DE60126254D1 - Vorrichtung zur wafervorbereitung - Google Patents

Vorrichtung zur wafervorbereitung

Info

Publication number
DE60126254D1
DE60126254D1 DE60126254T DE60126254T DE60126254D1 DE 60126254 D1 DE60126254 D1 DE 60126254D1 DE 60126254 T DE60126254 T DE 60126254T DE 60126254 T DE60126254 T DE 60126254T DE 60126254 D1 DE60126254 D1 DE 60126254D1
Authority
DE
Germany
Prior art keywords
wafer
disposed
drive
wafer preparation
roller
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60126254T
Other languages
English (en)
Other versions
DE60126254T2 (de
Inventor
David Jones
T Frost
G Dewit
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Lam Research Corp
Original Assignee
Lam Research Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/540,097 external-priority patent/US6328640B1/en
Priority claimed from US09/540,975 external-priority patent/US6368192B1/en
Priority claimed from US09/540,160 external-priority patent/US6427566B1/en
Application filed by Lam Research Corp filed Critical Lam Research Corp
Application granted granted Critical
Publication of DE60126254D1 publication Critical patent/DE60126254D1/de
Publication of DE60126254T2 publication Critical patent/DE60126254T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67046—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly scrubbing means, e.g. brushes

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
DE60126254T 2000-03-31 2001-03-29 Vorrichtung zur wafervorbereitung Expired - Fee Related DE60126254T2 (de)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US540097 2000-03-31
US09/540,097 US6328640B1 (en) 2000-03-31 2000-03-31 Wafer preparation apparatus including rotatable wafer preparation assemblies
US09/540,975 US6368192B1 (en) 2000-03-31 2000-03-31 Wafer preparation apparatus including variable height wafer drive assembly
US540160 2000-03-31
US09/540,160 US6427566B1 (en) 2000-03-31 2000-03-31 Self-aligning cylindrical mandrel assembly and wafer preparation apparatus including the same
US540975 2000-03-31
PCT/US2001/010439 WO2001075942A1 (en) 2000-03-31 2001-03-29 Wafer preparation apparatus

Publications (2)

Publication Number Publication Date
DE60126254D1 true DE60126254D1 (de) 2007-03-15
DE60126254T2 DE60126254T2 (de) 2007-10-25

Family

ID=27415315

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60126254T Expired - Fee Related DE60126254T2 (de) 2000-03-31 2001-03-29 Vorrichtung zur wafervorbereitung

Country Status (9)

Country Link
EP (1) EP1269522B1 (de)
JP (1) JP4846165B2 (de)
KR (1) KR100770186B1 (de)
CN (1) CN1225769C (de)
AT (1) ATE352865T1 (de)
AU (1) AU2001251178A1 (de)
DE (1) DE60126254T2 (de)
TW (1) TW492119B (de)
WO (1) WO2001075942A1 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100796553B1 (ko) * 2006-06-29 2008-01-21 두산메카텍 주식회사 웨이퍼 표면연마장비의 세정 브러쉬 승하강장치
US7962990B2 (en) * 2008-10-01 2011-06-21 Applied Materials, Inc. Brush box cleaner module with force control
US8458843B2 (en) * 2009-10-22 2013-06-11 Applied Materials, Inc. Apparatus and methods for brush and pad conditioning
TWI393204B (zh) * 2009-11-27 2013-04-11 Au Optronics Corp 製程機台
US9230846B2 (en) * 2010-06-07 2016-01-05 Veeco Instruments, Inc. Multi-wafer rotating disc reactor with inertial planetary drive
CN102074455B (zh) * 2010-09-03 2012-11-14 清华大学 用于晶圆的刷洗装置
CN103008301B (zh) * 2013-01-11 2016-01-20 常州市科沛达超声工程设备有限公司 晶圆片双面刷洗机
US10229842B2 (en) * 2013-07-26 2019-03-12 Applied Materials, Inc. Double sided buff module for post CMP cleaning
CN107931179B (zh) * 2017-11-15 2020-10-02 宜都同创光电科技有限公司 一种光学玻璃镜片洗前半自动擦油机

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4208760A (en) * 1977-12-19 1980-06-24 Huestis Machine Corp. Apparatus and method for cleaning wafers
US5317778A (en) * 1991-07-31 1994-06-07 Shin-Etsu Handotai Co., Ltd. Automatic cleaning apparatus for wafers
JP3044277B2 (ja) * 1994-12-21 2000-05-22 信越半導体株式会社 ウェーハの洗浄及び洗浄乾燥装置
JP3278590B2 (ja) * 1996-08-23 2002-04-30 株式会社東芝 超音波洗浄装置及び超音波洗浄方法
US5924154A (en) * 1996-08-29 1999-07-20 Ontrak Systems, Inc. Brush assembly apparatus
US5933902A (en) * 1997-11-18 1999-08-10 Frey; Bernhard M. Wafer cleaning system
JPH11288911A (ja) * 1997-12-01 1999-10-19 Mitsubishi Materials Corp 半導体ウェーハ洗浄装置及び半導体ウェーハの製造方法
US6070284A (en) * 1998-02-04 2000-06-06 Silikinetic Technology, Inc. Wafer cleaning method and system
JP4007677B2 (ja) * 1998-04-22 2007-11-14 信越半導体株式会社 ブラシ洗浄装置及びワーク洗浄システム

Also Published As

Publication number Publication date
WO2001075942A1 (en) 2001-10-11
JP4846165B2 (ja) 2011-12-28
DE60126254T2 (de) 2007-10-25
CN1225769C (zh) 2005-11-02
ATE352865T1 (de) 2007-02-15
KR20020087438A (ko) 2002-11-22
CN1422438A (zh) 2003-06-04
TW492119B (en) 2002-06-21
AU2001251178A1 (en) 2001-10-15
KR100770186B1 (ko) 2007-10-25
JP2003529929A (ja) 2003-10-07
EP1269522A1 (de) 2003-01-02
EP1269522B1 (de) 2007-01-24

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee