DE60238703D1 - Photokatalysator und verfahren zu seiner herstellung - Google Patents

Photokatalysator und verfahren zu seiner herstellung

Info

Publication number
DE60238703D1
DE60238703D1 DE60238703T DE60238703T DE60238703D1 DE 60238703 D1 DE60238703 D1 DE 60238703D1 DE 60238703 T DE60238703 T DE 60238703T DE 60238703 T DE60238703 T DE 60238703T DE 60238703 D1 DE60238703 D1 DE 60238703D1
Authority
DE
Germany
Prior art keywords
production
photo catalyst
photo
catalyst
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60238703T
Other languages
English (en)
Inventor
Junji Hiraoka
Takahiro Doke
Hisato Haraga
Daisuke Noguchi
Yoshio Kawamata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shibaura Mechatronics Corp
Original Assignee
Shibaura Mechatronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shibaura Mechatronics Corp filed Critical Shibaura Mechatronics Corp
Application granted granted Critical
Publication of DE60238703D1 publication Critical patent/DE60238703D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J35/00—Catalysts, in general, characterised by their form or physical properties
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
    • B01J37/02—Impregnation, coating or precipitation
    • B01J37/0215—Coating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J20/00—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
    • B01J20/28—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof characterised by their form or physical properties
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J33/00—Protection of catalysts, e.g. by coating
    • B01J35/39—
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
    • B01J37/02—Impregnation, coating or precipitation
    • B01J37/024—Multiple impregnation or coating
    • B01J37/0244—Coatings comprising several layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
    • B01J37/34—Irradiation by, or application of, electric, magnetic or wave energy, e.g. ultrasonic waves ; Ionic sputtering; Flame or plasma spraying; Particle radiation
    • B01J37/341—Irradiation by, or application of, electric, magnetic or wave energy, e.g. ultrasonic waves ; Ionic sputtering; Flame or plasma spraying; Particle radiation making use of electric or magnetic fields, wave energy or particle radiation
    • B01J37/347—Ionic or cathodic spraying; Electric discharge
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G23/00—Compounds of titanium
    • C01G23/04—Oxides; Hydroxides
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G23/00—Compounds of titanium
    • C01G23/04—Oxides; Hydroxides
    • C01G23/047—Titanium dioxide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/083—Oxides of refractory metals or yttrium
    • B01J35/60—
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/70—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
    • C01P2002/72—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data by d-values or two theta-values, e.g. as X-ray diagram
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/70—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
    • C01P2002/74—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data by peak-intensities or a ratio thereof only
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/01—Particle morphology depicted by an image
    • C01P2004/03—Particle morphology depicted by an image obtained by SEM
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/01—Particle morphology depicted by an image
    • C01P2004/04—Particle morphology depicted by an image obtained by TEM, STEM, STM or AFM
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/80—Particles consisting of a mixture of two or more inorganic phases
    • C01P2004/82—Particles consisting of a mixture of two or more inorganic phases two phases having the same anion, e.g. both oxidic phases
    • C01P2004/84—Particles consisting of a mixture of two or more inorganic phases two phases having the same anion, e.g. both oxidic phases one phase coated with the other
    • C01P2004/86—Thin layer coatings, i.e. the coating thickness being less than 0.1 time the particle radius
DE60238703T 2001-09-28 2002-09-27 Photokatalysator und verfahren zu seiner herstellung Expired - Lifetime DE60238703D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2001303953 2001-09-28
PCT/JP2002/010007 WO2003028885A1 (fr) 2001-09-28 2002-09-27 Element photocatalyseur, procede et dispositif pour l'elaboration de cet element

Publications (1)

Publication Number Publication Date
DE60238703D1 true DE60238703D1 (de) 2011-02-03

Family

ID=19123954

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60238703T Expired - Lifetime DE60238703D1 (de) 2001-09-28 2002-09-27 Photokatalysator und verfahren zu seiner herstellung

Country Status (7)

Country Link
US (3) US7799731B2 (de)
EP (1) EP1442793B1 (de)
JP (1) JP4261353B2 (de)
KR (2) KR100882345B1 (de)
CN (1) CN1332763C (de)
DE (1) DE60238703D1 (de)
WO (1) WO2003028885A1 (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4261353B2 (ja) 2001-09-28 2009-04-30 芝浦メカトロニクス株式会社 光触媒体、光触媒体の製造方法及び光触媒体の製造装置
CN101695655B (zh) 2001-11-29 2012-11-21 芝浦机械电子装置股份有限公司 光催化剂的制造装置
JP4576619B2 (ja) * 2003-06-02 2010-11-10 独立行政法人 日本原子力研究開発機構 結晶配向した微結晶から成る二酸化チタン膜の作製方法
DE602005003228T2 (de) 2004-07-12 2008-08-28 Cardinal Cg Co., Eden Prairie Wartungsarme beschichtungen
ITPR20040059A1 (it) * 2004-08-06 2004-11-06 Vacuum Surtec Srl Procedimento per depositare strati sottili di biossido di titanio su superfici di supporto e manufatti realizzati mediante detto procedimento.
CA2648686C (en) 2006-04-11 2016-08-09 Cardinal Cg Company Photocatalytic coatings having improved low-maintenance properties
US20080011599A1 (en) 2006-07-12 2008-01-17 Brabender Dennis M Sputtering apparatus including novel target mounting and/or control
US20080134420A1 (en) * 2006-12-07 2008-06-12 Edward Ho Led toilet seat cover
US7820309B2 (en) 2007-09-14 2010-10-26 Cardinal Cg Company Low-maintenance coatings, and methods for producing low-maintenance coatings
GB0803574D0 (en) * 2008-02-27 2008-04-02 Pilkington Group Ltd Coated glazing
CN102159317B (zh) * 2008-09-16 2014-04-16 株式会社东芝 亲水性薄膜以及使用该亲水性薄膜的构件和结构物
FR2948037B1 (fr) * 2009-07-17 2012-12-28 Saint Gobain Materiau photocatalytique
KR20120029872A (ko) * 2010-09-17 2012-03-27 (주)엘지하우시스 표면 모폴로지 처리를 통한 코팅막의 친수성 개선 방법 및 이를 이용하여 제조한 초친수 유리 코팅층
JP6015668B2 (ja) * 2011-12-06 2016-10-26 日東紡績株式会社 長繊維強化熱可塑性樹脂プリフォーム及びそれを用いる繊維強化樹脂成形体の製造方法
KR20160056017A (ko) * 2014-11-11 2016-05-19 고려대학교 산학협력단 항균 구조물의 제조 방법
CN108367273A (zh) * 2015-11-16 2018-08-03 沙特基础工业全球技术公司 具有等离子体效应优化的等离子体金属层的多层水裂解光催化剂
EP3541762B1 (de) 2016-11-17 2022-03-02 Cardinal CG Company Statisch-dissipative beschichtungstechnologie

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69230493T2 (de) * 1991-04-04 2000-05-04 Seagate Technology Verfahren und vorrichtung zum sputtern mit hoher geschwindigkeit
JP3101537B2 (ja) 1995-05-10 2000-10-23 ワイケイケイ株式会社 防汚性建築材料及び外装建材ユニット
EP0870530B1 (de) * 1996-08-05 2005-01-19 Nippon Sheet Glass Co., Ltd. Photokatalysator und methode zu seiner herstellung
WO1998025761A1 (fr) 1996-12-09 1998-06-18 Nippon Sheet Glass Co., Ltd. Article anti-buee et son procede de production
JP3700358B2 (ja) 1996-12-18 2005-09-28 日本板硝子株式会社 防曇防汚ガラス物品
KR100291482B1 (ko) * 1997-06-24 2001-06-01 시부키 유키오 이산화티탄 결정배향막을 갖는 재료 및 그 제조방법
JP3783750B2 (ja) * 1997-07-14 2006-06-07 株式会社ブリヂストン スパッタ膜の作製方法
JP3791152B2 (ja) * 1997-07-23 2006-06-28 東芝ライテック株式会社 光触媒体、光触媒体の製造方法、消臭装置および照明器具
JPH1179788A (ja) 1997-08-29 1999-03-23 Central Glass Co Ltd 被膜形成ガラスおよびその製法
JP3469456B2 (ja) * 1998-02-20 2003-11-25 東光株式会社 スイッチング素子の駆動回路
US6905578B1 (en) * 1998-04-27 2005-06-14 Cvc Products, Inc. Apparatus and method for multi-target physical-vapor deposition of a multi-layer material structure
JP3904355B2 (ja) * 1998-12-03 2007-04-11 日本板硝子株式会社 親水性光触媒部材
JP2001098187A (ja) * 1999-05-21 2001-04-10 Toto Ltd 光触媒性親水性コーティング組成物、及び光触媒性親水性部材の製造方法
JP2001046882A (ja) * 1999-08-05 2001-02-20 Nippon Sheet Glass Co Ltd 酸化チタンの光触媒膜の被覆方法
JP3622585B2 (ja) 1999-08-05 2005-02-23 日本板硝子株式会社 光触媒活性を有する物品
JP2001051107A (ja) * 1999-08-09 2001-02-23 Toto Ltd 浴室用防曇鏡及び浴室設備並びに浴室
JP2001129474A (ja) * 1999-11-02 2001-05-15 Tsutomu Minami 膨らみパターンの形成方法および当該パターンを有する基体
JP2001149790A (ja) * 1999-11-25 2001-06-05 Kobe Steel Ltd 光触媒性に優れた被覆材料およびその製造方法
JP2001262335A (ja) * 2000-03-21 2001-09-26 Nippon Sheet Glass Co Ltd 被膜の被覆方法
JP2001335343A (ja) * 2000-05-23 2001-12-04 Central Glass Co Ltd 光触媒膜付きガラスおよびその製造方法
NZ521736A (en) 2000-06-30 2004-07-30 S Improvements to the bittering of beer
FR2814094B1 (fr) 2000-09-20 2003-08-15 Saint Gobain Substrat a revetement photocatalytique et son procede de fabrication
JP2002256416A (ja) * 2001-03-01 2002-09-11 Andes Denki Kk 光触媒薄膜材料およびその応用品
JP4261353B2 (ja) 2001-09-28 2009-04-30 芝浦メカトロニクス株式会社 光触媒体、光触媒体の製造方法及び光触媒体の製造装置
CN101695655B (zh) 2001-11-29 2012-11-21 芝浦机械电子装置股份有限公司 光催化剂的制造装置

Also Published As

Publication number Publication date
CN1578701A (zh) 2005-02-09
US7799731B2 (en) 2010-09-21
WO2003028885A1 (fr) 2003-04-10
KR20080102321A (ko) 2008-11-24
US20100206723A1 (en) 2010-08-19
EP1442793B1 (de) 2010-12-22
KR100882345B1 (ko) 2009-02-12
CN1332763C (zh) 2007-08-22
EP1442793A4 (de) 2007-04-25
US8022011B2 (en) 2011-09-20
JP4261353B2 (ja) 2009-04-30
JPWO2003028885A1 (ja) 2005-01-13
KR20040047873A (ko) 2004-06-05
US20100210447A1 (en) 2010-08-19
KR100948542B1 (ko) 2010-03-18
US20040248725A1 (en) 2004-12-09
EP1442793A1 (de) 2004-08-04

Similar Documents

Publication Publication Date Title
DE50214717D1 (de) Und verfahren zu seiner herstellung
DE60233058D1 (de) Silsesquioxanderivate und verfahren zu ihrer herstellung
DE60115902D1 (de) Osteoimplantat und verfahren zu seiner herstellung
DE60027698D1 (de) Lasttragendes osteoimplantat und verfahren zu seiner herstellung
ATA10852001A (de) Bauelement und verfahren zu seiner herstellung
DE60023023D1 (de) Zirkoniumdioxidsol und verfahren zu seiner herstellung
DE50209103D1 (de) Filterverbund und verfahren zu seiner herstellung
DE60231548D1 (de) N; formkörper und verfahren zu ihrer herstellung
DE50213224D1 (de) Induktives bauelement und verfahren zu seiner herstellung
DE50103010D1 (de) Induktives bauelement und verfahren zu seiner herstellung
DE60013027D1 (de) Bauteil und Verfahren zu seiner Herstellung
DE60215922D1 (de) Filterelement, verfahren zu seiner herstellung und das element verwendender filter
ATE376098T1 (de) Vernetzte pulpe und verfahren zu deren herstellung
DE60116486D1 (de) Gallengangstent und verfahren zu seiner herstellung
DE60208523D1 (de) Spulenbauteil und verfahren zu seiner herstellung
DE50209101D1 (de) Hitzebeständige filterlage, filterkörper und verfahren zu seiner herstellung
DE60238703D1 (de) Photokatalysator und verfahren zu seiner herstellung
DE60113459D1 (de) Spulenfilter und verfahren zu seiner herstellung
DE60111904D1 (de) Biosensor und verfahren zu dessen herstellung
DE60234678D1 (de) Leiterplatte und verfahren zu ihrer herstellung
DE60224880D1 (de) Mikrobolometer und verfahren zu dessen herstellung
DE60226677D1 (de) Saw-einrichtung und verfahren zu ihrer herstellung
DE60227159D1 (de) Element mit trennungsstruktur und verfahren zu seiner herstellung
DE60235706D1 (de) Photochrome bis-naphtopyranverbindungen und verfahren zu deren herstellung
DE60226707D1 (de) Kunsthaare und verfahren zu deren herstellung