DE602007007167D1 - Verfahren zur Herstellung einer Struktur durch Unterschneiden einer Druckmaske - Google Patents

Verfahren zur Herstellung einer Struktur durch Unterschneiden einer Druckmaske

Info

Publication number
DE602007007167D1
DE602007007167D1 DE602007007167T DE602007007167T DE602007007167D1 DE 602007007167 D1 DE602007007167 D1 DE 602007007167D1 DE 602007007167 T DE602007007167 T DE 602007007167T DE 602007007167 T DE602007007167 T DE 602007007167T DE 602007007167 D1 DE602007007167 D1 DE 602007007167D1
Authority
DE
Germany
Prior art keywords
undercutting
producing
printing mask
mask
printing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602007007167T
Other languages
English (en)
Inventor
Scott J Limb
William S Wong
Steven E Ready
Michael L Chabinyc
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Palo Alto Research Center Inc
Original Assignee
Palo Alto Research Center Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Palo Alto Research Center Inc filed Critical Palo Alto Research Center Inc
Publication of DE602007007167D1 publication Critical patent/DE602007007167D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G03F7/2018—Masking pattern obtained by selective application of an ink or a toner, e.g. ink jet printing
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
DE602007007167T 2006-01-20 2007-01-22 Verfahren zur Herstellung einer Struktur durch Unterschneiden einer Druckmaske Active DE602007007167D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/336,365 US7498119B2 (en) 2006-01-20 2006-01-20 Process for forming a feature by undercutting a printed mask

Publications (1)

Publication Number Publication Date
DE602007007167D1 true DE602007007167D1 (de) 2010-07-29

Family

ID=38285934

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602007007167T Active DE602007007167D1 (de) 2006-01-20 2007-01-22 Verfahren zur Herstellung einer Struktur durch Unterschneiden einer Druckmaske

Country Status (4)

Country Link
US (1) US7498119B2 (de)
EP (1) EP1906229B1 (de)
JP (1) JP5074047B2 (de)
DE (1) DE602007007167D1 (de)

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US7955783B2 (en) * 2007-11-09 2011-06-07 Palo Alto Research Center Incorporated Lamination for printed photomask
US8551556B2 (en) * 2007-11-20 2013-10-08 Palo Alto Research Center Incorporated Method for obtaining controlled sidewall profile in print-patterned structures
US20090155732A1 (en) * 2007-12-13 2009-06-18 Palo Alto Research Center Incorporated Method for Patterning Using Phase-Change Material
US8765226B2 (en) * 2007-12-13 2014-07-01 Palo Alto Research Center Incorporated Method for patterning using phase-change material
TWI370270B (en) * 2008-08-06 2012-08-11 Au Optronics Corp Color filter sustrate and fabricating method thereof
DE102010013755A1 (de) 2009-04-02 2010-10-14 Optrex Europe Gmbh Verfahren zur Herstellung von Strukturen mit negativen Flanken
US8610285B2 (en) 2011-05-30 2013-12-17 Taiwan Semiconductor Manufacturing Company, Ltd. 3D IC packaging structures and methods with a metal pillar
US8664760B2 (en) * 2011-05-30 2014-03-04 Taiwan Semiconductor Manufacturing Company, Ltd. Connector design for packaging integrated circuits
US9829740B2 (en) 2014-07-23 2017-11-28 Apple Inc. Display with reduced color mixing
CN104979372B (zh) * 2015-05-20 2018-03-02 京东方科技集团股份有限公司 显示基板及其制作方法以及显示装置
CN105116685B (zh) * 2015-09-24 2019-10-01 京东方科技集团股份有限公司 一种光刻胶图案的制作方法、彩色滤光片及显示装置
JP6671335B2 (ja) * 2017-12-28 2020-03-25 株式会社小森コーポレーション 機能性膜のパターニング方法、電子デバイスの製造方法

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US4533624A (en) * 1983-05-23 1985-08-06 Sperry Corporation Method of forming a low temperature multilayer photoresist lift-off pattern
JPS61256729A (ja) * 1985-05-10 1986-11-14 Toshiba Corp 導体パタ−ンの形成方法
JPS643663A (en) 1987-06-26 1989-01-09 Toshiba Corp Forming method for fine pattern
US4959674A (en) * 1989-10-03 1990-09-25 Xerox Corporation Acoustic ink printhead having reflection coating for improved ink drop ejection control
JPH03283418A (ja) * 1990-03-30 1991-12-13 Toshiba Corp レジストパターン形成方法
JPH04301086A (ja) * 1991-03-29 1992-10-23 Kenseidou Kagaku Kogyo Kk 細い金属棒表面に微細な溝を有する金属シャフトの製法
JPH0729846A (ja) * 1993-07-15 1995-01-31 Honda Motor Co Ltd 半導体装置の電極形成方法
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JP2002323775A (ja) * 2001-04-26 2002-11-08 Fujitsu Ltd パターン形成方法
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US6890050B2 (en) * 2002-08-20 2005-05-10 Palo Alto Research Center Incorporated Method for the printing of homogeneous electronic material with a multi-ejector print head
US6872588B2 (en) * 2002-11-22 2005-03-29 Palo Alto Research Center Inc. Method of fabrication of electronic devices using microfluidic channels
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JP4617650B2 (ja) * 2003-09-26 2011-01-26 セイコーエプソン株式会社 多面取り用フォトマスク、電気光学装置の製造方法
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Also Published As

Publication number Publication date
EP1906229B1 (de) 2010-06-16
JP5074047B2 (ja) 2012-11-14
US7498119B2 (en) 2009-03-03
EP1906229A3 (de) 2008-04-23
EP1906229A2 (de) 2008-04-02
JP2007194641A (ja) 2007-08-02
US20070172774A1 (en) 2007-07-26

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