DE502007002036D1 - Elektolyt und Verfahren zur Abscheidung von dekoraium - Google Patents

Elektolyt und Verfahren zur Abscheidung von dekoraium

Info

Publication number
DE502007002036D1
DE502007002036D1 DE502007002036T DE502007002036T DE502007002036D1 DE 502007002036 D1 DE502007002036 D1 DE 502007002036D1 DE 502007002036 T DE502007002036 T DE 502007002036T DE 502007002036 T DE502007002036 T DE 502007002036T DE 502007002036 D1 DE502007002036 D1 DE 502007002036D1
Authority
DE
Germany
Prior art keywords
dekoraium
electrolysis
deposition
electrolyte
concentration
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE502007002036T
Other languages
German (de)
English (en)
Inventor
Philip Dipl-Ing Schramek
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Umicore Galvanotechnik GmbH
Original Assignee
Umicore Galvanotechnik GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Umicore Galvanotechnik GmbH filed Critical Umicore Galvanotechnik GmbH
Publication of DE502007002036D1 publication Critical patent/DE502007002036D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/54—Electroplating: Baths therefor from solutions of metals not provided for in groups C25D3/04 - C25D3/50
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/50—Electroplating: Baths therefor from solutions of platinum group metals
    • C25D3/52—Electroplating: Baths therefor from solutions of platinum group metals characterised by the organic bath constituents used

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Secondary Cells (AREA)
  • Chemical Treatment Of Metals (AREA)
DE502007002036T 2007-03-28 2007-03-28 Elektolyt und Verfahren zur Abscheidung von dekoraium Active DE502007002036D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP07006380A EP1975282B1 (de) 2007-03-28 2007-03-28 Elektolyt und Verfahren zur Abscheidung von dekorativen und technischen Schichten aus Schwarz-Ruthenium

Publications (1)

Publication Number Publication Date
DE502007002036D1 true DE502007002036D1 (de) 2009-12-31

Family

ID=38372350

Family Applications (1)

Application Number Title Priority Date Filing Date
DE502007002036T Active DE502007002036D1 (de) 2007-03-28 2007-03-28 Elektolyt und Verfahren zur Abscheidung von dekoraium

Country Status (10)

Country Link
US (1) US8211286B2 (enExample)
EP (1) EP1975282B1 (enExample)
JP (1) JP5449130B2 (enExample)
KR (1) KR101416253B1 (enExample)
CN (1) CN101675185B (enExample)
AT (1) ATE449201T1 (enExample)
BR (1) BRPI0809382A2 (enExample)
DE (1) DE502007002036D1 (enExample)
TW (1) TWI427195B (enExample)
WO (1) WO2008116545A1 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102011105207B4 (de) 2011-06-17 2015-09-10 Umicore Galvanotechnik Gmbh Elektrolyt und seine Verwendung zur Abscheidung von Schwarz-Ruthenium-Überzügen und so erhaltene Überzüge und Artikel
CN107722361B (zh) * 2017-09-26 2020-01-10 同济大学 一种纳米氨基三亚甲基膦酸镁负载还原氧化石墨烯阻燃剂的制备方法
DE102019109188B4 (de) * 2019-04-08 2022-08-11 Umicore Galvanotechnik Gmbh Verwendung eines Elektrolyten zur Abscheidung von anthrazit/schwarzen Rhodium/Ruthenium Legierungsschichten
CN110965088A (zh) * 2019-08-27 2020-04-07 周大福珠宝金行（深圳）有限公司 一种黄金的复古工艺以及复古黄金
CN115261937B (zh) * 2022-03-22 2024-12-13 东莞市弘裕表面处理技术有限公司 钌镀液及其制备方法、镀钌方法、钌镀层及含有其的器件
CN115787010B (zh) * 2022-12-02 2024-11-12 周大福珠宝文化产业园(武汉)有限公司 黑钌镀液及其在复古黄金或铂金等饰品制备中的应用

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1198527A (en) * 1966-09-16 1970-07-15 Fred I Nobel Improvements in Electrodeposition of Gold and Gold Alloys
GB1244309A (en) * 1967-10-18 1971-08-25 Int Nickel Ltd Electrodeposition of ruthenium
US3530049A (en) * 1968-10-02 1970-09-22 Technic Gold and ruthenium plating baths
DE1959907A1 (de) * 1968-11-28 1970-06-18 Johnson Matthey Co Ltd Rutheniumkomplex und seine Verwendung bei der Elektroplattierung
CH512590A (fr) * 1970-03-20 1971-09-15 Sel Rex Corp Procédé pour le dépôt électrolytique d'alliages de ruthénium, bain aqueux pour la mise en oeuvre de ce procédé, et article revêtu d'un alliage de ruthénium obtenu par ce procédé
US3939226A (en) * 1974-01-07 1976-02-17 Hooker Chemicals & Plastics Corporation Phosphonomethyl compounds
GB1520140A (en) * 1976-06-08 1978-08-02 Inco Europ Ltd Electrodeposition of ruthenium
US4082624A (en) * 1976-12-03 1978-04-04 Bell Telephone Laboratories, Incorporated Articles electrodeposited with ruthenium and processes of producing such articles
US4297178A (en) * 1979-04-10 1981-10-27 The International Nickel Company, Inc. Ruthenium electroplating and baths and compositions therefor
US4402802A (en) * 1981-01-03 1983-09-06 Dequssa Aktiengesellschaft Electrolytic bath for the deposition of rhodium coatings
US4375392A (en) * 1981-06-02 1983-03-01 Occidental Chemical Corporation Bath and process for the electrodeposition of ruthenium
US4563405A (en) * 1983-06-23 1986-01-07 Konishiroku Photo Industry Co., Ltd. Processing solution having bleaching ability for light-sensitive silver halide color photographic material
JPS61104097A (ja) 1984-10-23 1986-05-22 Iwasaki Mekki:Kk 外装部品
JPS63259095A (ja) 1987-04-16 1988-10-26 Nippon Mining Co Ltd ルテニウムめつき液
JPH01119660A (ja) 1987-10-30 1989-05-11 Seiko Epson Corp 部分乾式メッキ法
JPH03226591A (ja) 1990-01-31 1991-10-07 Seiko Epson Corp 部分古美調装飾部品およびその製造方法
US5077442A (en) * 1990-04-26 1991-12-31 Mitsubishi Kasei Corporation Method for producing 1,4-butanediol
JPH0474883A (ja) * 1990-07-17 1992-03-10 Tanaka Kikinzoku Kogyo Kk ルテニウム合金メッキ方法
JPH0474884A (ja) * 1990-07-17 1992-03-10 Tanaka Kikinzoku Kogyo Kk ルテニウム合金メッキ方法
JPH04154988A (ja) 1990-10-16 1992-05-27 Seiko Epson Corp 装飾部材の製造方法
DE19741990C1 (de) * 1997-09-24 1999-04-29 Degussa Elektrolyt zur galvanischen Abscheidung von spannungsarmen, rißfesten Rutheniumschichten, Verfahren zur Herstellung und Verwendung
JP3302949B2 (ja) 1999-08-03 2002-07-15 株式会社日鉱マテリアルズ 黒色ルテニウムめっき液

Also Published As

Publication number Publication date
JP5449130B2 (ja) 2014-03-19
EP1975282A1 (de) 2008-10-01
CN101675185B (zh) 2011-04-13
TWI427195B (zh) 2014-02-21
EP1975282B1 (de) 2009-11-18
HK1138044A1 (en) 2010-08-13
WO2008116545A1 (en) 2008-10-02
ATE449201T1 (de) 2009-12-15
TW200914650A (en) 2009-04-01
BRPI0809382A2 (pt) 2014-09-09
US8211286B2 (en) 2012-07-03
JP2010522277A (ja) 2010-07-01
CN101675185A (zh) 2010-03-17
US20100051468A1 (en) 2010-03-04
KR20090123928A (ko) 2009-12-02
KR101416253B1 (ko) 2014-07-09

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Legal Events

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8364 No opposition during term of opposition