DE602006000278D1 - Mehrmaliges Rundfräsen zur Probenherstellung - Google Patents

Mehrmaliges Rundfräsen zur Probenherstellung

Info

Publication number
DE602006000278D1
DE602006000278D1 DE602006000278T DE602006000278T DE602006000278D1 DE 602006000278 D1 DE602006000278 D1 DE 602006000278D1 DE 602006000278 T DE602006000278 T DE 602006000278T DE 602006000278 T DE602006000278 T DE 602006000278T DE 602006000278 D1 DE602006000278 D1 DE 602006000278D1
Authority
DE
Germany
Prior art keywords
multiple round
sample production
round milling
milling
sample
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602006000278T
Other languages
English (en)
Other versions
DE602006000278T2 (de
Inventor
Lucille Giannuzzi
Paul Anzalone
Richard Young
Jr Daniel Phifer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
FEI Co
Original Assignee
FEI Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by FEI Co filed Critical FEI Co
Publication of DE602006000278D1 publication Critical patent/DE602006000278D1/de
Application granted granted Critical
Publication of DE602006000278T2 publication Critical patent/DE602006000278T2/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N1/00—Sampling; Preparing specimens for investigation
    • G01N1/28—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
    • G01N1/286—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q involving mechanical work, e.g. chopping, disintegrating, compacting, homogenising
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N1/00—Sampling; Preparing specimens for investigation
    • G01N1/28—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
    • G01N1/32—Polishing; Etching
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2813—Scanning microscopes characterised by the application
    • H01J2237/2817—Pattern inspection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3174—Etching microareas
    • H01J2237/31745—Etching microareas for preparing specimen to be viewed in microscopes or analyzed in microanalysers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24355—Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.]

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Sampling And Sample Adjustment (AREA)
DE602006000278T 2005-02-23 2006-02-22 Mehrmaliges Rundfräsen zur Probenherstellung Active DE602006000278T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US65532705P 2005-02-23 2005-02-23
US655327P 2005-02-23

Publications (2)

Publication Number Publication Date
DE602006000278D1 true DE602006000278D1 (de) 2008-01-17
DE602006000278T2 DE602006000278T2 (de) 2008-11-06

Family

ID=36498943

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602006000278T Active DE602006000278T2 (de) 2005-02-23 2006-02-22 Mehrmaliges Rundfräsen zur Probenherstellung

Country Status (4)

Country Link
US (1) US7442924B2 (de)
EP (1) EP1696219B1 (de)
JP (2) JP5173142B2 (de)
DE (1) DE602006000278T2 (de)

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EP0884626B1 (de) 1997-06-12 2008-01-02 Sharp Kabushiki Kaisha Anzeigevorrichtung mit vertical ausgerichtetem Flüssigkristall
US7786452B2 (en) 2003-10-16 2010-08-31 Alis Corporation Ion sources, systems and methods
US8110814B2 (en) 2003-10-16 2012-02-07 Alis Corporation Ion sources, systems and methods
US9159527B2 (en) 2003-10-16 2015-10-13 Carl Zeiss Microscopy, Llc Systems and methods for a gas field ionization source
US7786451B2 (en) 2003-10-16 2010-08-31 Alis Corporation Ion sources, systems and methods
US7511282B2 (en) * 2006-05-25 2009-03-31 Fei Company Sample preparation
US7644637B2 (en) * 2006-09-25 2010-01-12 Omniprobe, Inc. Method and apparatus for transfer of samples in a controlled environment
WO2008049134A2 (en) 2006-10-20 2008-04-24 Fei Company Method for s/tem sample analysis
EP2095134B1 (de) * 2006-10-20 2017-02-22 FEI Company Verfahren und vorrichtung zur probenextraktion und -handhabung
US7804068B2 (en) 2006-11-15 2010-09-28 Alis Corporation Determining dopant information
US7842920B2 (en) * 2006-12-14 2010-11-30 Dcg Systems, Inc. Methods and systems of performing device failure analysis, electrical characterization and physical characterization
JP4592716B2 (ja) * 2007-02-16 2010-12-08 三菱重工業株式会社 試料片採取方法、翼の温度推定方法
JP2009115677A (ja) * 2007-11-08 2009-05-28 Jeol Ltd 試料作製方法及びシステム
US8907277B2 (en) 2008-03-07 2014-12-09 Carl Zeiss Microscopy, Llc Reducing particle implantation
US8288740B2 (en) * 2008-06-27 2012-10-16 Omniprobe, Inc. Method for preparing specimens for atom probe analysis and specimen assemblies made thereby
JP5175008B2 (ja) * 2009-02-20 2013-04-03 株式会社日立ハイテクサイエンス ミクロ断面加工方法
CN102096307A (zh) * 2009-12-14 2011-06-15 鸿富锦精密工业（深圳）有限公司 测试相机镜头偏转角度的方法和装置
US8859963B2 (en) * 2011-06-03 2014-10-14 Fei Company Methods for preparing thin samples for TEM imaging
US8912490B2 (en) * 2011-06-03 2014-12-16 Fei Company Method for preparing samples for imaging
EP2749863A3 (de) * 2012-12-31 2016-05-04 Fei Company Verfahren zur Vorbereitung von Proben für Bildgebung
US9941096B2 (en) 2011-09-12 2018-04-10 Fei Company Glancing angle mill
DE102012202519A1 (de) 2012-02-17 2013-08-22 Carl Zeiss Microscopy Gmbh Verfahren und Vorrichtungen zur Präparation mikroskopischer Proben mit Hilfe von gepulstem Licht
US8740209B2 (en) * 2012-02-22 2014-06-03 Expresslo Llc Method and apparatus for ex-situ lift-out specimen preparation
DE102012010708B4 (de) * 2012-05-30 2021-12-23 Carl Zeiss Microscopy Gmbh Kombiniertes bearbeitungssystem zur bearbeitung mittels laser und fokussierten ionenstrahlen
KR102039528B1 (ko) * 2012-10-05 2019-11-01 에프이아이 컴파니 경사진 밀링 보호를 위한 벌크 증착
EP2916342A1 (de) 2014-03-05 2015-09-09 Fei Company Herstellung einer Lamelle zur korrelativen tomografischen Analyse mit atomarer Auflösung
JP6385899B2 (ja) 2014-07-21 2018-09-05 エフ・イ−・アイ・カンパニー Ｔｅｍ試料取付け構造
US9378927B2 (en) * 2014-09-11 2016-06-28 Fei Company AutoSlice and view undercut method
US9627176B2 (en) 2015-07-23 2017-04-18 Fei Company Fiducial formation for TEM/STEM tomography tilt-series acquisition and alignment
EP3153838B1 (de) 2015-10-06 2022-07-06 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur präparation einer probe für die mikrostrukturdiagnostik sowie probe für die mikrostrukturdiagnostik
DE102016119437B4 (de) * 2016-10-12 2024-05-23 scia Systems GmbH Verfahren zum Bearbeiten einer Oberfläche mittels eines Teilchenstrahls
EP3318862B1 (de) * 2016-11-04 2019-08-21 FEI Company Tomographieprobenvorbereitungssysteme und verfahren mit verbesserter geschwindigkeit, automatisierung und zuverlässigkeit
DE102022130985A1 (de) 2022-11-23 2024-05-23 Carl Zeiss Microscopy Gmbh Verfahren zum Betrieb eines Teilchenstrahlgeräts, Computerprogrammprodukt und Teilchenstrahlgerät zum Durchführen des Verfahrens

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JP2753306B2 (ja) * 1988-03-18 1998-05-20 株式会社日立製作所 イオンビーム加工方法及び集束イオンビーム装置
JP2774884B2 (ja) * 1991-08-22 1998-07-09 株式会社日立製作所 試料の分離方法及びこの分離方法で得た分離試料の分析方法
US5435850A (en) * 1993-09-17 1995-07-25 Fei Company Gas injection system
JP2743891B2 (ja) * 1995-10-27 1998-04-22 日本電気株式会社 透過型電子顕微鏡用試料の作製方法
US5851413A (en) * 1996-06-19 1998-12-22 Micrion Corporation Gas delivery systems for particle beam processing
WO1999005506A1 (en) * 1997-07-22 1999-02-04 Hitachi, Ltd. Method and apparatus for preparing samples
JP2000035390A (ja) * 1998-07-16 2000-02-02 Seiko Instruments Inc 薄片化加工方法
US6140652A (en) * 1998-09-09 2000-10-31 Intersil Corporation Device containing sample preparation sites for transmission electron microscopic analysis and processes of formation and use
WO2002095378A1 (en) * 2000-05-22 2002-11-28 Moore Thomas M Method for sample separation and lift-out
JP4178741B2 (ja) * 2000-11-02 2008-11-12 株式会社日立製作所 荷電粒子線装置および試料作製装置
EP1209737B2 (de) * 2000-11-06 2014-04-30 Hitachi, Ltd. Verfahren zur Herstellung von Proben
WO2002071031A1 (en) * 2001-03-01 2002-09-12 Moore Thomas M Total release method for sample extraction from a charged particle instrument
JP4200665B2 (ja) * 2001-05-08 2008-12-24 株式会社日立製作所 加工装置
JP2004093353A (ja) * 2002-08-30 2004-03-25 Seiko Instruments Inc 試料作製装置
NL1022426C2 (nl) * 2003-01-17 2004-07-26 Fei Co Werkwijze voor het vervaardigen en transmissief bestralen van een preparaat alsmede deeltjes optisch systeem.
JP2004301557A (ja) * 2003-03-28 2004-10-28 Tdk Corp 観察対象物の加工方法及び微細加工方法
JP3887356B2 (ja) * 2003-07-08 2007-02-28 エスアイアイ・ナノテクノロジー株式会社 薄片試料作製方法
JPWO2005003736A1 (ja) * 2003-07-08 2006-08-17 エスアイアイ・ナノテクノロジー株式会社 薄片試料作製方法および複合荷電粒子ビーム装置
US7408178B2 (en) * 2004-07-01 2008-08-05 Fei Company Method for the removal of a microscopic sample from a substrate
US20060017016A1 (en) * 2004-07-01 2006-01-26 Fei Company Method for the removal of a microscopic sample from a substrate
JP4393352B2 (ja) * 2004-11-15 2010-01-06 株式会社日立製作所 電子顕微鏡

Also Published As

Publication number Publication date
JP2006234816A (ja) 2006-09-07
EP1696219B1 (de) 2007-12-05
US20060186336A1 (en) 2006-08-24
EP1696219A1 (de) 2006-08-30
JP2013047691A (ja) 2013-03-07
JP5670988B2 (ja) 2015-02-18
DE602006000278T2 (de) 2008-11-06
US7442924B2 (en) 2008-10-28
JP5173142B2 (ja) 2013-03-27

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Legal Events

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