DE4204938C1 - - Google Patents
Info
- Publication number
- DE4204938C1 DE4204938C1 DE4204938A DE4204938A DE4204938C1 DE 4204938 C1 DE4204938 C1 DE 4204938C1 DE 4204938 A DE4204938 A DE 4204938A DE 4204938 A DE4204938 A DE 4204938A DE 4204938 C1 DE4204938 C1 DE 4204938C1
- Authority
- DE
- Germany
- Prior art keywords
- crucible
- heating
- strips
- gap
- thermal insulation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000010438 heat treatment Methods 0.000 claims description 48
- 239000000463 material Substances 0.000 claims description 17
- 229910052751 metal Inorganic materials 0.000 claims description 14
- 239000002184 metal Substances 0.000 claims description 14
- 239000012774 insulation material Substances 0.000 claims description 9
- 238000009413 insulation Methods 0.000 claims description 7
- 239000007769 metal material Substances 0.000 claims description 6
- 238000010025 steaming Methods 0.000 claims description 3
- 238000007738 vacuum evaporation Methods 0.000 claims description 2
- 238000001704 evaporation Methods 0.000 description 12
- 230000008020 evaporation Effects 0.000 description 12
- 239000000758 substrate Substances 0.000 description 11
- 230000005855 radiation Effects 0.000 description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 239000010439 graphite Substances 0.000 description 4
- 229910002804 graphite Inorganic materials 0.000 description 4
- 229910052500 inorganic mineral Inorganic materials 0.000 description 4
- 239000011707 mineral Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 238000009834 vaporization Methods 0.000 description 4
- 230000008016 vaporization Effects 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 2
- 229910002091 carbon monoxide Inorganic materials 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 238000002207 thermal evaporation Methods 0.000 description 2
- 239000011364 vaporized material Substances 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000009422 external insulation Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000008092 positive effect Effects 0.000 description 1
- 230000002028 premature Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000005019 vapor deposition process Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE4204938A DE4204938C1 (enExample) | 1992-02-19 | 1992-02-19 | |
| US07/928,970 US5216742A (en) | 1992-02-19 | 1992-08-11 | Linear thermal evaporator for vacuum vapor depositing apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE4204938A DE4204938C1 (enExample) | 1992-02-19 | 1992-02-19 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE4204938C1 true DE4204938C1 (enExample) | 1993-06-24 |
Family
ID=6452027
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE4204938A Expired - Fee Related DE4204938C1 (enExample) | 1992-02-19 | 1992-02-19 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US5216742A (enExample) |
| DE (1) | DE4204938C1 (enExample) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4342574C1 (de) * | 1993-12-14 | 1995-04-13 | Hilmar Weinert | Bandbedampfungsanlage |
| DE19720026A1 (de) * | 1997-05-13 | 1998-11-19 | Ruckh Martin Dr Ing | Linienförmige Verdampferquelle für Vakuum-Aufdampfanlagen |
| DE10128091C1 (de) * | 2001-06-11 | 2002-10-02 | Applied Films Gmbh & Co Kg | Vorrichtung für die Beschichtung eines flächigen Substrats |
| DE102008043634A1 (de) | 2008-11-11 | 2010-05-12 | Robert Bosch Gmbh | Verdampfer für organische Materialien sowie Beschichtungsanlage zur Herstellung organischer Leuchtdioden und/oder organischer Solarzellen |
| WO2011026674A1 (de) | 2009-09-07 | 2011-03-10 | Robert Bosch Gmbh | Verdampfer, anordnung von verdampfern sowie beschichtungsanlage |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CH692000A5 (de) * | 1995-11-13 | 2001-12-31 | Unaxis Balzers Ag | Beschichtungskammer, Substratträger hierfür, Verfahren zum Vakuumbedampfen sowie Beschichtungsverfahren. |
| WO2000046418A1 (de) * | 1999-02-05 | 2000-08-10 | Applied Films Gmbh & Co. Kg | Vorrichtung zum beschichten von substraten mit einem materialdampf im unterdruck oder vakuum mit einer materialdampfquelle |
| US7194197B1 (en) * | 2000-03-16 | 2007-03-20 | Global Solar Energy, Inc. | Nozzle-based, vapor-phase, plume delivery structure for use in production of thin-film deposition layer |
| PT1585846E (pt) * | 2003-01-08 | 2010-11-23 | Kennametal Sintec Keramik Gmbh | Recipiente vaporizador aquecido por resistência |
| JP2005029895A (ja) * | 2003-07-04 | 2005-02-03 | Agfa Gevaert Nv | 蒸着装置 |
| US7166169B2 (en) * | 2005-01-11 | 2007-01-23 | Eastman Kodak Company | Vaporization source with baffle |
| DE102005030862B4 (de) * | 2005-07-01 | 2009-12-24 | Sintec Keramik Gmbh | Erstbenetzungshilfsmaterial für einen Verdampferkörper, seine Verwendung zum Herrichten der Verdampferfläche eines Verdampferkörpers und ein elektrisch beheizbarer keramischer Verdampferkörper |
| US8198123B2 (en) | 2008-04-15 | 2012-06-12 | Global Solar Energy, Inc. | Apparatus and methods for manufacturing thin-film solar cells |
| US8628617B2 (en) * | 2008-12-03 | 2014-01-14 | First Solar, Inc. | System and method for top-down material deposition |
| WO2011065998A1 (en) * | 2008-12-18 | 2011-06-03 | Veeco Instruments Inc. | Linear deposition source |
| WO2011065999A1 (en) * | 2008-12-18 | 2011-06-03 | Veeco Instruments Inc. | Linear deposition source |
| US20100159132A1 (en) * | 2008-12-18 | 2010-06-24 | Veeco Instruments, Inc. | Linear Deposition Source |
| WO2011082179A1 (en) * | 2009-12-28 | 2011-07-07 | Global Solar Energy, Inc. | Apparatus and methods of mixing and depositing thin film photovoltaic compositions |
| US9140466B2 (en) * | 2012-07-17 | 2015-09-22 | Eemax, Inc. | Fluid heating system and instant fluid heating device |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2440135A (en) * | 1944-08-04 | 1948-04-20 | Alexander Paul | Method of and apparatus for depositing substances by thermal evaporation in vacuum chambers |
| US3984585A (en) * | 1974-05-30 | 1976-10-05 | Fuji Xerox Co., Ltd. | Vacuum evaporation plating method |
| DE3817513A1 (de) * | 1988-05-24 | 1989-12-07 | Leybold Ag | Vorrichtung zum verdampfen von metallen |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5150237A (ja) * | 1974-10-29 | 1976-05-01 | Kurihara Shigeru | Shinkujochakuyohijochakubutsuno kanetsuhoho |
| JPS5938379A (ja) * | 1982-08-26 | 1984-03-02 | Mitsubishi Heavy Ind Ltd | 真空蒸着装置のスタ−トアツプ法 |
| JPS59177370A (ja) * | 1983-03-29 | 1984-10-08 | Mitsubishi Heavy Ind Ltd | 真空蒸着装置 |
| JPS616270A (ja) * | 1984-06-19 | 1986-01-11 | Mitsubishi Electric Corp | 蒸着装置の熱エネルギ回生装置 |
| JPS6286155A (ja) * | 1985-10-11 | 1987-04-20 | Mitsubishi Electric Corp | 溶融物質の蒸気噴出装置 |
| JPH02225659A (ja) * | 1989-01-18 | 1990-09-07 | Komatsu Ltd | 真空蒸着装置 |
-
1992
- 1992-02-19 DE DE4204938A patent/DE4204938C1/de not_active Expired - Fee Related
- 1992-08-11 US US07/928,970 patent/US5216742A/en not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2440135A (en) * | 1944-08-04 | 1948-04-20 | Alexander Paul | Method of and apparatus for depositing substances by thermal evaporation in vacuum chambers |
| US3984585A (en) * | 1974-05-30 | 1976-10-05 | Fuji Xerox Co., Ltd. | Vacuum evaporation plating method |
| DE3817513A1 (de) * | 1988-05-24 | 1989-12-07 | Leybold Ag | Vorrichtung zum verdampfen von metallen |
Non-Patent Citations (1)
| Title |
|---|
| JP 02-225659 A. In: Patents Abstracts of Japan, C-782, 28.Nov.1990, Vol.14, No.539 * |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4342574C1 (de) * | 1993-12-14 | 1995-04-13 | Hilmar Weinert | Bandbedampfungsanlage |
| DE19720026A1 (de) * | 1997-05-13 | 1998-11-19 | Ruckh Martin Dr Ing | Linienförmige Verdampferquelle für Vakuum-Aufdampfanlagen |
| DE19720026C2 (de) * | 1997-05-13 | 2000-08-10 | Martin Ruckh | Linienförmige Verdampferquelle für Vakuum-Aufdampfanlagen |
| DE10128091C1 (de) * | 2001-06-11 | 2002-10-02 | Applied Films Gmbh & Co Kg | Vorrichtung für die Beschichtung eines flächigen Substrats |
| DE10224908B4 (de) * | 2001-06-11 | 2009-11-05 | Applied Materials Gmbh & Co. Kg | Vorrichtung für die Beschichtung eines flächigen Substrats |
| US8012260B2 (en) | 2001-06-11 | 2011-09-06 | Applied Materials Gmbh & Co. Kg | Apparatus and method for coating an areal substrate |
| DE102008043634A1 (de) | 2008-11-11 | 2010-05-12 | Robert Bosch Gmbh | Verdampfer für organische Materialien sowie Beschichtungsanlage zur Herstellung organischer Leuchtdioden und/oder organischer Solarzellen |
| WO2011026674A1 (de) | 2009-09-07 | 2011-03-10 | Robert Bosch Gmbh | Verdampfer, anordnung von verdampfern sowie beschichtungsanlage |
| DE102009029236A1 (de) | 2009-09-07 | 2011-03-10 | Robert Bosch Gmbh | Verdampfer, Anordnung von Verdampfern sowie Beschichtungsanlage |
| DE102009029236B4 (de) | 2009-09-07 | 2023-02-16 | Robert Bosch Gmbh | Verdampfer, Anordnung von Verdampfern sowie Beschichtungsanlage |
Also Published As
| Publication number | Publication date |
|---|---|
| US5216742A (en) | 1993-06-01 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8100 | Publication of the examined application without publication of unexamined application | ||
| D1 | Grant (no unexamined application published) patent law 81 | ||
| 8364 | No opposition during term of opposition | ||
| 8327 | Change in the person/name/address of the patent owner |
Owner name: BALZERS UND LEYBOLD DEUTSCHLAND HOLDING AG, 63450 |
|
| 8327 | Change in the person/name/address of the patent owner |
Owner name: UNAXIS DEUTSCHLAND HOLDING GMBH, 63450 HANAU, DE |
|
| 8339 | Ceased/non-payment of the annual fee |