DE50015866D1 - Elektronenstossionenquelle - Google Patents

Elektronenstossionenquelle

Info

Publication number
DE50015866D1
DE50015866D1 DE50015866T DE50015866T DE50015866D1 DE 50015866 D1 DE50015866 D1 DE 50015866D1 DE 50015866 T DE50015866 T DE 50015866T DE 50015866 T DE50015866 T DE 50015866T DE 50015866 D1 DE50015866 D1 DE 50015866D1
Authority
DE
Germany
Prior art keywords
electron beam
axial
ion
ion trap
symmetric
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE50015866T
Other languages
English (en)
Inventor
Guenter Zschornack
Vladimir Petrovich Ovsyannikov
Frank Grossmann
Oleg Konstantinov Koulthachev
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Technische Universitaet Dresden
Original Assignee
Technische Universitaet Dresden
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Technische Universitaet Dresden filed Critical Technische Universitaet Dresden
Application granted granted Critical
Publication of DE50015866D1 publication Critical patent/DE50015866D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
    • H01J27/18—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation with an applied axial magnetic field

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Dental Preparations (AREA)
  • Luminescent Compositions (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • Particle Accelerators (AREA)
DE50015866T 1999-10-08 2000-10-06 Elektronenstossionenquelle Expired - Lifetime DE50015866D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19949978A DE19949978A1 (de) 1999-10-08 1999-10-08 Elektronenstoßionenquelle
PCT/DE2000/003525 WO2001027964A2 (de) 1999-10-08 2000-10-06 Elektronenstossionenquelle

Publications (1)

Publication Number Publication Date
DE50015866D1 true DE50015866D1 (de) 2010-04-01

Family

ID=7925926

Family Applications (3)

Application Number Title Priority Date Filing Date
DE19949978A Withdrawn DE19949978A1 (de) 1999-10-08 1999-10-08 Elektronenstoßionenquelle
DE10083121T Expired - Lifetime DE10083121D2 (de) 1999-10-08 2000-10-06 Elektronenstossionenquelle
DE50015866T Expired - Lifetime DE50015866D1 (de) 1999-10-08 2000-10-06 Elektronenstossionenquelle

Family Applications Before (2)

Application Number Title Priority Date Filing Date
DE19949978A Withdrawn DE19949978A1 (de) 1999-10-08 1999-10-08 Elektronenstoßionenquelle
DE10083121T Expired - Lifetime DE10083121D2 (de) 1999-10-08 2000-10-06 Elektronenstossionenquelle

Country Status (7)

Country Link
US (1) US6717155B1 (de)
EP (1) EP1222677B1 (de)
JP (1) JP4886138B2 (de)
AT (1) ATE458260T1 (de)
AU (1) AU1992701A (de)
DE (3) DE19949978A1 (de)
WO (1) WO2001027964A2 (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10113064B4 (de) * 2001-03-15 2004-05-19 Lzh Laserzentrum Hannover E.V. Verfahren und Einrichtung zur Erzeugung von UV-Strahlung, insbesondere von EUV-Strahlung
US7081711B2 (en) * 2003-10-28 2006-07-25 Applied Pulsed Power, Inc. Inductively generated streaming plasma ion source
FR2874125B1 (fr) * 2004-08-05 2006-11-24 Centre Nat Rech Scient Cnrse Piege a ions a aimant longitudinal et spectrometre de masse utilisant un tel aimant
US8334506B2 (en) 2007-12-10 2012-12-18 1St Detect Corporation End cap voltage control of ion traps
US7973277B2 (en) 2008-05-27 2011-07-05 1St Detect Corporation Driving a mass spectrometer ion trap or mass filter
DE102010030372B4 (de) 2010-06-22 2012-02-16 Dreebit Gmbh Vorrichtung zur Strukturierung von Festkörperflächen mit Ionenstrahlen aus einem Ionenstrahlspektrum
DE202010009379U1 (de) 2010-06-22 2010-09-02 Dreebit Gmbh Vorrichtung zur Strukturierung von Festkörperflächen mit Ionenstrahlen aus einem Ionenstrahlspektrum
JP6218403B2 (ja) * 2013-03-15 2017-10-25 株式会社マーストーケンソリューション 電界放射型電子銃を備えたｘ線管及びそれを用いたｘ線検査装置
US9984847B2 (en) 2013-03-15 2018-05-29 Mars Tohken Solution Co., Ltd. Open-type X-ray tube comprising field emission type electron gun and X-ray inspection apparatus using the same
US10297413B2 (en) 2015-03-10 2019-05-21 North-Western International Cleaner Production Centre Method and device for the production of highly charged ions
DE102015104213A1 (de) 2015-03-20 2016-09-22 Dreebit Gmbh Vorrichtung und Verfahren zur Erzeugung und Aussendung eines ladungs- und massenseparierten Ionenstrahls variabler Energie
DE102016110495B4 (de) 2016-06-07 2018-03-29 Vacom Vakuum Komponenten & Messtechnik Gmbh Vorrichtung und Verfahren zum Erzeugen, Speichern und Freisetzen von Ionen aus einer umgebenden Restgasatmosphäre

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2507652A (en) * 1940-10-04 1950-05-16 Cornell Res Foundation Inc Ion source
GB1237028A (en) * 1969-04-28 1971-06-30 Mullard Ltd Ion source
US4105916A (en) * 1977-02-28 1978-08-08 Extranuclear Laboratories, Inc. Methods and apparatus for simultaneously producing and electronically separating the chemical ionization mass spectrum and the electron impact ionization mass spectrum of the same sample material
US4247804A (en) * 1979-06-04 1981-01-27 Hughes Aircraft Company Cold cathode discharge device with grid control
US4579144A (en) * 1983-03-04 1986-04-01 Uti Instrument Company Electron impact ion source for trace analysis
US4707637A (en) * 1986-03-24 1987-11-17 Hughes Aircraft Company Plasma-anode electron gun
DE4324233C1 (de) * 1993-07-20 1995-01-19 Bruker Franzen Analytik Gmbh Verfahren zur Auswahl der Reaktionspfade in Ionenfallen
GB9409953D0 (en) * 1994-05-17 1994-07-06 Fisons Plc Mass spectrometer and electron impact ion source therefor
JP2642881B2 (ja) * 1994-09-28 1997-08-20 東京大学長 低速多価イオンによる超高感度水素検出法
JP3779373B2 (ja) * 1996-04-22 2006-05-24 株式会社ムサシノエンジニアリング 真空蒸着装置
US6115452A (en) * 1998-01-08 2000-09-05 The Regents Of The University Of California X-ray radiography with highly charged ions
US6291820B1 (en) * 1999-01-08 2001-09-18 The Regents Of The University Of California Highly charged ion secondary ion mass spectroscopy
US6288394B1 (en) * 1999-03-02 2001-09-11 The Regents Of The University Of California Highly charged ion based time of flight emission microscope
CA2305938C (en) * 2000-04-10 2007-07-03 Vladimir I. Gorokhovsky Filtered cathodic arc deposition method and apparatus

Also Published As

Publication number Publication date
US6717155B1 (en) 2004-04-06
JP4886138B2 (ja) 2012-02-29
WO2001027964A3 (de) 2002-03-14
DE10083121D2 (de) 2002-04-25
EP1222677A2 (de) 2002-07-17
WO2001027964A2 (de) 2001-04-19
JP2003511843A (ja) 2003-03-25
AU1992701A (en) 2001-04-23
DE19949978A1 (de) 2001-05-10
EP1222677B1 (de) 2010-02-17
ATE458260T1 (de) 2010-03-15

Similar Documents

Publication Publication Date Title
DE50015866D1 (de) Elektronenstossionenquelle
WO1998033199A3 (en) Ion accelerator for use in ion implanter
WO2001026133A3 (en) High transmission, low energy beamline apparatus for ion implanter
JP2002352765A (ja) イオン注入装置
US20030057846A1 (en) Plasma accelarator arrangement
WO2002043103A3 (en) Extraction and deceleration of low energy beam with low beam divergence
US7139349B2 (en) Spherical neutron generator
JPS61290629A (ja) 電子ビ−ム励起イオン源
Wang et al. Mechanism of electron cloud clearing in the accumulator ring of the Spallation Neutron Source
Ames et al. Acceleration of clusters, collision induced charge exchange at MeV energies and applications for materials science
Banerjee et al. Design of a two-ion-source (2-IS) beam transport line for the production of multi charged radioactive ion beams
CN114828379B (zh) 用于高功率加速器引出区的束流整形机构
FR2833452B1 (fr) Source d'electrons
Ovsyannikov et al. Universal main magnetic focus ion source: A new tool for laboratory research of astrophysics and Tokamak microplasma
JP3341497B2 (ja) 高周波型荷電粒子加速器
JPH04181636A (ja) 金属イオン源
Kanesue et al. Study on ion current density of different species in laser produced plasma in a solenoid magnet
JPH02112140A (ja) 低速イオン銃
Spädtke et al. Beam transport
RU2001133770A (ru) Способ получения ионного луча
JPH0727764B2 (ja) マイクロ波イオン源
JPS5853145A (ja) 三極形イオンポンプ
Abdul’manov et al. Electron-optic system of the multicharge ion source (MIS-1)
RU2087986C1 (ru) Ионно-оптическая система с магнитной защитой электродов
Ono et al. Gas cluster ion beam source for secondary ion emission measurements

Legal Events

Date Code Title Description
8364 No opposition during term of opposition