DE69913575D1 - Material zur Gasphasenabscheidung - Google Patents

Material zur Gasphasenabscheidung

Info

Publication number
DE69913575D1
DE69913575D1 DE69913575T DE69913575T DE69913575D1 DE 69913575 D1 DE69913575 D1 DE 69913575D1 DE 69913575 T DE69913575 T DE 69913575T DE 69913575 T DE69913575 T DE 69913575T DE 69913575 D1 DE69913575 D1 DE 69913575D1
Authority
DE
Germany
Prior art keywords
vapor deposition
deposition material
vapor
deposition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69913575T
Other languages
English (en)
Other versions
DE69913575T2 (de
Inventor
Satoshi Kondou
Yoshitaka Kubota
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tosoh Corp
Original Assignee
Tosoh Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tosoh Corp filed Critical Tosoh Corp
Application granted granted Critical
Publication of DE69913575D1 publication Critical patent/DE69913575D1/de
Publication of DE69913575T2 publication Critical patent/DE69913575T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/083—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/48—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zirconium or hafnium oxides, zirconates, zircon or hafnates
    • C04B35/486—Fine ceramics
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/62222—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products obtaining ceramic coatings
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02T—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
    • Y02T50/00—Aeronautics or air transport
    • Y02T50/60—Efficient propulsion technologies, e.g. for aircraft
DE69913575T 1998-01-23 1999-01-22 Material zur Gasphasenabscheidung Expired - Fee Related DE69913575T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP1105398 1998-01-23
JP01105398A JP4253855B2 (ja) 1998-01-23 1998-01-23 蒸着材

Publications (2)

Publication Number Publication Date
DE69913575D1 true DE69913575D1 (de) 2004-01-29
DE69913575T2 DE69913575T2 (de) 2004-10-14

Family

ID=11767291

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69913575T Expired - Fee Related DE69913575T2 (de) 1998-01-23 1999-01-22 Material zur Gasphasenabscheidung

Country Status (4)

Country Link
US (1) US6143437A (de)
EP (1) EP0931852B1 (de)
JP (1) JP4253855B2 (de)
DE (1) DE69913575T2 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003097895A1 (fr) * 2002-05-20 2003-11-27 Mitsubishi Materials Corporation Materiau soumis a l'evaporation sous vide, materiau mgo soumis a l'evaporation sous vide, procede de fabrication correspondant et procede de formation de films
FR2860790B1 (fr) 2003-10-09 2006-07-28 Snecma Moteurs Cible destinee a etre evaporee sous faisceau d'electrons, son procede de fabrication, barriere thermique et revetement obtenus a partir d'une cible, et piece mecanique comportant un tel revetement
JP5365487B2 (ja) * 2008-12-11 2013-12-11 東ソー株式会社 表面が平滑なセラミックビーズおよびその製造方法
ES2749354T3 (es) 2009-09-25 2020-03-19 Oerlikon Surface Solutions Ag Pfaeffikon Procedimiento para la preparación de capas de óxido de zirconio cúbicas
JP5287669B2 (ja) * 2009-11-04 2013-09-11 住友金属鉱山株式会社 真空蒸着法用酸化亜鉛系酸化物ペレットの製造方法
EP3184663B1 (de) * 2015-12-23 2020-04-15 Materion Advanced Materials Germany GmbH Zirkonoxidbasiertes sputter-target
CN114315348B (zh) * 2021-12-22 2023-06-30 西南科技大学 一种全稳定四方ysz靶材及超长寿命eb-pvd涂层的制备方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4302167C1 (de) * 1993-01-27 1994-02-10 Degussa Target aus Zirkoniumdioxid und Verfahren zu seiner Herstellung
JP2607039B2 (ja) * 1993-06-28 1997-05-07 品川白煉瓦株式会社 耐熱被覆用蒸着材及びその製造方法
DE69700448T2 (de) * 1996-06-13 2000-01-13 Tosoh Corp Material zur Gasphasenabscheidung

Also Published As

Publication number Publication date
US6143437A (en) 2000-11-07
DE69913575T2 (de) 2004-10-14
JP4253855B2 (ja) 2009-04-15
JPH11209175A (ja) 1999-08-03
EP0931852B1 (de) 2003-12-17
EP0931852A1 (de) 1999-07-28

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee