DE60111961D1 - Dünnschichtwiderstand mit tantalpentoxid feuchtigkeitsbarriere - Google Patents

Dünnschichtwiderstand mit tantalpentoxid feuchtigkeitsbarriere

Info

Publication number
DE60111961D1
DE60111961D1 DE60111961T DE60111961T DE60111961D1 DE 60111961 D1 DE60111961 D1 DE 60111961D1 DE 60111961 T DE60111961 T DE 60111961T DE 60111961 T DE60111961 T DE 60111961T DE 60111961 D1 DE60111961 D1 DE 60111961D1
Authority
DE
Germany
Prior art keywords
layer
thin
pentoxide
tantal
film resistance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60111961T
Other languages
English (en)
Other versions
DE60111961T2 (de
Inventor
Stephen C Vincent
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Vishay Dale Electronics LLC
Original Assignee
Vishay Dale Electronics LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Vishay Dale Electronics LLC filed Critical Vishay Dale Electronics LLC
Publication of DE60111961D1 publication Critical patent/DE60111961D1/de
Application granted granted Critical
Publication of DE60111961T2 publication Critical patent/DE60111961T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
    • H01C17/075—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques
    • H01C17/12—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques by sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C7/00—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
    • H01C7/006—Thin film resistors
DE60111961T 2001-04-09 2001-04-12 Dünnschichtwiderstand mit tantalpentoxid feuchtigkeitsbarriere Expired - Fee Related DE60111961T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/829,169 US7214295B2 (en) 2001-04-09 2001-04-09 Method for tantalum pentoxide moisture barrier in film resistors
US829169 2001-04-09
PCT/US2001/012034 WO2002082474A1 (en) 2001-04-09 2001-04-12 Thin film resistor having tantalum pentoxide moisture barrier

Publications (2)

Publication Number Publication Date
DE60111961D1 true DE60111961D1 (de) 2005-08-18
DE60111961T2 DE60111961T2 (de) 2006-03-30

Family

ID=25253729

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60111961T Expired - Fee Related DE60111961T2 (de) 2001-04-09 2001-04-12 Dünnschichtwiderstand mit tantalpentoxid feuchtigkeitsbarriere

Country Status (6)

Country Link
US (2) US7214295B2 (de)
EP (1) EP1377990B1 (de)
JP (1) JP3863491B2 (de)
AT (1) ATE299614T1 (de)
DE (1) DE60111961T2 (de)
WO (1) WO2002082474A1 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7271700B2 (en) * 2005-02-16 2007-09-18 International Business Machines Corporation Thin film resistor with current density enhancing layer (CDEL)
JP6209220B2 (ja) * 2012-11-16 2017-10-04 ニヴァロックス−ファー ソシエテ アノニム 気候変動に対する感受性が低減された共振器
FR3002386A1 (fr) * 2013-02-18 2014-08-22 Pierre Emile Jean Marie Pinsseau Amplificateur a distorsions residuelles
CN105980832B (zh) * 2013-12-10 2019-08-16 伊鲁米那股份有限公司 用于生物或化学分析的生物传感器及其制造方法
US9508474B2 (en) * 2015-01-15 2016-11-29 Shih-Long Wei Method for manufacturing anticorrosive thin film resistor and structure thereof
TW202136550A (zh) * 2020-03-25 2021-10-01 光頡科技股份有限公司 薄膜電阻層製備方法
DE102021121240A1 (de) * 2021-08-16 2023-02-16 Vishay Electronic Gmbh Elektrisches Widerstandsbauelement

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DE2215151C3 (de) 1972-03-28 1979-05-23 Siemens Ag, 1000 Berlin Und 8000 Muenchen Verfahren zum Herstellen von dünnen Schichten aus Tantal
US4005050A (en) 1972-04-19 1977-01-25 Champion Spark Plug Company Tantalum or niobium-modified resistor element
US3896284A (en) * 1972-06-12 1975-07-22 Microsystems Int Ltd Thin-film microelectronic resistors
JPS523196A (en) 1975-06-26 1977-01-11 Oki Electric Ind Co Ltd Method of manufacturing a thin film device
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US4002542A (en) * 1976-02-09 1977-01-11 Corning Glass Works Thin film capacitor and method
JPS5375472A (en) 1976-12-17 1978-07-04 Hitachi Ltd Method of producing thin film resistive ic
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JPS5923404B2 (ja) 1978-10-09 1984-06-01 株式会社徳田製作所 耐蝕性透明導電膜形成方法
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JPS5926277A (ja) * 1982-08-04 1984-02-10 Ricoh Co Ltd サ−マルヘツドの製造方法
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US4949065A (en) 1987-09-21 1990-08-14 Matsushita Electric Industrial Co., Ltd. Resistor composition, resistor produced therefrom, and method of producing resistor
JPH01291401A (ja) 1988-05-19 1989-11-24 Fuji Elelctrochem Co Ltd 薄膜抵抗体及びその製造方法
US4952904A (en) 1988-12-23 1990-08-28 Honeywell Inc. Adhesion layer for platinum based sensors
US5077564A (en) * 1990-01-26 1991-12-31 Dynamics Research Corporation Arcuate edge thermal print head
US5317341A (en) * 1991-01-24 1994-05-31 Rohm Co., Ltd. Thermal head and method of making the same
US5076906A (en) * 1991-01-31 1991-12-31 Raytheon Company Method for testing encapsulation integrity
JPH07153603A (ja) 1993-11-26 1995-06-16 Hitachi Koki Co Ltd インクジェット用発熱抵抗体の製造方法及びインクジェットプリンタ
JP2844051B2 (ja) * 1994-10-31 1999-01-06 セイコーインスツルメンツ株式会社 サーマルヘッド
JP3494747B2 (ja) 1995-03-31 2004-02-09 石塚電子株式会社 薄膜温度センサ及びその製造方法
TW424245B (en) * 1998-01-08 2001-03-01 Matsushita Electric Ind Co Ltd Resistor and its manufacturing method
EP0973020B1 (de) 1998-07-16 2009-06-03 EPIQ Sensor-Nite N.V. Elektrischer Temperatur-Sensor mit Mehrfachschicht
EP1133755B1 (de) 1999-09-27 2015-08-26 Civolution B.V. Wasserzeichenerkennung
DE19961683A1 (de) * 1999-12-21 2001-06-28 Philips Corp Intellectual Pty Bauteil mit Dünnschichtschaltkreis
JP2001316611A (ja) 2000-05-11 2001-11-16 Daikin Ind Ltd フッ素ゴム塗料組成物

Also Published As

Publication number Publication date
EP1377990B1 (de) 2005-07-13
US20020145503A1 (en) 2002-10-10
JP2004535059A (ja) 2004-11-18
ATE299614T1 (de) 2005-07-15
US20020145504A1 (en) 2002-10-10
WO2002082474A1 (en) 2002-10-17
JP3863491B2 (ja) 2006-12-27
US7170389B2 (en) 2007-01-30
EP1377990A1 (de) 2004-01-07
DE60111961T2 (de) 2006-03-30
US7214295B2 (en) 2007-05-08

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee