ATE440381T1 - Hybride esd-klemme - Google Patents

Hybride esd-klemme

Info

Publication number
ATE440381T1
ATE440381T1 AT05700212T AT05700212T ATE440381T1 AT E440381 T1 ATE440381 T1 AT E440381T1 AT 05700212 T AT05700212 T AT 05700212T AT 05700212 T AT05700212 T AT 05700212T AT E440381 T1 ATE440381 T1 AT E440381T1
Authority
AT
Austria
Prior art keywords
dmos
ground
current
resistor
diode
Prior art date
Application number
AT05700212T
Other languages
English (en)
Inventor
Koen Reynders
Peter Moens
Original Assignee
Ami Semiconductor Belgium Bvba
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ami Semiconductor Belgium Bvba filed Critical Ami Semiconductor Belgium Bvba
Application granted granted Critical
Publication of ATE440381T1 publication Critical patent/ATE440381T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H01L29/78—Field effect transistors with field effect produced by an insulated gate
    • H01L29/7801—DMOS transistors, i.e. MISFETs with a channel accommodating body or base region adjoining a drain drift region
    • H01L29/7802—Vertical DMOS transistors, i.e. VDMOS transistors
    • H01L29/7809—Vertical DMOS transistors, i.e. VDMOS transistors having both source and drain contacts on the same surface, i.e. Up-Drain VDMOS transistors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/0203—Particular design considerations for integrated circuits
    • H01L27/0248—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection
    • H01L27/0251—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices
    • H01L27/0266—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices using field effect transistors as protective elements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H01L29/78—Field effect transistors with field effect produced by an insulated gate
    • H01L29/7801—DMOS transistors, i.e. MISFETs with a channel accommodating body or base region adjoining a drain drift region
    • H01L29/7802—Vertical DMOS transistors, i.e. VDMOS transistors
    • H01L29/7803—Vertical DMOS transistors, i.e. VDMOS transistors structurally associated with at least one other device
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/10—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode not carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
    • H01L29/1095—Body region, i.e. base region, of DMOS transistors or IGBTs

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Ceramic Engineering (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Developing Agents For Electrophotography (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Transition And Organic Metals Composition Catalysts For Addition Polymerization (AREA)
AT05700212T 2005-01-07 2005-01-07 Hybride esd-klemme ATE440381T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/BE2005/000003 WO2006072148A1 (en) 2005-01-07 2005-01-07 Hybrid esd clamp

Publications (1)

Publication Number Publication Date
ATE440381T1 true ATE440381T1 (de) 2009-09-15

Family

ID=34960391

Family Applications (1)

Application Number Title Priority Date Filing Date
AT05700212T ATE440381T1 (de) 2005-01-07 2005-01-07 Hybride esd-klemme

Country Status (6)

Country Link
US (1) US7804670B2 (de)
EP (1) EP1834359B1 (de)
AT (1) ATE440381T1 (de)
DE (1) DE602005016156D1 (de)
IL (1) IL184440A (de)
WO (1) WO2006072148A1 (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8218276B2 (en) * 2006-05-31 2012-07-10 Alpha and Omega Semiconductor Inc. Transient voltage suppressor (TVS) with improved clamping voltage
JP2010278188A (ja) * 2009-05-28 2010-12-09 Renesas Electronics Corp 半導体集積回路装置
US20120154956A1 (en) * 2010-12-17 2012-06-21 National Semiconductor Corporation Self protected snapback device driven by driver circuitry using high side pull-up avalanche diode
CN102157518B (zh) * 2011-01-07 2012-05-30 北方工业大学 单片集成的新型双重突波保护器件及其制作方法
EP2515334B1 (de) * 2011-04-20 2013-11-20 Nxp B.V. ESD-Schutzschaltung
JP5801609B2 (ja) * 2011-06-03 2015-10-28 ルネサスエレクトロニクス株式会社 保護回路素子
US8436418B2 (en) * 2011-06-20 2013-05-07 United Microelectronics Corp. High-voltage semiconductor device with electrostatic discharge protection
US8520347B2 (en) 2011-07-29 2013-08-27 Silicon Laboratories Inc. Circuit for ESD protection including dynamically terminated diode strings comprised of bipolar devices
US8630072B2 (en) 2011-07-29 2014-01-14 Silicon Laboratories Inc. Circuits including a diode string comprised of bipolar stages having an adjustable pseudo beta for ESD protection
US8854103B2 (en) * 2012-03-28 2014-10-07 Infineon Technologies Ag Clamping circuit
CN103578992B (zh) * 2012-07-25 2016-01-13 北大方正集团有限公司 一种集成vdmos芯片及其制作方法
KR101926607B1 (ko) 2012-09-28 2018-12-07 삼성전자 주식회사 클램핑 회로, 이를 포함하는 반도체 장치 및 반도체 장치의 클램핑 방법
KR102016986B1 (ko) 2013-01-25 2019-09-02 삼성전자주식회사 엘디모스 트랜지스터 기반의 다이오드 및 이를 포함하는 정전기 방전 보호 회로
KR102495452B1 (ko) 2016-06-29 2023-02-02 삼성전자주식회사 반도체 장치
US10276558B1 (en) 2017-10-30 2019-04-30 International Business Machines Corporation Electrostatic discharge protection using vertical fin CMOS technology
TWI804736B (zh) * 2020-03-25 2023-06-11 立錡科技股份有限公司 具有橫向絕緣閘極雙極性電晶體之功率元件及其製造方法
US11532610B2 (en) 2020-06-24 2022-12-20 Amazing Microelectronic Corp. Electrostatic discharge protection structure and electrostatic discharge protection circuit with low parasitic capacitance thereof

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4630162A (en) * 1984-07-31 1986-12-16 Texas Instruments Incorporated ESD input protection circuit
FR2698486B1 (fr) * 1992-11-24 1995-03-10 Sgs Thomson Microelectronics Structure de protection contre les surtensions directes pour composant semiconducteur vertical.
US5528188A (en) * 1995-03-13 1996-06-18 International Business Machines Corporation Electrostatic discharge suppression circuit employing low-voltage triggering silicon-controlled rectifier
US5917220A (en) * 1996-12-31 1999-06-29 Stmicroelectronics, Inc. Integrated circuit with improved overvoltage protection
US5982217A (en) * 1997-02-19 1999-11-09 Texas Instruments Incorporated PNP driven NMOS ESD protection circuit
US6064249A (en) * 1997-06-20 2000-05-16 Texas Instruments Incorporated Lateral DMOS design for ESD protection
TW373316B (en) * 1998-01-09 1999-11-01 Winbond Electronic Corp Electrostatic discharge protect circuit having erasable coding ROM device
ATE456861T1 (de) * 1999-06-01 2010-02-15 Imec Esd-schutz-bauteil für mittlere triggerspannung
JP2001358297A (ja) * 2000-06-14 2001-12-26 Nec Corp 静電保護回路
US7224560B2 (en) * 2003-02-13 2007-05-29 Medtronic, Inc. Destructive electrical transient protection
US6693339B1 (en) * 2003-03-14 2004-02-17 Motorola, Inc. Semiconductor component and method of manufacturing same

Also Published As

Publication number Publication date
DE602005016156D1 (de) 2009-10-01
US20090268357A1 (en) 2009-10-29
EP1834359B1 (de) 2009-08-19
EP1834359A1 (de) 2007-09-19
WO2006072148A1 (en) 2006-07-13
US7804670B2 (en) 2010-09-28
IL184440A0 (en) 2007-10-31
IL184440A (en) 2012-01-31

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