DE60322252D1 - Sputtertarget zur Herstellung eines optischen Aufzeichnungsmediums - Google Patents
Sputtertarget zur Herstellung eines optischen AufzeichnungsmediumsInfo
- Publication number
- DE60322252D1 DE60322252D1 DE60322252T DE60322252T DE60322252D1 DE 60322252 D1 DE60322252 D1 DE 60322252D1 DE 60322252 T DE60322252 T DE 60322252T DE 60322252 T DE60322252 T DE 60322252T DE 60322252 D1 DE60322252 D1 DE 60322252D1
- Authority
- DE
- Germany
- Prior art keywords
- producing
- recording medium
- optical recording
- sputtering target
- sputtering
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000003287 optical effect Effects 0.000 title 1
- 238000005477 sputtering target Methods 0.000 title 1
Classifications
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/2403—Layers; Shape, structure or physical properties thereof
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0617—AIII BV compounds, where A is Al, Ga, In or Tl and B is N, P, As, Sb or Bi
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/584—Non-reactive treatment
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
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- G03G7/0006—Cover layers for image-receiving members; Strippable coversheets
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- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/252—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
- G11B7/258—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of reflective layers
- G11B7/259—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of reflective layers based on silver
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
- Thermal Transfer Or Thermal Recording In General (AREA)
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002163793 | 2002-06-05 | ||
JP2002189628A JP2004025801A (ja) | 2002-06-28 | 2002-06-28 | 相変化型情報記録媒体 |
JP2002198114 | 2002-07-08 | ||
JP2002214500A JP3920731B2 (ja) | 2002-07-23 | 2002-07-23 | 相変化型光記録媒体 |
JP2002258638 | 2002-09-04 | ||
JP2002344719 | 2002-11-27 |
Publications (1)
Publication Number | Publication Date |
---|---|
DE60322252D1 true DE60322252D1 (de) | 2008-08-28 |
Family
ID=29587936
Family Applications (5)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60316223T Expired - Lifetime DE60316223T2 (de) | 2002-06-05 | 2003-06-04 | Optisches Aufzeichnungsmedium, Herstellungsprozess für dasselbe und optisches Aufzeichnungsverfahren für dasselbe |
DE60322252T Expired - Lifetime DE60322252D1 (de) | 2002-06-05 | 2003-06-04 | Sputtertarget zur Herstellung eines optischen Aufzeichnungsmediums |
DE60318615T Expired - Lifetime DE60318615T2 (de) | 2002-06-05 | 2003-06-04 | Optisches Aufzeichnungsverfahren |
DE60320018T Expired - Lifetime DE60320018T2 (de) | 2002-06-05 | 2003-06-04 | Optisches Aufzeichnungsmedium, Herstellungsprozess für dasselbe, Sputtertarget zur Herstellung desselben und optisches Aufzeichnungsverfahren für dasselbe |
DE60320017T Expired - Lifetime DE60320017T2 (de) | 2002-06-05 | 2003-06-04 | Optisches Aufzeichnungsmedium, Herstellungsprozess für dasselbe, Sputtertarget zur Herstellung desselben und optisches Aufzeichnungsverfahren für dasselbe |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60316223T Expired - Lifetime DE60316223T2 (de) | 2002-06-05 | 2003-06-04 | Optisches Aufzeichnungsmedium, Herstellungsprozess für dasselbe und optisches Aufzeichnungsverfahren für dasselbe |
Family Applications After (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60318615T Expired - Lifetime DE60318615T2 (de) | 2002-06-05 | 2003-06-04 | Optisches Aufzeichnungsverfahren |
DE60320018T Expired - Lifetime DE60320018T2 (de) | 2002-06-05 | 2003-06-04 | Optisches Aufzeichnungsmedium, Herstellungsprozess für dasselbe, Sputtertarget zur Herstellung desselben und optisches Aufzeichnungsverfahren für dasselbe |
DE60320017T Expired - Lifetime DE60320017T2 (de) | 2002-06-05 | 2003-06-04 | Optisches Aufzeichnungsmedium, Herstellungsprozess für dasselbe, Sputtertarget zur Herstellung desselben und optisches Aufzeichnungsverfahren für dasselbe |
Country Status (3)
Country | Link |
---|---|
EP (5) | EP1569214B1 (de) |
DE (5) | DE60316223T2 (de) |
TW (1) | TWI272606B (de) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4249590B2 (ja) | 2002-11-18 | 2009-04-02 | 株式会社リコー | 光情報記録媒体およびその製造方法 |
JP3977740B2 (ja) * | 2002-12-27 | 2007-09-19 | 株式会社リコー | 相変化型光記録媒体とその記録方法 |
DE602004023166D1 (de) * | 2003-10-16 | 2009-10-29 | Ricoh Kk | Medium zur optischen Datenspeicherung und Verfahren zu dessen Herstellung |
TW200614224A (en) * | 2004-07-15 | 2006-05-01 | Tdk Corp | Optical recording medium |
DE102004041191A1 (de) * | 2004-08-25 | 2006-03-02 | Infineon Technologies Ag | Neue Materialien für elektrische Phasenwechselspeicher |
JP2006155794A (ja) | 2004-11-30 | 2006-06-15 | Tdk Corp | 光記録媒体及びその試験方法 |
DE102005031394A1 (de) * | 2005-07-05 | 2007-01-18 | Infineon Technologies Ag | Aufbau und Verfahren zur Herstellung von Phasenwechselspeichern mit bestimmten Schalteigenschaften |
JP2007220269A (ja) | 2006-01-23 | 2007-08-30 | Ricoh Co Ltd | 光記録媒体 |
JP4871062B2 (ja) | 2006-03-01 | 2012-02-08 | 株式会社リコー | スパッタリングターゲット及びその製造方法、並びに追記型光記録媒体 |
JP2009080895A (ja) | 2007-09-26 | 2009-04-16 | Toshiba Corp | 情報記録媒体及びこの媒体を用いたディスク装置 |
CN102804269B (zh) * | 2009-06-24 | 2016-03-02 | 三菱化学媒体股份有限公司 | 光记录介质 |
US9917252B2 (en) * | 2015-06-19 | 2018-03-13 | Macronix International Co., Ltd. | GaSbGe phase change memory materials |
JP7283273B2 (ja) * | 2019-07-01 | 2023-05-30 | 株式会社レゾナック | 磁気記録媒体およびその製造方法ならびに磁気記録再生装置 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA1337582C (en) * | 1988-08-09 | 1995-11-21 | Donald Robert Preuss | Optical recording materials comprising antimony-tin alloys including a third element |
JPH05286249A (ja) * | 1992-02-10 | 1993-11-02 | Hitachi Ltd | 情報記録用媒体 |
KR0153033B1 (ko) * | 1993-06-18 | 1998-12-15 | 가나이 쯔또무 | 정보기록용 박막 및 정보기록매체 |
DE19612823C2 (de) * | 1995-03-31 | 2001-03-01 | Mitsubishi Chem Corp | Optisches Aufzeichnungsverfahren |
TW411457B (en) * | 1997-08-01 | 2000-11-11 | Hitachi Maxell | Information recording medium |
JP3917078B2 (ja) * | 2001-04-12 | 2007-05-23 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | 再書き込み可能な光データ記録媒体 |
JP2003305955A (ja) * | 2001-05-21 | 2003-10-28 | Ricoh Co Ltd | 光記録媒体及び記録方法 |
-
2003
- 2003-06-04 EP EP05011263A patent/EP1569214B1/de not_active Expired - Fee Related
- 2003-06-04 DE DE60316223T patent/DE60316223T2/de not_active Expired - Lifetime
- 2003-06-04 DE DE60322252T patent/DE60322252D1/de not_active Expired - Lifetime
- 2003-06-04 DE DE60318615T patent/DE60318615T2/de not_active Expired - Lifetime
- 2003-06-04 EP EP05011264A patent/EP1566800B1/de not_active Expired - Fee Related
- 2003-06-04 EP EP05011265A patent/EP1566801B1/de not_active Expired - Fee Related
- 2003-06-04 EP EP03012695A patent/EP1372148B1/de not_active Expired - Fee Related
- 2003-06-04 DE DE60320018T patent/DE60320018T2/de not_active Expired - Lifetime
- 2003-06-04 EP EP05011266A patent/EP1566802B1/de not_active Expired - Fee Related
- 2003-06-04 DE DE60320017T patent/DE60320017T2/de not_active Expired - Lifetime
- 2003-06-05 TW TW092115259A patent/TWI272606B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
DE60316223D1 (de) | 2007-10-25 |
EP1372148B1 (de) | 2007-09-12 |
DE60320018D1 (de) | 2008-05-08 |
DE60320018T2 (de) | 2009-06-18 |
DE60318615D1 (de) | 2008-02-21 |
EP1372148A3 (de) | 2004-03-03 |
EP1566800B1 (de) | 2008-03-26 |
DE60320017T2 (de) | 2009-04-16 |
DE60318615T2 (de) | 2008-12-24 |
EP1566801A1 (de) | 2005-08-24 |
EP1569214A1 (de) | 2005-08-31 |
DE60316223T2 (de) | 2008-06-05 |
TWI272606B (en) | 2007-02-01 |
TW200405323A (en) | 2004-04-01 |
EP1566800A1 (de) | 2005-08-24 |
EP1566802B1 (de) | 2008-01-09 |
EP1569214B1 (de) | 2008-03-26 |
EP1566801B1 (de) | 2008-07-16 |
EP1372148A2 (de) | 2003-12-17 |
EP1566802A1 (de) | 2005-08-24 |
DE60320017D1 (de) | 2008-05-08 |
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8364 | No opposition during term of opposition |