ITPR20040059A1 - Procedimento per depositare strati sottili di biossido di titanio su superfici di supporto e manufatti realizzati mediante detto procedimento. - Google Patents
Procedimento per depositare strati sottili di biossido di titanio su superfici di supporto e manufatti realizzati mediante detto procedimento.Info
- Publication number
- ITPR20040059A1 ITPR20040059A1 ITPR20040059A ITPR20040059A1 IT PR20040059 A1 ITPR20040059 A1 IT PR20040059A1 IT PR20040059 A ITPR20040059 A IT PR20040059A IT PR20040059 A1 ITPR20040059 A1 IT PR20040059A1
- Authority
- IT
- Italy
- Prior art keywords
- procedure
- manufactures
- realized
- titanium dioxide
- support surfaces
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
- C23C14/0073—Reactive sputtering by exposing the substrates to reactive gases intermittently
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
- C23C14/0047—Activation or excitation of reactive gases outside the coating chamber
- C23C14/0052—Bombardment of substrates by reactive ion beams
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
- C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Catalysts (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
ITPR20040059 ITPR20040059A1 (it) | 2004-08-06 | 2004-08-06 | Procedimento per depositare strati sottili di biossido di titanio su superfici di supporto e manufatti realizzati mediante detto procedimento. |
EP05014446.8A EP1624087B1 (en) | 2004-08-06 | 2005-07-04 | A method for depositing thin layers of titanium dioxide on support surfaces |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
ITPR20040059 ITPR20040059A1 (it) | 2004-08-06 | 2004-08-06 | Procedimento per depositare strati sottili di biossido di titanio su superfici di supporto e manufatti realizzati mediante detto procedimento. |
Publications (1)
Publication Number | Publication Date |
---|---|
ITPR20040059A1 true ITPR20040059A1 (it) | 2004-11-06 |
Family
ID=35207561
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ITPR20040059 ITPR20040059A1 (it) | 2004-08-06 | 2004-08-06 | Procedimento per depositare strati sottili di biossido di titanio su superfici di supporto e manufatti realizzati mediante detto procedimento. |
Country Status (2)
Country | Link |
---|---|
EP (1) | EP1624087B1 (it) |
IT (1) | ITPR20040059A1 (it) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20090187253A1 (en) * | 2008-01-18 | 2009-07-23 | Sandvik Intellectual Property Ab | Method of making a coated medical bone implant and a medical bone implant made thereof |
DE102010023418A1 (de) * | 2010-06-11 | 2011-12-15 | Uhde Gmbh | Ein- oder mehrseitige Substratbeschichtung |
CN108455698B (zh) | 2017-02-22 | 2020-12-25 | 南方科技大学 | 光催化组件及其制备方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB9902993D0 (en) | 1999-02-11 | 1999-03-31 | Univ Strathclyde | Low pressure chemical vapour deposition of titanium dioxide |
JP2001262335A (ja) * | 2000-03-21 | 2001-09-26 | Nippon Sheet Glass Co Ltd | 被膜の被覆方法 |
EP1205243A1 (en) | 2000-11-09 | 2002-05-15 | Neomat S.A. | Preparation of firmly-anchored photocatalitically-active titanium dioxide coating films with non-gelled organic-doped precursors |
KR100948542B1 (ko) * | 2001-09-28 | 2010-03-18 | 시바우라 메카트로닉스 가부시끼가이샤 | 광촉매체, 광촉매체의 제조 방법 및 광촉매체의 제조 장치 |
-
2004
- 2004-08-06 IT ITPR20040059 patent/ITPR20040059A1/it unknown
-
2005
- 2005-07-04 EP EP05014446.8A patent/EP1624087B1/en not_active Not-in-force
Also Published As
Publication number | Publication date |
---|---|
EP1624087B1 (en) | 2014-05-14 |
EP1624087A1 (en) | 2006-02-08 |
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