DE60032568D1 - Positionierungsapparat und damit versehener lithographischer Apparat - Google Patents

Positionierungsapparat und damit versehener lithographischer Apparat

Info

Publication number
DE60032568D1
DE60032568D1 DE60032568T DE60032568T DE60032568D1 DE 60032568 D1 DE60032568 D1 DE 60032568D1 DE 60032568 T DE60032568 T DE 60032568T DE 60032568 T DE60032568 T DE 60032568T DE 60032568 D1 DE60032568 D1 DE 60032568D1
Authority
DE
Germany
Prior art keywords
provided therewith
positioning
lithographic
apparatus provided
lithographic apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60032568T
Other languages
English (en)
Other versions
DE60032568T2 (de
Inventor
Yimbun Patrick Kwan
Serge Felix Chretien L Wetzels
Gerjan Peter Veldhuis
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Publication of DE60032568D1 publication Critical patent/DE60032568D1/de
Application granted granted Critical
Publication of DE60032568T2 publication Critical patent/DE60032568T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Details Of Measuring And Other Instruments (AREA)
DE60032568T 1999-12-01 2000-11-22 Positionierungsapparat und damit versehener lithographischer Apparat Expired - Fee Related DE60032568T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP99204051 1999-12-01
EP99204051 1999-12-01

Publications (2)

Publication Number Publication Date
DE60032568D1 true DE60032568D1 (de) 2007-02-08
DE60032568T2 DE60032568T2 (de) 2007-10-04

Family

ID=8240943

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60032568T Expired - Fee Related DE60032568T2 (de) 1999-12-01 2000-11-22 Positionierungsapparat und damit versehener lithographischer Apparat

Country Status (5)

Country Link
US (2) US6635887B2 (de)
JP (1) JP3947652B2 (de)
KR (1) KR100573663B1 (de)
DE (1) DE60032568T2 (de)
TW (1) TW594427B (de)

Families Citing this family (60)

* Cited by examiner, † Cited by third party
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DE60032568T2 (de) * 1999-12-01 2007-10-04 Asml Netherlands B.V. Positionierungsapparat und damit versehener lithographischer Apparat
US6666611B2 (en) * 2000-08-18 2003-12-23 Nikon Corporation Three degree of freedom joint
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EP1477852A1 (de) * 2003-05-16 2004-11-17 ASML Netherlands B.V. Lithographischer Apparat, Verfahren zur Herstellung eines Artikels und dabei hergestellter Artikel
TWI245170B (en) * 2003-07-22 2005-12-11 Asml Netherlands Bv Lithographic apparatus, device manufacturing method, and device manufactured thereby
JP4314091B2 (ja) * 2003-10-03 2009-08-12 キヤノン株式会社 露光装置及びデバイス製造方法
TWI288306B (en) * 2003-11-05 2007-10-11 Asml Netherlands Bv Lithographic apparatus and method for manufacturing a lithographic device
EP1688988A1 (de) * 2003-11-17 2006-08-09 Nikon Corporation Bühnenantriebsverfahren, bühnenvorrichtung und belichtungsvorrichtung
JP3950861B2 (ja) 2004-02-25 2007-08-01 キヤノン株式会社 位置決め装置及び露光装置
US7456527B2 (en) * 2004-03-04 2008-11-25 Asml Netherlands B.V. Moveable object carrier, lithographic apparatus comprising the moveable object carrier and device manufacturing method
KR100573771B1 (ko) * 2004-06-25 2006-04-25 삼성전자주식회사 갠트리장치
JP2006287098A (ja) * 2005-04-04 2006-10-19 Nsk Ltd 位置決め装置
WO2007062505A1 (en) * 2005-11-17 2007-06-07 Socovar, Société En Commandite Planar parallel mechanism and method
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US8104752B2 (en) * 2006-03-20 2012-01-31 Boaz Eidelberg Integrated large XY rotary positioning table with virtual center of rotation
JP2007329435A (ja) * 2006-06-09 2007-12-20 Canon Inc ステージ装置、露光装置及びデバイス製造方法
CN2938172Y (zh) * 2006-07-18 2007-08-22 上海微电子装备有限公司 双台轮换曝光精密定位系统
US20080093319A1 (en) * 2006-10-19 2008-04-24 Universal Display & Fixtures Company Storage Rack Sliding Frame Apparatus
KR100847509B1 (ko) * 2006-11-03 2008-07-22 마이크로모션테크놀러지(주) 스테이지 시스템의 워킹 프레임
EP1947675B1 (de) * 2007-01-22 2009-03-25 FEI Company Manipulator zum Drehen und Verschieben eines Probenhalters
US7884326B2 (en) * 2007-01-22 2011-02-08 Fei Company Manipulator for rotating and translating a sample holder
DE102007011399A1 (de) * 2007-03-08 2008-09-11 Siemens Ag Partikeltherapie-Anlage
JP4903648B2 (ja) * 2007-08-01 2012-03-28 大塚電子株式会社 サイズ可変ステージ及び液晶基板の検査装置
EP2051280A1 (de) * 2007-10-18 2009-04-22 The Regents of the University of California Motorisierter Manipulator zur Positionierung einer TEM-Probe
WO2009144218A1 (en) * 2008-05-29 2009-12-03 Asml Netherlands B.V. Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
NL2002935A1 (nl) * 2008-06-27 2009-12-29 Asml Netherlands Bv Object support positioning device and lithographic apparatus.
US20100032397A1 (en) * 2008-08-09 2010-02-11 Chien-Cheng Lin Gantry with Adjustable Torsion Leaf Springs
TWI468879B (zh) * 2008-08-18 2015-01-11 Mapper Lithography Ip Bv 帶電粒子射束微影系統以及目標物定位裝置
KR101024319B1 (ko) * 2008-09-30 2011-03-23 에이피시스템 주식회사 겐트리 장치 및 겐트리 장치의 틸트 보정 방법과 이를 이용한 기판처리장치
CN102159328A (zh) * 2009-03-06 2011-08-17 株式会社爱发科 喷墨用涂布头的转动调节装置
US8285418B2 (en) * 2009-07-23 2012-10-09 Kla-Tencor Corporation Dual scanning stage
US8973768B1 (en) * 2009-10-09 2015-03-10 Par Systems, Inc. Gantry robot system
CN102279529B (zh) * 2010-06-11 2015-03-25 上海微电子装备有限公司 柔性双边驱动设备的位置控制装置、及相关参数的整定方法
US9529353B2 (en) * 2010-09-08 2016-12-27 Nikon Corporation Methods for limiting counter-mass trim-motor force and stage assemblies incorporating same
JP5677025B2 (ja) * 2010-10-22 2015-02-25 株式会社トプコン 載置ステージ
CN102736435B (zh) * 2011-04-15 2014-09-17 上海微电子装备有限公司 一种光刻机直线运动驱动装置
JP5449263B2 (ja) * 2011-06-30 2014-03-19 國立虎尾科技大學 製造工程装置
JP5807841B2 (ja) * 2011-08-30 2015-11-10 株式会社ニコン 移動体装置、露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法
JP5955964B2 (ja) 2011-09-12 2016-07-20 マッパー・リソグラフィー・アイピー・ビー．ブイ． ターゲット処理ツールのためのガイダンス
JP5773825B2 (ja) * 2011-09-29 2015-09-02 スターテクノ株式会社 水平及び回転位置決め装置
JP5918518B2 (ja) * 2011-11-30 2016-05-18 川崎重工業株式会社 搬送ワークのヨーイング補正機構とその補正方法
JP5946659B2 (ja) * 2012-03-12 2016-07-06 株式会社アイエイアイ 直交ロボット
CN102615514B (zh) * 2012-04-10 2013-08-14 清华大学 一种平面两自由度冗余驱动并联机构及采用该机构的机床
JP6010686B2 (ja) * 2012-04-27 2016-10-19 エーエスエムエル ネザーランズ ビー．ブイ． アクチュエータを備えるリソグラフィ装置、およびアクチュエータを保護する方法
US8485740B1 (en) * 2012-06-19 2013-07-16 Chapman/Leonard Studio Equipment, Inc. Camera head with pan, roll and tilt movement
JP6068877B2 (ja) * 2012-08-31 2017-01-25 京セラ株式会社 ステージ装置
US20140166203A1 (en) * 2012-12-14 2014-06-19 Shenzhen China Star Optoelectronics Technology Co., Ltd Blocking device, sealant curing device, and sealant curing method
CN103056863A (zh) * 2012-12-21 2013-04-24 大连理工大学 龙门架式船体分段划线机
JP6662089B2 (ja) * 2016-02-22 2020-03-11 ウシオ電機株式会社 ステージ装置
JP6761279B2 (ja) 2016-05-16 2020-09-23 キヤノン株式会社 位置決め装置、リソグラフィー装置および物品製造方法
CN107561869B (zh) * 2016-06-30 2019-10-25 上海微电子装备（集团）股份有限公司 一种工件台锁定限位装置和采用该装置的工件台
CN108969119A (zh) * 2018-09-07 2018-12-11 郑州大学第附属医院 一种整形美容颌面部固定装置
EP3670067B1 (de) 2018-12-20 2022-07-27 Etel S.A. Positioniereinrichtung in portalbauweise
KR102225960B1 (ko) * 2019-06-24 2021-03-10 세메스 주식회사 기판 이송 장치
EP3876036A1 (de) 2020-03-04 2021-09-08 ASML Netherlands B.V. Schwingungsisolationssystem und zugehörige anwendungen in der lithographie
US11938677B2 (en) * 2020-05-14 2024-03-26 John Martin Harra Positioning system
JP2022061834A (ja) * 2020-10-07 2022-04-19 キヤノン株式会社 位置決め装置、リソグラフィ装置及び物品の製造方法
KR102547187B1 (ko) * 2021-02-16 2023-06-26 재단법인대구경북과학기술원 갠트리 스테이지장치
CN113488950B (zh) * 2021-07-12 2022-09-16 上海隐冠半导体技术有限公司 线缆台机构及移动装置

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DE69717975T2 (de) * 1996-12-24 2003-05-28 Asml Netherlands Bv In zwei richtungen ausgewogenes positioniergerät, sowie lithographisches gerät mit einem solchen positioniergerät
US5815246A (en) * 1996-12-24 1998-09-29 U.S. Philips Corporation Two-dimensionally balanced positioning device, and lithographic device provided with such a positioning device
USRE40043E1 (en) * 1997-03-10 2008-02-05 Asml Netherlands B.V. Positioning device having two object holders
JP3483452B2 (ja) * 1998-02-04 2004-01-06 キヤノン株式会社 ステージ装置および露光装置、ならびにデバイス製造方法
JPH11300557A (ja) * 1998-04-15 1999-11-02 Thk Co Ltd 移動テーブル装置
DE60032568T2 (de) * 1999-12-01 2007-10-04 Asml Netherlands B.V. Positionierungsapparat und damit versehener lithographischer Apparat
US6467960B1 (en) * 2000-08-18 2002-10-22 Nikon Corporation Air bearing linear guide for use in a vacuum

Also Published As

Publication number Publication date
JP2002025902A (ja) 2002-01-25
US20010050341A1 (en) 2001-12-13
JP3947652B2 (ja) 2007-07-25
TW594427B (en) 2004-06-21
US6852989B2 (en) 2005-02-08
US6635887B2 (en) 2003-10-21
KR100573663B1 (ko) 2006-04-24
DE60032568T2 (de) 2007-10-04
KR20010061993A (ko) 2001-07-07
US20040036035A1 (en) 2004-02-26

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee