) |
JP (1) | JPH04218673A (it) |
AT (1) | ATE90737T1 (it) |
CA (1) | CA2036403A1 (it) |
DE (1) | DE69002000T2 (it) |
DK (1) | DK0442162T3 (it) |
ES (1) | ES2042203T3 (it) |
IT (1) | IT1238695B (it) |
RU (1) | RU1836487C (it) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10235154B4 (de) * | 2002-08-01 | 2005-01-05 | Saint-Gobain Glass Deutschland Gmbh | Vorspannbares Schichtsystem für Glasscheiben |
CN102310038B (zh) * | 2011-09-29 | 2014-06-11 | 华东交通大学 | 一种增强金属薄膜表面疏水性的方法 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4055686A (en) * | 1976-02-20 | 1977-10-25 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Method of forming metal hydride films |
FR2585730B1 (fr) * | 1985-08-01 | 1987-10-09 | Centre Nat Rech Scient | Procede de depot de metaux en couche mince sur un substrat non metallique, avec depot intermediaire d'hydrures par pulverisation cathodique reactive |
FR2630133B1 (fr) * | 1988-04-18 | 1993-09-24 | Siderurgie Fse Inst Rech | Procede pour l'amelioration de la resistance a la corrosion de materiaux metalliques |
-
1990
- 1990-02-16 IT IT19390A patent/IT1238695B/it active IP Right Grant
- 1990-12-20 EP EP90203447A patent/EP0442162B1/en not_active Expired - Lifetime
- 1990-12-20 DE DE90203447T patent/DE69002000T2/de not_active Expired - Fee Related
- 1990-12-20 ES ES199090203447T patent/ES2042203T3/es not_active Expired - Lifetime
- 1990-12-20 AT AT90203447T patent/ATE90737T1/de not_active IP Right Cessation
- 1990-12-20 DK DK90203447.9T patent/DK0442162T3/da active
-
1991
- 1991-02-15 RU SU914894693A patent/RU1836487C/ru active
- 1991-02-15 CA CA002036403A patent/CA2036403A1/en not_active Abandoned
- 1991-02-15 JP JP3042266A patent/JPH04218673A/ja not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
RU1836487C (ru) | 1993-08-23 |
EP0442162A1 (en) | 1991-08-21 |
CA2036403A1 (en) | 1991-08-17 |
DE69002000D1 (de) | 1993-07-22 |
JPH04218673A (ja) | 1992-08-10 |
ES2042203T3 (es) | 1993-12-01 |
ATE90737T1 (de) | 1993-07-15 |
DE69002000T2 (de) | 1994-01-27 |
DK0442162T3 (da) | 1993-10-11 |
EP0442162B1 (en) | 1993-06-16 |
IT9019390A1 (it) | 1991-08-17 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
0001 | Granted |