DE602004031832D1 - Verfahren zum herstellen eines siliziumoxidfilms u - Google Patents

Verfahren zum herstellen eines siliziumoxidfilms u

Info

Publication number
DE602004031832D1
DE602004031832D1 DE602004031832T DE602004031832T DE602004031832D1 DE 602004031832 D1 DE602004031832 D1 DE 602004031832D1 DE 602004031832 T DE602004031832 T DE 602004031832T DE 602004031832 T DE602004031832 T DE 602004031832T DE 602004031832 D1 DE602004031832 D1 DE 602004031832D1
Authority
DE
Germany
Prior art keywords
producing
oxide film
silicon oxide
silicon
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE602004031832T
Other languages
English (en)
Inventor
Toru Ikeda
Takahiro Mashimo
Eiji Shidoji
Toshihisa Kamiyama
Yoshihito Katayama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Publication of DE602004031832D1 publication Critical patent/DE602004031832D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/10—Glass or silica
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0042—Controlling partial pressure or flow rate of reactive or inert gases with feedback of measurements
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0094—Reactive sputtering in transition mode
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/083—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
DE602004031832T 2003-04-25 2004-04-23 Verfahren zum herstellen eines siliziumoxidfilms u Expired - Lifetime DE602004031832D1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2003121527 2003-04-25
JP2003339748 2003-09-30
PCT/JP2004/005875 WO2004097063A2 (en) 2003-04-25 2004-04-23 Method for producing silicon oxide film and method for producing optical multilayer film

Publications (1)

Publication Number Publication Date
DE602004031832D1 true DE602004031832D1 (de) 2011-04-28

Family

ID=33422040

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602004031832T Expired - Lifetime DE602004031832D1 (de) 2003-04-25 2004-04-23 Verfahren zum herstellen eines siliziumoxidfilms u

Country Status (6)

Country Link
US (1) US7842168B2 (de)
EP (1) EP1627095B1 (de)
JP (1) JP4486838B2 (de)
KR (1) KR101073415B1 (de)
DE (1) DE602004031832D1 (de)
WO (1) WO2004097063A2 (de)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ATE377579T1 (de) 2004-07-12 2007-11-15 Cardinal Cg Co Wartungsarme beschichtungen
JP4533815B2 (ja) * 2005-07-08 2010-09-01 株式会社東芝 スパッタリングターゲットとそれを用いた光学薄膜の製造方法
US7901778B2 (en) * 2006-01-13 2011-03-08 Saint-Gobain Performance Plastics Corporation Weatherable multilayer film
JP5129975B2 (ja) 2006-04-11 2013-01-30 日本板硝子株式会社 向上した低保守特性を有する光触媒コーティング
US20080011599A1 (en) 2006-07-12 2008-01-17 Brabender Dennis M Sputtering apparatus including novel target mounting and/or control
JP2008152839A (ja) * 2006-12-15 2008-07-03 Toshiba Corp 光記録媒体、及び光記録媒体の製造方法
JP2009007636A (ja) * 2007-06-28 2009-01-15 Sony Corp 低屈折率膜及びその成膜方法、並びに反射防止膜
JP5078470B2 (ja) 2007-07-05 2012-11-21 ペンタックスリコーイメージング株式会社 光学ローパスフィルタ及びそれを具備する撮像装置
KR20090009612A (ko) * 2007-07-20 2009-01-23 엘지디스플레이 주식회사 스퍼터링을 통한 무기절연막 형성방법
EP2066594B1 (de) 2007-09-14 2016-12-07 Cardinal CG Company Pflegeleichte beschichtungen und verfahren zur herstellung pflegeleichter beschichtungen
JP2014114497A (ja) * 2012-12-12 2014-06-26 Ulvac Japan Ltd スパッタ装置
JP6332109B2 (ja) * 2015-03-31 2018-05-30 信越化学工業株式会社 ハーフトーン位相シフト型フォトマスクブランクの製造方法
JP6500791B2 (ja) * 2016-01-22 2019-04-17 信越化学工業株式会社 ハーフトーン位相シフト型フォトマスクブランク及びその製造方法
JP6677139B2 (ja) * 2016-09-28 2020-04-08 信越化学工業株式会社 ハーフトーン位相シフト型フォトマスクブランクの製造方法
US10604442B2 (en) 2016-11-17 2020-03-31 Cardinal Cg Company Static-dissipative coating technology
GB201701846D0 (en) * 2017-02-03 2017-03-22 Univ Manchester Method of producing sputtered silicon oxide electrolyte
JP7332324B2 (ja) * 2019-04-10 2023-08-23 デクセリアルズ株式会社 無機偏光板及びその製造方法、並びに光学機器
KR102176552B1 (ko) * 2020-06-19 2020-11-09 한화시스템 주식회사 하이브리드 타입 변형거울 장치 및 이의 작동방법

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08109473A (ja) * 1994-10-14 1996-04-30 Asahi Glass Co Ltd 酸化ケイ素膜の成膜方法
WO1996034124A1 (en) * 1995-04-25 1996-10-31 The Boc Group, Inc. Sputtering system using cylindrical rotating magnetron electrically powered using alternating current
DE19610012B4 (de) * 1996-03-14 2005-02-10 Unaxis Deutschland Holding Gmbh Verfahren zur Stabilisierung eines Arbeitspunkts beim reaktiven Zerstäuben in einer Sauerstoff enthaltenden Atmosphäre
DE19609970A1 (de) 1996-03-14 1997-09-18 Leybold Systems Gmbh Vorrichtung zum Aufbringen dünner Schichten auf ein Substrat
JPH1129863A (ja) 1997-07-10 1999-02-02 Canon Inc 堆積膜製造方法
JP2000104161A (ja) * 1998-09-28 2000-04-11 Bridgestone Corp ドライプレーティング皮膜の屈折率コントロール方法
JP4733890B2 (ja) 1999-10-13 2011-07-27 Ａｇｃセラミックス株式会社 ＳｉＯ２を主成分とする膜の成膜方法
JP3774353B2 (ja) 2000-02-25 2006-05-10 株式会社シンクロン 金属化合物薄膜の形成方法およびその形成装置
DE60122837T2 (de) * 2000-07-27 2007-09-06 Asahi Glass Co., Ltd. Mit Antireflexionsfilmen ausgestattetes Substrat und dessen Herstellungsverfahren
JP4614037B2 (ja) 2000-09-08 2011-01-19 Ａｇｃセラミックス株式会社 円筒状ターゲット
US6744425B2 (en) * 2000-12-26 2004-06-01 Bridgestone Corporation Transparent electroconductive film
JP2003013216A (ja) 2001-06-27 2003-01-15 Bridgestone Corp 透明薄膜の成膜方法
JP4280890B2 (ja) 2001-07-23 2009-06-17 旭硝子株式会社 スパッタ装置及びスパッタ成膜方法
US6896981B2 (en) * 2001-07-24 2005-05-24 Bridgestone Corporation Transparent conductive film and touch panel
EP1437609A4 (de) * 2001-10-18 2004-11-17 Bridgestone Corp Optisches element und herstellungsverfahren dafür und bandpassfilter, nah-infrarot-sperrfilter und antireflexfilm
JP2003121639A (ja) 2001-10-18 2003-04-23 Bridgestone Corp バンドパスフィルターおよびその製造方法
JP2003121636A (ja) 2001-10-18 2003-04-23 Bridgestone Corp 近赤外線カットフィルターおよびその製造方法
JP2003121605A (ja) 2001-10-18 2003-04-23 Bridgestone Corp 反射防止膜およびその製造方法
US7709145B2 (en) * 2004-11-12 2010-05-04 Gm Global Technology Operations, Inc. Hydrophilic surface modification of bipolar plate

Also Published As

Publication number Publication date
EP1627095B1 (de) 2011-03-16
EP1627095A2 (de) 2006-02-22
KR101073415B1 (ko) 2011-10-17
US20060032739A1 (en) 2006-02-16
WO2004097063A3 (en) 2005-02-24
JP2005126813A (ja) 2005-05-19
KR20060003890A (ko) 2006-01-11
JP4486838B2 (ja) 2010-06-23
US7842168B2 (en) 2010-11-30
WO2004097063A2 (en) 2004-11-11

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