DE60027371D1 - Kinematische Linsenhalterung - Google Patents

Kinematische Linsenhalterung

Info

Publication number
DE60027371D1
DE60027371D1 DE60027371T DE60027371T DE60027371D1 DE 60027371 D1 DE60027371 D1 DE 60027371D1 DE 60027371 T DE60027371 T DE 60027371T DE 60027371 T DE60027371 T DE 60027371T DE 60027371 D1 DE60027371 D1 DE 60027371D1
Authority
DE
Germany
Prior art keywords
mounts
flexure
radial
lens
soft
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60027371T
Other languages
English (en)
Other versions
DE60027371T2 (de
Inventor
Douglas C Watson
Thomas W Novak
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of DE60027371D1 publication Critical patent/DE60027371D1/de
Application granted granted Critical
Publication of DE60027371T2 publication Critical patent/DE60027371T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216Mask projection systems
    • G03F7/70241Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/022Mountings, adjusting means, or light-tight connections, for optical elements for lenses lens and mount having complementary engagement means, e.g. screw/thread
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/026Mountings, adjusting means, or light-tight connections, for optical elements for lenses using retaining rings or springs
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/028Mountings, adjusting means, or light-tight connections, for optical elements for lenses with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/708Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825Mounting of individual elements, e.g. mounts, holders or supports

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Epidemiology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Lens Barrels (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Prostheses (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Fuel Cell (AREA)
DE60027371T 1999-08-31 2000-07-29 Kinematische Linsenhalterung Expired - Fee Related DE60027371T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US386255 1999-08-31
US09/386,255 US6239924B1 (en) 1999-08-31 1999-08-31 Kinematic lens mounting with distributed support and radial flexure

Publications (2)

Publication Number Publication Date
DE60027371D1 true DE60027371D1 (de) 2006-05-24
DE60027371T2 DE60027371T2 (de) 2007-06-21

Family

ID=23524830

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60027371T Expired - Fee Related DE60027371T2 (de) 1999-08-31 2000-07-29 Kinematische Linsenhalterung

Country Status (7)

Country Link
US (1) US6239924B1 (de)
EP (1) EP1081521B1 (de)
JP (1) JP4622058B2 (de)
KR (1) KR100654117B1 (de)
AT (1) ATE323893T1 (de)
DE (1) DE60027371T2 (de)
TW (1) TW490599B (de)

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US6603611B1 (en) * 2001-11-06 2003-08-05 Itt Manufacturing Enterprises, Inc. Mount for ultra-high performance of optical components under thermal and vibrational distortion conditions
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US6649865B1 (en) * 2002-08-07 2003-11-18 Great Computer Corp. Control method for optical lens-seat on a laser processing machine
JP2005534998A (ja) * 2002-08-08 2005-11-17 カール・ツァイス・エスエムティー・アーゲー イメージングデバイスにおける光学式アセンブリを保持するための装置
US20040080730A1 (en) * 2002-10-29 2004-04-29 Michael Binnard System and method for clamping a device holder with reduced deformation
WO2004086148A1 (de) * 2003-03-26 2004-10-07 Carl Zeiss Smt Ag Vorrichtung zur deformationsarmen austauschbaren lagerung eines optischen elements
JP2004363559A (ja) * 2003-05-14 2004-12-24 Canon Inc 光学部材保持装置
JP2004347814A (ja) * 2003-05-21 2004-12-09 Canon Inc 保持装置、露光装置及びデバイス製造方法
DE602004024302D1 (de) * 2003-06-06 2010-01-07 Nippon Kogaku Kk Halteeinrichtung für optische elemente, objektivtubus, belichtungseinrichtung und herstellungsverfahren für bauelemente
DE102004025832A1 (de) * 2004-05-24 2005-12-22 Carl Zeiss Smt Ag Optikmodul für ein Objektiv
US7697222B2 (en) * 2003-12-25 2010-04-13 Nikon Corporation Apparatus for holding optical element, barrel, exposure apparatus, and device producing method
EP1577693B1 (de) * 2004-02-26 2011-07-13 Carl Zeiss SMT GmbH Objektiv mit wenigstens einem optischen Element
DE102004014641B4 (de) * 2004-03-09 2007-09-13 Carl Zeiss Smt Ag Anordnung zur Lagerung eines optischen Bauelements
WO2006096045A1 (en) * 2005-03-09 2006-09-14 Stichting Astron Suspension for keeping an object aligned during large temperature variations; optical system provided with such a suspension.
US20060238735A1 (en) * 2005-04-22 2006-10-26 Vladimir Kamenov Optical system of a projection exposure apparatus
WO2006134910A1 (ja) * 2005-06-14 2006-12-21 Nikon Corporation 光学素子、光学素子保持装置、露光装置、及びデバイス製造方法
EP1899756A2 (de) * 2005-07-01 2008-03-19 Carl Zeiss SMT AG Anordnung zur lagerung eines optischen bauelements
JP5243957B2 (ja) 2005-08-16 2013-07-24 カール・ツァイス・エスエムティー・ゲーエムベーハー 液浸リソグラフィー用オブジェクティブ
TWI372271B (en) * 2005-09-13 2012-09-11 Zeiss Carl Smt Gmbh Optical element unit, optical element holder, method of manufacturing an optical element holder, optical element module, optical exposure apparatus, and method of manufacturing a semiconductor device
WO2007132862A1 (ja) * 2006-05-16 2007-11-22 Nikon Corporation 投影光学系、露光方法、露光装置、及びデバイス製造方法
EP1901101A1 (de) 2006-09-14 2008-03-19 Carl Zeiss SMT AG Optische Elementeinheit und Verfahren zum Stützen eines optischen Elements
US8416386B2 (en) * 2007-03-13 2013-04-09 Nikon Corporation Conforming seats for clamps used in mounting an optical element, and optical systems comprising same
JPWO2008146655A1 (ja) * 2007-05-25 2010-08-19 株式会社ニコン 光学素子保持装置、鏡筒及び露光装置ならびにデバイスの製造方法
WO2009024192A1 (en) * 2007-08-23 2009-02-26 Carl Zeiss Smt Ag Optical element module with minimized parasitic loads
US7990628B1 (en) * 2007-08-29 2011-08-02 Tessera MEMS Technologies, Inc. Planar flexure system with high pitch stiffness
DE102007047186B4 (de) * 2007-10-02 2014-01-09 Carl Zeiss Sms Gmbh Aufnahmevorrichtung zur Aufnahme einer Photolithographiemaske
DE102007063305A1 (de) * 2007-12-27 2009-07-02 Carl Zeiss Smt Ag Optische Einrichtung mit einer Federeinrichtung mit einem Bereich konstanter Federkraft
DE102008022211B3 (de) * 2008-05-06 2010-02-25 Carl Zeiss Surgical Gmbh Linsenträger sowie optische Baugruppe
US9335641B2 (en) * 2008-07-21 2016-05-10 Asml Netherlands B.V. Optical element mount for lithographic apparatus
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CN102486564B (zh) * 2010-12-06 2014-10-29 上海微电子装备有限公司 透镜挠性固定装置
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CN103885302B (zh) * 2014-04-04 2016-03-30 中国科学院光电技术研究所 一种装卡光学元件的力反馈精密支撑装置
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CN106383395A (zh) * 2015-07-29 2017-02-08 上海微电子装备有限公司 一种大口径侧立镜组结构
CN105371763B (zh) * 2015-12-01 2017-09-19 中国科学院长春光学精密机械与物理研究所 一种大口径光学元件卧式电磁支撑装置
CN107329225B (zh) * 2016-04-29 2020-06-16 上海微电子装备(集团)股份有限公司 侧立镜组及其安装方法
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US11692816B2 (en) 2018-04-27 2023-07-04 Cognex Corporation Mounting arrangement for optical systems
EP3608627B1 (de) 2018-08-09 2023-11-08 Cognex Corporation Positionierungssystem für komponenten von optischen systemen
CN109387918A (zh) * 2018-12-03 2019-02-26 长春奥普光电技术股份有限公司 一种主三一体镜定位组合装置及方法
EP3792673A1 (de) * 2019-09-16 2021-03-17 ASML Netherlands B.V. Anordnung zur bündelung von breitbandstrahlung
WO2021043516A1 (en) * 2019-09-03 2021-03-11 Asml Netherlands B.V. Assembly for collimating broadband radiation
CN110568576B (zh) * 2019-09-09 2021-04-06 中国科学院长春光学精密机械与物理研究所 一种透镜柔性支撑装置
CN112068277B (zh) * 2020-08-31 2021-08-20 中国科学院长春光学精密机械与物理研究所 大口径光学透镜的多级柔性支撑结构
CN112128546B (zh) * 2020-09-30 2021-11-05 中国科学院国家天文台南京天文光学技术研究所 用于大尺寸拼接光学元件的支撑结构及其安装方法
DE102021200131A1 (de) * 2021-01-11 2022-07-14 Carl Zeiss Smt Gmbh Baugruppe mit einem Entkopplungsgelenk zur mechanischen Lagerung eines Elements
CN113917645B (zh) * 2021-11-01 2023-03-31 中国科学院光电技术研究所 一种镜片弹性支撑装置
CN114486939B (zh) * 2022-04-08 2022-07-22 欧普康视科技股份有限公司 一种镜片划痕检测系统及方法

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Also Published As

Publication number Publication date
EP1081521B1 (de) 2006-04-19
KR20010020912A (ko) 2001-03-15
ATE323893T1 (de) 2006-05-15
EP1081521A3 (de) 2004-01-02
US6239924B1 (en) 2001-05-29
JP4622058B2 (ja) 2011-02-02
DE60027371T2 (de) 2007-06-21
KR100654117B1 (ko) 2006-12-05
EP1081521A2 (de) 2001-03-07
JP2001074991A (ja) 2001-03-23
TW490599B (en) 2002-06-11

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