DE3889392T2 - Schleudergiessbare Mischungen für die Herstellung von Schichten mit erhöhtem Kontrast im tiefen UV-Licht. - Google Patents

Schleudergiessbare Mischungen für die Herstellung von Schichten mit erhöhtem Kontrast im tiefen UV-Licht.

Info

Publication number
DE3889392T2
DE3889392T2 DE3889392T DE3889392T DE3889392T2 DE 3889392 T2 DE3889392 T2 DE 3889392T2 DE 3889392 T DE3889392 T DE 3889392T DE 3889392 T DE3889392 T DE 3889392T DE 3889392 T2 DE3889392 T2 DE 3889392T2
Authority
DE
Germany
Prior art keywords
spin
alkyl
photoresist
castable
radical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE3889392T
Other languages
German (de)
English (en)
Other versions
DE3889392D1 (de
Inventor
Gary Charles David
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu MicroSi Inc
Original Assignee
MicroSi Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by MicroSi Inc filed Critical MicroSi Inc
Publication of DE3889392D1 publication Critical patent/DE3889392D1/de
Application granted granted Critical
Publication of DE3889392T2 publication Critical patent/DE3889392T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09B—EDUCATIONAL OR DEMONSTRATION APPLIANCES; APPLIANCES FOR TEACHING, OR COMMUNICATING WITH, THE BLIND, DEAF OR MUTE; MODELS; PLANETARIA; GLOBES; MAPS; DIAGRAMS
    • G09B9/00—Simulators for teaching or training purposes
    • G09B9/02—Simulators for teaching or training purposes for teaching control of vehicles or other craft
    • G09B9/08—Simulators for teaching or training purposes for teaching control of vehicles or other craft for teaching control of aircraft, e.g. Link trainer
    • G09B9/30—Simulation of view from aircraft
    • G09B9/32—Simulation of view from aircraft by projected image
    • G09B9/326—Simulation of view from aircraft by projected image the image being transformed by optical means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F1/00—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties
    • H01F1/01—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials
    • H01F1/03—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity
    • H01F1/12—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials
    • H01F1/14—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials metals or alloys
    • H01F1/147—Alloys characterised by their composition
    • H01F1/153—Amorphous metallic alloys, e.g. glassy metals
    • H01F1/15383—Applying coatings thereon

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Theoretical Computer Science (AREA)
  • Electromagnetism (AREA)
  • Business, Economics & Management (AREA)
  • Chemical & Material Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • Power Engineering (AREA)
  • Aviation & Aerospace Engineering (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Educational Administration (AREA)
  • Educational Technology (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Paints Or Removers (AREA)
  • Materials For Photolithography (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
DE3889392T 1987-07-31 1988-07-29 Schleudergiessbare Mischungen für die Herstellung von Schichten mit erhöhtem Kontrast im tiefen UV-Licht. Expired - Fee Related DE3889392T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US7998887A 1987-07-31 1987-07-31

Publications (2)

Publication Number Publication Date
DE3889392D1 DE3889392D1 (de) 1994-06-09
DE3889392T2 true DE3889392T2 (de) 1994-11-17

Family

ID=22154078

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3889392T Expired - Fee Related DE3889392T2 (de) 1987-07-31 1988-07-29 Schleudergiessbare Mischungen für die Herstellung von Schichten mit erhöhtem Kontrast im tiefen UV-Licht.

Country Status (9)

Country Link
EP (1) EP0301559B1 (enExample)
JP (1) JPH07109512B2 (enExample)
KR (1) KR960005035B1 (enExample)
CA (1) CA1328700C (enExample)
DE (1) DE3889392T2 (enExample)
IE (1) IE63705B1 (enExample)
MX (1) MX170825B (enExample)
MY (1) MY103752A (enExample)
TW (1) TW224166B (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6162579A (en) * 1996-04-19 2000-12-19 Corning Incorporated Nitrone compounds as photopolymer polymerization inhibitors and contrast enhancing additives

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3481739A (en) * 1966-04-22 1969-12-02 Horizons Research Inc Increased speed in nonsilver light sensitive systems by incorporating therein organic n-oxides
US4677049A (en) * 1983-09-28 1987-06-30 General Electric Company Spin castable photobleachable layer forming compositions
JPS61121050A (ja) * 1984-11-16 1986-06-09 Fuji Photo Film Co Ltd 新規なフオトレジスト組成物
US4578344A (en) * 1984-12-20 1986-03-25 General Electric Company Photolithographic method using a two-layer photoresist and photobleachable film
JPS6269259A (ja) * 1985-09-24 1987-03-30 Toshiba Corp パタ−ン形成方法
JPH0688961B2 (ja) * 1985-12-30 1994-11-09 マイクロサイ，インコーポレイテッド ニトロン類の製造方法
IE59915B1 (en) * 1986-07-25 1994-04-20 Microsi Inc Contrast enhancement layer compositions, alkylnitrones, and use

Also Published As

Publication number Publication date
KR890002708A (ko) 1989-04-11
IE882355L (en) 1989-01-31
DE3889392D1 (de) 1994-06-09
TW224166B (enExample) 1994-05-21
JPH0250162A (ja) 1990-02-20
KR960005035B1 (ko) 1996-04-18
EP0301559A3 (en) 1990-05-23
IE63705B1 (en) 1995-05-31
MX170825B (es) 1993-09-20
EP0301559B1 (en) 1994-05-04
MY103752A (en) 1993-09-30
CA1328700C (en) 1994-04-19
JPH07109512B2 (ja) 1995-11-22
EP0301559A2 (en) 1989-02-01

Similar Documents

Publication Publication Date Title
US5196295A (en) Spin castable mixtures useful for making deep-UV contrast enhancement layers
DE69807913T2 (de) Thermisch aushärtbare polyester-antireflexionsschichten für mehrlagenresistverfahren
EP0378067B1 (de) Positiv arbeitendes strahlungsempfindliches Gemisch, enthaltend einen mehrfunktionellen alpha-Diazo-beta-ketoester, Verfahren zu dessen Herstellung und strahlungsempfindliches Aufzeichnungsmaterial enthaltend dieses Gemisch
DE4222423C2 (de) Lichtempfindliche Masse
DE3518927C2 (enExample)
DE2948324A1 (de) Lichtempfindliche masse und ihre verwendung
DE3441041A1 (de) Verfahren zur herstellung von squarainzusammensetzungen
DE3134158A1 (de) "zusammensetzung und verfahren zur ultrafeinen musterbildung"
EP0369219A1 (de) Neue, strahlungsempfindliche Verbindungen, hiermit hergestelltes strahlungsempfindliches Gemisch und Aufzeichnungsmaterial
DE4116243C2 (de) Neue Chinondiazidverbindung und lichtempfindliche Zusammensetzung, die diese enthält
DE3324795A1 (de) Negativ arbeitende fotoresistzusammensetzungen mit strahlungsabsorbierenden zusaetzen
DE3417607C2 (enExample)
DE2810310A1 (de) Lichtempfindliches hochmolekulares diazopolymerisat und seine verwendung zur herstellung von farbmischtafeln
DE3341394A1 (de) Verfahren zur herstellung einer waessrigen pigmentdispersion
EP0510446B1 (de) Negativ arbeitendes strahlungsempfindliches Gemisch und damit hergestelltes strahlungsempfindliches Aufzeichnungsmaterial
DE1597759A1 (de) Farbkorrektursystem
EP0456075B1 (de) Positiv arbeitendes strahlungsempfindliches Gemisch und strahlungsempfindliches Aufzeichnungsmaterial für die Belichtung mit DUV-Strahlung
DE69308403T2 (de) Hitzebeständige, negativ-arbeitende Photoresistzusammensetzung, lichtempfindliches Substrat und Verfahren zur Herstellung eines negativen Musters
EP0815579A1 (de) Black-matrix in farbbildröhren und verfahren zur herstellung der black-matrix
KR960005035B1 (ko) 심-uv 콘트라스트 향상층을 제조하는데 유용한 원심 주형 가능한 혼합물 및 이를 사용하여 패턴화된 감광성 내식막을 제조하는 방법
DE3738603A1 (de) Lagerstabile positiv-fotoresist-zusammensetzungen
DE2231247C2 (de) Vorsensibilisierte Druckplatte
EP0510441A1 (de) Positiv arbeitendes strahlungsempfindliches Gemisch und damit hergestelltes strahlungsempfindliches Aufzeichnungsmaterial
EP0619337B1 (de) Photolabile Polymere mit Triazen- oder/und Pentazadien-Bausteinen
DE2132063A1 (de) Photosensitive Zusammensetzungen und Materialien

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee