DE60042994D1 - Verfahren zur Reinigung von photovoltaischen Modulen und Reinigungsvorrichtung - Google Patents

Verfahren zur Reinigung von photovoltaischen Modulen und Reinigungsvorrichtung

Info

Publication number
DE60042994D1
DE60042994D1 DE60042994T DE60042994T DE60042994D1 DE 60042994 D1 DE60042994 D1 DE 60042994D1 DE 60042994 T DE60042994 T DE 60042994T DE 60042994 T DE60042994 T DE 60042994T DE 60042994 D1 DE60042994 D1 DE 60042994D1
Authority
DE
Germany
Prior art keywords
cleaning
photovoltaic modules
cleaning device
cleaning photovoltaic
modules
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60042994T
Other languages
English (en)
Inventor
Masafumi Hiraishi
Masataka Kondo
Hideo Yamagishi
Katsuhiko Hayashi
Toshihide Okatsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kaneka Corp
Original Assignee
Kaneka Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP11215178A external-priority patent/JP2001044467A/ja
Priority claimed from JP11215177A external-priority patent/JP2001044466A/ja
Application filed by Kaneka Corp filed Critical Kaneka Corp
Application granted granted Critical
Publication of DE60042994D1 publication Critical patent/DE60042994D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67046—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly scrubbing means, e.g. brushes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
    • H01L31/042—PV modules or arrays of single PV cells
    • H01L31/0445—PV modules or arrays of single PV cells including thin film solar cells, e.g. single thin film a-Si, CIS or CdTe solar cells
    • H01L31/046—PV modules composed of a plurality of thin film solar cells deposited on the same substrate
    • H01L31/0463—PV modules composed of a plurality of thin film solar cells deposited on the same substrate characterised by special patterning methods to connect the PV cells in a module, e.g. laser cutting of the conductive or active layers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S134/00—Cleaning and liquid contact with solids
    • Y10S134/902—Semiconductor wafer

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Sustainable Energy (AREA)
  • Electromagnetism (AREA)
  • Photovoltaic Devices (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning In General (AREA)
DE60042994T 1999-07-29 2000-03-22 Verfahren zur Reinigung von photovoltaischen Modulen und Reinigungsvorrichtung Expired - Lifetime DE60042994D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP11215178A JP2001044467A (ja) 1999-07-29 1999-07-29 集積型薄膜太陽電池の洗浄装置
JP11215177A JP2001044466A (ja) 1999-07-29 1999-07-29 集積型薄膜太陽電池の洗浄方法及びその装置

Publications (1)

Publication Number Publication Date
DE60042994D1 true DE60042994D1 (de) 2009-11-05

Family

ID=26520718

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60042994T Expired - Lifetime DE60042994D1 (de) 1999-07-29 2000-03-22 Verfahren zur Reinigung von photovoltaischen Modulen und Reinigungsvorrichtung

Country Status (4)

Country Link
US (1) US6506260B1 (de)
EP (2) EP2141735B1 (de)
AU (1) AU772539B2 (de)
DE (1) DE60042994D1 (de)

Families Citing this family (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE60044762D1 (de) * 1999-05-20 2010-09-16 Kaneka Corp Verfahren und Vorrichtung zur Herstellung eines Halbleiterbauelements
DE19934300C2 (de) * 1999-07-21 2002-02-07 Steag Micro Tech Gmbh Vorrichtung zum Behandeln von Substraten
US7147721B2 (en) * 2002-12-30 2006-12-12 Asm Assembly Automation Ltd. Apparatus and method for cleaning electronic packages
KR100582202B1 (ko) * 2003-10-13 2006-05-23 엘지.필립스 엘시디 주식회사 박막트랜지스터 어레이 기판의 제조장치 및 방법
CN101015037B (zh) * 2004-03-22 2010-04-21 里纳特种机械有限责任公司 处理衬底表面的方法
DE102005049005B4 (de) * 2005-10-11 2017-02-16 Vanguard Ag Einrichtung zur Reinigung von medizinischen Instrumenten mittels Ultraschall
DE102005057109A1 (de) * 2005-11-26 2007-05-31 Kunze-Concewitz, Horst, Dipl.-Phys. Vorrichtung und Verfahren für mechanisches Prozessieren flacher, dünner Substrate im Durchlaufverfahren
TW200738532A (en) * 2006-04-10 2007-10-16 Chicony Electronic Co Ltd Material delivery system capable of preventing dust suspension
JP2008066437A (ja) * 2006-09-06 2008-03-21 Mitsubishi Heavy Ind Ltd 太陽電池パネルの製造方法
KR20090117881A (ko) * 2007-01-30 2009-11-13 솔라스타, 인코포레이티드 광전지 및 광전지를 제조하는 방법
JP2010518623A (ja) * 2007-02-12 2010-05-27 ソーラスタ インコーポレイテッド ホットキャリアクーリングが低減された光電池
GB2449309A (en) * 2007-05-18 2008-11-19 Renewable Energy Corp Asa A method for exposing a solar cell wafer to a liquid
WO2009005805A2 (en) * 2007-07-03 2009-01-08 Solasta, Inc. Distributed coax photovoltaic device
DE102007040851A1 (de) * 2007-08-29 2009-03-05 Wacker Chemie Ag Verfahren zum Reinigen von polykristallinem Silicium
JP2009206279A (ja) * 2008-02-27 2009-09-10 Sharp Corp 薄膜太陽電池およびその製造方法
CN101610641B (zh) * 2008-06-19 2011-06-29 富葵精密组件(深圳)有限公司 湿处理系统及湿处理方法
DE102008034505B4 (de) * 2008-07-24 2013-04-18 Stangl Semiconductor Equipment Ag Vorrichtungen und Verfahren zum Prozessieren und Handhaben von Prozessgut
JP5192946B2 (ja) 2008-09-04 2013-05-08 川崎重工業株式会社 太陽熱発電設備における集光装置のクリーニング装置
JP5377037B2 (ja) * 2009-04-07 2013-12-25 川崎重工業株式会社 薄膜太陽電池パネルの高圧液噴射洗浄装置
US8333843B2 (en) * 2009-04-16 2012-12-18 Applied Materials, Inc. Process to remove metal contamination on a glass substrate
WO2010126699A2 (en) 2009-04-29 2010-11-04 Hunter Douglas Industries B.V. Architectural panels with organic photovoltaic interlayers and methods of forming the same
DE102009022318A1 (de) * 2009-05-22 2010-12-23 Schott Solar Ag Verfahren zur Herstellung eines photovoltaischen Moduls
KR101125568B1 (ko) * 2009-12-14 2012-03-22 삼성모바일디스플레이주식회사 식각 장치
DE102011008862A1 (de) * 2010-09-04 2012-03-08 Maschinenbau Gerold Gmbh & Co. Kg Dünnschicht-Solarzelle sowie Anlage zur Herstellung von Dünnschicht-Solarzellen
TWI460305B (zh) * 2010-11-30 2014-11-11 Ind Tech Res Inst 化學水浴法鍍膜設備
CN102054903B (zh) * 2010-12-14 2012-03-28 浙江宝利特新能源股份有限公司 一种用于太阳能电池硅片清洗机上的自动换槽清洗装置
DE102012210618A1 (de) 2012-01-26 2013-08-01 Singulus Stangl Solar Gmbh Vorrichtung und Verfahren zum Behandeln von plattenförmigem Prozessgut
SG11201406646PA (en) * 2012-04-20 2014-11-27 Rensselaer Polytech Inst Light emitting diodes and a method of packaging the same
CN103551336A (zh) * 2013-11-12 2014-02-05 合肥京东方光电科技有限公司 一种清洗装置以及清洗方法
DE102014222737B4 (de) 2014-05-16 2021-06-10 Singulus Stangl Solar Gmbh Vorrichtung zum Behandeln der Unterseite und der Kanten eines Guts mit einer Flüssigkeit und Verfahren zum Herstellen eines auf einer Unterseite mit einer Flüssigkeit behandelten Guts
KR102423108B1 (ko) * 2015-06-11 2022-07-22 주성엔지니어링(주) 박막형 태양전지와 그의 제조방법
CN105855218A (zh) * 2016-06-02 2016-08-17 常州市金海珑机械制造有限公司 一种机械零配件的清洗烘干装置
CN106238411B (zh) * 2016-07-28 2018-07-31 深圳吉阳智云科技有限公司 一种可升降的清洗平台组件及其激光清洗设备
CN106141905B (zh) * 2016-08-22 2018-06-29 上海华力微电子有限公司 一种晶圆研磨头清洗装置及清洗方法
CN106972824B (zh) * 2017-04-20 2019-05-21 苏州协鑫新能源运营科技有限公司 一种分段清理型光伏部件除尘装置
CN107695031B (zh) * 2017-11-16 2021-01-05 张家港市科宇信超声有限公司 用于管型工件的超声波清洗机及超声波清洗方法
CN108449043A (zh) * 2018-02-09 2018-08-24 重庆恒佳工程技术咨询有限公司 一种道路桥梁工程光伏板自洁装置
CN108400771A (zh) * 2018-03-13 2018-08-14 江苏鼎阳绿能电力有限公司 一种具有辅助清洗光伏板功能的光伏支架
CN109848107A (zh) * 2018-12-26 2019-06-07 中芳特纤股份有限公司 一种基于超声波的ppta水洗机
CN111047219A (zh) * 2019-12-27 2020-04-21 新奥数能科技有限公司 一种光伏清洗的确定方法、装置、可读介质及电子设备
CN112427394A (zh) * 2020-10-19 2021-03-02 苏州殷绿勒精密机械科技有限公司 一种光伏硅片超声清洗设备
CN114289409A (zh) * 2021-11-29 2022-04-08 中国华能集团清洁能源技术研究院有限公司 一种光伏电站喷水喷气清洁系统

Family Cites Families (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3935041A (en) * 1971-10-18 1976-01-27 Chemcut Corporation Method for treatment fluid application and removal
US3849195A (en) * 1972-08-03 1974-11-19 D Floyd Ultrasonic cleaning
JPS6095980A (ja) 1983-10-31 1985-05-29 Semiconductor Energy Lab Co Ltd 光電変換装置
JPS60110178A (ja) 1983-11-18 1985-06-15 Semiconductor Energy Lab Co Ltd 半導体装置作製方法
US4854337A (en) * 1988-05-24 1989-08-08 Eastman Kodak Company Apparatus for treating wafers utilizing megasonic energy
JP2986875B2 (ja) * 1990-09-07 1999-12-06 キヤノン株式会社 集積化太陽電池
US5464477A (en) * 1992-09-18 1995-11-07 Crest Ultrasonics Corporation Process for cleaning and drying ferrous surfaces without causing flash rusting
US5512106A (en) * 1993-01-27 1996-04-30 Sumitomo Heavy Industries, Ltd. Surface cleaning with argon
JPH0779007A (ja) 1993-09-01 1995-03-20 Sanyo Electric Co Ltd 半導体装置の製造方法
JP2923193B2 (ja) * 1993-12-30 1999-07-26 キヤノン株式会社 光電変換素子の製造方法
JPH07231015A (ja) * 1994-02-17 1995-08-29 Sanyo Electric Co Ltd 半導体装置及びその製造方法
KR100222460B1 (ko) * 1994-03-18 1999-10-01 도키와 후미카츠 세정방법
JPH07328573A (ja) * 1994-06-09 1995-12-19 Supiide Fuamu Clean Syst Kk 洗浄方法及び洗浄装置
JP3057599B2 (ja) * 1994-07-06 2000-06-26 キヤノン株式会社 洗浄装置及び洗浄方法
JP3653800B2 (ja) 1995-06-15 2005-06-02 株式会社カネカ 集積化薄膜太陽電池の製造方法
US5762749A (en) 1995-07-21 1998-06-09 Dainippon Screen Mfg. Co., Ltd. Apparatus for removing liquid from substrates
US5796111A (en) * 1995-10-30 1998-08-18 Phrasor Scientific, Inc. Apparatus for cleaning contaminated surfaces using energetic cluster beams
JP3573869B2 (ja) * 1996-03-27 2004-10-06 三洋電機株式会社 光起電力装置の製造方法
US5913980A (en) * 1996-04-10 1999-06-22 Ebara Solar, Inc. Method for removing complex oxide film growth on silicon crystal
JP3740618B2 (ja) * 1996-06-17 2006-02-01 株式会社カネカ 太陽電池の短絡部除去方法及び該短絡部除去装置
JP3755551B2 (ja) * 1996-06-25 2006-03-15 株式会社カネカ 太陽電池の短絡部除去方法及び該短絡部除去装置
JP3762013B2 (ja) * 1997-01-16 2006-03-29 株式会社カネカ 集積型薄膜光電変換装置の製造方法
JP3819507B2 (ja) * 1997-01-30 2006-09-13 三洋電機株式会社 光起電力装置及びその製造方法
US5989355A (en) * 1997-02-26 1999-11-23 Eco-Snow Systems, Inc. Apparatus for cleaning and testing precision components of hard drives and the like
JP3436858B2 (ja) 1997-02-27 2003-08-18 シャープ株式会社 薄膜太陽電池の製造方法
JP4001662B2 (ja) * 1997-06-27 2007-10-31 株式会社半導体エネルギー研究所 シリコンの洗浄方法および多結晶シリコンの作製方法
US5993739A (en) * 1997-10-29 1999-11-30 Chaircare Continuous washing system
US6057240A (en) * 1998-04-06 2000-05-02 Chartered Semiconductor Manufacturing, Ltd. Aqueous surfactant solution method for stripping metal plasma etch deposited oxidized metal impregnated polymer residue layers from patterned metal layers
US6123088A (en) * 1999-12-20 2000-09-26 Chartered Semiconducotor Manufacturing Ltd. Method and cleaner composition for stripping copper containing residue layers

Also Published As

Publication number Publication date
AU2244000A (en) 2001-02-01
EP1073095A2 (de) 2001-01-31
EP1073095A3 (de) 2001-09-19
US6506260B1 (en) 2003-01-14
EP2141735B1 (de) 2013-03-20
AU772539B2 (en) 2004-04-29
EP2141735A2 (de) 2010-01-06
EP1073095B1 (de) 2009-09-23
EP2141735A3 (de) 2012-01-04

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