DE60135890D1 - Abgedeckte Verdampfungsquellenanordnung mit mehreren Taschen - Google Patents

Abgedeckte Verdampfungsquellenanordnung mit mehreren Taschen

Info

Publication number
DE60135890D1
DE60135890D1 DE60135890T DE60135890T DE60135890D1 DE 60135890 D1 DE60135890 D1 DE 60135890D1 DE 60135890 T DE60135890 T DE 60135890T DE 60135890 T DE60135890 T DE 60135890T DE 60135890 D1 DE60135890 D1 DE 60135890D1
Authority
DE
Germany
Prior art keywords
crucible
pockets
evaporation source
source arrangement
several pockets
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60135890T
Other languages
English (en)
Inventor
Bruce Gordon Ramsey
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ferrotec USA Corp
Original Assignee
Edwards Vacuum LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Edwards Vacuum LLC filed Critical Edwards Vacuum LLC
Application granted granted Critical
Publication of DE60135890D1 publication Critical patent/DE60135890D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Toxicology (AREA)
  • Health & Medical Sciences (AREA)
  • Physical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
  • Muffle Furnaces And Rotary Kilns (AREA)
DE60135890T 2000-06-01 2001-05-31 Abgedeckte Verdampfungsquellenanordnung mit mehreren Taschen Expired - Lifetime DE60135890D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/584,940 US6342103B1 (en) 2000-06-01 2000-06-01 Multiple pocket electron beam source

Publications (1)

Publication Number Publication Date
DE60135890D1 true DE60135890D1 (de) 2008-11-06

Family

ID=24339380

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60135890T Expired - Lifetime DE60135890D1 (de) 2000-06-01 2001-05-31 Abgedeckte Verdampfungsquellenanordnung mit mehreren Taschen

Country Status (6)

Country Link
US (2) US6342103B1 (de)
EP (2) EP1967607A1 (de)
JP (1) JP4845286B2 (de)
AT (1) ATE409245T1 (de)
DE (1) DE60135890D1 (de)
DK (1) DK1160351T3 (de)

Families Citing this family (39)

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US6342103B1 (en) 2000-06-01 2002-01-29 The Boc Group, Inc. Multiple pocket electron beam source
US6641674B2 (en) * 2000-11-10 2003-11-04 Helix Technology Inc. Movable evaporation device
TWI262034B (en) * 2002-02-05 2006-09-11 Semiconductor Energy Lab Manufacturing system, manufacturing method, method of operating a manufacturing apparatus, and light emitting device
TWI285515B (en) * 2002-02-22 2007-08-11 Semiconductor Energy Lab Light-emitting device and method of manufacturing the same, and method of operating manufacturing apparatus
GB0307745D0 (en) * 2003-04-03 2003-05-07 Microemissive Displays Ltd Method and apparatus for depositing material on a substrate
KR100671673B1 (ko) * 2005-03-09 2007-01-19 삼성에스디아이 주식회사 다중 진공증착장치 및 제어방법
WO2007012342A1 (de) * 2005-07-27 2007-02-01 Applied Materials Gmbh & Co. Kg Vorrichtung zum einspannen und positionieren eines verdampferschiffchens
CN100516284C (zh) * 2006-01-21 2009-07-22 鸿富锦精密工业（深圳）有限公司 蒸镀装置
KR20080007820A (ko) * 2006-07-18 2008-01-23 세메스 주식회사 박막 증착용 회전 증착원 및 이를 이용하는 박막 증착 장치
EP2113584A1 (de) 2008-04-28 2009-11-04 LightLab Sweden AB Verdampfungssystem
US8557045B2 (en) * 2008-08-26 2013-10-15 Colorado State University Research Foundation Apparatus and method for fabricating photovoltaic modules using heated pocket deposition in a vacuum
FR2957455B1 (fr) * 2010-03-09 2012-04-20 Essilor Int Enveloppe de protection pour canon a ions, dispositif de depot de materiaux par evaporation sous vide comprenant une telle enveloppe de protection et procede de depot de materiaux
US8480805B2 (en) * 2010-04-16 2013-07-09 Colorado State University Research Foundation System and method for sealing a vapor deposition source
TW201202454A (en) * 2010-07-07 2012-01-16 Hon Hai Prec Ind Co Ltd Processing apparatus for smoothing film material and evaporation deposition device with same
TW201204845A (en) * 2010-07-16 2012-02-01 Hon Hai Prec Ind Co Ltd Processing apparatus for smoothing film material and evaporation deposition device with same
CN102337502A (zh) * 2010-07-19 2012-02-01 鸿富锦精密工业（深圳）有限公司 膜料加工装置及具有该膜料加工装置的蒸镀设备
KR101671489B1 (ko) * 2010-07-29 2016-11-02 삼성디스플레이 주식회사 유기물 증발원 및 그를 포함하는 증착 장치
CN101942641B (zh) * 2010-09-08 2012-06-13 四川虹视显示技术有限公司 Oled蒸镀机的蒸发源装置
KR20120138305A (ko) * 2011-06-14 2012-12-26 삼성디스플레이 주식회사 유기 박막 증착 시스템 및 유기 박막 증착 방법
JPWO2013153604A1 (ja) * 2012-04-09 2015-12-17 株式会社シンクロン 電子銃装置
CN203373418U (zh) * 2012-04-09 2014-01-01 株式会社新柯隆 电子枪装置
WO2014006706A1 (ja) * 2012-07-04 2014-01-09 中外炉工業株式会社 蒸着装置
KR101438734B1 (ko) * 2013-11-08 2014-11-03 우경금속주식회사 회전식 열처리로
CN104789930B (zh) * 2015-04-24 2016-05-11 京东方科技集团股份有限公司 蒸镀设备及采用该蒸镀设备的操作方法
CN105018884B (zh) * 2015-07-30 2018-04-10 苏州方昇光电装备技术有限公司 一种小型真空蒸镀仪
TWI737718B (zh) * 2016-04-25 2021-09-01 美商創新先進材料股份有限公司 含有瀉流源的沉積系統及相關方法
CN107326329A (zh) * 2017-08-31 2017-11-07 京东方科技集团股份有限公司 蒸发源和蒸镀装置
CN107604315B (zh) * 2017-09-21 2023-10-27 京东方科技集团股份有限公司 一种密闭式坩埚和使用该坩埚的蒸镀方法
CN108704687A (zh) * 2018-05-03 2018-10-26 宁波大学 一种圆形玻璃纤维滤膜层叠堆放式烘烧皿
EP3887562A4 (de) * 2018-11-30 2022-08-24 Ferrotec (USA) Corporation Tiegeldeckel zur beschichtung mit einer elektronenstrahlquelle
USD939461S1 (en) 2018-11-30 2021-12-28 Ferrotec (Usa) Corporation Two-piece crucible cover for coating with an electron beam source
USD909439S1 (en) 2018-11-30 2021-02-02 Ferrotec (Usa) Corporation Two-piece crucible cover
DE102019102587B4 (de) * 2019-02-01 2023-02-23 Semikron Elektronik Gmbh & Co. Kg Drehbare Verdampfungsmaterialaufnahmeeinrichtung und Vorrichtung hiermit zur Beschichtung von Halbleiter- oder sonstigen Oberflächen
USD973734S1 (en) * 2019-08-06 2022-12-27 Nxl Technologies Inc. Blind shear
EP3840012A1 (de) * 2019-12-20 2021-06-23 Essilor International Optimierte tiegelanordnung und verfahren zur physikalischen dampfabscheidung
WO2022221038A1 (en) * 2021-04-15 2022-10-20 Applied Materials, Inc. Evaporation source cooling mechanism
CN113564536B (zh) * 2021-06-11 2022-08-26 北京航空航天大学 一种实现自动蒸发陶瓷靶材制备双层陶瓷层的装置
CN116770234B (zh) * 2023-06-25 2023-12-15 苏州佑伦真空设备科技有限公司 一种防止串料的坩埚装置
JP7421002B1 (ja) 2023-07-07 2024-01-23 株式会社アルバック 電子ビーム式蒸着ユニット

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2482329A (en) 1946-05-27 1949-09-20 Rca Corp Apparatus for selective vapor coating
US2853402A (en) * 1954-08-06 1958-09-23 Jr Marsden S Blois Magnetic element and method for producing the same
US4108107A (en) 1976-04-01 1978-08-22 Airco, Inc. Rotatable substrate holder for use in vacuum
DE2917841A1 (de) * 1979-05-03 1980-11-13 Leybold Heraeus Gmbh & Co Kg Verdampfer fuer vakuumaufdampfanlagen
DE3316554C1 (de) 1983-05-06 1984-07-12 Dr. Johannes Heidenhain Gmbh, 8225 Traunreut Verdampfervorrichtung mit Strahlheizung zum Aufdampfen mehrerer Materialien
CH663037A5 (de) 1985-02-05 1987-11-13 Balzers Hochvakuum Dampfquelle fuer vakuumbeschichtungsanlagen.
US4866239A (en) * 1988-05-31 1989-09-12 The Boc Group, Inc. Vapor source assembly with crucible
DE59002513D1 (de) 1989-02-09 1993-10-07 Balzers Hochvakuum Tiegelabdeckung für Beschichtungsanlagen mit einer Elektronenstrahlquelle.
US4983806A (en) * 1990-03-01 1991-01-08 Harper James L Method and device for cooling electron beam gun
JP2913745B2 (ja) 1990-04-10 1999-06-28 松下電器産業株式会社 真空蒸着装置
US5473627A (en) 1992-11-05 1995-12-05 Mdc Vacuum Products Corporation UHV rotating fluid delivery system
US5338913A (en) 1992-12-28 1994-08-16 Tfi Telemark Electron beam gun with liquid cooled rotatable crucible
US5792521A (en) 1996-04-18 1998-08-11 General Electric Company Method for forming a multilayer thermal barrier coating
US6012413A (en) * 1998-03-10 2000-01-11 Mdc Vacuum Products Corp. Electron beam source for use with varying sizes of crucibles
US6342103B1 (en) 2000-06-01 2002-01-29 The Boc Group, Inc. Multiple pocket electron beam source
US20030019849A1 (en) 2001-07-16 2003-01-30 Cameron Daniel Barton Electron beam gun with water cooled interlocking crucible cover

Also Published As

Publication number Publication date
US20020040682A1 (en) 2002-04-11
EP1967607A1 (de) 2008-09-10
US6902625B2 (en) 2005-06-07
JP2002038256A (ja) 2002-02-06
EP1160351A2 (de) 2001-12-05
EP1160351A3 (de) 2004-01-28
ATE409245T1 (de) 2008-10-15
US6342103B1 (en) 2002-01-29
EP1160351B1 (de) 2008-09-24
DK1160351T3 (da) 2009-01-19
JP4845286B2 (ja) 2011-12-28

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: FERROTEC (USA) CORP. (N.D. GES. D. STAATES MAS, US

8328 Change in the person/name/address of the agent

Representative=s name: WUESTHOFF & WUESTHOFF PATENT- UND RECHTSANWAELTE,