DE60033486D1 - Verfahren und Vorrichtung zur Behandlung von Perfluorverbindungen enthaltenden Gasen - Google Patents

Verfahren und Vorrichtung zur Behandlung von Perfluorverbindungen enthaltenden Gasen

Info

Publication number
DE60033486D1
DE60033486D1 DE60033486T DE60033486T DE60033486D1 DE 60033486 D1 DE60033486 D1 DE 60033486D1 DE 60033486 T DE60033486 T DE 60033486T DE 60033486 T DE60033486 T DE 60033486T DE 60033486 D1 DE60033486 D1 DE 60033486D1
Authority
DE
Germany
Prior art keywords
gases containing
treating gases
perfluorocompounds
containing perfluorocompounds
treating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60033486T
Other languages
English (en)
Other versions
DE60033486T2 (de
Inventor
Shuichi Kanno
Hisao Yamashita
Tomohiko Miyamoto
Shin Tamata
Yoshiki Shibano
Takeo Komuro
Tsugihiro Yukitake
Terufumi Kawasaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Application granted granted Critical
Publication of DE60033486D1 publication Critical patent/DE60033486D1/de
Publication of DE60033486T2 publication Critical patent/DE60033486T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/86—Catalytic processes
    • B01D53/8659—Removing halogens or halogen compounds
    • B01D53/8662—Organic halogen compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/68—Halogens or halogen compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/68—Halogens or halogen compounds
    • B01D53/70—Organic halogen compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/86—Catalytic processes
    • B01D53/8659—Removing halogens or halogen compounds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
    • Y02C20/00—Capture or disposal of greenhouse gases
    • Y02C20/30—Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]
DE60033486T 1999-11-26 2000-11-23 Verfahren und Vorrichtung zur Behandlung von Perfluorverbindungen enthaltenden Gasen Expired - Lifetime DE60033486T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP33546899A JP3994605B2 (ja) 1999-11-26 1999-11-26 Ｐｆｃガスの処理方法及び処理装置
JP33546899 1999-11-26

Publications (2)

Publication Number Publication Date
DE60033486D1 true DE60033486D1 (de) 2007-04-05
DE60033486T2 DE60033486T2 (de) 2007-06-21

Family

ID=18288908

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60033486T Expired - Lifetime DE60033486T2 (de) 1999-11-26 2000-11-23 Verfahren und Vorrichtung zur Behandlung von Perfluorverbindungen enthaltenden Gasen

Country Status (5)

Country Link
US (1) US7285250B2 (de)
EP (2) EP1103297B1 (de)
JP (1) JP3994605B2 (de)
KR (1) KR100821452B1 (de)
DE (1) DE60033486T2 (de)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6602323B2 (en) * 2001-03-21 2003-08-05 Samsung Electronics Co., Ltd. Method and apparatus for reducing PFC emission during semiconductor manufacture
JP4454176B2 (ja) * 2001-04-20 2010-04-21 Ｎｅｃ液晶テクノロジー株式会社 Ｐｆｃガス燃焼除害装置及びｐｆｃガス燃焼除害方法
WO2002087732A2 (de) * 2001-04-27 2002-11-07 Infineon Technologies Ag Zentrale verbrennungsanlage zur behandlung pfc-haltiger abluft
JP4112845B2 (ja) * 2001-11-13 2008-07-02 日本パイオニクス株式会社 フッ化硫黄の分解処理剤及び分解処理方法
JP4214717B2 (ja) * 2002-05-31 2009-01-28 株式会社日立製作所 過弗化物処理装置
GB0416385D0 (en) * 2004-07-22 2004-08-25 Boc Group Plc Gas abatement
JP2006130499A (ja) * 2004-10-07 2006-05-25 Japan Pionics Co Ltd 排ガスの処理方法及び処理装置
TWI251301B (en) * 2004-11-29 2006-03-11 Unimicron Technology Corp Substrate core and method for fabricating the same
US20090155154A1 (en) * 2007-12-13 2009-06-18 Industrial Technology Research Institute Apparatus for decomposing suflur-fluorine-containing compound and method thereof
KR100978350B1 (ko) 2008-04-08 2010-08-26 (주)이에이앤지 과불화화합물 가스 처리용 고온 스크러버
JP5468216B2 (ja) * 2008-06-10 2014-04-09 昭和電工株式会社 過弗化物処理装置および過弗化物処理方法
JP5291794B2 (ja) * 2009-03-16 2013-09-18 ジェイパワー・エンテック株式会社 再生塔及び乾式排ガス処理装置
US8518165B2 (en) * 2009-03-16 2013-08-27 J—Power Entech, Inc. Dry exhaust-gas treating apparatus
KR20130086925A (ko) * 2010-06-21 2013-08-05 에드워즈 가부시키가이샤 가스 처리 시스템
CN102151425B (zh) * 2010-12-08 2013-03-27 云南大红山管道有限公司 一种浓缩池排水操作系统及其控制方法
CN102151415B (zh) * 2011-01-18 2013-07-10 大连理工大学 低温多效蒸发结晶过滤工艺
CN102151452A (zh) * 2011-01-27 2011-08-17 江苏宇达电站辅机阀门制造有限公司 静电凝聚型滤袋除尘工艺及设备
CN102151454B (zh) * 2011-04-09 2012-12-05 江苏天目环保科技有限公司 垃圾焚烧烟气的预处理装置
KR101443346B1 (ko) * 2013-02-27 2014-09-22 현대제철 주식회사 배가스 처리 장치
CN103207818B (zh) * 2013-04-23 2016-01-13 互动在线（北京）科技有限公司 一种基于草稿箱的词条编辑备份方法和草稿箱系统
GB2515017B (en) * 2013-06-10 2017-09-20 Edwards Ltd Process gas abatement
CN104248908B (zh) * 2014-09-27 2017-05-31 深圳市鑫鸿发环保设备有限公司 一种浓酸雾净化装置
US10375901B2 (en) 2014-12-09 2019-08-13 Mtd Products Inc Blower/vacuum
TWI589343B (zh) * 2015-11-26 2017-07-01 Orient Service Co Ltd Dust filters installed in semiconductor exhaust gas treatment equipment
CN105688619A (zh) * 2016-03-18 2016-06-22 浙江工业大学 一种有害物去除装置及其去除气流中有害物的方法
KR101825825B1 (ko) * 2016-08-02 2018-02-06 주식회사 에코프로 질소산화물, 염화불화탄소류, 수소염화불화탄소류, 수소불화탄소류 및 과불화화합물을 포함하는 복합 폐가스의 통합 처리 시스템
MY194516A (en) * 2017-07-07 2022-11-30 Siw Eng Pte Ltd Device and system for decomposing and oxidizing gaseous pollutant
KR102332213B1 (ko) * 2019-08-22 2021-12-01 한국전력공사 플라즈마를 이용한 고농도 육불화황(sf6)의 분해 및 후처리 시스템
KR102349738B1 (ko) * 2020-03-10 2022-01-12 주식회사 글로벌스탠다드테크놀로지 니켈계 활성 촉매 제조방법

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4022593A (en) * 1975-05-05 1977-05-10 Lerner Bernard J Mist elimination
JPS57197023A (en) 1981-05-28 1982-12-03 Toho Titanium Co Ltd Treatment of waste gas from chlorinating furnace
EP0382986A1 (de) * 1989-02-13 1990-08-22 L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude Verfahren und Vorrichtung zur Entgiftung von Stickstoff- oder Kohlenstoffhalogeniden
JPH0710334B2 (ja) * 1991-03-19 1995-02-08 荏原インフィルコ株式会社 Ｎｆ３ 排ガス処理方法および装置
GB9116020D0 (en) * 1991-07-25 1991-09-11 Serck Baker Ltd Separator
JP3278453B2 (ja) 1992-03-06 2002-04-30 日本無機株式会社 ミストフィルタ並びにミスト捕集装置
JPH05277332A (ja) * 1992-03-30 1993-10-26 Ishikawajima Harima Heavy Ind Co Ltd 吸収塔
JPH08318122A (ja) 1995-05-25 1996-12-03 Hitachi Ltd フロン分解排ガスの処理方法
JP3486022B2 (ja) * 1995-10-16 2004-01-13 ジャパン・エア・ガシズ株式会社 排ガス処理装置
JPH10137544A (ja) * 1996-11-08 1998-05-26 Hitachi Ltd フッ素を含む有機ハロゲン化合物排ガスの処理方法及び装置
US5955037A (en) * 1996-12-31 1999-09-21 Atmi Ecosys Corporation Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases
JPH10286434A (ja) * 1997-04-15 1998-10-27 Ube Ind Ltd フッ素含有化合物の分解方法
DE69820926T2 (de) * 1997-06-20 2004-09-02 Hitachi, Ltd. Verfahren, Vorrichtung und Verwendung eines Katalysators zur Zersetzung fluorierter Verbindungen
JP3269456B2 (ja) 1997-06-20 2002-03-25 株式会社日立製作所 フッ素含有化合物の分解処理方法、触媒及び分解処理装置
TW550112B (en) * 1997-11-14 2003-09-01 Hitachi Ltd Method for processing perfluorocarbon, and apparatus therefor
JPH11216455A (ja) 1998-02-04 1999-08-10 Hitachi Ltd 廃プリント基板処理装置及びその処理方法
JP3976459B2 (ja) * 1999-11-18 2007-09-19 株式会社荏原製作所 フッ素含有化合物を含む排ガスの処理方法及び装置
JP4211227B2 (ja) * 2001-03-16 2009-01-21 株式会社日立製作所 過弗化物の処理方法及びその処理装置

Also Published As

Publication number Publication date
DE60033486T2 (de) 2007-06-21
EP1103297A4 (de) 2001-03-05
KR100821452B1 (ko) 2008-04-10
US7285250B2 (en) 2007-10-23
EP1103297B1 (de) 2007-02-21
JP3994605B2 (ja) 2007-10-24
JP2001149749A (ja) 2001-06-05
EP1775012A3 (de) 2007-07-04
EP1103297A1 (de) 2001-05-30
US20020122750A1 (en) 2002-09-05
EP1775012A2 (de) 2007-04-18
KR20010067078A (ko) 2001-07-12

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