DE60129818D1 - Strahlungsdetektor und verfahren zu seiner herstellung - Google Patents

Strahlungsdetektor und verfahren zu seiner herstellung

Info

Publication number
DE60129818D1
DE60129818D1 DE60129818T DE60129818T DE60129818D1 DE 60129818 D1 DE60129818 D1 DE 60129818D1 DE 60129818 T DE60129818 T DE 60129818T DE 60129818 T DE60129818 T DE 60129818T DE 60129818 D1 DE60129818 D1 DE 60129818D1
Authority
DE
Germany
Prior art keywords
production
radiation detector
detector
radiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60129818T
Other languages
English (en)
Other versions
DE60129818T2 (de
Inventor
Takuya Homme
Kazuhisa Miyaguchi
Toshio Takabayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hamamatsu Photonics KK
Original Assignee
Hamamatsu Photonics KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hamamatsu Photonics KK filed Critical Hamamatsu Photonics KK
Publication of DE60129818D1 publication Critical patent/DE60129818D1/de
Application granted granted Critical
Publication of DE60129818T2 publication Critical patent/DE60129818T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144—Devices controlled by radiation
    • H01L27/146—Imager structures
    • H01L27/14643—Photodiode arrays; MOS imagers
    • H01L27/14658—X-ray, gamma-ray or corpuscular radiation imagers
    • H01L27/14663—Indirect radiation imagers, e.g. using luminescent members
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144—Devices controlled by radiation
    • H01L27/146—Imager structures
    • H01L27/14601—Structural or functional details thereof
    • H01L27/14618—Containers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02—Bonding areas; Manufacturing methods related thereto
    • H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • H01L2224/0554—External layer
    • H01L2224/0555—Shape
    • H01L2224/05552—Shape in top view
    • H01L2224/05554—Shape in top view being square
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42—Wire connectors; Manufacturing methods related thereto
    • H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805—Shape
    • H01L2224/4809—Loop shape
    • H01L2224/48091—Arched
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42—Wire connectors; Manufacturing methods related thereto
    • H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481—Disposition
    • H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item

Landscapes

  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Measurement Of Radiation (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)
  • Light Receiving Elements (AREA)
DE60129818T 2000-05-19 2001-05-18 Strahlungsdetektor und verfahren zu seiner herstellung Expired - Lifetime DE60129818T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2000148308 2000-05-19
JP2000148308A JP4398065B2 (ja) 2000-05-19 2000-05-19 放射線検出器
PCT/JP2001/004174 WO2001088569A1 (fr) 2000-05-19 2001-05-18 Detecteur de rayonnement et fabrication de ce detecteur

Publications (2)

Publication Number Publication Date
DE60129818D1 true DE60129818D1 (de) 2007-09-20
DE60129818T2 DE60129818T2 (de) 2008-04-17

Family

ID=18654360

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60129818T Expired - Lifetime DE60129818T2 (de) 2000-05-19 2001-05-18 Strahlungsdetektor und verfahren zu seiner herstellung

Country Status (6)

Country Link
US (1) US6919569B2 (de)
EP (1) EP1300692B1 (de)
JP (1) JP4398065B2 (de)
AU (1) AU2001256778A1 (de)
DE (1) DE60129818T2 (de)
WO (1) WO2001088569A1 (de)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE60144280D1 (en) * 2000-05-19 2011-05-05 Hamamatsu Photonics Kk Lung
JP4907799B2 (ja) * 2001-08-24 2012-04-04 浜松ホトニクス株式会社 撮像装置
JP4391078B2 (ja) * 2002-11-28 2009-12-24 浜松ホトニクス株式会社 固体撮像装置及び放射線撮像装置
WO2004090928A1 (ja) * 2003-04-04 2004-10-21 Matsushita Electric Industrial Co. Ltd. プラズマディスプレイパネルの製造方法
JP4563042B2 (ja) * 2004-01-29 2010-10-13 浜松ホトニクス株式会社 放射線イメージセンサ
EP1853970B1 (de) * 2005-02-10 2012-04-11 Koninklijke Philips Electronics N.V. Tragbare röntgendetektorplatte mit stossdämpfung
FR2888043B1 (fr) 2005-07-01 2007-11-30 Atmel Grenoble Soc Par Actions Capteur d'image a galette de fibres optiques
US7972659B2 (en) 2008-03-14 2011-07-05 Ecosil Technologies Llc Method of applying silanes to metal in an oil bath containing a controlled amount of water
DE102008033759B4 (de) * 2008-07-18 2011-01-20 Siemens Aktiengesellschaft Szintillatorplatte
IL201765A (en) 2008-10-27 2013-06-27 Imaging Sciences Int Llc Device and method for detecting x-rays by sensor
US9492129B2 (en) * 2008-10-27 2016-11-15 Dental Imaging Technologies Corporation Triggering of intraoral X-ray sensor using pixel array sub-sampling
US8366318B2 (en) 2009-07-17 2013-02-05 Dental Imaging Technologies Corporation Intraoral X-ray sensor with embedded standard computer interface
JP5908668B2 (ja) * 2010-04-12 2016-04-26 富士フイルム株式会社 可搬型放射線撮影装置
JP5475574B2 (ja) * 2010-07-02 2014-04-16 富士フイルム株式会社 放射線検出素子、及び放射線画像撮影装置
JP5599681B2 (ja) * 2010-08-31 2014-10-01 富士フイルム株式会社 放射線画像撮影装置
US9018725B2 (en) * 2011-09-02 2015-04-28 Optiz, Inc. Stepped package for image sensor and method of making same
DE102011083420A1 (de) 2011-09-26 2013-03-28 Siemens Aktiengesellschaft Strahlungsdetektor
JP2013246078A (ja) * 2012-05-28 2013-12-09 Fujifilm Corp 放射線画像検出装置
US9496247B2 (en) 2013-08-26 2016-11-15 Optiz, Inc. Integrated camera module and method of making same
JP6259382B2 (ja) * 2014-09-22 2018-01-10 富士フイルム株式会社 電子カセッテ
DE102016214482A1 (de) * 2016-08-04 2018-02-08 Berthold Technologies Gmbh & Co. Kg Radiometrisches Messgerät
DE102018115952A1 (de) 2018-07-02 2020-01-02 Ebm-Papst St. Georgen Gmbh & Co. Kg Motoranordnung mit einem Spalttopf
KR102666048B1 (ko) * 2019-05-29 2024-05-13 엘지디스플레이 주식회사 디지털 엑스레이 검출기와 이를 포함하는 디지털 엑스레이 검출 장치 및 이의 제조 방법

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4132539A (en) * 1977-09-23 1979-01-02 Ppg Industries, Inc. Method of welding edges of glass sheets
JPS59122988A (ja) 1982-12-29 1984-07-16 Shimadzu Corp 放射線計測素子
DE3606152A1 (de) 1986-02-26 1987-08-27 Basf Ag Halterung fuer substratplatten auf traegerplatten
US5153438A (en) 1990-10-01 1992-10-06 General Electric Company Method of forming an x-ray imaging array and the array
US5187369A (en) 1990-10-01 1993-02-16 General Electric Company High sensitivity, high resolution, solid state x-ray imaging device with barrier layer
US5179284A (en) 1991-08-21 1993-01-12 General Electric Company Solid state radiation imager having a reflective and protective coating
US5132539A (en) * 1991-08-29 1992-07-21 General Electric Company Planar X-ray imager having a moisture-resistant sealing structure
JPH0560871A (ja) 1991-09-04 1993-03-12 Hamamatsu Photonics Kk 放射線検出素子
US5208460A (en) 1991-09-23 1993-05-04 General Electric Company Photodetector scintillator radiation imager having high efficiency light collection
DE69416460D1 (de) * 1993-07-01 1999-03-25 Gen Electric Anschmiegendes Aufbringen von einer dünnen Membrane auf eine unregelmässig geformte Oberfläche
JP2721476B2 (ja) 1993-07-07 1998-03-04 浜松ホトニクス株式会社 放射線検出素子及びその製造方法
KR100514547B1 (ko) 1997-02-14 2005-12-14 하마마츠 포토닉스 가부시키가이샤 방사선검출소자및그제조방법
US7019301B2 (en) 1997-02-14 2006-03-28 Hamamatsu Photonics K.K. Radiation detection device and method of making the same
CA2261663C (en) 1997-02-14 2001-08-28 Hamamatsu Photonics K.K. Radiation detection device and method of producing the same
JP3836208B2 (ja) 1997-04-09 2006-10-25 浜松ホトニクス株式会社 医療用小型ｘ線画像検出装置
JPH11282243A (ja) 1998-03-30 1999-10-15 Brother Ind Ltd 画像形成装置
US6172371B1 (en) 1998-06-15 2001-01-09 General Electric Company Robust cover plate for radiation imager
EP1382723B1 (de) 1998-06-18 2011-07-27 Hamamatsu Photonics K.K. Verfahren zur Abscheidung von organischen Filmen
WO1999066350A1 (fr) 1998-06-18 1999-12-23 Hamamatsu Photonics K.K. Panneau de scintillateur et capteur d'image radiologique
WO1999066346A1 (fr) 1998-06-18 1999-12-23 Hamamatsu Photonics K.K. Plaque de scintillateurs, capteur d'image radiologique et procede de fabrication
US6146489A (en) 1998-11-19 2000-11-14 General Electric Company Method and apparatus for depositing scintillator material on radiation imager
DE19853605A1 (de) 1998-11-20 2000-05-25 Philips Corp Intellectual Pty Verfahren und Anordnung zur Herstellung einer Leuchtschicht
JP2001015723A (ja) * 1999-06-30 2001-01-19 Canon Inc 放射線光変換装置、それを備える放射線撮像装置、放射線撮像システム及び放射線光変換装置の製造方法
US6414315B1 (en) 1999-10-04 2002-07-02 General Electric Company Radiation imaging with continuous polymer layer for scintillator
KR100747800B1 (ko) 2000-01-13 2007-08-08 하마마츠 포토닉스 가부시키가이샤 방사선 이미지 센서 및 신틸레이터 패널
DE60138090D1 (de) 2000-01-13 2009-05-07 Hamamatsu Photonics Kk Strahlungsbildsensor und szintillatorplatte
US20030221620A1 (en) * 2002-06-03 2003-12-04 Semiconductor Energy Laboratory Co., Ltd. Vapor deposition device

Also Published As

Publication number Publication date
EP1300692A1 (de) 2003-04-09
EP1300692B1 (de) 2007-08-08
AU2001256778A1 (en) 2001-11-26
EP1300692A4 (de) 2004-11-03
JP4398065B2 (ja) 2010-01-13
JP2001330675A (ja) 2001-11-30
US6919569B2 (en) 2005-07-19
US20030116714A1 (en) 2003-06-26
DE60129818T2 (de) 2008-04-17
WO2001088569A1 (fr) 2001-11-22

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition