DE60219903D1 - Wärmebehandlungseinrichtung - Google Patents
WärmebehandlungseinrichtungInfo
- Publication number
- DE60219903D1 DE60219903D1 DE60219903T DE60219903T DE60219903D1 DE 60219903 D1 DE60219903 D1 DE 60219903D1 DE 60219903 T DE60219903 T DE 60219903T DE 60219903 T DE60219903 T DE 60219903T DE 60219903 D1 DE60219903 D1 DE 60219903D1
- Authority
- DE
- Germany
- Prior art keywords
- heat treatment
- treatment facility
- facility
- heat
- treatment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000010438 heat treatment Methods 0.000 title 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01K—MEASURING TEMPERATURE; MEASURING QUANTITY OF HEAT; THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR
- G01K7/00—Measuring temperature based on the use of electric or magnetic elements directly sensitive to heat ; Power supply therefor, e.g. using thermoelectric elements
- G01K7/02—Measuring temperature based on the use of electric or magnetic elements directly sensitive to heat ; Power supply therefor, e.g. using thermoelectric elements using thermoelectric elements, e.g. thermocouples
- G01K7/04—Measuring temperature based on the use of electric or magnetic elements directly sensitive to heat ; Power supply therefor, e.g. using thermoelectric elements using thermoelectric elements, e.g. thermocouples the object to be measured not forming one of the thermoelectric materials
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01K—MEASURING TEMPERATURE; MEASURING QUANTITY OF HEAT; THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR
- G01K1/00—Details of thermometers not specially adapted for particular types of thermometer
- G01K1/20—Compensating for effects of temperature changes other than those to be measured, e.g. changes in ambient temperature
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001100032 | 2001-03-30 | ||
JP2001100032A JP4210041B2 (ja) | 2001-03-30 | 2001-03-30 | 熱処理装置 |
PCT/JP2002/002710 WO2002082524A1 (fr) | 2001-03-30 | 2002-03-20 | Dispositif de traitement thermique |
Publications (2)
Publication Number | Publication Date |
---|---|
DE60219903D1 true DE60219903D1 (de) | 2007-06-14 |
DE60219903T2 DE60219903T2 (de) | 2008-01-17 |
Family
ID=18953512
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60219903T Expired - Lifetime DE60219903T2 (de) | 2001-03-30 | 2002-03-20 | Wärmebehandlungseinrichtung |
Country Status (8)
Country | Link |
---|---|
US (1) | US7141765B2 (de) |
EP (1) | EP1376667B1 (de) |
JP (1) | JP4210041B2 (de) |
KR (1) | KR20030078936A (de) |
CN (1) | CN1257537C (de) |
DE (1) | DE60219903T2 (de) |
TW (1) | TWI248129B (de) |
WO (1) | WO2002082524A1 (de) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4270991B2 (ja) | 2002-10-11 | 2009-06-03 | 株式会社リコー | 情報記録装置、情報記録方法、情報記録用プログラム、情報記録用プログラムを記憶する記憶媒体、及び情報記録システム |
JP3802889B2 (ja) * | 2003-07-01 | 2006-07-26 | 東京エレクトロン株式会社 | 熱処理装置及びその校正方法 |
JP5647502B2 (ja) * | 2010-02-23 | 2014-12-24 | 株式会社日立国際電気 | 熱処理装置、半導体装置の製造方法及び基板処理方法。 |
JP5451793B2 (ja) * | 2012-02-10 | 2014-03-26 | 東京エレクトロン株式会社 | 温度センサ及び熱処理装置 |
GB201303189D0 (en) * | 2013-02-22 | 2013-04-10 | Weston Aerospace Ltd | Method of producing a thermocouple having a tailored thermoelectric response |
CA2841756C (en) | 2013-02-22 | 2023-09-19 | Weston Aerospace Limited | Method of producing a thermocouple having a tailored thermoelectric response |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US567689A (en) * | 1896-09-15 | Sash-fastener | ||
DK170450B1 (da) * | 1986-12-12 | 1995-09-04 | Matsushita Electric Ind Co Ltd | Termisk følesystem |
JPH075631Y2 (ja) * | 1987-01-30 | 1995-02-08 | 国際電気株式会社 | 縦型炉 |
US5106786A (en) * | 1989-10-23 | 1992-04-21 | At&T Bell Laboratories | Thin coatings for use in semiconductor integrated circuits and processes as antireflection coatings consisting of tungsten silicide |
JPH0824193B2 (ja) * | 1990-10-16 | 1996-03-06 | 工業技術院長 | 平板型光弁駆動用半導体装置の製造方法 |
JP3024661B2 (ja) * | 1990-11-09 | 2000-03-21 | セイコーエプソン株式会社 | アクティブマトリクス基板及びその製造方法 |
JPH06229837A (ja) * | 1993-02-08 | 1994-08-19 | Sumitomo Electric Ind Ltd | 被覆熱電対の製造方法および被覆熱電対用線材の製造方法 |
JPH07181085A (ja) | 1993-12-24 | 1995-07-18 | Sumitomo Electric Ind Ltd | 測温接点が絶縁被覆された熱電対及びその製造方法 |
JP3307181B2 (ja) * | 1995-07-31 | 2002-07-24 | ソニー株式会社 | 透過型表示装置 |
US5917563A (en) * | 1995-10-16 | 1999-06-29 | Sharp Kabushiki Kaisha | Liquid crystal display device having an insulation film made of organic material between an additional capacity and a bus line |
KR100268926B1 (ko) * | 1996-12-31 | 2000-10-16 | 김영환 | 반도체소자의 배선 형성방법 |
US5889302A (en) * | 1997-04-21 | 1999-03-30 | Advanced Micro Devices, Inc. | Multilayer floating gate field effect transistor structure for use in integrated circuit devices |
JPH11224130A (ja) * | 1998-02-06 | 1999-08-17 | Bridgestone Corp | 温度の調節方法 |
JP4312851B2 (ja) * | 1998-04-27 | 2009-08-12 | 株式会社半導体エネルギー研究所 | 半導体装置およびその作製方法 |
JP3702096B2 (ja) * | 1998-06-08 | 2005-10-05 | 三洋電機株式会社 | 薄膜トランジスタ及び表示装置 |
JP2000077346A (ja) * | 1998-08-26 | 2000-03-14 | Tokyo Electron Ltd | 熱処理装置 |
JP2000088667A (ja) * | 1998-09-16 | 2000-03-31 | Isuzu Ceramics Res Inst Co Ltd | 繊維補強型熱電対 |
JP3141860B2 (ja) * | 1998-10-28 | 2001-03-07 | ソニー株式会社 | 液晶表示装置の製造方法 |
EP1031873A3 (de) * | 1999-02-23 | 2005-02-23 | Sel Semiconductor Energy Laboratory Co., Ltd. | Halbleiterbauelement und Verfahren zu dessen Herstellung |
JP4700156B2 (ja) * | 1999-09-27 | 2011-06-15 | 株式会社半導体エネルギー研究所 | 半導体装置 |
JP2002319679A (ja) * | 2001-04-20 | 2002-10-31 | Semiconductor Energy Lab Co Ltd | 半導体装置 |
-
2001
- 2001-03-30 JP JP2001100032A patent/JP4210041B2/ja not_active Expired - Fee Related
-
2002
- 2002-03-20 WO PCT/JP2002/002710 patent/WO2002082524A1/ja active IP Right Grant
- 2002-03-20 EP EP02705408A patent/EP1376667B1/de not_active Expired - Fee Related
- 2002-03-20 KR KR10-2003-7011125A patent/KR20030078936A/ko not_active Application Discontinuation
- 2002-03-20 DE DE60219903T patent/DE60219903T2/de not_active Expired - Lifetime
- 2002-03-20 US US10/473,248 patent/US7141765B2/en not_active Expired - Fee Related
- 2002-03-20 CN CNB028057686A patent/CN1257537C/zh not_active Expired - Fee Related
- 2002-03-27 TW TW091106048A patent/TWI248129B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
CN1494738A (zh) | 2004-05-05 |
JP4210041B2 (ja) | 2009-01-14 |
EP1376667A4 (de) | 2005-01-12 |
US7141765B2 (en) | 2006-11-28 |
CN1257537C (zh) | 2006-05-24 |
EP1376667B1 (de) | 2007-05-02 |
WO2002082524A1 (fr) | 2002-10-17 |
TWI248129B (en) | 2006-01-21 |
JP2002299335A (ja) | 2002-10-11 |
EP1376667A1 (de) | 2004-01-02 |
DE60219903T2 (de) | 2008-01-17 |
US20040115585A1 (en) | 2004-06-17 |
KR20030078936A (ko) | 2003-10-08 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8381 | Inventor (new situation) |
Inventor name: MAKIYA, TOSHIYUKI, TACHIKAWA, TOKYO, JP Inventor name: SAITO, TAKANORI, MINATO, TOKYO, JP Inventor name: EICKMANN, KARUKI, MINATO, TOKYO, JP Inventor name: KAUSHAL, SANJEEV, AUSTIN, TX, US Inventor name: DIP, ANTHONY, AUSTIN, TX, US Inventor name: O'MEARA, DAVID L, HOPEWELL JUNCTION, NY, US |
|
8364 | No opposition during term of opposition |