DE60201147D1 - Verfahren zur Herstellung eines organischen Dünnfilmbauelements unter Verwendung einer Sputtervorrichtung des Typs der einander gegenüberliegenden Targets - Google Patents

Verfahren zur Herstellung eines organischen Dünnfilmbauelements unter Verwendung einer Sputtervorrichtung des Typs der einander gegenüberliegenden Targets

Info

Publication number
DE60201147D1
DE60201147D1 DE60201147T DE60201147T DE60201147D1 DE 60201147 D1 DE60201147 D1 DE 60201147D1 DE 60201147 T DE60201147 T DE 60201147T DE 60201147 T DE60201147 T DE 60201147T DE 60201147 D1 DE60201147 D1 DE 60201147D1
Authority
DE
Germany
Prior art keywords
manufacturing
thin film
type
organic thin
opposing targets
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60201147T
Other languages
English (en)
Other versions
DE60201147T2 (de
Inventor
Junji Kido
Akira Yokoi
Sadao Kadokura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kido Junji Yonezawa-Shi Yamagata-Ken Jp
Rohm Co Ltd
Original Assignee
International Manufacturing and Engineering Services Co Ltd IMES
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Manufacturing and Engineering Services Co Ltd IMES filed Critical International Manufacturing and Engineering Services Co Ltd IMES
Application granted granted Critical
Publication of DE60201147D1 publication Critical patent/DE60201147D1/de
Publication of DE60201147T2 publication Critical patent/DE60201147T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/805—Electrodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/60—Forming conductive regions or layers, e.g. electrodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/30—Coordination compounds
    • H10K85/321—Metal complexes comprising a group IIIA element, e.g. Tris (8-hydroxyquinoline) gallium [Gaq3]
    • H10K85/324—Metal complexes comprising a group IIIA element, e.g. Tris (8-hydroxyquinoline) gallium [Gaq3] comprising aluminium, e.g. Alq3
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/60—Organic compounds having low molecular weight
    • H10K85/631—Amine compounds having at least two aryl rest on at least one amine-nitrogen atom, e.g. triphenylamine

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
DE60201147T 2001-05-14 2002-05-14 Verfahren zur Herstellung eines organischen Dünnfilmbauelements unter Verwendung einer Sputtervorrichtung des Typs der einander gegenüberliegenden Targets Expired - Lifetime DE60201147T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2001142672A JP3955744B2 (ja) 2001-05-14 2001-05-14 有機薄膜素子の製造方法
JP2001142672 2001-05-14

Publications (2)

Publication Number Publication Date
DE60201147D1 true DE60201147D1 (de) 2004-10-14
DE60201147T2 DE60201147T2 (de) 2005-01-27

Family

ID=18988936

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60201147T Expired - Lifetime DE60201147T2 (de) 2001-05-14 2002-05-14 Verfahren zur Herstellung eines organischen Dünnfilmbauelements unter Verwendung einer Sputtervorrichtung des Typs der einander gegenüberliegenden Targets

Country Status (7)

Country Link
US (1) US6794278B2 (de)
EP (1) EP1261042B1 (de)
JP (1) JP3955744B2 (de)
KR (1) KR100629370B1 (de)
CN (1) CN1281783C (de)
DE (1) DE60201147T2 (de)
TW (1) TW593721B (de)

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KR101436791B1 (ko) 2004-10-29 2014-09-03 가부시키가이샤 한도오따이 에네루기 켄큐쇼 복합 재료, 발광 소자, 발광 장치 및 이의 제조방법
KR100810629B1 (ko) * 2004-12-08 2008-03-06 삼성에스디아이 주식회사 대향 타겟식 스퍼터링 장치를 이용한 유기 발광 소자의제조방법
JP4712372B2 (ja) * 2004-12-16 2011-06-29 株式会社半導体エネルギー研究所 発光装置
CN1800441B (zh) * 2005-01-05 2010-09-01 鸿富锦精密工业（深圳）有限公司 等离子体增强薄膜沉积方法及装置
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KR100685832B1 (ko) * 2005-05-13 2007-02-22 삼성에스디아이 주식회사 무기막 및 그의 제조 방법
EP1724852A3 (de) 2005-05-20 2010-01-27 Semiconductor Energy Laboratory Co., Ltd. Lichtemittierendes Bauelement, lichtemittierende Vorrichtung, und elektronische Vorrichtung
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JP2007179797A (ja) * 2005-12-27 2007-07-12 Tokyo Electron Ltd 成膜装置および発光素子の製造方法
US7528418B2 (en) * 2006-02-24 2009-05-05 Semiconductor Energy Laboratory Co., Ltd. Light-emitting device
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ITMI20070301A1 (it) * 2007-02-16 2008-08-17 Getters Spa Supporti comprendenti materiali getter e sorgenti di metalli alcalini o alcalino-terrosi per sistemi di termoregolazione basati su effetto tunnel
KR100914038B1 (ko) * 2007-06-04 2009-08-28 주식회사 탑 엔지니어링 이중 타깃 스퍼터링 장치
JP2009037813A (ja) * 2007-07-31 2009-02-19 Sumitomo Chemical Co Ltd 有機ｅｌ装置の製造方法
JP2010055926A (ja) * 2008-08-28 2010-03-11 Yamagata Promotional Organization For Industrial Technology 有機エレクトロルミネッセンス素子およびその製造方法
JP2010153365A (ja) 2008-11-19 2010-07-08 Semiconductor Energy Lab Co Ltd 発光素子、発光装置、電子機器及び照明装置
US8404500B2 (en) 2009-11-02 2013-03-26 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing light-emitting element, light-emitting element, light-emitting device, lighting device, and electronic appliance
JP2011243441A (ja) * 2010-05-19 2011-12-01 Nec Lighting Ltd 有機ｅｌ装置
JP5969216B2 (ja) 2011-02-11 2016-08-17 株式会社半導体エネルギー研究所 発光素子、表示装置、照明装置、及びこれらの作製方法
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JP5889730B2 (ja) 2012-06-27 2016-03-22 Ｌｕｍｉｏｔｅｃ株式会社 有機エレクトロルミネッセント素子及び照明装置
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Also Published As

Publication number Publication date
US20020173068A1 (en) 2002-11-21
US6794278B2 (en) 2004-09-21
TW593721B (en) 2004-06-21
KR20020087839A (ko) 2002-11-23
DE60201147T2 (de) 2005-01-27
KR100629370B1 (ko) 2006-09-29
JP2002332567A (ja) 2002-11-22
CN1386895A (zh) 2002-12-25
CN1281783C (zh) 2006-10-25
EP1261042B1 (de) 2004-09-08
EP1261042A1 (de) 2002-11-27
JP3955744B2 (ja) 2007-08-08

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Legal Events

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8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: KIDO, JUNJI, YONEZAWA-SHI, YAMAGATA-KEN, JP

Owner name: ROHM CO., LTD., KYOTO, KYOTO, JP