DE602005012891D1 - Reflexionsschicht aus einer Silberlegierung, Sputter Target dafür, und optischer Datenträger mit einer solchen Schicht - Google Patents

Reflexionsschicht aus einer Silberlegierung, Sputter Target dafür, und optischer Datenträger mit einer solchen Schicht

Info

Publication number
DE602005012891D1
DE602005012891D1 DE602005012891T DE602005012891T DE602005012891D1 DE 602005012891 D1 DE602005012891 D1 DE 602005012891D1 DE 602005012891 T DE602005012891 T DE 602005012891T DE 602005012891 T DE602005012891 T DE 602005012891T DE 602005012891 D1 DE602005012891 D1 DE 602005012891D1
Authority
DE
Germany
Prior art keywords
layer
sputtering target
optical disk
silver alloy
reflection layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE602005012891T
Other languages
German (de)
English (en)
Inventor
Yuuki Tauchi
Junichi Nakai
Katsutoshi Takagi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kobe Steel Ltd
Original Assignee
Kobe Steel Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kobe Steel Ltd filed Critical Kobe Steel Ltd
Publication of DE602005012891D1 publication Critical patent/DE602005012891D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/18—Metallic material, boron or silicon on other inorganic substrates
    • C23C14/185—Metallic material, boron or silicon on other inorganic substrates by cathodic sputtering
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/252—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
    • G11B7/258—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of reflective layers
    • G11B7/259—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of reflective layers based on silver
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/007—Arrangement of the information on the record carrier, e.g. form of tracks, actual track shape, e.g. wobbled, or cross-section, e.g. v-shaped; Sequential information structures, e.g. sectoring or header formats within a track
    • G11B7/00736—Auxiliary data, e.g. lead-in, lead-out, Power Calibration Area [PCA], Burst Cutting Area [BCA], control information
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/252—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
    • G11B7/258—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of reflective layers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/21—Circular sheet or circular blank

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Optical Record Carriers (AREA)
DE602005012891T 2004-07-15 2005-06-30 Reflexionsschicht aus einer Silberlegierung, Sputter Target dafür, und optischer Datenträger mit einer solchen Schicht Expired - Lifetime DE602005012891D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004208686 2004-07-15
JP2005067262A JP3907666B2 (ja) 2004-07-15 2005-03-10 レーザーマーキング用再生専用光情報記録媒体

Publications (1)

Publication Number Publication Date
DE602005012891D1 true DE602005012891D1 (de) 2009-04-09

Family

ID=35241160

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602005012891T Expired - Lifetime DE602005012891D1 (de) 2004-07-15 2005-06-30 Reflexionsschicht aus einer Silberlegierung, Sputter Target dafür, und optischer Datenträger mit einer solchen Schicht

Country Status (8)

Country Link
US (1) US7695790B2 (https=)
EP (3) EP2077556A1 (https=)
JP (1) JP3907666B2 (https=)
KR (1) KR100720203B1 (https=)
AT (1) ATE424025T1 (https=)
DE (1) DE602005012891D1 (https=)
SG (1) SG119296A1 (https=)
TW (1) TWI327602B (https=)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1238554C (zh) * 2002-06-24 2006-01-25 株式会社钢臂功科研 银合金溅射靶及其制造方法
US7514037B2 (en) 2002-08-08 2009-04-07 Kobe Steel, Ltd. AG base alloy thin film and sputtering target for forming AG base alloy thin film
JP3993530B2 (ja) * 2003-05-16 2007-10-17 株式会社神戸製鋼所 Ａｇ−Ｂｉ系合金スパッタリングターゲットおよびその製造方法
JP2006294195A (ja) * 2005-04-14 2006-10-26 Kobe Steel Ltd 光情報記録用Ａｇ合金反射膜、光情報記録媒体および光情報記録用Ａｇ合金反射膜の形成用のＡｇ合金スパッタリングターゲット
JP4377861B2 (ja) * 2005-07-22 2009-12-02 株式会社神戸製鋼所 光情報記録媒体用Ａｇ合金反射膜、光情報記録媒体および光情報記録媒体用Ａｇ合金反射膜の形成用のＡｇ合金スパッタリングターゲット
JP2007035104A (ja) * 2005-07-22 2007-02-08 Kobe Steel Ltd 光情報記録媒体用Ａｇ合金反射膜、光情報記録媒体および光情報記録媒体用Ａｇ合金反射膜の形成用のＡｇ合金スパッタリングターゲット
JP4527624B2 (ja) * 2005-07-22 2010-08-18 株式会社神戸製鋼所 Ａｇ合金反射膜を有する光情報媒体
JP4377877B2 (ja) 2005-12-21 2009-12-02 ソニー株式会社 光情報記録媒体用Ａｇ合金反射膜、光情報記録媒体および光情報記録媒体用Ａｇ合金反射膜の形成用のＡｇ合金スパッタリングターゲット
JP2007335061A (ja) * 2006-05-16 2007-12-27 Sony Corp 光情報記録媒体とそのＢＣＡ（ＢｕｒｓｔＣｕｔｔｉｎｇＡｒｅａ）マーキング方法
JP2008021393A (ja) * 2006-07-14 2008-01-31 Mitsubishi Kagaku Media Co Ltd 光記録媒体およびディスク媒体認識信号の記録方法
WO2008026601A1 (en) * 2006-08-28 2008-03-06 Kabushiki Kaisha Kobe Seiko Sho Ag ALLOY REFLECTION FILM FOR OPTICAL INFORMATION RECORDING MEDIUM, OPTICAL INFORMATION RECORDING MEDIUM, AND SPUTTERING TARGET FOR Ag ALLOY REFLECTION FILM FOR OPTICAL INFORMATION RECORDING MEDIUM FORMATION
JP2008117470A (ja) * 2006-11-02 2008-05-22 Sony Corp 光情報記録媒体および光情報記録媒体の製造方法、ＢＣＡ（ＢｕｒｓｔＣｕｔｔｉｎｇＡｒｅａ）マーキング方法
JP4540687B2 (ja) * 2007-04-13 2010-09-08 株式会社ソニー・ディスクアンドデジタルソリューションズ 読み出し専用の光情報記録媒体
JP4694543B2 (ja) * 2007-08-29 2011-06-08 株式会社コベルコ科研 Ａｇ基合金スパッタリングターゲット、およびその製造方法
JP4833942B2 (ja) * 2007-08-29 2011-12-07 株式会社コベルコ科研 Ａｇ基合金スパッタリングターゲット
JP2009076129A (ja) * 2007-09-19 2009-04-09 Kobe Steel Ltd 読み出し専用の光情報記録媒体
WO2009041529A1 (ja) * 2007-09-25 2009-04-02 Kabushiki Kaisha Kobe Seiko Sho 反射膜、反射膜積層体、ｌｅｄ、有機ｅｌディスプレイ及び有機ｅｌ照明器具
JP5046890B2 (ja) * 2007-11-29 2012-10-10 株式会社コベルコ科研 Ａｇ系スパッタリングターゲット
JP2010049736A (ja) * 2008-08-21 2010-03-04 Taiyo Yuden Co Ltd 光情報記録媒体
JP5331420B2 (ja) 2008-09-11 2013-10-30 株式会社神戸製鋼所 読み出し専用の光情報記録媒体および該光情報記録媒体の半透過反射膜形成用スパッタリングターゲット
JP2010225572A (ja) * 2008-11-10 2010-10-07 Kobe Steel Ltd 有機ｅｌディスプレイ用の反射アノード電極および配線膜
US20110293961A1 (en) * 2009-02-06 2011-12-01 M-Tech Japan Co., Ltd. Silver-containing alloy plating bath and method for electrolytic plating using same
US8530023B2 (en) 2009-04-14 2013-09-10 Kobe Steel, Ltd. Optical information recording medium and sputtering target for forming reflective film for optical information recording medium
EP2460910B1 (en) 2009-07-31 2014-11-05 Shinji Dewaki Tin-containing alloy plating bath, electroplating method using same, and base having electroplated material deposited thereon
JP5719179B2 (ja) * 2010-01-25 2015-05-13 株式会社神戸製鋼所 反射膜積層体
KR101432362B1 (ko) 2011-06-29 2014-08-20 후지쯔 콤포넌트 가부시끼가이샤 프린터 장치
JP2013077547A (ja) * 2011-09-15 2013-04-25 Mitsubishi Materials Corp 導電性膜及びその製造方法並びに導電性膜形成用銀合金スパッタリングターゲット及びその製造方法
JP5159962B1 (ja) * 2012-01-10 2013-03-13 三菱マテリアル株式会社 導電性膜形成用銀合金スパッタリングターゲットおよびその製造方法
JP5159963B1 (ja) * 2012-01-13 2013-03-13 三菱マテリアル株式会社 導電性膜形成用銀合金スパッタリングターゲットおよびその製造方法

Family Cites Families (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US292651A (en) * 1884-01-29 Refuse attachment for table-plates
US274205A (en) * 1883-03-20 Straw-stacker
US292662A (en) * 1884-01-29 Centrifugal creamer
US293072A (en) * 1884-02-05 Fire-escape
US4998239A (en) * 1987-10-07 1991-03-05 The Dow Chemical Company Optical information recording medium containing a metal alloy as a reflective material
US5948497A (en) * 1992-10-19 1999-09-07 Eastman Kodak Company High stability silver based alloy reflectors for use in a writable compact disk
JP3404165B2 (ja) 1994-03-30 2003-05-06 日本板硝子株式会社 熱線遮蔽ガラス
CN1190785C (zh) * 1996-09-24 2005-02-23 富士写真菲林株式会社 光信息记录盘
US6007889A (en) * 1998-06-22 1999-12-28 Target Technology, Llc Metal alloys for the reflective or the semi-reflective layer of an optical storage medium
US6852384B2 (en) * 1998-06-22 2005-02-08 Han H. Nee Metal alloys for the reflective or the semi-reflective layer of an optical storage medium
US6544616B2 (en) * 2000-07-21 2003-04-08 Target Technology Company, Llc Metal alloys for the reflective or the semi-reflective layer of an optical storage medium
JP2000169959A (ja) 1998-12-04 2000-06-20 Japan Energy Corp 光ディスク反射膜形成用スパッタリングターゲット
CN1202521C (zh) * 1999-07-22 2005-05-18 索尼株式会社 光记录媒体、光记录及再生方法、光记录及再生装置
JP3365762B2 (ja) 2000-04-28 2003-01-14 株式会社神戸製鋼所 光情報記録媒体用の反射層または半透明反射層、光情報記録媒体及び光情報記録媒体用スパッタリングターゲット
SG116432A1 (en) * 2000-12-26 2005-11-28 Kobe Steel Ltd Reflective layer or semi-transparent reflective layer for use in optical information recording media, optical information recording media and sputtering target for use in the optical information recording media.
WO2002077317A1 (en) 2001-03-16 2002-10-03 Ishifuku Metal Industry Co., Ltd. Sputtering target material
TW583323B (en) 2001-08-20 2004-04-11 Cosmos Vacuum Technology Corp Manufacturing process of depositing anti-reflection film at room temperature and low reflectivity polarizer manufactured by the same
JP3772972B2 (ja) 2001-11-26 2006-05-10 三菱マテリアル株式会社 光記録媒体の反射層形成用銀合金スパッタリングターゲット
US7022384B2 (en) * 2002-01-25 2006-04-04 Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.) Reflective film, reflection type liquid crystal display, and sputtering target for forming the reflective film
CN1238554C (zh) * 2002-06-24 2006-01-25 株式会社钢臂功科研 银合金溅射靶及其制造方法
AU2003248890A1 (en) 2002-07-08 2004-01-23 Academy Corporation Reflective or semi-reflective metal alloy coatings
JP3655907B2 (ja) 2002-08-20 2005-06-02 株式会社神戸製鋼所 光情報記録媒体用反射膜と半透過反射膜、および光情報記録媒体
US7514037B2 (en) * 2002-08-08 2009-04-07 Kobe Steel, Ltd. AG base alloy thin film and sputtering target for forming AG base alloy thin film
EP1560704B1 (en) * 2003-04-18 2012-06-13 Target Technology Company, LLC. Metal alloys for the reflective or the semi-reflective layer of an optical storage medium
JP3993530B2 (ja) 2003-05-16 2007-10-17 株式会社神戸製鋼所 Ａｇ−Ｂｉ系合金スパッタリングターゲットおよびその製造方法
JP4009564B2 (ja) * 2003-06-27 2007-11-14 株式会社神戸製鋼所 リフレクター用Ａｇ合金反射膜、及び、このＡｇ合金反射膜を用いたリフレクター、並びに、このＡｇ合金反射膜のＡｇ合金薄膜の形成用のＡｇ合金スパッタリングターゲット
JP2005029849A (ja) * 2003-07-07 2005-02-03 Kobe Steel Ltd リフレクター用Ａｇ合金反射膜、及び、このＡｇ合金反射膜を用いたリフレクター、並びに、このＡｇ合金反射膜の形成用のＡｇ合金スパッタリングターゲット
US20050112019A1 (en) * 2003-10-30 2005-05-26 Kabushiki Kaisha Kobe Seiko Sho(Kobe Steel, Ltd.) Aluminum-alloy reflection film for optical information-recording, optical information-recording medium, and aluminum-alloy sputtering target for formation of the aluminum-alloy reflection film for optical information-recording
TWI325134B (en) 2004-04-21 2010-05-21 Kobe Steel Ltd Semi-reflective film and reflective film for optical information recording medium, optical information recording medium, and sputtering target

Also Published As

Publication number Publication date
KR100720203B1 (ko) 2007-05-21
EP2077556A1 (en) 2009-07-08
TW200622011A (en) 2006-07-01
US20060013988A1 (en) 2006-01-19
EP1617427A2 (en) 2006-01-18
EP1617427B1 (en) 2009-02-25
US7695790B2 (en) 2010-04-13
KR20060050179A (ko) 2006-05-19
TWI327602B (en) 2010-07-21
JP3907666B2 (ja) 2007-04-18
EP1617427A3 (en) 2006-03-15
JP2006054032A (ja) 2006-02-23
EP2043097A1 (en) 2009-04-01
SG119296A1 (en) 2006-02-28
ATE424025T1 (de) 2009-03-15

Similar Documents

Publication Publication Date Title
DE602005012891D1 (de) Reflexionsschicht aus einer Silberlegierung, Sputter Target dafür, und optischer Datenträger mit einer solchen Schicht
TW200735089A (en) Silver alloy reflective films for optical information recording media, silver alloy sputtering targets therefor, and optical information recording media
SG116607A1 (en) Semi-reflective film and reflective film for optical information recording medium, optical information recording medium, and sputtering target.
ATE379836T1 (de) Halbreflektierende und reflektierende schicht für ein optisches informationsaufzeichnungsmedium, informationsaufzeichnungsmedium, und sputter target
TWI336888B (en) Silver alloy reflective films for optical information recording media, silver alloy sputtering targets therefor, and optical information recording media
TW200641875A (en) Silver alloy reflective films for optical information recording media, silver alloy sputtering targets therefor, and optical information recording media
SG129399A1 (en) Optical information recording media and silver alloy reflective films for the same
ATE434255T1 (de) Aufzeichnungsschicht für optische aufzeichnungsmedien und sputtertarget
RU2010120431A (ru) Оптический носитель однократной записи и способ его изготовления
DE59907819D1 (de) Optische datenspeicherscheibe
JP2002527846A5 (https=)
TW200737172A (en) Optical information recording medium suppressing sulfuration of silver
TW200703306A (en) Optical recording medium
TW200746130A (en) Translucent reflection film for optical recording medium, and Ag alloy sputtering target for forming the reflection film
WO2005044578A8 (ja) 光記録媒体及びその製造方法、スパッタリングターゲット、並びに光記録媒体の使用方法及び光記録装置
JPH11154354A (ja) 光記録媒体
WO2007004344A1 (ja) 光ディスク及びCu合金記録層用スパッタリングターゲット
WO2008026601A1 (en) Ag ALLOY REFLECTION FILM FOR OPTICAL INFORMATION RECORDING MEDIUM, OPTICAL INFORMATION RECORDING MEDIUM, AND SPUTTERING TARGET FOR Ag ALLOY REFLECTION FILM FOR OPTICAL INFORMATION RECORDING MEDIUM FORMATION
EP1750259A3 (en) Optical recording medium
JP2004133979A5 (https=)
JP2003286567A (ja) 光学記録媒体の反射膜用スパッタリングターゲット材及びそれを用いたスパッタ法による反射膜
TW200731253A (en) Translucent reflection film and reflection film for optical recording medium, and Ag alloy sputtering target for forming the translucent reflection film and the reflection film
JP2007287302A (ja) 光学的情報記録媒体
TW200741703A (en) Optical disk including a sulfuration suppressing dielectric film
JP2007287301A (ja) 光学的情報記録媒体

Legal Events

Date Code Title Description
8364 No opposition during term of opposition