DE4042337C1 - Controlling degree of ionisation of vapour for surface coating - by preventing straight line current flow between hot anode target surface and cold cathode by using movable wall between them - Google Patents
Controlling degree of ionisation of vapour for surface coating - by preventing straight line current flow between hot anode target surface and cold cathode by using movable wall between themInfo
- Publication number
- DE4042337C1 DE4042337C1 DE4042337A DE4042337A DE4042337C1 DE 4042337 C1 DE4042337 C1 DE 4042337C1 DE 4042337 A DE4042337 A DE 4042337A DE 4042337 A DE4042337 A DE 4042337A DE 4042337 C1 DE4042337 C1 DE 4042337C1
- Authority
- DE
- Germany
- Prior art keywords
- cathode
- anode
- degree
- ionization
- coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000576 coating method Methods 0.000 title claims abstract description 34
- 239000011248 coating agent Substances 0.000 title claims abstract description 18
- 239000000463 material Substances 0.000 claims abstract description 22
- 238000010891 electric arc Methods 0.000 claims abstract description 7
- 238000000034 method Methods 0.000 claims description 37
- 238000001704 evaporation Methods 0.000 claims description 13
- 210000002381 plasma Anatomy 0.000 description 18
- 239000007789 gas Substances 0.000 description 11
- 230000008020 evaporation Effects 0.000 description 8
- 239000000758 substrate Substances 0.000 description 6
- 239000000853 adhesive Substances 0.000 description 5
- 230000001070 adhesive effect Effects 0.000 description 5
- 239000010406 cathode material Substances 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 238000007789 sealing Methods 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000009833 condensation Methods 0.000 description 3
- 230000005494 condensation Effects 0.000 description 3
- 239000002737 fuel gas Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000005240 physical vapour deposition Methods 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 239000010405 anode material Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 238000001465 metallisation Methods 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 239000011364 vaporized material Substances 0.000 description 2
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000010849 ion bombardment Methods 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 238000007885 magnetic separation Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 239000012858 resilient material Substances 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32055—Arc discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32614—Consumable cathodes for arc discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32623—Mechanical discharge control means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/32—Processing objects by plasma generation
- H01J2237/33—Processing objects by plasma generation characterised by the type of processing
- H01J2237/332—Coating
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE4026494A DE4026494A1 (de) | 1990-08-22 | 1990-08-22 | Vorrichtung zur materialverdampfung mittels vakuumlichtbogenentladung und verfahren |
| DE4042337A DE4042337C1 (en) | 1990-08-22 | 1990-08-22 | Controlling degree of ionisation of vapour for surface coating - by preventing straight line current flow between hot anode target surface and cold cathode by using movable wall between them |
| PCT/EP1991/001446 WO1992003841A2 (de) | 1990-08-22 | 1991-08-01 | Vorrichtung zur materialverdampfung mittels vakuumlichtbogenentladung und verfahren |
| AU82911/91A AU8291191A (en) | 1990-08-22 | 1991-08-01 | Device for evaporating material by means of a vacuum arc discharge and process |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE4026494A DE4026494A1 (de) | 1990-08-22 | 1990-08-22 | Vorrichtung zur materialverdampfung mittels vakuumlichtbogenentladung und verfahren |
| DE4042337A DE4042337C1 (en) | 1990-08-22 | 1990-08-22 | Controlling degree of ionisation of vapour for surface coating - by preventing straight line current flow between hot anode target surface and cold cathode by using movable wall between them |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE4042337C1 true DE4042337C1 (en) | 1991-09-12 |
Family
ID=39523631
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE4042337A Expired - Lifetime DE4042337C1 (en) | 1990-08-22 | 1990-08-22 | Controlling degree of ionisation of vapour for surface coating - by preventing straight line current flow between hot anode target surface and cold cathode by using movable wall between them |
| DE4026494A Granted DE4026494A1 (de) | 1990-08-22 | 1990-08-22 | Vorrichtung zur materialverdampfung mittels vakuumlichtbogenentladung und verfahren |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE4026494A Granted DE4026494A1 (de) | 1990-08-22 | 1990-08-22 | Vorrichtung zur materialverdampfung mittels vakuumlichtbogenentladung und verfahren |
Country Status (3)
| Country | Link |
|---|---|
| AU (1) | AU8291191A (enExample) |
| DE (2) | DE4042337C1 (enExample) |
| WO (1) | WO1992003841A2 (enExample) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4203371C1 (enExample) * | 1992-02-06 | 1993-02-25 | Multi-Arc Oberflaechentechnik Gmbh, 5060 Bergisch Gladbach, De | |
| DE4223091C1 (en) * | 1992-07-14 | 1993-07-01 | Vtd-Vakuumtechnik Dresden Gmbh, O-8017 Dresden, De | Water cooled holder for inserted exchangeable target - comprises housing, cooling plate and axially freely movable metal bellows, vacuum arc discharge vapour deposition appts. |
| WO1993014240A1 (de) * | 1992-01-10 | 1993-07-22 | Plasco Dr. Ehrich Plasma-Coating Gmbh | Verfahren zur ionisation thermisch erzeugter materialdämpfe und vorrichtung zur durchführung des verfahrens |
| DE19600993A1 (de) * | 1995-01-13 | 1996-08-08 | Technics Plasma Gmbh | Vorrichtung und Verfahren zur anodischen Verdampfung eines Materials mittels einer Vakuumlichtbogenentladung |
| DE102020124270A1 (de) | 2020-09-17 | 2022-03-17 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung eingetragener Verein | Verfahren und Vorrichtung zur anodischen Bogenverdampfung |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4409761B4 (de) * | 1994-03-22 | 2007-12-27 | Vtd Vakuumtechnik Dresden Gmbh | Einrichtung zur plasmagestützten Verdampfung in einem Bogenentladungsplasma |
| DE4444763C2 (de) * | 1994-12-19 | 1996-11-21 | Apvv Angewandte Plasma Vakuum | Elektrode zur Materialverdampfung für die Beschichtung von Substraten |
| DE19521419C2 (de) * | 1995-06-14 | 1997-11-27 | Plasma Applikation Mbh Ges | Verdampfereinheit zur Verdampfung von Materialien im elektrischen Vakuumbogen |
| US6223683B1 (en) | 1997-03-14 | 2001-05-01 | The Coca-Cola Company | Hollow plastic containers with an external very thin coating of low permeability to gases and vapors through plasma-assisted deposition of inorganic substances and method and system for making the coating |
| US6251233B1 (en) | 1998-08-03 | 2001-06-26 | The Coca-Cola Company | Plasma-enhanced vacuum vapor deposition system including systems for evaporation of a solid, producing an electric arc discharge and measuring ionization and evaporation |
| EP1103630B1 (de) * | 1999-11-17 | 2003-12-17 | Applied Films GmbH & Co. KG | Elektrodenanordnung |
| US6740378B1 (en) | 2000-08-24 | 2004-05-25 | The Coca-Cola Company | Multilayer polymeric/zero valent material structure for enhanced gas or vapor barrier and uv barrier and method for making same |
| US6720052B1 (en) | 2000-08-24 | 2004-04-13 | The Coca-Cola Company | Multilayer polymeric/inorganic oxide structure with top coat for enhanced gas or vapor barrier and method for making same |
| US6599584B2 (en) | 2001-04-27 | 2003-07-29 | The Coca-Cola Company | Barrier coated plastic containers and coating methods therefor |
| MXPA04009183A (es) | 2002-04-15 | 2004-11-26 | Coca Cola Co | Composicion de recubrimiento que contiene un aditivo epoxido y estructuras recubiertas con el mismo. |
| DE102024107070A1 (de) * | 2024-03-12 | 2025-09-18 | Oerlikon Surface Solutions AG, Pfäffikon, Zweigniederlassung Balzers | ARC Quelle mit Confinementringsystem mit veränderbarer Höhe |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR1496697A (fr) * | 1965-10-20 | 1967-09-29 | Gen Precision Inc | Appareil de revêtement de la surface d'un substrat |
| US3562141A (en) * | 1968-02-23 | 1971-02-09 | John R Morley | Vacuum vapor deposition utilizing low voltage electron beam |
| US3625848A (en) * | 1968-12-26 | 1971-12-07 | Alvin A Snaper | Arc deposition process and apparatus |
| US4197157A (en) * | 1975-03-19 | 1980-04-08 | Arthur D. Little, Inc. | Method for forming refractory tubing |
| DE3234100C2 (de) * | 1982-09-17 | 1985-04-11 | Gennadij Vasil'evič Ključko | Plasmalichtbogeneinrichtung zum Auftragen von Überzügen |
| DE3413891C2 (de) * | 1984-04-12 | 1987-01-08 | Horst Dipl.-Phys. Dr. 4270 Dorsten Ehrich | Verfahren und Vorrichtung zur Materialverdampfung in einem Vakuumbehälter |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1982002906A1 (en) * | 1981-02-23 | 1982-09-02 | Leonid Pavlovich Sablev | Consumable cathode for electric-arc evaporator of metal |
| DE3239131A1 (de) * | 1982-10-22 | 1984-04-26 | Ulrich 8950 Kaufbeuren Goetz | Verfahren zur thermischen verdampfung von metallen im vakuum |
| DE3707545A1 (de) * | 1987-02-03 | 1988-08-11 | Balzers Hochvakuum | Anordnung zur stabilisierung eines lichtbogens zwischen einer anode und einer kathode |
| DE3829260A1 (de) * | 1988-08-29 | 1990-03-01 | Multi Arc Gmbh | Plasmabeschichtungskammer mit entfernbarem schutzschirm |
| JPH06149358A (ja) * | 1992-11-13 | 1994-05-27 | Matsushita Electric Works Ltd | 移動ロボット |
-
1990
- 1990-08-22 DE DE4042337A patent/DE4042337C1/de not_active Expired - Lifetime
- 1990-08-22 DE DE4026494A patent/DE4026494A1/de active Granted
-
1991
- 1991-08-01 AU AU82911/91A patent/AU8291191A/en not_active Abandoned
- 1991-08-01 WO PCT/EP1991/001446 patent/WO1992003841A2/de not_active Ceased
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR1496697A (fr) * | 1965-10-20 | 1967-09-29 | Gen Precision Inc | Appareil de revêtement de la surface d'un substrat |
| US3562141A (en) * | 1968-02-23 | 1971-02-09 | John R Morley | Vacuum vapor deposition utilizing low voltage electron beam |
| US3625848A (en) * | 1968-12-26 | 1971-12-07 | Alvin A Snaper | Arc deposition process and apparatus |
| US4197157A (en) * | 1975-03-19 | 1980-04-08 | Arthur D. Little, Inc. | Method for forming refractory tubing |
| DE3234100C2 (de) * | 1982-09-17 | 1985-04-11 | Gennadij Vasil'evič Ključko | Plasmalichtbogeneinrichtung zum Auftragen von Überzügen |
| DE3413891C2 (de) * | 1984-04-12 | 1987-01-08 | Horst Dipl.-Phys. Dr. 4270 Dorsten Ehrich | Verfahren und Vorrichtung zur Materialverdampfung in einem Vakuumbehälter |
Non-Patent Citations (6)
| Title |
|---|
| DE-Z.: Vakuum-Technik 37, 1988, S. 176 * |
| SU-Z.: Soviet Phys. Letters 5, 1979, No. 8, S. 418 * |
| US-Z.: J. Vac. Sci. Technol. A(6), 1988, No. 1, S. 134 * |
| US-Z.: J. Vac. Sci. Technol. A(6), 1988, No. 4, S. 2499 * |
| US-Z.: J. Vac. Sci. Technol. A(7), 1989, No. 3, S. 2339 * |
| US-Z.: J. Vac. Sci. Technol. A(8), 1990, No. 3, S. 2160 * |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1993014240A1 (de) * | 1992-01-10 | 1993-07-22 | Plasco Dr. Ehrich Plasma-Coating Gmbh | Verfahren zur ionisation thermisch erzeugter materialdämpfe und vorrichtung zur durchführung des verfahrens |
| DE4203371C1 (enExample) * | 1992-02-06 | 1993-02-25 | Multi-Arc Oberflaechentechnik Gmbh, 5060 Bergisch Gladbach, De | |
| DE4223091C1 (en) * | 1992-07-14 | 1993-07-01 | Vtd-Vakuumtechnik Dresden Gmbh, O-8017 Dresden, De | Water cooled holder for inserted exchangeable target - comprises housing, cooling plate and axially freely movable metal bellows, vacuum arc discharge vapour deposition appts. |
| DE19600993A1 (de) * | 1995-01-13 | 1996-08-08 | Technics Plasma Gmbh | Vorrichtung und Verfahren zur anodischen Verdampfung eines Materials mittels einer Vakuumlichtbogenentladung |
| DE102020124270A1 (de) | 2020-09-17 | 2022-03-17 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung eingetragener Verein | Verfahren und Vorrichtung zur anodischen Bogenverdampfung |
Also Published As
| Publication number | Publication date |
|---|---|
| WO1992003841A3 (de) | 1992-04-16 |
| DE4026494A1 (de) | 1992-02-27 |
| AU8291191A (en) | 1992-03-17 |
| WO1992003841A2 (de) | 1992-03-05 |
| DE4026494C2 (enExample) | 1992-05-21 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE4042337C1 (en) | Controlling degree of ionisation of vapour for surface coating - by preventing straight line current flow between hot anode target surface and cold cathode by using movable wall between them | |
| EP0725843B1 (de) | Verfahren und einrichtung zum plasmaaktivierten elektronenstrahlverdampfen | |
| EP0158972B1 (de) | Verfahren und Vorrichtung zur Materialverdampfung in einer Unterdruckkammer durch Bogenentladung | |
| EP0306612B1 (de) | Verfahren zur Aufbringung von Schichten auf Substraten | |
| DE3513014C2 (de) | Verfahren zur Behandlung der Oberfläche von Werkstücken | |
| EP2159821A2 (de) | Beschichtungsvorrichtung zum Beschichten eines Substrats, sowie ein Verfahren zum Beschichten eines Substrats | |
| DE3206882A1 (de) | Verfahren und vorrichtung zum verdampfen von material unter vakuum | |
| EP2585622B1 (de) | Arc-verdampfungsquelle mit definiertem elektrischem feld | |
| DE3901401C2 (de) | Verfahren zur Steuerung einer Vakuum-Lichtbogenentladung | |
| DE4203371C1 (enExample) | ||
| EP0910683B1 (de) | Vakuumbeschichtungsanlage mit einer beschichtungskammer und zumindest einer quellenkammer | |
| EP0566606B1 (de) | Vorrichtung und verfahren zur materialverdampfung | |
| DE4336680C2 (de) | Verfahren zum Elektronenstrahlverdampfen | |
| DE102014207454B4 (de) | Vorrichtung zur Ausbildung einer Beschichtung auf einer Substratoberfläche | |
| DE19600993A1 (de) | Vorrichtung und Verfahren zur anodischen Verdampfung eines Materials mittels einer Vakuumlichtbogenentladung | |
| EP0791226B1 (de) | Vorrichtung zum beschichten von substraten mit einem materialdampf im unterdruck oder vakuum | |
| DE102006027853A1 (de) | Verfahren und Vorrichtung zum Erzeugen eines Plasmas sowie Verwendung derselben | |
| DE3030454C2 (de) | Vorrichtung zur großflächigen Abscheidung von haftfesten, insbesondere harten Kohlenstoffschichten | |
| WO1998058095A1 (de) | Verfahren zum plasmaaktivierten elektronenstrahlverdampfen und einrichtung zur durchführung des verfahrens | |
| DE69808267T2 (de) | Verfahren und vorrichtung für pvd beschichtung | |
| DE4011515C1 (en) | Coating substrate with metal (alloy) - by magnetic sputtering, with substrate mounted on surface held at negative voltage | |
| DD275883B5 (de) | Verfahren zur homogenen Schichtabscheidung mittels Bogenentladung | |
| DE19818868A1 (de) | Verfahren und Vorrichtung zur Filterung von makropartikelhaltigen Materialdämpfen | |
| DE4409761A1 (de) | Einrichtung zur plasmagestützten Verdampfung in einem Bogenentladungsplasma | |
| DD146625A1 (de) | Vorrichtung zum ionengestuetzten beschichten und ionenaetzen von substraten |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8100 | Publication of the examined application without publication of unexamined application | ||
| AC | Divided out of |
Ref country code: DE Ref document number: 4026494 Format of ref document f/p: P |
|
| D1 | Grant (no unexamined application published) patent law 81 | ||
| AC | Divided out of |
Ref country code: DE Ref document number: 4026494 Format of ref document f/p: P |
|
| 8364 | No opposition during term of opposition | ||
| AC | Divided out of |
Ref country code: DE Ref document number: 4026494 Format of ref document f/p: P |
|
| 8339 | Ceased/non-payment of the annual fee |