AU8291191A - Device for evaporating material by means of a vacuum arc discharge and process - Google Patents

Device for evaporating material by means of a vacuum arc discharge and process

Info

Publication number
AU8291191A
AU8291191A AU82911/91A AU8291191A AU8291191A AU 8291191 A AU8291191 A AU 8291191A AU 82911/91 A AU82911/91 A AU 82911/91A AU 8291191 A AU8291191 A AU 8291191A AU 8291191 A AU8291191 A AU 8291191A
Authority
AU
Australia
Prior art keywords
arc discharge
vacuum arc
evaporating material
evaporating
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU82911/91A
Inventor
Horst Ehrich
Brunhilde Hasse
Michael Mausbach
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Plasco Dr Ehrich Plasma Coating GmbH
Original Assignee
Plasco Dr Ehrich Plasma Coating GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Plasco Dr Ehrich Plasma Coating GmbH filed Critical Plasco Dr Ehrich Plasma Coating GmbH
Publication of AU8291191A publication Critical patent/AU8291191A/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32614—Consumable cathodes for arc discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/332—Coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
AU82911/91A 1990-08-22 1991-08-01 Device for evaporating material by means of a vacuum arc discharge and process Abandoned AU8291191A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE4026494 1990-08-22
DE4042337A DE4042337C1 (en) 1990-08-22 1990-08-22 Controlling degree of ionisation of vapour for surface coating - by preventing straight line current flow between hot anode target surface and cold cathode by using movable wall between them
DE4026494A DE4026494A1 (en) 1990-08-22 1990-08-22 DEVICE FOR EVAPORATING MATERIAL BY VACUUM ARC DISCHARGE AND METHOD

Publications (1)

Publication Number Publication Date
AU8291191A true AU8291191A (en) 1992-03-17

Family

ID=39523631

Family Applications (1)

Application Number Title Priority Date Filing Date
AU82911/91A Abandoned AU8291191A (en) 1990-08-22 1991-08-01 Device for evaporating material by means of a vacuum arc discharge and process

Country Status (3)

Country Link
AU (1) AU8291191A (en)
DE (2) DE4026494A1 (en)
WO (1) WO1992003841A2 (en)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4200429A1 (en) * 1992-01-10 1993-07-15 Ehrich Plasma Coating METHOD FOR IONIZING THERMALLY PRODUCED MATERIAL STEAMS AND DEVICE FOR IMPLEMENTING THE METHOD
DE4203371C1 (en) * 1992-02-06 1993-02-25 Multi-Arc Oberflaechentechnik Gmbh, 5060 Bergisch Gladbach, De
DE4223091C1 (en) * 1992-07-14 1993-07-01 Vtd-Vakuumtechnik Dresden Gmbh, O-8017 Dresden, De Water cooled holder for inserted exchangeable target - comprises housing, cooling plate and axially freely movable metal bellows, vacuum arc discharge vapour deposition appts.
DE4409761B4 (en) * 1994-03-22 2007-12-27 Vtd Vakuumtechnik Dresden Gmbh Device for plasma assisted evaporation in an arc discharge plasma
DE4444763C2 (en) * 1994-12-19 1996-11-21 Apvv Angewandte Plasma Vakuum Electrode for material evaporation for the coating of substrates
DE19600993A1 (en) * 1995-01-13 1996-08-08 Technics Plasma Gmbh Appts. for high rate anodic evapn. for substrate coating
DE19521419C2 (en) * 1995-06-14 1997-11-27 Plasma Applikation Mbh Ges Evaporator unit for the evaporation of materials in an electrical vacuum arc
US6223683B1 (en) 1997-03-14 2001-05-01 The Coca-Cola Company Hollow plastic containers with an external very thin coating of low permeability to gases and vapors through plasma-assisted deposition of inorganic substances and method and system for making the coating
US6251233B1 (en) 1998-08-03 2001-06-26 The Coca-Cola Company Plasma-enhanced vacuum vapor deposition system including systems for evaporation of a solid, producing an electric arc discharge and measuring ionization and evaporation
ATE256762T1 (en) 1999-11-17 2004-01-15 Applied Films Gmbh & Co Kg ELECTRODE ARRANGEMENT
US6740378B1 (en) 2000-08-24 2004-05-25 The Coca-Cola Company Multilayer polymeric/zero valent material structure for enhanced gas or vapor barrier and uv barrier and method for making same
US6720052B1 (en) 2000-08-24 2004-04-13 The Coca-Cola Company Multilayer polymeric/inorganic oxide structure with top coat for enhanced gas or vapor barrier and method for making same
US6599584B2 (en) 2001-04-27 2003-07-29 The Coca-Cola Company Barrier coated plastic containers and coating methods therefor
JP2005522572A (en) 2002-04-15 2005-07-28 ザ・コカ−コーラ・カンパニー Coating composition containing epoxide additive and structure coated therewith
DE102020124270A1 (en) 2020-09-17 2022-03-17 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung eingetragener Verein Process and device for anodic arc evaporation

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1496697A (en) * 1965-10-20 1967-09-29 Gen Precision Inc Apparatus for coating the surface of a substrate
US3562141A (en) * 1968-02-23 1971-02-09 John R Morley Vacuum vapor deposition utilizing low voltage electron beam
US3625848A (en) * 1968-12-26 1971-12-07 Alvin A Snaper Arc deposition process and apparatus
US4197157A (en) * 1975-03-19 1980-04-08 Arthur D. Little, Inc. Method for forming refractory tubing
JPS6011103B2 (en) * 1981-02-23 1985-03-23 レオニド パフロヴイツチ サブレフ Consumable cathode for electric arc metal evaporation equipment
AT376460B (en) * 1982-09-17 1984-11-26 Kljuchko Gennady V PLASMA ARC DEVICE FOR APPLYING COVERS
DE3239131A1 (en) * 1982-10-22 1984-04-26 Ulrich 8950 Kaufbeuren Goetz Process for the thermal vaporisation of metals in vacuo
DE3413891C2 (en) * 1984-04-12 1987-01-08 Horst Dipl.-Phys. Dr. 4270 Dorsten Ehrich Method and device for material evaporation in a vacuum container
DE8703520U1 (en) * 1987-02-03 1987-10-01 Balzers Hochvakuum GmbH, 65205 Wiesbaden Cathode surrounded by a limiting ring with an electrically conductive surface for an arc discharge
DE3829260A1 (en) * 1988-08-29 1990-03-01 Multi Arc Gmbh Plasma-coating chamber with removable guard screen
JPH06149358A (en) * 1992-11-13 1994-05-27 Matsushita Electric Works Ltd Mobile robot

Also Published As

Publication number Publication date
DE4026494A1 (en) 1992-02-27
WO1992003841A2 (en) 1992-03-05
DE4026494C2 (en) 1992-05-21
DE4042337C1 (en) 1991-09-12
WO1992003841A3 (en) 1992-04-16

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