DE68906973D1 - Herstellung von sehr reiner, wenig arsen enthaltender, wasserfreier fluorwasserstoffsaeure. - Google Patents

Herstellung von sehr reiner, wenig arsen enthaltender, wasserfreier fluorwasserstoffsaeure.

Info

Publication number
DE68906973D1
DE68906973D1 DE8989306641T DE68906973T DE68906973D1 DE 68906973 D1 DE68906973 D1 DE 68906973D1 DE 8989306641 T DE8989306641 T DE 8989306641T DE 68906973 T DE68906973 T DE 68906973T DE 68906973 D1 DE68906973 D1 DE 68906973D1
Authority
DE
Germany
Prior art keywords
arsen
pure
little
production
water
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE8989306641T
Other languages
English (en)
Other versions
DE68906973T2 (de
Inventor
Somanahalli Naranappa Subbanna
Charles Lewis Redmon
Barry John Boghean
Christian Wamser
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Honeywell International Inc
Original Assignee
AlliedSignal Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by AlliedSignal Inc filed Critical AlliedSignal Inc
Application granted granted Critical
Publication of DE68906973D1 publication Critical patent/DE68906973D1/de
Publication of DE68906973T2 publication Critical patent/DE68906973T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B7/00—Halogens; Halogen acids
    • C01B7/19—Fluorine; Hydrogen fluoride
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G28/00—Compounds of arsenic
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B7/00—Halogens; Halogen acids
    • C01B7/19—Fluorine; Hydrogen fluoride
    • C01B7/191—Hydrogen fluoride
    • C01B7/195—Separation; Purification
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B7/00—Halogens; Halogen acids
    • C01B7/19—Fluorine; Hydrogen fluoride
    • C01B7/191—Hydrogen fluoride
    • C01B7/195—Separation; Purification
    • C01B7/196—Separation; Purification by distillation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Catalysts (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
DE8989306641T 1988-07-11 1989-06-29 Herstellung von sehr reiner, wenig arsen enthaltender, wasserfreier fluorwasserstoffsaeure. Expired - Lifetime DE68906973T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/217,497 US4929435A (en) 1987-02-12 1988-07-11 Manufacture of high purity low arsenic anhydrous hydrogen fluoride

Publications (2)

Publication Number Publication Date
DE68906973D1 true DE68906973D1 (de) 1993-07-15
DE68906973T2 DE68906973T2 (de) 1993-09-16

Family

ID=22811337

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8989306641T Expired - Lifetime DE68906973T2 (de) 1988-07-11 1989-06-29 Herstellung von sehr reiner, wenig arsen enthaltender, wasserfreier fluorwasserstoffsaeure.

Country Status (10)

Country Link
US (1) US4929435A (de)
EP (2) EP0428547A1 (de)
JP (1) JPH0657602B2 (de)
KR (1) KR970000892B1 (de)
AU (1) AU636298B2 (de)
CA (1) CA1314382C (de)
DE (1) DE68906973T2 (de)
ES (1) ES2055065T3 (de)
MX (1) MX167322B (de)
WO (1) WO1990000521A1 (de)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4960580A (en) * 1989-10-31 1990-10-02 E. I. Du Pont De Nemours And Company Process for purifying hydrogen fluoride
ES2077842T3 (es) * 1990-03-02 1995-12-01 Du Pont Procedimiento para purificar fluoruro de hidrogeno.
US5089241A (en) * 1990-12-20 1992-02-18 Allied-Signal Inc. Process for converting hexafluoroarsenic acid or any salt thereof to arsenic acid or salt thereof which can then be rendered nonhazardous
GB9300956D0 (en) * 1993-01-19 1993-03-10 British Nuclear Fuels Plc Dehydration of mixtures
US5722442A (en) * 1994-01-07 1998-03-03 Startec Ventures, Inc. On-site generation of ultra-high-purity buffered-HF for semiconductor processing
US5846387A (en) * 1994-01-07 1998-12-08 Air Liquide Electronics Chemicals & Services, Inc. On-site manufacture of ultra-high-purity hydrochloric acid for semiconductor processing
US6350425B2 (en) 1994-01-07 2002-02-26 Air Liquide America Corporation On-site generation of ultra-high-purity buffered-HF and ammonium fluoride
US5496778A (en) * 1994-01-07 1996-03-05 Startec Ventures, Inc. Point-of-use ammonia purification for electronic component manufacture
US5785820A (en) * 1994-01-07 1998-07-28 Startec Ventures, Inc. On-site manufacture of ultra-high-purity hydrofluoric acid for semiconductor processing
US5846386A (en) * 1994-01-07 1998-12-08 Startec Ventures, Inc. On-site ammonia purification for semiconductor manufacture
AU6161996A (en) * 1995-06-05 1996-12-24 Startec Ventures, Inc. On-site manufacture of ultra-high-purity hydrochloric acid f or semiconductor processing
KR100379887B1 (ko) * 1995-06-05 2003-06-12 스타텍 벤처스, 인코포레이티드 반도체제조용암모니아의온-사이트(on-site)정제
JPH11507001A (ja) * 1995-06-05 1999-06-22 スターテック・ベンチャーズ・インコーポレーテッド 半導体処理用超高純度弗化水素酸の現場での製造
KR100379886B1 (ko) * 1995-06-05 2003-06-19 스타텍 벤처스, 인코포레이티드 반도체공정용초순도완충HF의온-사이트(on-site)발생시스템
EP0830316A1 (de) * 1995-06-05 1998-03-25 Startec Ventures, Inc. Reinigung von ammonia an der verbrauchsstelle für die herstellung von elektronischen bauteilen
US6001223A (en) * 1995-07-07 1999-12-14 Air Liquide America Corporation On-site ammonia purification for semiconductor manufacture
EP0879211A1 (de) * 1995-11-13 1998-11-25 AlliedSignal Inc. Herstellung von wasserstofffluorid mit einem sehr niedrigen arsengehalt
US6214173B1 (en) 1996-06-05 2001-04-10 Air Liquide Electronics Chemicals & Services, Inc. On-site manufacture of ultra-high-purity nitric acid
DE10031563B4 (de) 2000-06-28 2009-01-29 Lanxess Deutschland Gmbh Verfahren zur Herstellung von perfluororganischen Verbindungen durch elektrochemische Fluorierung
DE10031565B4 (de) 2000-06-28 2006-02-23 Bulan, Andreas Verfahren zur Herstellung von perfluorierten organischen Verbindungen durch elektrochemische Fluorierung
US20080003172A1 (en) * 2006-06-29 2008-01-03 Honeywell International Inc. Continuous hydrolysis of hexafluoroarsenic acid
CN102232060B (zh) 2008-11-28 2013-11-06 国立大学法人京都大学 氟化氢的精制方法
MX357878B (es) 2014-12-18 2018-07-27 Mexichem Fluor Sa De Capital Variable Proceso para la purificación del ácido fluorhídrico incluyendo la obtención del subproducto ácido arsenioso.
CN108862200B (zh) * 2018-07-31 2020-04-28 苏州香榭轩表面工程技术咨询有限公司 一种超高纯氢氟酸的制备方法
CN114195099B (zh) * 2021-12-16 2023-04-28 浙江博瑞电子科技有限公司 一种多通道微反应器原位除砷制备电子级氟化氢和电子级氢氟酸的方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE62309C (de) * Dr. R. HIRSCH in Berlin W., Potsdamerstr. 113 Verfahren zur Darstellung von Diphenylamin, o- und p-Amidodiphenyl
BE620698A (de) * 1961-07-27
FR1335675A (fr) * 1961-07-27 1963-08-23 I C P M Ind Chimiche Porto Mar Procédé pour l'élimination de composés d'arsenic et d'antimoine de l'acide fluorhdrique moyennant la formation de complexes, facilement séparables, entre l'arsenic et l'antimoine, le fluor et un métal alcalin
BE632837A (de) * 1962-06-04 1963-10-21
US3663382A (en) * 1969-08-19 1972-05-16 Du Pont Process of recovering hydrogen fluoride free of arsenic by distillation
US3689370A (en) * 1970-02-20 1972-09-05 Daikin Ind Ltd Process for purifying hydrofluoric acid by distillation with an oxidizing agent and a ferrous salt
US3687622A (en) * 1970-11-30 1972-08-29 Du Pont High pressure purification of hydrogen fluoride
US4032621A (en) * 1975-11-24 1977-06-28 E. I. Du Pont De Nemours And Company Preparation of hydrogen fluoride with low levels of arsenic, iron and sulfite
JPS5354463A (en) * 1976-10-27 1978-05-17 Nec Corp Microwave tube
US4083941A (en) * 1977-04-18 1978-04-11 E. I. Du Pont De Nemours And Company Purification of anhydrous hydrogen fluoride
DE2942545A1 (de) * 1979-10-20 1981-06-04 Riedel-De Haen Ag, 3016 Seelze Verfahren zur herstellung einer gereinigten oxidationsbestaendigen anorganischen saeure und danach erhaltene saeure
US4491570A (en) * 1984-05-03 1985-01-01 Pennwalt Corporation Removal of arsenic from hydrogen fluoride
JPH0238521B2 (ja) * 1984-12-25 1990-08-30 Hashimoto Chemical Ind Futsukasuisosannoseiseiho
US4752379A (en) * 1986-09-23 1988-06-21 Union Oil Company Of California Arsenic removal from shale oil by oxidation
US4752380A (en) * 1986-09-23 1988-06-21 Union Oil Company Of California Arsenic removal from shale oil by chloride addition
US4756899A (en) * 1987-02-12 1988-07-12 Allied-Signal Inc. Manufacture of high purity low arsenic anhydrous hydrogen fluoride

Also Published As

Publication number Publication date
EP0428547A1 (de) 1991-05-29
DE68906973T2 (de) 1993-09-16
MX167322B (es) 1993-03-16
AU3872589A (en) 1990-02-05
CA1314382C (en) 1993-03-16
EP0351107A1 (de) 1990-01-17
KR900701649A (ko) 1990-12-04
US4929435A (en) 1990-05-29
ES2055065T3 (es) 1994-08-16
AU636298B2 (en) 1993-04-29
KR970000892B1 (ko) 1997-01-21
WO1990000521A1 (en) 1990-01-25
EP0351107B1 (de) 1993-06-09
JPH0657602B2 (ja) 1994-08-03
JPH03501965A (ja) 1991-05-09

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

Representative=s name: HANSMANN & VOGESER, 81369 MUENCHEN