DE60210393D1 - Integrierte aus Schottky und FET bestehende Reihenschaltung, die negative Drainspannung zulässt - Google Patents

Integrierte aus Schottky und FET bestehende Reihenschaltung, die negative Drainspannung zulässt

Info

Publication number
DE60210393D1
DE60210393D1 DE60210393T DE60210393T DE60210393D1 DE 60210393 D1 DE60210393 D1 DE 60210393D1 DE 60210393 T DE60210393 T DE 60210393T DE 60210393 T DE60210393 T DE 60210393T DE 60210393 D1 DE60210393 D1 DE 60210393D1
Authority
DE
Germany
Prior art keywords
series connection
drain voltage
connection allowing
integrated schottky
negative drain
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60210393T
Other languages
English (en)
Other versions
DE60210393T2 (de
Inventor
Niraj Ranjan
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Infineon Technologies Americas Corp
Original Assignee
International Rectifier Corp USA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Rectifier Corp USA filed Critical International Rectifier Corp USA
Application granted granted Critical
Publication of DE60210393D1 publication Critical patent/DE60210393D1/de
Publication of DE60210393T2 publication Critical patent/DE60210393T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/64—Double-diffused metal-oxide semiconductor [DMOS] FETs
    • H10D30/65—Lateral DMOS [LDMOS] FETs
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03K—PULSE TECHNIQUE
    • H03K17/00—Electronic switching or gating, i.e. not by contact-making and –breaking
    • H03K17/04—Modifications for accelerating switching
    • H03K17/041—Modifications for accelerating switching without feedback from the output circuit to the control circuit
    • H03K17/0416—Modifications for accelerating switching without feedback from the output circuit to the control circuit by measures taken in the output circuit
    • H03K17/04163—Modifications for accelerating switching without feedback from the output circuit to the control circuit by measures taken in the output circuit in field-effect transistor switches
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03K—PULSE TECHNIQUE
    • H03K17/00—Electronic switching or gating, i.e. not by contact-making and –breaking
    • H03K17/06—Modifications for ensuring a fully conducting state
    • H03K17/063—Modifications for ensuring a fully conducting state in field-effect transistor switches
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03K—PULSE TECHNIQUE
    • H03K17/00—Electronic switching or gating, i.e. not by contact-making and –breaking
    • H03K17/51—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used
    • H03K17/56—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used by the use, as active elements, of semiconductor devices
    • H03K17/687—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used by the use, as active elements, of semiconductor devices the devices being field-effect transistors
    • H03K17/6871—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used by the use, as active elements, of semiconductor devices the devices being field-effect transistors the output circuit comprising more than one controlled field-effect transistor
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D12/00—Bipolar devices controlled by the field effect, e.g. insulated-gate bipolar transistors [IGBT]
    • H10D12/411—Insulated-gate bipolar transistors [IGBT]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/60—Electrodes characterised by their materials
    • H10D64/64—Electrodes comprising a Schottky barrier to a semiconductor
    • H10D64/647—Schottky drain or source electrodes for IGFETs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/101—Integrated devices comprising main components and built-in components, e.g. IGBT having built-in freewheel diode
    • H10D84/151—LDMOS having built-in components
    • H10D84/156—LDMOS having built-in components the built-in components being Schottky barrier diodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/102—Constructional design considerations for preventing surface leakage or controlling electric field concentration
    • H10D62/103—Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices
    • H10D62/105—Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices by having particular doping profiles, shapes or arrangements of PN junctions; by having supplementary regions, e.g. junction termination extension [JTE] 

Landscapes

  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Electronic Switches (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
  • Amplifiers (AREA)
DE60210393T 2001-11-07 2002-11-05 Integrierte aus Schottky und FET bestehende Reihenschaltung, die negative Drainspannung zulässt Expired - Fee Related DE60210393T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US45451 2001-11-07
US10/045,451 US6529034B1 (en) 2001-11-07 2001-11-07 Integrated series schottky and FET to allow negative drain voltage

Publications (2)

Publication Number Publication Date
DE60210393D1 true DE60210393D1 (de) 2006-05-18
DE60210393T2 DE60210393T2 (de) 2007-01-11

Family

ID=21937951

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60210393T Expired - Fee Related DE60210393T2 (de) 2001-11-07 2002-11-05 Integrierte aus Schottky und FET bestehende Reihenschaltung, die negative Drainspannung zulässt

Country Status (5)

Country Link
US (2) US6529034B1 (de)
EP (1) EP1311067B1 (de)
JP (2) JP3857216B2 (de)
AT (1) ATE322764T1 (de)
DE (1) DE60210393T2 (de)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10063084B4 (de) * 2000-12-18 2009-12-03 Siemens Ag Leistungselektronische Schaltung
WO2002084745A2 (en) * 2001-04-11 2002-10-24 Silicon Wireless Corporation Power semiconductor devices and methods of forming same
US6529034B1 (en) * 2001-11-07 2003-03-04 International Rectifier Corporation Integrated series schottky and FET to allow negative drain voltage
US6835619B2 (en) * 2002-08-08 2004-12-28 Micron Technology, Inc. Method of forming a memory transistor comprising a Schottky contact
US6987305B2 (en) * 2003-08-04 2006-01-17 International Rectifier Corporation Integrated FET and schottky device
US7485984B2 (en) * 2006-05-12 2009-02-03 Delphi Technologies, Inc. Control module
US7829928B2 (en) * 2006-06-26 2010-11-09 System General Corp. Semiconductor structure of a high side driver and method for manufacturing the same
US7633135B2 (en) * 2007-07-22 2009-12-15 Alpha & Omega Semiconductor, Ltd. Bottom anode Schottky diode structure and method
US7564099B2 (en) * 2007-03-12 2009-07-21 International Rectifier Corporation Monolithic MOSFET and Schottky diode device
JP5047653B2 (ja) * 2007-03-13 2012-10-10 三菱電機株式会社 半導体装置
US7807555B2 (en) * 2007-07-31 2010-10-05 Intersil Americas, Inc. Method of forming the NDMOS device body with the reduced number of masks
US8027215B2 (en) * 2008-12-19 2011-09-27 Unity Semiconductor Corporation Array operation using a schottky diode as a non-ohmic isolation device
JP5522824B2 (ja) * 2009-03-17 2014-06-18 Ｆｄｋ株式会社 スイッチング素子の損失低減回路
DK2328264T3 (da) * 2009-09-29 2012-07-23 Abb Schweiz Ag Direkte omformer og system med en sådan direkte omformer
US8610233B2 (en) 2011-03-16 2013-12-17 International Business Machines Corporation Hybrid MOSFET structure having drain side schottky junction
JP2013062717A (ja) 2011-09-14 2013-04-04 Mitsubishi Electric Corp 半導体装置
US20130334648A1 (en) * 2012-06-15 2013-12-19 Taiwan Semiconductor Manufacturing Company, Ltd. Methods and Apparatus for High Voltage Diodes
US10522670B2 (en) 2012-06-26 2019-12-31 Nxp Usa, Inc. Semiconductor device with selectively etched surface passivation
US10825924B2 (en) 2012-06-26 2020-11-03 Nxp Usa, Inc. Semiconductor device with selectively etched surface passivation
US9111868B2 (en) 2012-06-26 2015-08-18 Freescale Semiconductor, Inc. Semiconductor device with selectively etched surface passivation
US8946776B2 (en) 2012-06-26 2015-02-03 Freescale Semiconductor, Inc. Semiconductor device with selectively etched surface passivation
KR101350684B1 (ko) * 2012-07-02 2014-01-13 삼성전기주식회사 유도성 부하에 적용 가능한 게이트 드라이버 회로, 인버터 모듈 및 인버터 장치
US8946779B2 (en) 2013-02-26 2015-02-03 Freescale Semiconductor, Inc. MISHFET and Schottky device integration
KR101657878B1 (ko) * 2015-03-09 2016-09-19 성균관대학교산학협력단 플로팅 스위치 게이트 드라이버의 전원 회로 및 이를 포함하는 플로팅 스위치 게이트 구동 회로
CN105827223B (zh) * 2016-02-23 2018-10-12 东南大学 一种集成自举的高压驱动芯片及其工艺结构
US11652411B2 (en) * 2021-02-26 2023-05-16 Nxp Usa, Inc. System and method of maintaining charge on boot capacitor of a power converter

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5023678A (en) * 1987-05-27 1991-06-11 International Rectifier Corporation High power MOSFET and integrated control circuit therefor for high-side switch application
US4866495A (en) * 1987-05-27 1989-09-12 International Rectifier Corporation High power MOSFET and integrated control circuit therefor for high-side switch application
US4811065A (en) * 1987-06-11 1989-03-07 Siliconix Incorporated Power DMOS transistor with high speed body diode
FR2627033B1 (fr) * 1988-02-04 1990-07-20 Sgs Thomson Microelectronics Circuit de commande de grille d'un transistor mos de puissance fonctionnant en commutation
US5184272A (en) * 1989-03-31 1993-02-02 Hitachi, Ltd. High-side switch with overcurrent protecting circuit
US5164802A (en) * 1991-03-20 1992-11-17 Harris Corporation Power vdmosfet with schottky on lightly doped drain of lateral driver fet
US5666280A (en) * 1993-05-07 1997-09-09 Philips Electronics North America Corporation High voltage integrated circuit driver for half-bridge circuit employing a jet to emulate a bootstrap diode
US5545955A (en) * 1994-03-04 1996-08-13 International Rectifier Corporation MOS gate driver for ballast circuits
JP2800735B2 (ja) * 1994-10-31 1998-09-21 日本電気株式会社 半導体装置
JPH08148675A (ja) * 1994-11-15 1996-06-07 Fuji Electric Co Ltd 半導体装置
US5818214A (en) * 1996-01-18 1998-10-06 International Rectifier Corporation Buck regulator circuit
JPH1127950A (ja) * 1997-07-04 1999-01-29 Shibaura Eng Works Co Ltd パルス幅変調方式負荷駆動回路
US6529034B1 (en) * 2001-11-07 2003-03-04 International Rectifier Corporation Integrated series schottky and FET to allow negative drain voltage

Also Published As

Publication number Publication date
JP2003198347A (ja) 2003-07-11
DE60210393T2 (de) 2007-01-11
JP3857216B2 (ja) 2006-12-13
EP1311067A1 (de) 2003-05-14
US6529034B1 (en) 2003-03-04
ATE322764T1 (de) 2006-04-15
US20030102886A1 (en) 2003-06-05
US6707101B2 (en) 2004-03-16
JP4485490B2 (ja) 2010-06-23
EP1311067B1 (de) 2006-04-05
JP2006311594A (ja) 2006-11-09

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee
8328 Change in the person/name/address of the agent

Representative=s name: DR. WEITZEL & PARTNER, 89522 HEIDENHEIM