MX170825B - Mezclas moldeables centrifugamente utiles para formar capas mejoradoras de contraste en la region ultravioleta profunda - Google Patents

Mezclas moldeables centrifugamente utiles para formar capas mejoradoras de contraste en la region ultravioleta profunda

Info

Publication number
MX170825B
MX170825B MX012485A MX1248588A MX170825B MX 170825 B MX170825 B MX 170825B MX 012485 A MX012485 A MX 012485A MX 1248588 A MX1248588 A MX 1248588A MX 170825 B MX170825 B MX 170825B
Authority
MX
Mexico
Prior art keywords
radical
alkyl
hydrogen
centrifugally
useful
Prior art date
Application number
MX012485A
Other languages
English (en)
Inventor
Gary Charles Davis
Original Assignee
Microsi Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Microsi Inc filed Critical Microsi Inc
Publication of MX170825B publication Critical patent/MX170825B/es

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09B—EDUCATIONAL OR DEMONSTRATION APPLIANCES; APPLIANCES FOR TEACHING, OR COMMUNICATING WITH, THE BLIND, DEAF OR MUTE; MODELS; PLANETARIA; GLOBES; MAPS; DIAGRAMS
    • G09B9/00—Simulators for teaching or training purposes
    • G09B9/02—Simulators for teaching or training purposes for teaching control of vehicles or other craft
    • G09B9/08—Simulators for teaching or training purposes for teaching control of vehicles or other craft for teaching control of aircraft, e.g. Link trainer
    • G09B9/30—Simulation of view from aircraft
    • G09B9/32—Simulation of view from aircraft by projected image
    • G09B9/326—Simulation of view from aircraft by projected image the image being transformed by optical means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F1/00—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties
    • H01F1/01—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials
    • H01F1/03—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity
    • H01F1/12—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials
    • H01F1/14—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials metals or alloys
    • H01F1/147—Alloys characterised by their composition
    • H01F1/153—Amorphous metallic alloys, e.g. glassy metals
    • H01F1/15383—Applying coatings thereon

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Theoretical Computer Science (AREA)
  • Electromagnetism (AREA)
  • Chemical & Material Sciences (AREA)
  • Educational Technology (AREA)
  • Business, Economics & Management (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Aviation & Aerospace Engineering (AREA)
  • Educational Administration (AREA)
  • Dispersion Chemistry (AREA)
  • Power Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Paints Or Removers (AREA)
  • Materials For Photolithography (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)

Abstract

La presente invención se refiere a mezclas moldeables centrifugantemente, útiles para aplicar capas mejoradoras de contraste sobre materiales fotorresistentes, capaces de absorber en la región de 200 a 300 nm, caracterizadas porque comprenden en peso: A) 100 partes de solvente inerte; B) 2 a 20 partes de aglutinante orgánico inerte; y C) de 2 a 20 partes de alquil-N-alquil-nitrona de la fórmula:en donde R se selecciona de hidrógeno y un radical alquilo de C(-8); X es un radical monovalente seleccionado de hidrógeno y un radical extractor de electrones seleccionado de la clase que consiste de carboalcoxi, acilo y oxirano; Y es un grupo alifático monovalente seleccionado de R1; y R1 es un radical alquilo de C(1-8), R2 y R3 son radicales monovalentes seleccionados de hidrógeno y alquilo de C(1-8), Z es un miembro seleccionado de hidrógeno, radical alquilo de C(1-8) o un radical extractor de electrones seleccionado de la clase que consiste de nitrilo, carbozlcoxi y acilo, y R y/o Y pueden ser un radical alquileno divalente de C(3-5) o un radical alquileno divalente de C(3-5) sustituído con uno a tres radicales monoalentes, o una mezcla de ellos, seleccionada de la clase que consiste de ciano, halógeno, carboalcoxi, nitro, amino y alquilamino, los cuales radicales divalentes juntos pueden formar un anillo heterocíclico de C(5-7).
MX012485A 1987-07-31 1988-07-29 Mezclas moldeables centrifugamente utiles para formar capas mejoradoras de contraste en la region ultravioleta profunda MX170825B (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US7998887A 1987-07-31 1987-07-31

Publications (1)

Publication Number Publication Date
MX170825B true MX170825B (es) 1993-09-20

Family

ID=22154078

Family Applications (1)

Application Number Title Priority Date Filing Date
MX012485A MX170825B (es) 1987-07-31 1988-07-29 Mezclas moldeables centrifugamente utiles para formar capas mejoradoras de contraste en la region ultravioleta profunda

Country Status (9)

Country Link
EP (1) EP0301559B1 (es)
JP (1) JPH07109512B2 (es)
KR (1) KR960005035B1 (es)
CA (1) CA1328700C (es)
DE (1) DE3889392T2 (es)
IE (1) IE63705B1 (es)
MX (1) MX170825B (es)
MY (1) MY103752A (es)
TW (1) TW224166B (es)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6162579A (en) * 1996-04-19 2000-12-19 Corning Incorporated Nitrone compounds as photopolymer polymerization inhibitors and contrast enhancing additives

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3481739A (en) * 1966-04-22 1969-12-02 Horizons Research Inc Increased speed in nonsilver light sensitive systems by incorporating therein organic n-oxides
US4677049A (en) * 1983-09-28 1987-06-30 General Electric Company Spin castable photobleachable layer forming compositions
JPS61121050A (ja) * 1984-11-16 1986-06-09 Fuji Photo Film Co Ltd 新規なフオトレジスト組成物
US4578344A (en) * 1984-12-20 1986-03-25 General Electric Company Photolithographic method using a two-layer photoresist and photobleachable film
JPS6269259A (ja) * 1985-09-24 1987-03-30 Toshiba Corp パタ−ン形成方法
JPH0688961B2 (ja) * 1985-12-30 1994-11-09 マイクロサイ，インコーポレイテッド ニトロン類の製造方法
IE59915B1 (en) * 1986-07-25 1994-04-20 Microsi Inc Contrast enhancement layer compositions, alkylnitrones, and use

Also Published As

Publication number Publication date
EP0301559B1 (en) 1994-05-04
DE3889392D1 (de) 1994-06-09
CA1328700C (en) 1994-04-19
EP0301559A3 (en) 1990-05-23
TW224166B (es) 1994-05-21
KR890002708A (ko) 1989-04-11
IE63705B1 (en) 1995-05-31
JPH0250162A (ja) 1990-02-20
DE3889392T2 (de) 1994-11-17
KR960005035B1 (ko) 1996-04-18
JPH07109512B2 (ja) 1995-11-22
EP0301559A2 (en) 1989-02-01
IE882355L (en) 1989-01-31
MY103752A (en) 1993-09-30

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