DE60321157D1 - Verfahren und vorrichtung zur durchfluss- und konz - Google Patents

Verfahren und vorrichtung zur durchfluss- und konz

Info

Publication number
DE60321157D1
DE60321157D1 DE60321157T DE60321157T DE60321157D1 DE 60321157 D1 DE60321157 D1 DE 60321157D1 DE 60321157 T DE60321157 T DE 60321157T DE 60321157 T DE60321157 T DE 60321157T DE 60321157 D1 DE60321157 D1 DE 60321157D1
Authority
DE
Germany
Prior art keywords
conc
flow
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60321157T
Other languages
English (en)
Inventor
Jens Fittkau
Johannes Seiwert
Christine Gottschalk
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
MKS Instruments Inc
Original Assignee
MKS Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by MKS Instruments Inc filed Critical MKS Instruments Inc
Application granted granted Critical
Publication of DE60321157D1 publication Critical patent/DE60321157D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D11/00—Control of flow ratio
    • G05D11/02—Controlling ratio of two or more flows of fluid or fluent material
    • G05D11/13—Controlling ratio of two or more flows of fluid or fluent material characterised by the use of electric means
    • G05D11/131—Controlling ratio of two or more flows of fluid or fluent material characterised by the use of electric means by measuring the values related to the quantity of the individual components
    • G05D11/132—Controlling ratio of two or more flows of fluid or fluent material characterised by the use of electric means by measuring the values related to the quantity of the individual components by controlling the flow of the individual components
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20—Mixing gases with liquids
    • B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
    • B01F23/232—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids using flow-mixing means for introducing the gases, e.g. baffles
    • B01F23/2322—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids using flow-mixing means for introducing the gases, e.g. baffles using columns, e.g. multi-staged columns
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20—Mixing gases with liquids
    • B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
    • B01F23/237—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids characterised by the physical or chemical properties of gases or vapours introduced in the liquid media
    • B01F23/2376—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids characterised by the physical or chemical properties of gases or vapours introduced in the liquid media characterised by the gas being introduced
    • B01F23/23761—Aerating, i.e. introducing oxygen containing gas in liquids
    • B01F23/237613—Ozone
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
    • B01F25/40—Static mixers
    • B01F25/42—Static mixers in which the mixing is affected by moving the components jointly in changing directions, e.g. in tubes provided with baffles or obstructions
    • B01F25/421—Static mixers in which the mixing is affected by moving the components jointly in changing directions, e.g. in tubes provided with baffles or obstructions by moving the components in a convoluted or labyrinthine path
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
    • B01F25/40—Static mixers
    • B01F25/42—Static mixers in which the mixing is affected by moving the components jointly in changing directions, e.g. in tubes provided with baffles or obstructions
    • B01F25/421—Static mixers in which the mixing is affected by moving the components jointly in changing directions, e.g. in tubes provided with baffles or obstructions by moving the components in a convoluted or labyrinthine path
    • B01F25/423—Static mixers in which the mixing is affected by moving the components jointly in changing directions, e.g. in tubes provided with baffles or obstructions by moving the components in a convoluted or labyrinthine path by means of elements placed in the receptacle for moving or guiding the components
    • B01F25/4231—Static mixers in which the mixing is affected by moving the components jointly in changing directions, e.g. in tubes provided with baffles or obstructions by moving the components in a convoluted or labyrinthine path by means of elements placed in the receptacle for moving or guiding the components using baffles
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
    • C01B13/10—Preparation of ozone
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
    • C01B13/10—Preparation of ozone
    • C01B13/11—Preparation of ozone by electric discharge
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/72—Treatment of water, waste water, or sewage by oxidation
    • C02F1/78—Treatment of water, waste water, or sewage by oxidation with ozone
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D11/00—Control of flow ratio
    • G05D11/02—Controlling ratio of two or more flows of fluid or fluent material
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D11/00—Control of flow ratio
    • G05D11/02—Controlling ratio of two or more flows of fluid or fluent material
    • G05D11/13—Controlling ratio of two or more flows of fluid or fluent material characterised by the use of electric means
    • G05D11/139—Controlling ratio of two or more flows of fluid or fluent material characterised by the use of electric means by measuring a value related to the quantity of the individual components and sensing at least one property of the mixture
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B2201/00—Preparation of ozone by electrical discharge
    • C01B2201/60—Feed streams for electrical dischargers
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B2201/00—Preparation of ozone by electrical discharge
    • C01B2201/60—Feed streams for electrical dischargers
    • C01B2201/64—Oxygen
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2201/00—Apparatus for treatment of water, waste water or sewage
    • C02F2201/78—Details relating to ozone treatment devices
    • C02F2201/782—Ozone generators
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2209/00—Controlling or monitoring parameters in water treatment
    • C02F2209/40—Liquid flow rate
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S134/00—Cleaning and liquid contact with solids
    • Y10S134/902—Semiconductor wafer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S261/00—Gas and liquid contact apparatus
    • Y10S261/42—Ozonizers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Automation & Control Theory (AREA)
  • Inorganic Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Hydrology & Water Resources (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Treatment Of Water By Oxidation Or Reduction (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)
  • Control Of Non-Electrical Variables (AREA)
DE60321157T 2002-04-26 2003-04-25 Verfahren und vorrichtung zur durchfluss- und konz Expired - Lifetime DE60321157D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/133,237 US6805791B2 (en) 2000-09-01 2002-04-26 Ozonated water flow and concentration control apparatus
PCT/US2003/012973 WO2003091815A1 (en) 2002-04-26 2003-04-25 Ozonated water flow and concentration control apparatus and method

Publications (1)

Publication Number Publication Date
DE60321157D1 true DE60321157D1 (de) 2008-07-03

Family

ID=29268775

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60321157T Expired - Lifetime DE60321157D1 (de) 2002-04-26 2003-04-25 Verfahren und vorrichtung zur durchfluss- und konz

Country Status (8)

Country Link
US (4) US6805791B2 (de)
EP (2) EP1962165B1 (de)
JP (2) JP2005523809A (de)
KR (1) KR100985087B1 (de)
CN (2) CN100549894C (de)
AU (1) AU2003239180A1 (de)
DE (1) DE60321157D1 (de)
WO (1) WO2003091815A1 (de)

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US6805791B2 (en) * 2000-09-01 2004-10-19 Applied Science And Technology, Inc. Ozonated water flow and concentration control apparatus
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JP2005152803A (ja) * 2003-11-26 2005-06-16 Siltronic Japan Corp オゾン水の送水方法
JP2005161284A (ja) * 2003-11-28 2005-06-23 Nittetu Chemical Engineering Ltd 定濃度オゾン水の供給方法
WO2006010109A2 (en) * 2004-07-08 2006-01-26 Akrion Technologies, Inc. Method and apparatus for creating ozonated process solutions having high ozone concentration
JP4077845B2 (ja) 2005-03-18 2008-04-23 セメス株式会社 機能水供給システム、及び機能水供給方法
US7429323B2 (en) * 2005-04-27 2008-09-30 Price Brothers Company Water treatment system and pressure pipe therefor
US7977241B2 (en) * 2006-12-20 2011-07-12 Freescale Semiconductor, Inc. Method for fabricating highly reliable interconnects
US8735337B2 (en) * 2007-03-13 2014-05-27 Food Safety Technology, Llc Aqueous ozone solution for ozone cleaning system
US9068149B2 (en) * 2007-03-14 2015-06-30 Food Safety Technology, Llc Ozone cleaning system
CN102036742B (zh) * 2008-05-19 2015-02-11 恩特格里公司 用于制备气体在液体中的无气泡溶液的气化系统和方法
US9522348B2 (en) 2008-07-24 2016-12-20 Food Safety Technology, Llc Ozonated liquid dispensing unit
US20130195725A1 (en) * 2008-07-24 2013-08-01 Food Safety Technology, Llc Ozonated liquid production and distribution systems
US9174845B2 (en) 2008-07-24 2015-11-03 Food Safety Technology, Llc Ozonated liquid dispensing unit
JP2013123650A (ja) * 2011-12-13 2013-06-24 Sharp Corp オゾン水生成装置、および、それを備えた衛生器具用洗浄装置
US9056262B2 (en) 2012-11-08 2015-06-16 Mks Instruments, Inc. Pressure-less ozonated Di-water (DIO3) recirculation reclaim system
US9449841B2 (en) * 2013-12-19 2016-09-20 Taiwan Semicondcutor Manufacturing Company, Ltd. Methods and systems for chemical mechanical polish and clean
PL3038740T3 (pl) * 2013-12-31 2017-12-29 Aygaz Anonim Sirketi System bezpieczeństwa i wtrysku dodatku
US9789448B2 (en) * 2014-01-24 2017-10-17 Taiwan Semiconductor Manufacturing Co., Ltd. Process for treating fluid
JP2016064386A (ja) * 2014-09-18 2016-04-28 株式会社荏原製作所 ガス溶解水製造装置および製造方法
CN104671457B (zh) * 2015-01-21 2016-11-16 浙江大学宁波理工学院 曝气污水处理装置及其控制方法
JP6826437B2 (ja) * 2016-01-15 2021-02-03 株式会社荏原製作所 供給液体製造装置および供給液体製造方法
JP7059040B2 (ja) * 2018-02-23 2022-04-25 株式会社荏原製作所 ガス溶解液製造装置
US11518696B2 (en) 2018-08-29 2022-12-06 Mks Instruments Ozonated water delivery system and method of use
US10792622B2 (en) * 2018-10-26 2020-10-06 Huei Tarng Liou Gas dissolving system with two mixers
JP7240260B2 (ja) * 2019-06-04 2023-03-15 株式会社荏原製作所 ガス溶解液供給装置およびガス溶解液供給方法
JP7515290B2 (ja) * 2020-04-24 2024-07-12 三菱電機株式会社 浄化装置および浄化方法

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Also Published As

Publication number Publication date
EP1499934B1 (de) 2008-05-21
CN1653400A (zh) 2005-08-10
US6948504B2 (en) 2005-09-27
JP2005523809A (ja) 2005-08-11
US20060107969A1 (en) 2006-05-25
US20050029202A1 (en) 2005-02-10
JP2011062694A (ja) 2011-03-31
CN101676220A (zh) 2010-03-24
US6805791B2 (en) 2004-10-19
JP5548106B2 (ja) 2014-07-16
EP1962165B1 (de) 2016-11-30
US7264006B2 (en) 2007-09-04
KR20050005459A (ko) 2005-01-13
EP1499934A1 (de) 2005-01-26
WO2003091815A1 (en) 2003-11-06
EP1962165A1 (de) 2008-08-27
KR100985087B1 (ko) 2010-10-04
AU2003239180A1 (en) 2003-11-10
US7622037B2 (en) 2009-11-24
US20080002518A1 (en) 2008-01-03
CN101676220B (zh) 2013-04-24
CN100549894C (zh) 2009-10-14
US20030164338A1 (en) 2003-09-04

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Representative=s name: KUDLEK & GRUNERT PATENTANWAELTE PARTNERSCHAFT, 803