ATE458260T1 - Elektronenstossionenquelle - Google Patents
ElektronenstossionenquelleInfo
- Publication number
- ATE458260T1 ATE458260T1 AT00982966T AT00982966T ATE458260T1 AT E458260 T1 ATE458260 T1 AT E458260T1 AT 00982966 T AT00982966 T AT 00982966T AT 00982966 T AT00982966 T AT 00982966T AT E458260 T1 ATE458260 T1 AT E458260T1
- Authority
- AT
- Austria
- Prior art keywords
- electron beam
- axial
- ion
- ion trap
- symmetric
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
- H01J27/18—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation with an applied axial magnetic field
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Combustion & Propulsion (AREA)
- Electron Sources, Ion Sources (AREA)
- Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
- Dental Preparations (AREA)
- Luminescent Compositions (AREA)
- Particle Accelerators (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19949978A DE19949978A1 (de) | 1999-10-08 | 1999-10-08 | Elektronenstoßionenquelle |
PCT/DE2000/003525 WO2001027964A2 (de) | 1999-10-08 | 2000-10-06 | Elektronenstossionenquelle |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE458260T1 true ATE458260T1 (de) | 2010-03-15 |
Family
ID=7925926
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT00982966T ATE458260T1 (de) | 1999-10-08 | 2000-10-06 | Elektronenstossionenquelle |
Country Status (7)
Country | Link |
---|---|
US (1) | US6717155B1 (de) |
EP (1) | EP1222677B1 (de) |
JP (1) | JP4886138B2 (de) |
AT (1) | ATE458260T1 (de) |
AU (1) | AU1992701A (de) |
DE (3) | DE19949978A1 (de) |
WO (1) | WO2001027964A2 (de) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10113064B4 (de) * | 2001-03-15 | 2004-05-19 | Lzh Laserzentrum Hannover E.V. | Verfahren und Einrichtung zur Erzeugung von UV-Strahlung, insbesondere von EUV-Strahlung |
US7081711B2 (en) * | 2003-10-28 | 2006-07-25 | Applied Pulsed Power, Inc. | Inductively generated streaming plasma ion source |
FR2874125B1 (fr) * | 2004-08-05 | 2006-11-24 | Centre Nat Rech Scient Cnrse | Piege a ions a aimant longitudinal et spectrometre de masse utilisant un tel aimant |
US8334506B2 (en) | 2007-12-10 | 2012-12-18 | 1St Detect Corporation | End cap voltage control of ion traps |
US7973277B2 (en) | 2008-05-27 | 2011-07-05 | 1St Detect Corporation | Driving a mass spectrometer ion trap or mass filter |
DE202010009379U1 (de) | 2010-06-22 | 2010-09-02 | Dreebit Gmbh | Vorrichtung zur Strukturierung von Festkörperflächen mit Ionenstrahlen aus einem Ionenstrahlspektrum |
DE102010030372B4 (de) | 2010-06-22 | 2012-02-16 | Dreebit Gmbh | Vorrichtung zur Strukturierung von Festkörperflächen mit Ionenstrahlen aus einem Ionenstrahlspektrum |
JP6218403B2 (ja) * | 2013-03-15 | 2017-10-25 | 株式会社マーストーケンソリューション | 電界放射型電子銃を備えたx線管及びそれを用いたx線検査装置 |
US9984847B2 (en) | 2013-03-15 | 2018-05-29 | Mars Tohken Solution Co., Ltd. | Open-type X-ray tube comprising field emission type electron gun and X-ray inspection apparatus using the same |
US10297413B2 (en) | 2015-03-10 | 2019-05-21 | North-Western International Cleaner Production Centre | Method and device for the production of highly charged ions |
DE102015104213A1 (de) | 2015-03-20 | 2016-09-22 | Dreebit Gmbh | Vorrichtung und Verfahren zur Erzeugung und Aussendung eines ladungs- und massenseparierten Ionenstrahls variabler Energie |
DE102016110495B4 (de) | 2016-06-07 | 2018-03-29 | Vacom Vakuum Komponenten & Messtechnik Gmbh | Vorrichtung und Verfahren zum Erzeugen, Speichern und Freisetzen von Ionen aus einer umgebenden Restgasatmosphäre |
DE102023001245A1 (de) | 2023-03-30 | 2024-10-02 | Erfindergemeinschaft Röntgenlithographie GbR (vertretungsberechtigter Gesellschafter: Dieter Beste, 40593 Düsseldorf) | Verfahren zur Herstellung von Atomstrahlen, um damit intensive Röntgenstrahlen zur Belichtung von Halbleiterwafern zu erzeugen |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2507652A (en) * | 1940-10-04 | 1950-05-16 | Cornell Res Foundation Inc | Ion source |
GB1237028A (en) * | 1969-04-28 | 1971-06-30 | Mullard Ltd | Ion source |
US4105916A (en) * | 1977-02-28 | 1978-08-08 | Extranuclear Laboratories, Inc. | Methods and apparatus for simultaneously producing and electronically separating the chemical ionization mass spectrum and the electron impact ionization mass spectrum of the same sample material |
US4247804A (en) * | 1979-06-04 | 1981-01-27 | Hughes Aircraft Company | Cold cathode discharge device with grid control |
US4579144A (en) * | 1983-03-04 | 1986-04-01 | Uti Instrument Company | Electron impact ion source for trace analysis |
US4707637A (en) * | 1986-03-24 | 1987-11-17 | Hughes Aircraft Company | Plasma-anode electron gun |
DE4324233C1 (de) * | 1993-07-20 | 1995-01-19 | Bruker Franzen Analytik Gmbh | Verfahren zur Auswahl der Reaktionspfade in Ionenfallen |
GB9409953D0 (en) * | 1994-05-17 | 1994-07-06 | Fisons Plc | Mass spectrometer and electron impact ion source therefor |
JP2642881B2 (ja) * | 1994-09-28 | 1997-08-20 | 東京大学長 | 低速多価イオンによる超高感度水素検出法 |
JP3779373B2 (ja) * | 1996-04-22 | 2006-05-24 | 株式会社ムサシノエンジニアリング | 真空蒸着装置 |
US6115452A (en) * | 1998-01-08 | 2000-09-05 | The Regents Of The University Of California | X-ray radiography with highly charged ions |
US6291820B1 (en) * | 1999-01-08 | 2001-09-18 | The Regents Of The University Of California | Highly charged ion secondary ion mass spectroscopy |
US6288394B1 (en) * | 1999-03-02 | 2001-09-11 | The Regents Of The University Of California | Highly charged ion based time of flight emission microscope |
CA2305938C (en) * | 2000-04-10 | 2007-07-03 | Vladimir I. Gorokhovsky | Filtered cathodic arc deposition method and apparatus |
-
1999
- 1999-10-08 DE DE19949978A patent/DE19949978A1/de not_active Withdrawn
-
2000
- 2000-10-06 EP EP00982966A patent/EP1222677B1/de not_active Expired - Lifetime
- 2000-10-06 WO PCT/DE2000/003525 patent/WO2001027964A2/de active Application Filing
- 2000-10-06 DE DE50015866T patent/DE50015866D1/de not_active Expired - Lifetime
- 2000-10-06 AT AT00982966T patent/ATE458260T1/de not_active IP Right Cessation
- 2000-10-06 AU AU19927/01A patent/AU1992701A/en not_active Abandoned
- 2000-10-06 US US10/110,261 patent/US6717155B1/en not_active Expired - Lifetime
- 2000-10-06 DE DE10083121T patent/DE10083121D2/de not_active Expired - Lifetime
- 2000-10-06 JP JP2001530888A patent/JP4886138B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
WO2001027964A2 (de) | 2001-04-19 |
JP2003511843A (ja) | 2003-03-25 |
EP1222677B1 (de) | 2010-02-17 |
EP1222677A2 (de) | 2002-07-17 |
AU1992701A (en) | 2001-04-23 |
DE10083121D2 (de) | 2002-04-25 |
DE50015866D1 (de) | 2010-04-01 |
WO2001027964A3 (de) | 2002-03-14 |
JP4886138B2 (ja) | 2012-02-29 |
DE19949978A1 (de) | 2001-05-10 |
US6717155B1 (en) | 2004-04-06 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
REN | Ceased due to non-payment of the annual fee |